JPH0555746A - High frequency copper clad laminated board and printed circuit board - Google Patents

High frequency copper clad laminated board and printed circuit board

Info

Publication number
JPH0555746A
JPH0555746A JP21763391A JP21763391A JPH0555746A JP H0555746 A JPH0555746 A JP H0555746A JP 21763391 A JP21763391 A JP 21763391A JP 21763391 A JP21763391 A JP 21763391A JP H0555746 A JPH0555746 A JP H0555746A
Authority
JP
Japan
Prior art keywords
wiring board
printed wiring
frequency
copper foil
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21763391A
Other languages
Japanese (ja)
Inventor
Masami Kamiya
雅己 神谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP21763391A priority Critical patent/JPH0555746A/en
Publication of JPH0555746A publication Critical patent/JPH0555746A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a printed circuit board with less high frequency transmission loss. CONSTITUTION:A copper foil which is given a surface length coefficient (obtained by multiplying the surface length per unit straight distance on the surface with 100) by making smooth both front and rear surfaces through elimination of protruded and recessed areas) is used for a metal layer to be used for signal transmission. (c) and (d) have a surface length coefficient which is smaller than that of (a) and (b). Moreover, the surface length coefficient is in the following relation, (c)=(d), (a)=(b).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高周波特性に優れた銅
張り積層板及びプリント配線板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper clad laminate excellent in high frequency characteristics and a printed wiring board.

【0002】[0002]

【従来の技術】回路用基板を高周波で使用するには様々
な特性が必要である。誘電体(絶縁層)については、t
anδが低く、適正なεr であることが必要であり、ポ
リイミド樹脂、変性ポリイミド樹脂又はフッ素樹脂が用
いられている。導体については、導電率が高く、錆びに
くく、表面粗さの小さいことが必要であり、通常は銅、
金が用いられている。
2. Description of the Related Art Various characteristics are required for using a circuit board at high frequencies. For the dielectric (insulating layer), t
It is necessary that an δ be low and be appropriate ε r , and a polyimide resin, a modified polyimide resin or a fluororesin is used. For conductors, it is necessary to have high conductivity, rust resistance, and small surface roughness, usually copper,
Gold is used.

【0003】高周波電流に特有の現象として表皮効果が
ある。表皮効果は、周波数が高くなるほど、電流が導体
の表層部に集中する現象である。電流密度は表面から深
くなるほど小さくなるが、表面の値の1/e(eは自然
対数)となる深さをスキンデプスといい、電流が流れる
深さの目安となる。スキンデプスは周波数に依存し、周
波数が高くなるほど小さくなる。
A skin effect is a phenomenon peculiar to high-frequency current. The skin effect is a phenomenon in which current concentrates on the surface layer of the conductor as the frequency increases. The current density decreases as it goes deeper from the surface, but the depth at which 1 / e (e is the natural logarithm) of the surface value is called the skin depth, which is a measure of the depth at which the current flows. The skin depth depends on the frequency, and becomes smaller as the frequency becomes higher.

【0004】回路用基板に使用する銅箔は、接着性を良
くするため、片面または両面を粗化し、更に多層化接着
を行う際には銅箔の表面を酸処理等で粗化されている。
ところが、周波数が高くなると表皮効果のため電流が表
層に集中し、電気抵抗(表皮抵抗)が大きくなる。その
結果として、電流の損失が大きくなるばかりでなく、ス
キンデプスが導体の表面粗さより小さくなると、電流は
導体の凹凸面を流れることとなって伝送距離が長くな
り、信号伝送に要する時間及び電流損失が大きくなる。
The copper foil used for the circuit board is roughened on one side or both sides in order to improve the adhesiveness, and the surface of the copper foil is roughened by an acid treatment or the like when performing multi-layered bonding. ..
However, as the frequency increases, the electric current concentrates on the surface layer due to the skin effect, and the electric resistance (skin resistance) increases. As a result, not only the loss of current increases, but when the skin depth becomes smaller than the surface roughness of the conductor, the current flows through the uneven surface of the conductor, the transmission distance becomes longer, and the time and current required for signal transmission are increased. The loss will increase.

【0005】この高周波に関する表面層の伝送時間及び
電流損失に比べると、回路用基板の誘電体の誘電率を下
げるとか、電子部品の実装を高密度とし線路長を短くす
るなどして得ることができる効果はその10%程度にす
ぎない。そこで、導体の表面粗さを小さくした高周波用
金属箔張り積層板が提案された(特開昭60−2483
44号公報参照)。
Compared with the transmission time and current loss of the surface layer for this high frequency, it can be obtained by lowering the permittivity of the dielectric of the circuit board, or by increasing the mounting density of electronic parts and shortening the line length. The effect that can be achieved is only about 10%. Therefore, a high-frequency metal foil-clad laminate in which the surface roughness of the conductor is reduced has been proposed (JP-A-60-2483).
44).

【0006】[0006]

【発明が解決しようとする課題】しかし、周波数が高く
なると、表面粗さを小さくしても効果がないことがわか
った。本発明は、衛星通信で使用されるような超高周波
領域においても表皮効果による損失を小さくすることを
目的とするものである。
However, it has been found that when the frequency becomes high, even if the surface roughness is made small, there is no effect. An object of the present invention is to reduce the loss due to the skin effect even in an ultra high frequency range such as used in satellite communication.

【0007】[0007]

【課題を解決するための手段】本発明は、高周波信号を
伝送する金属層が、表裏両面ともに表面長さ率が150
以下の銅箔からなる高周波用銅張り積層板である。表面
長さ率が150を超えると、信号の伝送時間が長くなり
所期の目的を達成できない。
According to the present invention, a metal layer for transmitting a high frequency signal has a surface length ratio of 150 on both front and back surfaces.
A high-frequency copper-clad laminate comprising the following copper foil. If the surface length ratio exceeds 150, the signal transmission time becomes long and the intended purpose cannot be achieved.

【0008】表面長さ率(以下RSIという)とは、表
面の単位直線距離あたりの表面長さに100を乗じた数
字である。表面に凹凸がないとRSIは100となる。
表面長さがその直線距離の2倍であると、RSIは20
0となる。
The surface length ratio (hereinafter referred to as RSI) is a number obtained by multiplying the surface length per unit linear distance of the surface by 100. If there is no unevenness on the surface, the RSI will be 100.
If the surface length is twice that straight distance, the RSI is 20.
It becomes 0.

【0009】RSIは次のようにして測定する。金属層
の部分に硬化性樹脂を注型し、これを研磨して金属層の
面方向に垂直な断面が明瞭に判別できる試料を作製す
る。これを、電子顕微鏡を用いて約1000〜5000
倍で撮影する。この写真の金属層の断面部分の表面長さ
を、キルビメ−タ(表面距離計)を使用して測定する。
単位距離(金属層の長手方向の直線距離)は、測定しよ
うとする表面の最大表面粗さ(Rmax)の5倍以上と
する。また、測定は異なる部分数カ所で行う。
The RSI is measured as follows. A curable resin is cast on the metal layer portion and polished to prepare a sample in which the cross section perpendicular to the surface direction of the metal layer can be clearly discriminated. About 1000 to 5000 of this using an electron microscope.
Shoot at double. The surface length of the cross-section of the metal layer in this photograph is measured using a quilvimeter (surface distance meter).
The unit distance (the linear distance in the longitudinal direction of the metal layer) is 5 times or more of the maximum surface roughness (Rmax) of the surface to be measured. Also, the measurement is performed at several different parts.

【0010】RSI150以下の銅箔には、粗化処理を
行わない圧延銅箔、圧延工程で物理的凹凸をつけた圧延
銅箔(ダル箔)、粗化面に電気的もしくは化学的処理を
行って平滑とした電解銅箔がある。圧延銅箔は、通常は
何らかの方法で粗化した後使用するが、本発明において
は粗化しないで使用する。脱脂、防錆処理を行う必要が
あることは言うまでもない。
For copper foils having an RSI of 150 or less, a rolled copper foil which is not subjected to a roughening treatment, a rolled copper foil (dull foil) which is physically roughened in the rolling step, and a roughened surface is subjected to an electrical or chemical treatment. There is an electrolytic copper foil that is smooth and smooth. The rolled copper foil is usually used after being roughened by some method, but in the present invention, it is used without being roughened. It goes without saying that degreasing and anticorrosion treatment are required.

【0011】圧延銅箔のうち、圧延工程で凹凸ロ−ルを
用いて凹凸をつけたものすなわちダル箔は、そのRSI
が150以下であり使用可能である。電解銅箔は、その
製造方法から、少なくとも片面は粗化面になる。通常の
電解銅箔では、厚み35μm、18μm、13μmのい
ずれも、RSIは200前後である。そこで製造後に、
この粗化面に電気的もしくは化学的処理を行って表面を
平滑にして使用する。
Among the rolled copper foils, the one having irregularities formed by using the irregularity roll in the rolling process, that is, the dull foil is the RSI of the rolled copper foil.
Is 150 or less and can be used. The electrolytic copper foil has a roughened surface on at least one side due to its manufacturing method. In an ordinary electrolytic copper foil, the RSI is around 200 for any of the thicknesses of 35 μm, 18 μm, and 13 μm. So after manufacturing,
The roughened surface is used by electrical or chemical treatment to smooth the surface.

【0012】本発明においては、使用する銅箔はいずれ
も、通常の多層化接着工程で行う酸処理、還元処理を行
わない。その理由は、いずれも粗化が非常に細かくな
り、RSIが150以上となるからである。
In the present invention, none of the copper foils used are subjected to the acid treatment or reduction treatment which is usually carried out in the multilayer adhesion step. The reason is that in both cases, the roughening becomes very fine and the RSI becomes 150 or more.

【0013】さらに、銅箔層は、通常はエッチングによ
って回路加工されるから、側面が非常に細かく粗化され
る。加うるに、銅箔は酸化しやすいために、側面に酸化
物が発生して更に変化の大きい凹凸となる可能性が高
い。そこで銅箔層に回路加工した後、金めっきする。金
めっきの厚みは、使用周波数におけるスキンデプスの2
倍程度とする。金めっきによって、導体抵抗が小さくな
り、また、酸化しないために凹凸が大きくならず最初の
表面形状を保持する。
Further, since the copper foil layer is usually processed into a circuit by etching, the side surface thereof is extremely finely roughened. In addition, since the copper foil is easily oxidized, an oxide is likely to be generated on the side surface to form unevenness having a large change. Therefore, after the circuit processing is performed on the copper foil layer, gold plating is performed. The thickness of gold plating is 2 of the skin depth at the operating frequency.
Double the amount. Gold plating reduces the conductor resistance, and since it does not oxidize, unevenness does not increase and the initial surface shape is retained.

【0014】本発明のプリント配線板は、他のプリント
配線板又は金属箔とを接着用樹脂フィルム介して積層一
体化してなる多層プリント配線板としても使用される。
本発明に係る積層板又はプリント配線板は、金属層に平
滑な銅箔を使用するが故に、通常の方法では接着できな
い。そこで、信号伝送層として用いる銅箔層の上下に接
着用樹脂フィルムを配置して、後に続く多層化接着の工
程で一体化するようにする。接着用樹脂フィルムの樹脂
は、基板に使用されている樹脂成分に類似のものを使う
のも方法の一つである。
The printed wiring board of the present invention is also used as a multilayer printed wiring board formed by laminating and integrating another printed wiring board or a metal foil via an adhesive resin film.
The laminated board or the printed wiring board according to the present invention cannot be adhered by a usual method because a smooth copper foil is used for the metal layer. Therefore, adhesive resin films are arranged above and below the copper foil layer used as the signal transmission layer so as to be integrated in the subsequent multilayer adhesion step. As the resin of the adhesive resin film, one similar to the resin component used for the substrate is used.

【0015】[0015]

【作用】一般に、単に表面粗さを小さくしてもRSIが
小さくなるとは限らない。その理由を図によって説明す
る。表面粗さを形成する凹凸が、正三角形状(図1)又
は円弧状(図2)であると仮定する。この形状を保った
まま表面粗さを小さくする。図の(a)と(b)とを比
較すれば明らかなように表面長さは変わらない。これに
対し、図の(c)と(d)から明らかなように、粗面の
頂角を大にする(図1では60度から120度)、又は
円弧の中心角を小にする(図2では180度から90
度)と表面長さは小さくなる。スキンデプスが表面粗さ
より小さくなるような高周波帯においては、信号電流が
表面の凹凸に沿って流れることになる。したがって、例
えば、厚み35μmの電解銅箔は、粗化面のRSIが約
200であるので、伝送距離が約2倍となり、伝送に要
する時間も約2倍、損失も約2倍となる。よって、表面
粗さを小さくしても、伝送損失は小さくならないが、表
面形状をなだらかにしてすなわちRSIを小さくすれば
伝送損失も小さくなる。
In general, simply reducing the surface roughness does not always reduce the RSI. The reason will be described with reference to the drawings. It is assumed that the irregularities forming the surface roughness have an equilateral triangle shape (FIG. 1) or an arc shape (FIG. 2). The surface roughness is reduced while maintaining this shape. As is clear from the comparison between (a) and (b) in the figure, the surface length does not change. On the other hand, as is apparent from (c) and (d) of the figure, the apex angle of the rough surface is made large (60 to 120 degrees in FIG. 1) or the central angle of the arc is made small (see FIG. 2 to 180 degrees to 90
Degree) and the surface length becomes smaller. In the high frequency band where the skin depth is smaller than the surface roughness, the signal current flows along the unevenness of the surface. Therefore, for example, an electrolytic copper foil having a thickness of 35 μm has a roughened surface RSI of about 200, so that the transmission distance is about doubled, the time required for transmission is also doubled, and the loss is also doubled. Therefore, even if the surface roughness is reduced, the transmission loss is not reduced, but if the surface shape is made gentle, that is, RSI is reduced, the transmission loss is also reduced.

【0016】[0016]

【実施例】実施例1 表面粗化してない圧延銅箔(厚み35μm、RSI=1
15)とポリイミド樹脂含浸ガラスクロスプリプレグと
をポリイミド樹脂フィルムを介して一体化し、4層のプ
リント配線板用基板とした。銅箔層の接着強さは、1.
0kg/cmで実用上差し支えない値であった。次に、
この基板に回路加工を施し、電気回路パタ−ンを形成
し、60℃、湿度90%で3000時間保った。そして
9GHzにおける信号の伝送時間を測定したところ、初
期値よりも3%長くなった。
Example 1 Rolled copper foil without surface roughening (thickness 35 μm, RSI = 1
15) and a polyimide resin-impregnated glass cloth prepreg were integrated via a polyimide resin film to obtain a four-layer printed wiring board substrate. The adhesive strength of the copper foil layer is 1.
The value was 0 kg / cm, which was practically acceptable. next,
Circuit processing was performed on this substrate to form an electric circuit pattern, which was kept at 60 ° C. and a humidity of 90% for 3000 hours. When the transmission time of the signal at 9 GHz was measured, it was 3% longer than the initial value.

【0017】実施例2 実施例1で得られたプリント配線板について、電気回路
パターンを形成した金属層の外部露出面(絶縁層と接し
ていない面)に厚み約5μmの金めっきを施した。この
回路について実施例1と同様なテストを行った。60
℃、湿度90%で3000時間保時前後における伝送時
間に変化はなく、実施例1のプリント配線板についての
初期値とほぼ同じであった。
Example 2 The printed wiring board obtained in Example 1 was subjected to gold plating with a thickness of about 5 μm on the externally exposed surface (the surface not in contact with the insulating layer) of the metal layer on which the electric circuit pattern was formed. The same test as in Example 1 was conducted on this circuit. 60
There was no change in the transmission time before and after 3000 hours at 90 ° C. and 90% humidity, which was almost the same as the initial value for the printed wiring board of Example 1.

【0018】比較例 片面粗化圧延銅箔(厚み35μm、RSI=207)を
用い、以下実施例1と同様にして4層のプリント配線板
用基板とした。銅箔層の接着強さは、1.2kg/cm
であった。この積層板の銅箔に回路加工を施して、電気
回路パタ−ンを形成し、伝送時間を測定した。伝送時間
は実施例1の約2.17倍であった。
Comparative Example Using a single-sided roughened rolled copper foil (thickness: 35 μm, RSI = 207), a four-layer printed wiring board substrate was prepared in the same manner as in Example 1 below. The adhesive strength of the copper foil layer is 1.2 kg / cm
Met. Circuit processing was performed on the copper foil of this laminated plate to form an electric circuit pattern, and the transmission time was measured. The transmission time was about 2.17 times that of Example 1.

【0019】[0019]

【発明の効果】本発明によって、高周波帯特有の表皮効
果のための信号伝送の遅れの少ないプリント配線板を得
ることができる。また、回路表面に金めっきをすること
により信号伝送能の劣化がなくなる。
According to the present invention, it is possible to obtain a printed wiring board with a small signal transmission delay due to the skin effect peculiar to the high frequency band. Moreover, the signal transmission ability is not deteriorated by plating the circuit surface with gold.

【図面の簡単な説明】[Brief description of drawings]

【図1】 表面長さと表面形状との関係の1例を示す図
である。
FIG. 1 is a diagram showing an example of a relationship between a surface length and a surface shape.

【図2】 表面長さと表面形状との関係の他の例を示す
図である。
FIG. 2 is a diagram showing another example of the relationship between the surface length and the surface shape.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 高周波信号を伝送する金属層が、表裏両
面ともに表面長さ率が150以下の銅箔からなる高周波
用銅張り積層板。
1. A high-frequency copper-clad laminate in which metal layers for transmitting high-frequency signals are copper foils having a surface length ratio of 150 or less on both front and back surfaces.
【請求項2】 請求項1記載の高周波用銅張り積層板を
回路加工してなる高周波用プリント配線板。
2. A high-frequency printed wiring board obtained by circuit-processing the high-frequency copper-clad laminate according to claim 1.
【請求項3】 請求項1記載の高周波用銅張り積層板を
回路加工した後、金属表面に金めっきを施してなる高周
波用プリント配線板。
3. A high-frequency printed wiring board obtained by circuit-processing the high-frequency copper-clad laminate according to claim 1, and then plating the metal surface with gold.
【請求項4】 請求項2又は3記載のプリント配線板と
他のプリント配線板又は金属箔とを接着用樹脂フィルム
介して積層一体化してなる多層プリント配線板。
4. A multilayer printed wiring board obtained by laminating and integrating the printed wiring board according to claim 2 and another printed wiring board or a metal foil with an adhesive resin film interposed therebetween.
JP21763391A 1991-08-29 1991-08-29 High frequency copper clad laminated board and printed circuit board Pending JPH0555746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21763391A JPH0555746A (en) 1991-08-29 1991-08-29 High frequency copper clad laminated board and printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21763391A JPH0555746A (en) 1991-08-29 1991-08-29 High frequency copper clad laminated board and printed circuit board

Publications (1)

Publication Number Publication Date
JPH0555746A true JPH0555746A (en) 1993-03-05

Family

ID=16707328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21763391A Pending JPH0555746A (en) 1991-08-29 1991-08-29 High frequency copper clad laminated board and printed circuit board

Country Status (1)

Country Link
JP (1) JPH0555746A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100401340B1 (en) * 2001-11-16 2003-10-10 엘지전선 주식회사 The surface treatment of electrodeposited copper foil for Printed Circuit Board
JP2004140244A (en) * 2002-10-18 2004-05-13 Kyocera Corp Package for housing semiconductor element and semiconductor device using it
KR100620129B1 (en) * 2003-04-04 2006-09-13 가부시키가이샤 덴소 Multi-layer circuit board
EP1820637A1 (en) * 2004-12-09 2007-08-22 Asahi Glass Company, Limited Laminate for printed wiring board
EP1830613A1 (en) * 2004-12-20 2007-09-05 Asahi Glass Company, Limited Laminate for flexible printed wiring boards
JP2012114696A (en) * 2010-11-25 2012-06-14 Mitsubishi Electric Corp High-frequency circuit board
KR20140139109A (en) 2012-03-29 2014-12-04 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Surface-treated copper foil
KR20140142341A (en) 2012-03-29 2014-12-11 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Surface-treated copper foil
WO2016035876A1 (en) * 2014-09-05 2016-03-10 古河電気工業株式会社 Copper foil, copper clad laminated plate, and substrate
WO2023276743A1 (en) * 2021-06-28 2023-01-05 株式会社村田製作所 Multilayered substrate and electronic device

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100401340B1 (en) * 2001-11-16 2003-10-10 엘지전선 주식회사 The surface treatment of electrodeposited copper foil for Printed Circuit Board
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US7687142B2 (en) 2004-12-09 2010-03-30 Asahi Glass Company, Limited Laminate for printed wiring board
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JP2015180777A (en) * 2012-03-29 2015-10-15 Jx日鉱日石金属株式会社 surface-treated copper foil
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KR20140139109A (en) 2012-03-29 2014-12-04 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Surface-treated copper foil
JP2015206119A (en) * 2012-03-29 2015-11-19 Jx日鉱日石金属株式会社 surface-treated copper foil
JPWO2013147116A1 (en) * 2012-03-29 2015-12-14 Jx日鉱日石金属株式会社 Surface-treated copper foil
JPWO2013147115A1 (en) * 2012-03-29 2015-12-14 Jx日鉱日石金属株式会社 Surface-treated copper foil
KR20160078512A (en) 2012-03-29 2016-07-04 제이엑스금속주식회사 Surface-treated copper foil
KR20140142341A (en) 2012-03-29 2014-12-11 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Surface-treated copper foil
JP2016056452A (en) * 2012-03-29 2016-04-21 Jx金属株式会社 Surface-treated copper foil
KR20160075865A (en) 2012-03-29 2016-06-29 제이엑스금속주식회사 Surface-treated copper foil
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JP5972486B1 (en) * 2014-09-05 2016-08-17 古河電気工業株式会社 Copper foil, copper clad laminate, and substrate
CN106574389A (en) * 2014-09-05 2017-04-19 古河电气工业株式会社 Copper foil, copper clad laminated plate, and substrate
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