JPH0552564B2 - - Google Patents
Info
- Publication number
- JPH0552564B2 JPH0552564B2 JP58137296A JP13729683A JPH0552564B2 JP H0552564 B2 JPH0552564 B2 JP H0552564B2 JP 58137296 A JP58137296 A JP 58137296A JP 13729683 A JP13729683 A JP 13729683A JP H0552564 B2 JPH0552564 B2 JP H0552564B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- film magnetic
- protective substrate
- thin film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 40
- 239000011521 glass Substances 0.000 claims description 29
- 230000001681 protective effect Effects 0.000 claims description 29
- 239000000853 adhesive Substances 0.000 claims description 23
- 230000001070 adhesive effect Effects 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 22
- 238000005520 cutting process Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 13
- 239000012790 adhesive layer Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
(イ) 産業上の利用分野
本発明は、薄膜磁気ヘツドパターンを形成して
成る基板上に保護用基板を接着して構成される薄
膜磁気ヘツドの製造方法に関するものである。[Detailed Description of the Invention] (a) Field of Industrial Application The present invention relates to a method for manufacturing a thin-film magnetic head, which is constructed by bonding a protective substrate onto a substrate on which a thin-film magnetic head pattern is formed. be.
(ロ) 従来技術
一般に、耐摩耗性の基板上に磁性体層、導電体
層等が夫々パターン化して形成された薄膜磁気ヘ
ツドを実装するには、ヘツドのテープ対接面側の
耐摩耗性を向上させるために、斯るパターン上に
耐摩耗の保護用基板を接着する必要がある。そし
て、斯る接着に用いる接着材としてはある程度の
耐摩耗性を有し、且つ接着時の加熱昇温によつて
薄膜磁気ヘツドの磁気特性を劣化させることのな
いように作業点400℃程度の鉛含有ガラスを用い
るのが一般的である。そしてまた、斯る接着を行
なうに際しては、少なくとも前記両基板に比べ
て耐摩耗性が一般に小さい接着層の厚さを出来る
限り薄くする、接着層中に残存する気泡を出来
る限り少なくする、薄膜磁気ヘツドのテープ対
接面近傍のみに保護用基板を接着し、ヘツドに外
部回路を接続するためのターミナル部は露出した
状態にしておく等の条件を満たし、更には基板上
に形成されている複数個のヘツドパターンに対し
て、同時に接着処理出来ることが望ましい。(b) Prior art In general, in order to mount a thin film magnetic head in which a magnetic layer, a conductive layer, etc. are patterned and formed on a wear-resistant substrate, it is necessary to improve the wear resistance of the tape-contacting surface of the head. In order to improve the performance, it is necessary to adhere a wear-resistant protective substrate onto such a pattern. The adhesive material used for such bonding has a certain degree of abrasion resistance, and the working temperature is about 400℃ so that the magnetic properties of the thin film magnetic head will not deteriorate due to the heating temperature increase during bonding. It is common to use lead-containing glass. Furthermore, when performing such bonding, at least the thickness of the adhesive layer, which generally has lower abrasion resistance than the above-mentioned substrates, should be made as thin as possible, the air bubbles remaining in the adhesive layer should be minimized, and the thin film magnetic material should be used. The protective board must be glued only near the tape-contacting surface of the head, and the terminal section for connecting the external circuit to the head should be left exposed. It is desirable to be able to perform bonding processing on individual head patterns at the same time.
(ハ) 発明の目的
本発明は斯る点に鑑み成されたもので、上記し
た条件を満たした保護用基板の接着を行なうこと
が出来るようにしたものである。(c) Purpose of the Invention The present invention has been made in view of the above points, and is capable of bonding protective substrates that meet the above-mentioned conditions.
(ニ) 発明の構成
即ち、本発明に依れば上記した目的を達成する
ために、薄膜磁気ヘツドパターンを形成して成る
基板上に保護用基板を接着して構成される薄膜磁
気ヘツドであつて、前記保護用基板に接着工程時
に接着材の逃し用として用いられる第1の溝と、
接着終了後の成形加工時に切断用として用いられ
る第2の溝とを予じめ形成しておくようにしたも
のである。(d) Structure of the Invention That is, according to the present invention, in order to achieve the above-mentioned object, there is provided a thin film magnetic head constructed by bonding a protective substrate onto a substrate formed with a thin film magnetic head pattern. a first groove used for releasing the adhesive during the bonding process on the protective substrate;
A second groove used for cutting during molding after completion of adhesion is formed in advance.
(ホ) 実施例
以下、本発明の一実施例について図面を参照し
ながら説明する。尚、本実施例では電磁変換手段
として磁気抵抗効果素子を用いる再生用としての
磁気抵抗効果型薄膜磁気ヘツドの製造方法につい
て説明する。(E) Embodiment Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In this embodiment, a method of manufacturing a magnetoresistive thin film magnetic head for reproduction using a magnetoresistive element as an electromagnetic transducer will be described.
先ず、第1図は磁性体層、導電体層、絶縁体層
等を夫々パターン化して形成した時点での磁気抵
抗効果型薄膜磁気ヘツドの断面図を示し、1は磁
気抵抗効果の大きな高透磁率の磁性体層、2は導
電体層、3は絶縁体層、4は各パターンが形成さ
れる下地となる基板である。この第1図のものに
おいて、絶縁体層3にて覆われた部分A上にガラ
ス接着材5を置き、更にその上に第2図に示すよ
うな溝加工が予じめ施された保護用基板6を第3
図に示すように配置する。ここで保護用基板6の
第1の溝6aは、ガラス接着材5の逃し用として
用いられ具体的には作業温度範囲に達して軟化し
たガラス接着材5が両基板4,6間で広がつて導
電体層2が露出したタオーミナル部(第1図B
部)に保護用基板6が接着されるのを防ぐための
ものであり、第2の溝6bは接着終了後の成形加
工時に切断用として用いられ具体的には接着工程
終了後にターミナル部上にある保護用基板を各パ
ターンを傷つけることなく切断除去するためのも
のである。 First, Figure 1 shows a cross-sectional view of a magnetoresistive thin film magnetic head after the magnetic layer, conductive layer, insulating layer, etc. have been patterned and formed. 2 is a conductive layer, 3 is an insulating layer, and 4 is a substrate on which each pattern is formed. In the case shown in Fig. 1, a glass adhesive 5 is placed on the portion A covered with the insulator layer 3, and a protective groove is preliminarily cut on top of the glass adhesive 5 as shown in Fig. 2. The third board 6
Arrange as shown. Here, the first groove 6a of the protective substrate 6 is used to release the glass adhesive 5, and specifically, the glass adhesive 5 that has softened upon reaching the working temperature range spreads between the two substrates 4 and 6. The terminal part where the conductor layer 2 is exposed (Fig. 1B)
The second groove 6b is used for cutting during the molding process after the adhesion is completed, and specifically, the second groove 6b is used to prevent the protective substrate 6 from being adhered to the terminal part after the adhesion process is completed. This is for cutting and removing a certain protective substrate without damaging each pattern.
次に、斯る第3図図示の配置状態で保護用基板
6が下に下地用の基板4が上になるように保持
し、上下方向から一様に加圧しながら(この加圧
は接着ガラスの破損を防ぐため配置状態がズレな
い程度の加圧にしておく)ガラス接着材5の作業
温度範囲(ガラスが軟化して接着機能を果たす範
囲)まで加熱昇温し、温度が所定のガラス接着材
5の作業温度範囲に達したら加圧を大きくする。
その結果軟化したガラス接着材5は両基板4,6
間隙に広がつて薄くなり、更に余分なガラス接着
材5は保護用基板6に形成された第1の溝6aに
流れ込んで吸収される。そのため、両基板4,6
間のガラス接着層は非常に薄いものとなり、且つ
ターミナル部の導電体層2にガラスが附着したり
或いは斯るターミナル部に保護用基板6が接着さ
れることも無い。そして、この様な接着工程はガ
ラス接着材の作業温度範囲で例えば10分間程度保
持した後、加圧を小さくしないで室温まで降温す
ることによつて終了し第4図に示す状態となる。 Next, hold the protective substrate 6 in the arrangement shown in FIG. (In order to prevent damage to the glass, apply pressure to the extent that the arrangement state does not shift)) Heat the glass adhesive material 5 to the working temperature range (the range where the glass softens and performs the adhesive function), and the temperature reaches the specified glass bonding temperature. When the working temperature range of material 5 is reached, the pressure is increased.
As a result, the softened glass adhesive 5 is applied to both the substrates 4 and 6.
The glass adhesive 5 spreads into the gap and becomes thinner, and the excess glass adhesive 5 flows into the first groove 6a formed in the protective substrate 6 and is absorbed. Therefore, both boards 4 and 6
The glass adhesive layer between them is very thin, and there is no possibility that glass will adhere to the conductor layer 2 of the terminal section or that the protective substrate 6 will be bonded to the terminal section. After the bonding process is maintained within the working temperature range of the glass bonding material for about 10 minutes, for example, the temperature is lowered to room temperature without reducing the pressure, thereby completing the bonding process, resulting in the state shown in FIG. 4.
従つて、斯る接着工程終了後第4図に示す切断
線C,D,Eで示す位置にて切断すると実装可能
な磁気抵抗効果型薄膜磁気ヘツドが得られる。こ
こで、外部回路が接続されるターミナル部を外部
に露出するために保護用基板6のみを切断するE
位置では、保護用基板6に予じめ切断用としての
第2の溝6bが形成されているため、導電体層2
等の各パターンを傷つけることなく行なうことが
出来る。 Therefore, after the bonding step is completed, a magnetoresistive thin film magnetic head that can be mounted is obtained by cutting at the positions indicated by cutting lines C, D, and E shown in FIG. At this point, only the protective board 6 is cut to expose the terminal section to which the external circuit is connected.
At this position, since the second groove 6b for cutting is formed in the protective substrate 6 in advance, the conductor layer 2
This can be done without damaging each pattern.
尚、前記ガラス接着材5としては、作業点が
400℃程度になるように成分組成を調合して溶解
作製したガラスインゴツトを長さ10mm、幅1mm、
厚さ0.2mm程度の短冊形に切断し、水溶液(弗酸
+弗化アンモニウム)で表面エツチングを施した
後、十分洗浄したものを用いるのが好ましく、そ
れに対してガラス粉末を用いると所定の部(第1
図のA部分)のみに接着材としてのガラスを配置
することが困難となり、また接着後接着層中に気
泡が残存し易い等の問題がある。ここで、表面エ
ツチングはガラスインゴツトを切断して容易に得
られる短冊形の寸法の限界から更に薄いガラス接
着材に整形し、切断によつて生じる表面の細かな
傷を平滑化することを目的として行なつており、
接着後接着層中に残存する気泡が少なくなる効果
がある。 Note that the glass adhesive 5 has a working point.
A glass ingot made by melting and mixing the ingredients to a temperature of about 400℃ is 10mm long, 1mm wide,
It is preferable to use etching that has been cut into strips about 0.2 mm thick, surface-etched with an aqueous solution (hydrofluoric acid + ammonium fluoride), and then thoroughly cleaned. (1st
It becomes difficult to place glass as an adhesive only in part A) in the figure, and there are also problems such as air bubbles tending to remain in the adhesive layer after adhesion. Here, the purpose of surface etching is to shape the glass adhesive into a thinner glass adhesive due to the limitations of the rectangular shape that can be easily obtained by cutting the glass ingot, and to smooth out small scratches on the surface caused by cutting. We are conducting this as
This has the effect of reducing the number of air bubbles remaining in the adhesive layer after adhesion.
このように、本発明による製造方法を用いれば
基板上に複数個形成されたヘツドパターンに対し
て、必要な条件を満たした状態で、同時に保護用
基板の接着を行なつて、その後の切断成形により
所望の薄膜磁気ヘツドを得ることが出来る。 As described above, by using the manufacturing method according to the present invention, a protective substrate can be simultaneously bonded to a plurality of head patterns formed on a substrate while satisfying the necessary conditions, and then cutting and forming can be performed. Thus, a desired thin film magnetic head can be obtained.
(ヘ) 発明の効果
上述した如く本発明の製造方法に依れば、薄膜
磁気ヘツドパターンを形成して成る基板上に、保
護用基板を接着して構成される薄膜磁気ヘツドで
あつて、斯る保護用基板の接着を、薄い接着層で
気泡を残存させることなく且つターミナル部に流
出させることなく行なうことが出来、接着終了後
ターミナル部上に位置している保護用基板のみの
切除も容易に行なうことが出来る。(f) Effects of the Invention As described above, according to the manufacturing method of the present invention, a thin film magnetic head is produced by adhering a protective substrate to a substrate on which a thin film magnetic head pattern is formed. The protective substrate can be bonded using a thin adhesive layer without leaving any air bubbles or leaking into the terminal area, and it is easy to remove only the protective substrate located on the terminal area after adhesion is completed. can be done.
図は本発明による薄膜磁気ヘツドの製造例を示
し、第1図はパターン化工程を終了した時点での
薄膜磁気ヘツドの断面図、第2図は溝加工を施し
た保護用基板の断面図、第3図は保護用基板とガ
ラス接着材の相対的配置を示す断面図、第4図は
接着工程終了時の状態及びその後の切断位置を示
す断面図である。
1……磁性体層、2……導電体層、4……下地
用の基板、5……ガラス接着材、6……保護用基
板、6a,6b……第1、第2の溝。
The figures show an example of manufacturing a thin film magnetic head according to the present invention, in which Fig. 1 is a sectional view of the thin film magnetic head after the patterning process is completed, Fig. 2 is a sectional view of a protective substrate with grooves, FIG. 3 is a sectional view showing the relative arrangement of the protective substrate and the glass adhesive, and FIG. 4 is a sectional view showing the state at the end of the bonding process and the subsequent cutting position. DESCRIPTION OF SYMBOLS 1... Magnetic layer, 2... Conductor layer, 4... Substrate for base, 5... Glass adhesive, 6... Protective substrate, 6a, 6b... First and second grooves.
Claims (1)
上に、保護用基板の平坦面を接着して構成される
薄膜磁気ヘツドの製造方法において、前記保護用
基板に、接着工程時に接着材の逃し用として用い
られる第1の溝と、接着終了後に前記薄膜磁気ヘ
ツドパターンのターミナル部上の保護用基板を切
断除去するために用いられる第2の溝とを、予じ
め形成しておき、該保護用基板を前記薄膜磁気ヘ
ツドパターンが形成された基板上にガラス接着材
を介して配置して加圧しながら昇温し、温度がガ
ラス接着材の所定の作業温度範囲に達した後加圧
を大きくして両基板間に介在されたガラス接着材
の厚みを薄くして残余のガラス接着材を前記第1
の溝にて吸収し、降温した後保護用基板の前記第
2の溝の裏側から切断加工を行うことにより、前
記薄膜磁気ヘツドパターンを傷つけることなくタ
ーミナル部上の保護用基板を除去することを特徴
とする薄膜磁気ヘツドの製造方法。 2 前記ガラス接着材として、その表面にエツチ
ングを施した短冊形ガラス薄板を用いることを特
徴とする特許請求の範囲第1項記載の薄膜磁気ヘ
ツドの製造方法。[Scope of Claims] 1. A method for manufacturing a thin-film magnetic head, which comprises bonding a flat surface of a protective substrate onto a substrate on which a thin-film magnetic head pattern is formed, wherein the protective substrate is bonded to the flat surface of the protective substrate. A first groove used for releasing the adhesive material and a second groove used for cutting and removing the protective substrate on the terminal portion of the thin film magnetic head pattern after the completion of bonding are formed in advance. Then, the protective substrate was placed on the substrate on which the thin film magnetic head pattern was formed via a glass adhesive, and the temperature was raised while applying pressure until the temperature reached a predetermined working temperature range of the glass adhesive. After that, the pressure is increased to reduce the thickness of the glass adhesive interposed between both substrates, and the remaining glass adhesive is removed from the first substrate.
The protective substrate on the terminal portion can be removed without damaging the thin film magnetic head pattern by absorbing it in the groove and cutting it from the back side of the second groove of the protective substrate after cooling down. A method for manufacturing a characteristic thin film magnetic head. 2. The method of manufacturing a thin film magnetic head according to claim 1, wherein a rectangular thin glass plate whose surface is etched is used as the glass adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13729683A JPS6028017A (en) | 1983-07-26 | 1983-07-26 | Production of thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13729683A JPS6028017A (en) | 1983-07-26 | 1983-07-26 | Production of thin film magnetic head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6028017A JPS6028017A (en) | 1985-02-13 |
JPH0552564B2 true JPH0552564B2 (en) | 1993-08-05 |
Family
ID=15195364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13729683A Granted JPS6028017A (en) | 1983-07-26 | 1983-07-26 | Production of thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6028017A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202309A (en) * | 1986-02-28 | 1987-09-07 | Sony Corp | Method for bonding protection plate for thin film magnetic head |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4932338A (en) * | 1972-07-28 | 1974-03-25 | ||
JPS55135322A (en) * | 1979-04-11 | 1980-10-22 | Fujitsu Ltd | Manufacture of thin-film magnetic head |
JPS5832216A (en) * | 1981-08-18 | 1983-02-25 | Sony Corp | Thin-film magnetic head |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5897719U (en) * | 1981-12-23 | 1983-07-02 | ソニー株式会社 | thin film magnetic head |
-
1983
- 1983-07-26 JP JP13729683A patent/JPS6028017A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4932338A (en) * | 1972-07-28 | 1974-03-25 | ||
JPS55135322A (en) * | 1979-04-11 | 1980-10-22 | Fujitsu Ltd | Manufacture of thin-film magnetic head |
JPS5832216A (en) * | 1981-08-18 | 1983-02-25 | Sony Corp | Thin-film magnetic head |
Also Published As
Publication number | Publication date |
---|---|
JPS6028017A (en) | 1985-02-13 |
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