JPH0552445B2 - - Google Patents
Info
- Publication number
- JPH0552445B2 JPH0552445B2 JP17341584A JP17341584A JPH0552445B2 JP H0552445 B2 JPH0552445 B2 JP H0552445B2 JP 17341584 A JP17341584 A JP 17341584A JP 17341584 A JP17341584 A JP 17341584A JP H0552445 B2 JPH0552445 B2 JP H0552445B2
- Authority
- JP
- Japan
- Prior art keywords
- heat
- temperature
- radiation source
- heat treatment
- treated object
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Radiation Pyrometers (AREA)
- Discharge Heating (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17341584A JPS6154184A (ja) | 1984-08-22 | 1984-08-22 | 加熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17341584A JPS6154184A (ja) | 1984-08-22 | 1984-08-22 | 加熱処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6154184A JPS6154184A (ja) | 1986-03-18 |
| JPH0552445B2 true JPH0552445B2 (enrdf_load_stackoverflow) | 1993-08-05 |
Family
ID=15960012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17341584A Granted JPS6154184A (ja) | 1984-08-22 | 1984-08-22 | 加熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6154184A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4890933A (en) * | 1988-02-17 | 1990-01-02 | Itt Corporation | Transmission method to determine and control the temperature of wafers or thin layers with special application to semiconductors |
| JPH04106782U (ja) * | 1991-02-28 | 1992-09-14 | スタンレー電気株式会社 | 車両用超音波式障害物検出装置 |
| US6183127B1 (en) * | 1999-03-29 | 2001-02-06 | Eaton Corporation | System and method for the real time determination of the in situ emissivity of a workpiece during processing |
| JP6188145B2 (ja) * | 2013-09-27 | 2017-08-30 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法及びプログラム |
-
1984
- 1984-08-22 JP JP17341584A patent/JPS6154184A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6154184A (ja) | 1986-03-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |