JPH055664B2 - - Google Patents
Info
- Publication number
- JPH055664B2 JPH055664B2 JP3495284A JP3495284A JPH055664B2 JP H055664 B2 JPH055664 B2 JP H055664B2 JP 3495284 A JP3495284 A JP 3495284A JP 3495284 A JP3495284 A JP 3495284A JP H055664 B2 JPH055664 B2 JP H055664B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- oil
- film layer
- hole surface
- nozzle hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000005871 repellent Substances 0.000 claims description 28
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 239000002241 glass-ceramic Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229920005573 silicon-containing polymer Polymers 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- -1 perfluorocarbon compound Chemical class 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 14
- 238000000576 coating method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
Description
技術分野
本発明は、インクジエツトヘツド、より詳細に
は、ノズル孔面に撥水撥油膜層を有するインクジ
エツトヘツドに関する。
従来技術
インクジエツトヘツドにおいては、ノズルから
のインク垂れ等を防止するために、ノズル孔面に
撥水撥油膜層を施こすことが行われている。第１
図は、上記撥水撥油膜層を施こしたインクジエツ
トヘツドの部分的拡大断面図で、図中、１はノズ
ル孔面、２は撥水撥油膜層であるが、この撥水撥
油膜層を設けるために、使来、(1)塗布手段を用い
てフツ素樹脂、シリコン樹脂等をノズル孔面にコ
ーテイングする方法（特開昭56−21862号公報）、
(2)プラズマ重合法を用いてフツ素樹脂をノズル孔
面にコーテイングする方法（特開昭58−191172号
公報）等が提案されているが、前者の塗布方法で
は、ノズル孔を塞いでしまう、均一なコーテイン
グが困難である。フツ素樹脂とノズル孔面との密
着性が悪い等の欠点があり、また、後者のプラズ
マ重合法は、フツ素樹脂とノズル面との密着性が
悪く、膜の剥離がおこりやすい等の欠点があつ
た。また、ノズル孔面にスパツタリングによつて
高低抗体層と撥水層からなる多層表面処理を行
い、撥水層によりインクの濡れやノズルの目詰ま
りを防止し、高低抗体層を通電発熱させてノズル
洗浄時の乾燥或いは偶発的な濡れ障害の発生を防
止するようにすることも提案されているが（特公
昭52−24821）、撥水層とノズル孔面との密着性に
ついては何ら考慮されていない。すなわち、イン
クジエツトヘツドのノズル孔面に撥水撥油膜層を
施こすことは従来より種に提案されているが、い
ずれもノズル孔面と撥水撥油膜層との密着性につ
いては考慮されておらず、そのため、撥水撥油膜
層の剥離が起こりやすく、ヘツドの耐久性、信頼
性等の点で問題があつた。
目 的
本発明は、上述のごとき実情に鑑みてなされた
もので、特に、インクジエツトプリンタヘツドの
ノズル孔面への撥水、撥油剤のコーテイングにお
いて、ノズル孔面と撥水、撥油剤との密着性の向
上を計ることを目的としてなされたものである。
構 成
本発明の構成について、以下、実施例に基づい
て説明する。
第２図は、本発明によるインクジエツトヘツド
の部分的拡大断面図で、図中、１はノズル孔面、
２は撥水撥油膜層、３はノズル孔面１と撥水撥油
膜層２とを密着させるための中間膜層で、まず、
ノズル孔面１に、撥水撥油膜層２とノズル孔面１
との密着性を向上させるために、ノズル孔面及び
撥水撥油膜層に対して密着性の良い中間膜層物質
３をプラズマ重合法を用いてコーテイングし、次
いで、中間膜層３の上に撥水撥油膜層３をプラズ
マ重合法を用いてコーテイングして２重膜構造と
したものである。前記中間膜層の材料としては、
ノズル孔面及び撥水撥油性の膜と密着性の良い物
質、例えば、ノズル材料がガラスセラミツクであ
る場合は、含ケイ素ポリマーがあげられる。ま
た、前記撥水撥油性の膜としては、含フツ素ポリ
マーが使用される。また、プラズマ重合法は、無
電極、内部電極方式のいずれでも良く、また、高
周波放電、低周波放電のいずれでも良い。
実施例
・ 前記プラズマ重合法としては、無電極高周波
放電方式を用いた。
・ ノズル材料として、ガラスセラミツクを用い
た。
・ 前記中間材料である含ケイ素ポリマーとし
て、テトラアルキルシランを用いた。アルキル
基として、メチル基、エチル基のいずれでも良
い。
・ 前記撥水撥油膜材料である含フツ素ポリマー
として、ペルフルオロ炭素化合物、例えば、テ
トラフルオロエチレン、ヘキサフルオロプロピ
レンを用いた。
第３図は、上記実施例における内部構造図で、
本実施例の場合、ガラスセラミツク上のSiO2と
テトラアルキルシランのSiとが、プラズマ重合に
よりSi−Ｏ−Siの共有結合をなし、ガラスセラミ
ツクと中間膜であるテトラアルキルシランから出
来た含ケイ素ポリマー膜との強い密着性を生む。
さらにペルフルオロ炭素化合物のＣ及びＦとテト
ラアルキルシランのSi及びＣがプラズマ重合によ
りラジカル反応を起して結合することで、中間膜
層と撥水撥油膜層との間に強い密着性が生じる。
第４図は、従来のプラズマ重合法によるテトラ
フルオロエチレンのみをガラスセラミツク上にコ
ーテイングした試料と本発明である２層構造（中
間層テトラメチルシラン、撥水撥油層テトラフル
オロエチレン）膜をコーテイングした試料のイン
ク浸潰による撥水性の経時劣化のようすを示す図
で、曲線Ａが本発明による２層構造による試料の
特性図、曲線Ｂが従来の単層構造による試料の特
性図である。同図から明らかなように、テトラア
ルキルシランから出来た含ケイ素ポリマー膜のみ
の従来試料ではインク浸潰20時間で膜の剥離を起
こし、撥水性の劣化が見られたが２層構造膜の本
発明による試料では、ガラスセラミツクとの強い
密着性を示している。ただし、本発明による２層
構造膜の重合条件は、表１に示す通りであり、イ
ンクの物性は、インク粘度2.3cp（25℃）、インク
表面張力45dyn／cmであつた。
TECHNICAL FIELD The present invention relates to an ink jet head, and more particularly to an ink jet head having a water- and oil-repellent film layer on the nozzle hole surface. Prior Art In an ink jet head, a water- and oil-repellent film layer is applied to the nozzle hole surface to prevent ink from dripping from the nozzle. 1st
The figure is a partially enlarged sectional view of an inkjet head on which the water- and oil-repellent film layer is applied. In the figure, 1 is the nozzle hole surface, and 2 is the water- and oil-repellent film layer. In order to provide this, the conventional method is (1) coating the nozzle hole surface with fluororesin, silicone resin, etc. using a coating method (Japanese Patent Application Laid-Open No. 56-21862);
(2) A method has been proposed in which fluororesin is coated on the nozzle hole surface using a plasma polymerization method (Japanese Patent Application Laid-open No. 191172/1983), but the former coating method ends up blocking the nozzle hole. , uniform coating is difficult. There are disadvantages such as poor adhesion between the fluorocarbon resin and the nozzle hole surface, and the latter plasma polymerization method has disadvantages such as poor adhesion between the fluorocarbon resin and the nozzle surface and easy peeling of the film. It was hot. In addition, a multilayer surface treatment consisting of a high-low antibody layer and a water-repellent layer is applied to the nozzle hole surface by sputtering.The water-repellent layer prevents ink wetting and nozzle clogging, and the high-low antibody layer is heated by electricity to prevent the nozzle from getting wet. Although it has been proposed to prevent drying during cleaning or accidental wetting problems (Japanese Patent Publication No. 52-24821), no consideration has been given to the adhesion between the water-repellent layer and the nozzle hole surface. do not have. That is, although there have been several proposals to apply a water- and oil-repellent film layer to the nozzle hole surface of an inkjet head, none of them have taken into consideration the adhesion between the nozzle hole surface and the water- and oil-repellent film layer. Therefore, the water- and oil-repellent film layer was likely to peel off, causing problems in terms of head durability, reliability, etc. Purpose The present invention was made in view of the above-mentioned circumstances, and in particular, in coating the nozzle hole surface of an ink jet printer head with a water repellent or oil repellent, This was done for the purpose of improving adhesion. Configuration The configuration of the present invention will be described below based on Examples. FIG. 2 is a partially enlarged sectional view of an ink jet head according to the present invention, in which 1 is a nozzle hole surface;
2 is a water- and oil-repellent film layer; 3 is an intermediate film layer for bringing the nozzle hole surface 1 and the water- and oil-repellent film layer 2 into close contact;
A water- and oil-repellent film layer 2 and a nozzle hole surface 1 are provided on the nozzle hole surface 1.
In order to improve the adhesion with the nozzle hole surface and the water- and oil-repellent film layer, an interlayer material 3 with good adhesion is coated on the nozzle hole surface and the water- and oil-repellent film layer using a plasma polymerization method. The water- and oil-repellent film layer 3 is coated using a plasma polymerization method to form a double film structure. As the material of the intermediate film layer,
A substance that has good adhesion to the nozzle hole surface and the water- and oil-repellent film, for example, when the nozzle material is glass ceramic, includes a silicon-containing polymer. Further, as the water- and oil-repellent film, a fluorine-containing polymer is used. Further, the plasma polymerization method may be an electrodeless method or an internal electrode method, and may be a high frequency discharge method or a low frequency discharge method. Example - As the plasma polymerization method, an electrodeless high frequency discharge method was used. - Glass ceramic was used as the nozzle material. - Tetraalkylsilane was used as the silicon-containing polymer that is the intermediate material. The alkyl group may be either a methyl group or an ethyl group. - A perfluorocarbon compound, such as tetrafluoroethylene or hexafluoropropylene, was used as the fluorine-containing polymer that is the water- and oil-repellent film material. FIG. 3 is an internal structure diagram of the above embodiment,
In the case of this example, SiO 2 on the glass ceramic and Si in the tetraalkylsilane form a Si-O-Si covalent bond through plasma polymerization, and the silicon-containing silicon made from the glass ceramic and the tetraalkylsilane as an interlayer film is formed. Creates strong adhesion with polymer membranes.
Furthermore, C and F of the perfluorocarbon compound and Si and C of the tetraalkylsilane cause a radical reaction and bond together through plasma polymerization, thereby creating strong adhesion between the intermediate film layer and the water- and oil-repellent film layer. Figure 4 shows a sample in which only tetrafluoroethylene was coated on glass ceramic using the conventional plasma polymerization method, and a sample coated with the two-layer structure (intermediate layer of tetramethylsilane, water/oil repellent layer of tetrafluoroethylene) of the present invention. 1 is a diagram showing how the water repellency of a sample deteriorates over time due to ink immersion, where curve A is a characteristic diagram of a sample with a two-layer structure according to the present invention, and curve B is a characteristic diagram of a sample with a conventional single-layer structure. As is clear from the figure, in the case of the conventional sample made of only a silicon-containing polymer film made from tetraalkylsilane, the film peeled off after 20 hours of immersion in the ink, and water repellency deteriorated. The samples according to the invention show strong adhesion to the glass-ceramic. However, the polymerization conditions for the two-layer structure film according to the present invention are as shown in Table 1, and the physical properties of the ink were as follows: viscosity of the ink was 2.3 cp (at 25° C.), and surface tension of the ink was 45 dyn/cm.
【表】
効 果
以上の説明から明らかなように、本発明による
と、
(イ) プラズマ重合法を用いるため、塗布方法に比
べ、ノズル孔の目づまり不均一膜形成等がなく
生産における歩留りが良い。
(ロ) 撥水撥油単層膜に比べ密着性が良いので、耐
久性が良くヘツドの信頼性向上につながる。[Table] Effects As is clear from the above explanation, according to the present invention, (a) Since the plasma polymerization method is used, there is no clogging of nozzle holes and non-uniform film formation, and the production yield is improved compared to the coating method. good. (b) It has better adhesion than a single-layer water- and oil-repellent film, resulting in good durability and improved reliability of the head.
第１図は、従来のインクジエツトの部分的拡大
断面図、第２図は、本発明によるインクジエツト
ヘツドの部分的拡大断面図、第３図は、内部構造
図、第４図は、実験例を示す図である。
１……ノズル孔面、２……撥水撥油膜層、３…
…中間膜層。
FIG. 1 is a partially enlarged sectional view of a conventional inkjet, FIG. 2 is a partially enlarged sectional view of an inkjet head according to the present invention, FIG. 3 is an internal structure diagram, and FIG. 4 is an experimental example. FIG. 1... Nozzle hole surface, 2... Water- and oil-repellent film layer, 3...
...intermediate film layer.
Claims (1)
ラズマ重合による撥水撥油膜層を有するインクジ
エツトヘツドにおいて、前記撥水撥油膜層は含フ
ツ素ポリマーから成り、該撥水撥油膜層と前記ノ
ズル孔面との間に、該撥水撥油膜層を前記ノズル
孔面に密着させるための含ケイ素ポリマーからな
る中間膜層を有することを特徴とするインクジエ
ツトヘツド。 ２ 前記含ケイ素ポリマーが、テトラアルキルシ
ランであることを特徴とする特許請求の範囲第１
項に記載のインクジエツトヘツド。 ３ 前記含フツ素ポリマーが、ペルフルオロ炭素
化合物であることを特徴とする特許請求の範囲第
１項に記載のインクジエツトヘツド。[Scope of Claims] 1. An inkjet head having a water- and oil-repellent film layer formed by plasma polymerization on the hole surface of a nozzle made of glass ceramic, wherein the water- and oil-repellent film layer is made of a fluorine-containing polymer; An ink jet head comprising an intermediate film layer made of a silicon-containing polymer between the layer and the nozzle hole surface for bringing the water- and oil-repellent film layer into close contact with the nozzle hole surface. 2. Claim 1, wherein the silicon-containing polymer is a tetraalkylsilane.
The inkjet head described in section. 3. The ink jet head according to claim 1, wherein the fluorine-containing polymer is a perfluorocarbon compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3495284A JPS60178065A (en) | 1984-02-24 | 1984-02-24 | Ink jet head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3495284A JPS60178065A (en) | 1984-02-24 | 1984-02-24 | Ink jet head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60178065A JPS60178065A (en) | 1985-09-12 |
| JPH055664B2 true JPH055664B2 (en) | 1993-01-22 |
Family
ID=12428496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3495284A Granted JPS60178065A (en) | 1984-02-24 | 1984-02-24 | Ink jet head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60178065A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006218712A (en) * | 2005-02-10 | 2006-08-24 | Ricoh Co Ltd | Liquid drop ejection head and image forming device |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5017946A (en) * | 1988-07-21 | 1991-05-21 | Canon Kabushiki Kaisha | Ink jet recording head having surface treatment layer and recording equipment having the head |
| CA1329341C (en) * | 1988-10-19 | 1994-05-10 | Rosemary Bridget Albinson | Method of forming adherent fluorosilane layer on a substrate and ink jet recording head containing such a layer |
| GB8906379D0 (en) * | 1989-03-20 | 1989-05-04 | Am Int | Providing a surface with solvent-wettable and solvent-non wettable zones |
| ES2120954T3 (en) * | 1990-07-21 | 1998-11-16 | Canon Kk | METHOD FOR THE MANUFACTURE OF A PRINT HEAD FOR INK JETS AND HEAD FOR PRINTING BY INKS. |
| US5136310A (en) * | 1990-09-28 | 1992-08-04 | Xerox Corporation | Thermal ink jet nozzle treatment |
| JP3160908B2 (en) * | 1991-02-04 | 2001-04-25 | セイコーエプソン株式会社 | Ink jet recording head and method of manufacturing the same |
| US5208606A (en) * | 1991-11-21 | 1993-05-04 | Xerox Corporation | Directionality of thermal ink jet transducers by front face metalization |
| JP3960561B2 (en) * | 1998-01-28 | 2007-08-15 | セイコーエプソン株式会社 | Liquid ejection structure, ink jet recording head and printer |
| US6923525B2 (en) | 2000-05-22 | 2005-08-02 | Seiko Epson Corporation | Head member ink repellence treating method and treating device |
| JP4293035B2 (en) * | 2003-05-07 | 2009-07-08 | セイコーエプソン株式会社 | Liquid repellent film covering member, component of liquid ejection device, nozzle plate of liquid ejection head, liquid ejection head, and liquid ejection device |
-
1984
- 1984-02-24 JP JP3495284A patent/JPS60178065A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006218712A (en) * | 2005-02-10 | 2006-08-24 | Ricoh Co Ltd | Liquid drop ejection head and image forming device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60178065A (en) | 1985-09-12 |
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