JPH0548612B2 - - Google Patents

Info

Publication number
JPH0548612B2
JPH0548612B2 JP59079085A JP7908584A JPH0548612B2 JP H0548612 B2 JPH0548612 B2 JP H0548612B2 JP 59079085 A JP59079085 A JP 59079085A JP 7908584 A JP7908584 A JP 7908584A JP H0548612 B2 JPH0548612 B2 JP H0548612B2
Authority
JP
Japan
Prior art keywords
optical system
wavelength
mask pattern
chromatic aberration
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59079085A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60222862A (ja
Inventor
Takamasa Hirose
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59079085A priority Critical patent/JPS60222862A/ja
Publication of JPS60222862A publication Critical patent/JPS60222862A/ja
Publication of JPH0548612B2 publication Critical patent/JPH0548612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59079085A 1984-04-19 1984-04-19 露光装置 Granted JPS60222862A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59079085A JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59079085A JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Publications (2)

Publication Number Publication Date
JPS60222862A JPS60222862A (ja) 1985-11-07
JPH0548612B2 true JPH0548612B2 (enrdf_load_stackoverflow) 1993-07-22

Family

ID=13680042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59079085A Granted JPS60222862A (ja) 1984-04-19 1984-04-19 露光装置

Country Status (1)

Country Link
JP (1) JPS60222862A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669014B2 (ja) * 1986-02-24 1994-08-31 株式会社ニコン 露光装置
JP2650895B2 (ja) * 1986-07-02 1997-09-10 松下電器産業株式会社 露光装置および露光方法

Also Published As

Publication number Publication date
JPS60222862A (ja) 1985-11-07

Similar Documents

Publication Publication Date Title
KR100200734B1 (ko) 에어리얼 이미지 측정 장치 및 방법
US4492459A (en) Projection printing apparatus for printing a photomask
JP3109852B2 (ja) 投影露光装置
US4811055A (en) Projection exposure apparatus
JPH06163348A (ja) 基板上にマスクパターンを投影する装置及び方法
US4798962A (en) Multi-wavelength projection exposure and alignment apparatus
GB2041554A (en) Registration marks for projection copying
JPS5830736B2 (ja) 半導体基板上のマスクのパタ−ンを投影印刷する装置
JPH10153866A (ja) 照明装置および該照明装置を備えた露光装置
US4792693A (en) Step-and-repeat exposure method
US6023321A (en) Projection exposure apparatus and method
JP2633028B2 (ja) 観察方法及び観察装置
US5774205A (en) Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure
JPS62188316A (ja) 投影露光装置
JPH0548612B2 (enrdf_load_stackoverflow)
JP2962972B2 (ja) 表面状態検査装置及び該装置を備える露光装置
JPS5950518A (ja) 投影プリント方法
JP3019505B2 (ja) 露光装置及びそれを用いた半導体チップの製造方法
JP3517483B2 (ja) 位置検出装置及びそれを用いた半導体デバイスの製造方法
JPH0612754B2 (ja) 投影露光装置
JP3326446B2 (ja) 露光方法及び装置、リソグラフィ方法、マーク焼き付け装置、及びプロキシミティ露光装置
JPH04267536A (ja) 位置検出装置
JP2819592B2 (ja) 位置合わせ装置
JP3295244B2 (ja) 位置決め装置
JP2591582B2 (ja) 投影型露光装置