JPH055664B2 - - Google Patents
Info
- Publication number
- JPH055664B2 JPH055664B2 JP3495284A JP3495284A JPH055664B2 JP H055664 B2 JPH055664 B2 JP H055664B2 JP 3495284 A JP3495284 A JP 3495284A JP 3495284 A JP3495284 A JP 3495284A JP H055664 B2 JPH055664 B2 JP H055664B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- oil
- film layer
- hole surface
- nozzle hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000005871 repellent Substances 0.000 claims description 28
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 239000002241 glass-ceramic Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229920005573 silicon-containing polymer Polymers 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- -1 perfluorocarbon compound Chemical class 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 14
- 238000000576 coating method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3495284A JPS60178065A (ja) | 1984-02-24 | 1984-02-24 | インクジエツトヘツド |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3495284A JPS60178065A (ja) | 1984-02-24 | 1984-02-24 | インクジエツトヘツド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60178065A JPS60178065A (ja) | 1985-09-12 |
| JPH055664B2 true JPH055664B2 (OSRAM) | 1993-01-22 |
Family
ID=12428496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3495284A Granted JPS60178065A (ja) | 1984-02-24 | 1984-02-24 | インクジエツトヘツド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60178065A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006218712A (ja) * | 2005-02-10 | 2006-08-24 | Ricoh Co Ltd | 液体吐出ヘッド及び画像形成装置 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5017946A (en) * | 1988-07-21 | 1991-05-21 | Canon Kabushiki Kaisha | Ink jet recording head having surface treatment layer and recording equipment having the head |
| CA1329341C (en) * | 1988-10-19 | 1994-05-10 | Rosemary Bridget Albinson | Method of forming adherent fluorosilane layer on a substrate and ink jet recording head containing such a layer |
| GB8906379D0 (en) * | 1989-03-20 | 1989-05-04 | Am Int | Providing a surface with solvent-wettable and solvent-non wettable zones |
| DE69132855T2 (de) * | 1990-07-21 | 2002-06-06 | Canon K.K., Tokio/Tokyo | Herstellungsverfahren eines Farbstrahlaufzeichnungskopfes und Farbstrahlaufzeichnungskopf |
| US5136310A (en) * | 1990-09-28 | 1992-08-04 | Xerox Corporation | Thermal ink jet nozzle treatment |
| WO1992013720A1 (fr) * | 1991-02-04 | 1992-08-20 | Seiko Epson Corporation | Tete d'impression a jet d'encre et son procede de fabrication |
| US5208606A (en) * | 1991-11-21 | 1993-05-04 | Xerox Corporation | Directionality of thermal ink jet transducers by front face metalization |
| CA2278601A1 (en) * | 1998-01-28 | 1999-08-05 | Hitoshi Fukushima | Liquid jet structure, ink jet type recording head and printer |
| WO2001089843A1 (en) | 2000-05-22 | 2001-11-29 | Seiko Epson Corporation | Head member and ink repellence treating method and treating device |
| JP4293035B2 (ja) * | 2003-05-07 | 2009-07-08 | セイコーエプソン株式会社 | 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置 |
-
1984
- 1984-02-24 JP JP3495284A patent/JPS60178065A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006218712A (ja) * | 2005-02-10 | 2006-08-24 | Ricoh Co Ltd | 液体吐出ヘッド及び画像形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60178065A (ja) | 1985-09-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |