JPH0551897B2 - - Google Patents

Info

Publication number
JPH0551897B2
JPH0551897B2 JP63004607A JP460788A JPH0551897B2 JP H0551897 B2 JPH0551897 B2 JP H0551897B2 JP 63004607 A JP63004607 A JP 63004607A JP 460788 A JP460788 A JP 460788A JP H0551897 B2 JPH0551897 B2 JP H0551897B2
Authority
JP
Japan
Prior art keywords
water
soluble
image
photosensitive
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63004607A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01180540A (ja
Inventor
Norio Yabe
Hideaki Sasaki
Kuniaki Kadota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Kokusaku Pulp Co Ltd
Original Assignee
Sanyo Kokusaku Pulp Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Kokusaku Pulp Co Ltd filed Critical Sanyo Kokusaku Pulp Co Ltd
Priority to JP460788A priority Critical patent/JPH01180540A/ja
Priority to GB8905742A priority patent/GB2229286B/en
Priority to DE19893908506 priority patent/DE3908506A1/de
Priority to FR8903670A priority patent/FR2644907A1/fr
Publication of JPH01180540A publication Critical patent/JPH01180540A/ja
Publication of JPH0551897B2 publication Critical patent/JPH0551897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP460788A 1988-01-12 1988-01-12 画像形成方法 Granted JPH01180540A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP460788A JPH01180540A (ja) 1988-01-12 1988-01-12 画像形成方法
GB8905742A GB2229286B (en) 1988-01-12 1989-03-13 Method of forming reversal images
DE19893908506 DE3908506A1 (de) 1988-01-12 1989-03-15 Bilderzeugungsverfahren
FR8903670A FR2644907A1 (fr) 1988-01-12 1989-03-21 Methode de formation d'images

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP460788A JPH01180540A (ja) 1988-01-12 1988-01-12 画像形成方法

Publications (2)

Publication Number Publication Date
JPH01180540A JPH01180540A (ja) 1989-07-18
JPH0551897B2 true JPH0551897B2 (enrdf_load_stackoverflow) 1993-08-03

Family

ID=11588735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP460788A Granted JPH01180540A (ja) 1988-01-12 1988-01-12 画像形成方法

Country Status (4)

Country Link
JP (1) JPH01180540A (enrdf_load_stackoverflow)
DE (1) DE3908506A1 (enrdf_load_stackoverflow)
FR (1) FR2644907A1 (enrdf_load_stackoverflow)
GB (1) GB2229286B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04369651A (ja) * 1991-06-18 1992-12-22 Sanyo Kokusaku Pulp Co Ltd 多色画像形成方法
JP2596271B2 (ja) * 1991-09-10 1997-04-02 双葉電子工業株式会社 感光性組成物及び基板の製造方法
AT404095B (de) * 1993-12-10 1998-08-25 Petritsch Erich Reinigungs- und pflegemittel für humanhaar und verfahren zu dessen herstellung
DE69610259T2 (de) * 1995-06-16 2001-03-01 Seiko Epson Corp., Tokio/Tokyo System zum Vewalten von Bestellungen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2522225C2 (de) * 1975-05-20 1983-12-08 Nippon Paint Co., Ltd., Osaka Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5965840A (ja) * 1982-10-07 1984-04-14 Sanyo Kokusaku Pulp Co Ltd 着色画像の形成方法およびこれに使用するための着色画像形成用感光材料
JPS59166945A (ja) * 1982-10-25 1984-09-20 Nippon Kankoushi Kogyo Kk 水現像方式高遮光性感光シ−ト
JPS60133440A (ja) * 1983-12-22 1985-07-16 Sanyo Kokusaku Pulp Co Ltd 画像形成材料およびその画像形成方法
JPH0693118B2 (ja) * 1987-06-15 1994-11-16 日本製紙株式会社 感光性シート

Also Published As

Publication number Publication date
GB8905742D0 (en) 1989-04-26
FR2644907A1 (fr) 1990-09-28
DE3908506A1 (de) 1990-09-20
GB2229286B (en) 1993-04-07
JPH01180540A (ja) 1989-07-18
GB2229286A (en) 1990-09-19

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees