JPH0546966U - Quartz crucible cleaning device - Google Patents

Quartz crucible cleaning device

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Publication number
JPH0546966U
JPH0546966U JP10577391U JP10577391U JPH0546966U JP H0546966 U JPH0546966 U JP H0546966U JP 10577391 U JP10577391 U JP 10577391U JP 10577391 U JP10577391 U JP 10577391U JP H0546966 U JPH0546966 U JP H0546966U
Authority
JP
Japan
Prior art keywords
crucible
cleaning
quartz crucible
section
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10577391U
Other languages
Japanese (ja)
Other versions
JP2557463Y2 (en
Inventor
光男 松村
宏 松井
享 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to JP10577391U priority Critical patent/JP2557463Y2/en
Publication of JPH0546966U publication Critical patent/JPH0546966U/en
Application granted granted Critical
Publication of JP2557463Y2 publication Critical patent/JP2557463Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】 坩堝を構成する素材の最大破壊圧力を基準
に、その挟持能力をその保持力に加味するとともに、混
在する大きさの坩堝を同一手段で搬送可能の搬送機構を
持つ微小気泡を含有する石英坩堝の洗浄手段を提供する
こと。 【構成】 付属する部材と機構を介して、またはそれら
とともに、それぞれの動きが求心または遠心方向に対称
的に左右移動が可能でかつ、同時に上下移動可能の下方
に垂下する一対の部材を有して構成する駆動系を備えた
搬送機構が、所定トルクを発生可能なトルクモータから
なる駆動源によって、前記部材が搬送対象坩堝を挟持し
て、該坩堝を隣接する工程箇所へ搬送可能に構成すると
ともに、あわせて該坩堝を前記部材が最大坩堝破壊圧力
以下の挟持圧力で常時付勢可能に構成し、また前記搬送
機構を搬入側用と搬出側用との一対で構成するととも
に、坩堝設定部位に水平で平行に配設する一対の支持棒
を設け、その支持棒を介して該坩堝開口端面の一部を保
持可能にする構成にしたものである。
(57) [Abstract] [Purpose] Based on the maximum breaking pressure of the materials that make up the crucible, a clamping mechanism is added to the holding force, and a crucible of mixed sizes can be conveyed by the same means. To provide a means for cleaning a quartz crucible containing fine bubbles. [Structure] Through a member and a mechanism attached thereto, or together with them, a pair of downwardly downwardly movable members that can be moved symmetrically in the centripetal or centrifugal directions A transport mechanism including a drive system configured as described above is configured such that the member holds a crucible to be transported by a drive source including a torque motor capable of generating a predetermined torque, and the crucible can be transported to an adjacent process location. Along with this, the crucible is configured such that the member can always be urged with a clamping pressure that is equal to or lower than the maximum crucible breaking pressure, and the transport mechanism is composed of a pair of loading side and unloading side, and a crucible setting portion. A pair of support rods arranged horizontally and in parallel are provided, and a part of the crucible opening end face can be held through the support rods.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、半導体製造に用いる単結晶引き上げ用坩堝について、その坩堝製造 の洗浄・乾燥工程に使用する搬送手段を有する装置に係わり、特に微小気泡を含 有する石英坩堝の洗浄装置に関する。 The present invention relates to a crucible for pulling a single crystal used in semiconductor manufacturing, to an apparatus having a conveying means used in a cleaning / drying step in manufacturing the crucible, and more particularly to a cleaning apparatus for a quartz crucible containing fine bubbles.

【0002】[0002]

【従来の技術】[Prior Art]

従来より半導体製造に用いる単結晶引き上げ用石英坩堝は、その坩堝表面を良 好な温度分布に保持することが、良質な単結晶を製造する一要因であるので、そ の温度環境を実現するために、計画的に微小気泡を坩堝内部に含むように、微小 気泡を含有する石英坩堝は製造される(特開昭60−215534号公報)。一方、石英 坩堝は特にその内面層が不純物元素を含む等汚染されていると、引き上げられる 単結晶に対して大きな悪影響を与えるので、製造の最終工程において化学洗浄( 例:弗化水素酸液使用)が行なわれる。この化学洗浄は、当該坩堝を一定時間化 学洗浄液に滞留させ、表面を液に浸食させてから純水により化学洗浄液の脱液処 理を行い、その純水洗浄を終えてから、乾燥工程に移される。従来の石英坩堝の 洗浄・乾燥工程は、搬入→HF洗浄→純水洗浄→乾燥→搬出、の各工程の1連か ら成り、その間に当該坩堝を所要場所へ運ぶ、移送作業が行われる。 In the conventional quartz crucible for pulling a single crystal for semiconductor production, maintaining a good temperature distribution on the surface of the crucible is one of the factors for producing a good quality single crystal, so in order to realize that temperature environment. In addition, a quartz crucible containing fine bubbles is manufactured so that fine bubbles are intentionally included in the crucible (Japanese Patent Laid-Open No. 60-215534). On the other hand, if the inner surface layer of the quartz crucible is contaminated, especially if it contains impurities, it will have a great adverse effect on the single crystal to be pulled, so chemical cleaning (eg, using a hydrofluoric acid solution) will occur in the final manufacturing process. ) Is performed. In this chemical cleaning, the crucible is allowed to stay in the chemical cleaning liquid for a certain period of time, the surface is eroded, and the chemical cleaning liquid is dewatered with pure water. Be transferred. The conventional cleaning / drying process of a quartz crucible consists of a series of processes of carrying-in → HF cleaning → pure water cleaning → drying → carrying out, during which the crucible is carried to a required place and transferred.

【0003】 従来その坩堝の搬出入に使用の搬送機構は、その表面に紐状の滑り止めを施し 、移送する坩堝外形に合わせた円弧状に形成した架台上に坩堝の左右底面を均等 になるように載せ、その架台をクレーンにより移動させ、架台よりの坩堝の落下 防止に対策するもの(特開昭63−62543号公報)や、坩堝保持アームが坩堝の表 面の汚染源にならないように該アームにコーティングを施して、その上に坩堝を 保持する構造のものを移動クレーンで移送可能に構成するものなどがあった。そ してそれらは結局は、坩堝の一定寸法およびその重量に合わせた構造となってい て、坩堝の形状が変われば搬送機構も変えることが一般であった。 ところで石英坩堝は外表面部にクラックが一旦発生すると、緻密な内面へその クラックが速く伸びる傾向が知られ(前記、特開昭60−215534号公報)、この性 質が坩堝を搬入する際に、その取扱を注意深くさせる要因となっている。 上記した坩堝製造において、坩堝自体は年々大型になりその大型化傾向に伴い 、洗浄のための液タンク、乾燥のための装置と同じく、搬出入装置においてもそ れらに使用する治具・装置に対し、数々の改良と投資が行われてきたが、それに も拘らず、例えば坩堝の重量の増大化や取り扱う化学洗浄液の危険性とともに搬 出入装置による、坩堝表面に対するクラック発生要因の付与、落下障害、坩堝へ の汚染を含むマイナス要因は減ることはなく、それらに多くの注意を増やさなけ ればならない作業者に対する、精神的、肉体的な作業環境の悪化は無視し得ない 状態である。換言すれば、これら従来技術における改善努力は、規模の大きさに 伴うものであっても、技術的にマイナーな改良に留まっていた。 すなわち洗浄装置の従来技術では、坩堝の大型化のたびに関係装置・治具を取 り替えるなど、対症療法的改良範囲内にあった。Conventionally, a transfer mechanism used for carrying in and out of the crucible has a string-like anti-slip on its surface, and the left and right bottom surfaces of the crucible are evenly arranged on a pedestal formed in an arc shape according to the outer shape of the crucible to be transferred. The crucible holding arm to prevent the crucible from falling from the cradle (Japanese Patent Laid-Open No. 63-62543), and the crucible holding arm so that it does not become the source of contamination on the crucible surface. In some cases, the arm was coated and the crucible was held on the arm so that it could be transferred by a mobile crane. After all, they had a structure adapted to a certain size of the crucible and its weight, and it was general that the transport mechanism was changed if the shape of the crucible was changed. By the way, it is known that once a crack is generated on the outer surface of a quartz crucible, the crack tends to spread rapidly to the dense inner surface (the above-mentioned Japanese Patent Laid-Open No. 60-215534). , It is a factor that makes the handling careful. In the above-mentioned crucible manufacturing, the crucible itself becomes larger year by year, and due to the trend toward larger size, as well as the liquid tank for cleaning and the device for drying, the jigs / devices used for them in the carry-in / out device as well. On the other hand, various improvements and investments have been made, but nevertheless, for example, increasing the weight of the crucible and the danger of chemical cleaning liquid to be handled, as well as giving cracking factors to the crucible surface by the loading and unloading device, and falling obstacles. However, the negative factors including contamination of the crucible are not diminished, and the deterioration of the mental and physical working environment for the workers, who have to pay much attention to them, cannot be ignored. In other words, the improvement efforts in these conventional techniques have been limited to technically minor improvements, even if they are accompanied by large scale. In other words, the conventional technology of the cleaning device was within the range of symptomatic improvement, such as changing the related devices and jigs each time the crucible was upsized.

【0004】[0004]

【考案が解決しようとする課題】[Problems to be solved by the device]

しかしながら従来の石英坩堝の洗浄装置は、その搬送機構が一定大きさ、ない し重量に対処するもので、その坩堝が有する構造が持つ内部応力または強度に対 応して、当該搬送機構の保持能力を設定するという概念から作られていなかった 。そのため当該坩堝重量の全体を保持する性能を持っていても、搬出機構と当該 坩堝との当接位置における単位荷重と当該坩堝部位の構成素材が有する単位当り 内部強度とが整合しないときは、クラック発生要因を蓄積し、または一度の搬出 入で当接する坩堝部位にクラックを発生させるか、引いてはその時間経過、保持 回数頻度が増えるに連れて、その坩堝を使用不能にさせることも可能となる。 However, in the conventional quartz crucible cleaning device, the transfer mechanism deals with a certain size or weight, and the holding capacity of the transfer mechanism is adjusted in response to the internal stress or strength of the structure of the crucible. Was not made from the concept of setting. Therefore, even if the crucible has the ability to hold the entire weight of the crucible, if the unit load at the contact position between the carry-out mechanism and the crucible does not match the internal strength per unit of the constituent material of the crucible part, the crack does not occur. It is possible to accumulate the factors of occurrence, or to generate a crack in the crucible part that comes into contact with it once with the loading or unloading, or to make the crucible unusable as time passes and the frequency of holding increases. Become.

【0005】 ところで坩堝の大型化に伴い、同一の搬送機構を使用し続けると前記した不整 合状態は増々大きくなるばかりか、坩堝が小型であったときは整合していたもの も、そして重量、大きさともその搬送機構の能力に余力が残されている場合にあ っても、前記坩堝の有する強度との関係が不整合状態に変わることが生ずる。 従って石英坩堝の大きさが、短いサイクルで変更が生じることで、搬送機構の 装置・治具の大きさを一定し続けることの不具合と、一方でその坩堝大きさの変 更のたびに搬送機構を変更しざるを得ないことと合わせて、前記した従来の搬送 手段の持つ技術方式が、能率的な自動化を進める障害の1つとなっていた。By the way, as the size of the crucible becomes larger, if the same transport mechanism is continuously used, the above-mentioned unbalanced state becomes larger and larger, and when the crucible was small, some of them were aligned and the weight, Even when the size of the crucible has a surplus capacity, the relationship with the strength of the crucible may change to an inconsistent state. Therefore, the size of the quartz crucible changes in a short cycle, which keeps the size of the equipment and jig of the transfer mechanism constant, and on the other hand, the size of the transfer mechanism changes every time the size of the crucible changes. In addition to having to change the above, the technical method of the above-mentioned conventional transportation means has been one of the obstacles for promoting efficient automation.

【0006】 本考案の目的は、かかる従来技術の欠点に鑑み、前記石英坩堝の構造の特性を 充分考慮し、該坩堝の大きさの増大化など社会的需要の対応を図りつつ、効果的 搬送方式の採用によって石英坩堝の直径に無関係な手段により、図らずも石英坩 堝が障害を受けることのない搬送機構を有し、かつ搬送工程での自動化機構の導 入による良好な製造環境の作出、もしくはアイドル時間の縮小と作業環境の向上 を図った、石英坩堝の洗浄装置を提供することを目的とする。In view of the drawbacks of the prior art, an object of the present invention is to effectively consider the characteristics of the structure of the quartz crucible and increase the size of the crucible so as to meet social demands while effectively transporting the quartz crucible. By adopting the method, the quartz crucible has a transport mechanism that does not inadvertently damage the quartz crucible by means that is unrelated to the diameter of the crucible, and an automated mechanism is introduced in the transport process to create a good manufacturing environment. Another object of the present invention is to provide a quartz crucible cleaning device with reduced idle time and improved working environment.

【0007】[0007]

【課題を解決するための手段】[Means for Solving the Problems]

本考案は、前記坩堝を開口面を下向きに設置した状態で、その坩堝を洗浄工程 の各工程、すなわち搬入部、洗浄槽、乾燥槽および搬出部のそれぞれの隣接する 処理工程へ搬送する、一または複数の搬送機構を備えた石英坩堝の洗浄装置にお いて、該搬送機構6を、下方に垂下した一対のアーム部材46と、該アーム部材 46を坩堝1外周面から左右に離接可能に揺動させる駆動系39と、所定圧のト ルクを発生可能な該駆動系39の駆動源40とにより構成し、前記駆動系39の 駆動により前記アーム部材46を坩堝1外周面に挟持させた状態で坩堝1を、隣 接する処理工程へ搬送可能に構成するとともに、該搬送時に前記駆動源40のト ルク圧を利用して前記坩堝1に坩堝破壊圧力より小なる挟持圧を常時付勢可能に 構成したことを特徴とするものである。 また、洗浄室および乾燥室をそれぞれ複数個配設した前記洗浄装置において、 前記搬送機構6を搬入部4側と搬出部8側にそれぞれ配し、これらを同一移動レ ール42に沿って相互に独立して移動可能に構成したことを特徴とするものであ る。 さらに搬入部4、洗浄槽2、乾燥槽3および搬出部8のそれぞれの坩堝1設置 部位を、水平にかつ平行に配設した、該洗浄槽2においては一対の支持棒7で形 成するとともに、該支持棒7を介して坩堝1開口端面の一部を保持可能に構成し た洗浄装置を特徴とするものである。なお該乾燥槽3においては石英坩堝支持体 26が前記支持棒7と同様な作用を有する保持が可能に構成されている。 この場合前記支持棒7を含む、それぞれの坩堝1設置部位を固定的に配設する 必要はなく、必要に応じて、その坩堝設置面が水平に保たれ、所定の位置への移 動と停止が可能になされ、かつ信頼できるロック手段を付設するものであれば、 全体を移動可能に構成してもよい。 According to the present invention, the crucible is installed with the opening face downward, and the crucible is conveyed to each step of the cleaning step, that is, the adjoining processing steps of the loading section, the cleaning tank, the drying tank and the unloading section. Alternatively, in a quartz crucible cleaning device equipped with a plurality of transfer mechanisms, the transfer mechanism 6 can be separated from the outer peripheral surface of the crucible 1 to the left and right, and the pair of arm members 46 hanging downward. It is composed of a drive system 39 to be swung and a drive source 40 of the drive system 39 capable of generating a torque of a predetermined pressure, and the arm member 46 is held between the outer peripheral surface of the crucible 1 by the drive of the drive system 39. In this state, the crucible 1 can be transferred to an adjacent processing step, and at the time of the transfer, the clamping pressure smaller than the crucible breaking pressure can be constantly applied to the crucible 1 by utilizing the torque pressure of the drive source 40. That you have configured It is an butterfly. Further, in the cleaning device having a plurality of cleaning chambers and a plurality of drying chambers, the transfer mechanism 6 is arranged on the loading section 4 side and the unloading section 8 side, respectively, and these are moved along the same moving rail 42. It is characterized in that it is independently movable. Further, the crucible 1 installation portions of the carry-in section 4, the cleaning tank 2, the drying tank 3 and the carry-out section 8 are arranged horizontally and in parallel. In the cleaning tank 2, a pair of support rods 7 are formed. The cleaning device is characterized in that a part of the opening end face of the crucible 1 can be held via the support rod 7. In the drying tank 3, the quartz crucible support 26 is configured to be capable of holding the same action as the support rod 7. In this case, it is not necessary to fixedly arrange each crucible 1 installation site including the support rod 7, and if necessary, the crucible installation surface is kept horizontal, and the crucible 1 is moved to a predetermined position and stopped. The entire structure may be movable as long as it is capable of locking and has a reliable locking means.

【0008】 なお本考案において、請求項1は図1と図2に、請求項2は図5に、請求項3 は図3ないし図5にその内容をそれぞれ図示する。In the present invention, claim 1 is shown in FIGS. 1 and 2, claim 2 is shown in FIG. 5, and claim 3 is shown in FIGS. 3 to 5, respectively.

【0009】[0009]

【作用】[Action]

かかる技術手段によれば、前記従来発明のように、搬送坩堝の重量やその大き さにのみに基く保持能力を有して搬送するのでなく、図1に示すごとく坩堝の大 きさが変わっても、それに対応可能の保持機構を有して、すなわち当該坩堝を左 右に挟み込んでその時のトルクを制御可能とさせて保持するので、坩堝の直径に 関係なく保持するとともに、該搬出機構の能力を常に数値に捉えて、予知された 前記坩堝の破壊圧力以下で搬送することが出来る。 本考案装置を、洗浄槽と乾燥槽とに共通する同一移動レール上で連係可能にか つ個別に配設して、洗浄、乾燥それぞれの工程に専属的な自由な搬送操作を可能 としたので、前工程あるいは後工程の処理操作遅れによる隣接工程でのアイドル 時間を最小とするとともに、一方の故障または調整期間中の緊急時の予備機とし て、他方を実工程に使用して工程管理を保全可能とすることが出来る。 さらに常に一定の、坩堝載置に安定し、かつ搬送機構の搬送に都合のよいよう に配設する、一対の支持棒で構成する坩堝1の設定部位は、該坩堝の大きさの種 類に拘らずその配設位置を固定するので、搬送機構の制御操作を容易に且つ確実 にすることが出来るとともに、搬送工程の管理を円滑にして、この搬送機構を公 知の自動化技術に結合して、隣接する他の工程の時間管理と連係させることを可 能にする。 この結果、坩堝の大形化また、大小の坩堝が混在する洗浄処理の何れにも対処 可能な搬送機構を提供することとなり、従って本考案装置に関連する製造工程管 理を融通可能のものとすることが出来る。 According to the technical means, unlike the conventional invention, the crucible is not transported with the holding ability based only on the weight and the size of the crucible, but the size of the crucible is changed as shown in FIG. Also has a holding mechanism that can cope with this, that is, the crucible is held between the left and right sides so that the torque at that time can be controlled and held, so that it can be held regardless of the diameter of the crucible and the capability of the carry-out mechanism. Can always be regarded as a numerical value and can be conveyed at a pressure equal to or lower than the predicted breaking pressure of the crucible. Since the device of the present invention can be linked and separately arranged on the same moving rail that is common to the cleaning tank and the drying tank, it is possible to perform a free transfer operation exclusive to the cleaning and drying processes. In addition, the idle time in the adjacent process due to the delay in the processing operation of the preceding process or the following process is minimized, and one of them is used as a standby machine in case of failure or during an adjustment period and the other is used for the actual process for process control. It can be maintained. Furthermore, the setting part of the crucible 1 which is always fixed and is stable for placing on the crucible and convenient for the transportation of the transport mechanism is composed of a pair of support rods. Since the placement position is fixed regardless of this, the control operation of the transfer mechanism can be performed easily and reliably, the management of the transfer process is facilitated, and this transfer mechanism is combined with the publicly known automation technology. , It is possible to link with time management of other adjacent processes. As a result, it is possible to provide a transfer mechanism capable of coping with both the size increase of the crucible and the cleaning process in which large and small crucibles coexist. Therefore, it is possible to flexibly control the manufacturing process related to the device of the present invention. You can do it.

【0010】[0010]

【実施例】【Example】

以下、図面を参照して本考案の好適な実施例を例示的に詳しく説明する。ただ しこの実施例に記載されている構成部品の寸法、材質、形状、その相対配置など は特に特定的な記載がない限りは、この考案の範囲をそれのみに限定する趣旨で はなく、単なる説明例に過ぎない。 図1は、本考案実施例の、乾燥室における搬送機構の要部を示す、側面図で、 石英坩堝支持体26に載置する坩堝1は、その両側端底部に搬送機構6の一対の 保持ブロック47が密着状に差し込まれ、同じくその坩堝1側面に密着状に当接 する補助ブロック48とともに前記坩堝1を左右から挟み込んで、上下に移動さ せ且つ搬送可能になっている。該保持ブロック47は、支持枠44に支えられて 駆動系39を構成するアーム部材46、ドライブ軸45および反転ギアボックス 39aを介して、トルクモータ40からなる駆動源40によって移動制御可能とな っている。このとき前記当接面を介し発生する保持トルクが予知された坩堝破壊 圧力以下であるようにここに図示しない公知技術により制御可能になっている。 なお前記保持ブロック47と前記補助ブロック48の外表面は、前記坩堝1の 表面に接触する際に汚染が生じない物性材料により、樹脂コーティングがなされ ている。 図2は、本考案実施例の、搬送機構の要部を示す平面図で、駆動源40は反転 ギアボックスを介して、その端部を支持枠44の桁44aと44bとに嵌設する軸 受け51aに保持されたドライブ軸45の各軸45aと45bとを反転させて、それ ぞれの各軸が逆回転可能になって、該ドライブ軸45に連接する、左右の横桟46 aと46bとを求心的にまたは遠心的に移動可能にしている。 図3は、本考案実施例の、搬入部での搬送機構の全体を示す、正面図で、搬送 機構6は2個一対の石英坩堝1を個別に保持可能になって配設してなり、その一 連の搬出機構6は、車輪42a、42bを付設するレール部材43を介して洗浄・乾 燥工程装置に共通して形成する移動架台受梁38上の、移動レール42上に前後 移動可能になっていて、ここに図示しない装置外の操作手段により、その制御操 作がなされる。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. However, the dimensions, materials, shapes, relative positions, etc. of the components described in this embodiment are not intended to limit the scope of the present invention to them, unless otherwise specified. It's just an example. FIG. 1 is a side view showing a main part of a transfer mechanism in a drying chamber according to an embodiment of the present invention. A crucible 1 placed on a quartz crucible support 26 is provided with a pair of holding members of a transfer mechanism 6 on the bottoms of both side ends thereof. A block 47 is inserted in close contact, and the crucible 1 is sandwiched from the left and right sides together with an auxiliary block 48 that also comes into close contact with the side surface of the crucible 1, so that the crucible 1 can be moved up and down and conveyed. The movement of the holding block 47 can be controlled by a drive source 40 including a torque motor 40 via an arm member 46 supported by a support frame 44, which constitutes a drive system 39, a drive shaft 45, and a reversing gearbox 39a. ing. At this time, the holding torque generated via the contact surface can be controlled by a known technique (not shown) so that the holding torque is equal to or lower than the predicted crucible breaking pressure. The outer surfaces of the holding block 47 and the auxiliary block 48 are resin-coated with a physical material that does not cause contamination when coming into contact with the surface of the crucible 1. FIG. 2 is a plan view showing the main part of the transport mechanism according to the embodiment of the present invention. The drive source 40 is a shaft whose end is fitted to the girders 44a and 44b of the support frame 44 via a reversing gear box. By reversing the respective shafts 45a and 45b of the drive shaft 45 held by the receiver 51a, the respective shafts can be rotated in the opposite directions, and the left and right horizontal rails 46a connected to the drive shaft 45 46b and can be moved centripetally or centrifugally. FIG. 3 is a front view showing the entire carrying mechanism at the carry-in section according to the embodiment of the present invention. The carrying mechanism 6 is provided such that two pairs of quartz crucibles 1 can be individually held. The series of unloading mechanisms 6 can be moved back and forth on the moving rail 42 on the moving pedestal beam 38 that is commonly formed in the cleaning / drying process apparatus via the rail member 43 provided with the wheels 42a and 42b. The control operation is performed by an operating means (not shown) outside the device.

【0011】 図4は、石英坩堝用の、本考案の洗浄・乾燥工程装置の全体を示す、平面図で 、右から左に搬入部4、洗浄槽2、乾燥槽3そして搬出部8が設けられている。 前記各槽は、一対の石英坩堝1が設置可能のように区分されて各室を形成し、前 記洗浄槽2には各室毎に排気口31が配設され、機外で処理可能に排気主管33 に配管されている。前記乾燥槽3には各室毎に、一方の側壁面に空気取入口28 が新鮮空気Jを取入れ可能に設けられ、他方の側壁面に自動開閉型の排気ダンパ ー35を有する排気口36が、室内空気を排気可能に排気主管37に案内して、 機外で処理可能になっている。該各室には、石英坩堝1が載置さるべき坩堝設置 部位1aないし1qが、平行で水平な一対の支持棒7を付設して各工程部位に設 けられている。搬出部8には前記坩堝1の存在を検知するフォトセンサーからな る検知器8aを配する。 図5は、石英坩堝用の、本考案の洗浄・乾燥工程装置の全体を示す、一部破断 面を含む側面図で、前記した搬入部4と搬出部8には、搬出機構6a、6bが、 坩堝1を保持して搬送可能に、洗浄槽2と乾燥槽3を通して連なる一対の移動レ ール42に配設して、タイミングベルト41で左右に移動可能になっている。前 記洗浄槽2には坩堝設置部位1g、1hをそれぞれ設け、スプレーノズルからな る洗浄装置13を付設する回転装置10が坩堝1を載置して回転可能に配設され 、同様に前記乾燥槽3には坩堝設置部位1k、1lをそれぞれ設ける乾燥装置2 0が配設される。前記槽内部の要所に空間遮断用のシャッタ54が、その槽壁面 要所には点検扉69が設けられている。前記各槽2、3の下部には排液集水用の ピット15が設けられ、洗浄・乾燥工程装置の全体は、搬出・搬入時の便宜のた めの移動車52上にあって、堅固な基礎53に載置している。FIG. 4 is a plan view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible. From right to left, a loading section 4, a cleaning tank 2, a drying tank 3 and an unloading section 8 are provided. Has been. Each of the above-mentioned tanks is divided so that a pair of quartz crucibles 1 can be installed to form each chamber, and the cleaning tank 2 is provided with an exhaust port 31 for each chamber so that it can be processed outside the machine. It is connected to the exhaust main pipe 33. For each room in the drying tank 3, an air inlet 28 is provided on one side wall surface so that fresh air J can be taken in, and an exhaust port 36 having an automatic opening / closing type exhaust damper 35 is provided on the other side wall surface. The indoor air is guided to the exhaust main pipe 37 so that it can be exhausted and treated outside the machine. In each chamber, crucible installation portions 1a to 1q on which the quartz crucible 1 is to be placed are provided at respective process portions by attaching a pair of parallel and horizontal support rods 7. The carry-out section 8 is provided with a detector 8a including a photosensor for detecting the presence of the crucible 1. FIG. 5 is a side view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible, including a partially broken surface. The above-mentioned carry-in section 4 and carry-out section 8 have carry-out mechanisms 6a and 6b. The crucible 1 is held and can be transported, and the crucible 1 is arranged on a pair of moving rails 42 connected to each other through the cleaning tank 2 and the drying tank 3, and can be moved left and right by a timing belt 41. The cleaning tank 2 is provided with crucible installation portions 1g and 1h, respectively, and a rotating device 10 provided with a cleaning device 13 including a spray nozzle is rotatably arranged with the crucible 1 mounted thereon. The tank 3 is provided with a drying device 20 provided with crucible installation portions 1k and 1l, respectively. A shutter 54 for shutting off the space is provided at a point inside the tank, and an inspection door 69 is provided at a point on the wall surface of the tank. A pit 15 for collecting drainage water is provided at the bottom of each of the tanks 2 and 3, and the entire washing / drying process apparatus is firmly mounted on a moving vehicle 52 for the convenience of carrying in / out. It is placed on the basic foundation 53.

【0012】 図6は、石英坩堝用の、本考案の実施例である洗浄装置の要部を示す側面図で 、回転装置10が固設する洗浄装置13を中心にモータボックス19により回転 可能に配設している。 図7は、本考案実施例に関連する、石英坩堝用の洗浄装置の回転装置の作用を 示す要部平面図で、一対の該回転装置10のターンテーブル11が、モータ19a によって回転伝達歯車18a、18bを介して回転可能になっている。 第8図は、本考案実施例に関連する、石英坩堝用の乾燥装置の作用を説明する 、要部断面図で、室内内壁面に熱反射体22bを付設する乾燥室9に配設する赤外 線ヒータ21の下側に半円弧上に熱反射体22aを配する、熱放射域rを有する該 赤外線ヒータ21が、赤外線を損失なく透過する透明石英ガラスから成る石英坩 堝支持体26上の、最大坩堝投影空間大きさRをもち微小気泡を含有する石英坩 堝1に対し、熱損失少なく効果的に加熱作用を可能の構成になっている。 図9は、本考案実施例に関連する、乾燥装置の全体を説明する側面図で、天井 開閉機構17により開閉天井16を有して密閉可能の、乾燥槽3内の区分された 1なる乾燥室9へ、高性能のフィルタ29と遮光ルーバー30を通って、排気口 34から排出するようにして、室内は換気可能となっている。床面はヒータ支持 台23上に赤外線ヒータ21が、その端子を端子カバー24に保護されて配設さ れ、その上方にベース板25が支持ベース27を保持して、平行で水平状態にあ る、一対の石英坩堝支持体26を固設して、坩堝設置部位を形成し、当該坩堝1 が移送された時に正規位置に載置可能になっている。FIG. 6 is a side view showing a main part of a cleaning device for a quartz crucible, which is an embodiment of the present invention. It is rotatable by a motor box 19 around a cleaning device 13 fixed by a rotating device 10. It is arranged. FIG. 7 is a plan view of an essential part showing the operation of the rotating device of the cleaning device for the quartz crucible, which is related to the embodiment of the present invention. The turntable 11 of the pair of rotating devices 10 is rotated by the motor 19a to transmit the rotation transmission gear 18a. , 18b so that it can be rotated. FIG. 8 is a cross-sectional view of the main part for explaining the operation of the drying device for a quartz crucible, which is related to the embodiment of the present invention. The infrared heater 21 having a heat radiation area r, in which a heat reflector 22a is arranged in a semi-circular shape below the outside wire heater 21, is provided on a quartz crucible support 26 made of transparent quartz glass that transmits infrared rays without loss. The quartz crucible 1 having the maximum projected space size R of the crucible and containing the micro bubbles is capable of effectively heating with less heat loss. FIG. 9 is a side view for explaining the whole of the drying apparatus related to the embodiment of the present invention. The drying unit 1 is divided in the drying tank 3 and has the opening / closing ceiling 16 by the ceiling opening / closing mechanism 17. The inside of the room can be ventilated by passing through the high-performance filter 29 and the light-shielding louver 30 to the room 9 and discharging from the exhaust port 34. The floor is provided with an infrared heater 21 on a heater support 23, the terminals of which are protected by a terminal cover 24, and a base plate 25 holds a support base 27 above the infrared heater 21 so that the heater is in a parallel and horizontal state. A pair of quartz crucible supports 26 are fixedly provided to form a crucible installation site, and when the crucible 1 is transferred, it can be placed in a regular position.

【0013】 図10は、本考案に関連する、石英坩堝用の洗浄装置関係配管のフローシート で、坩堝1に内挿可能に配設するとともに、該坩堝1の外面を洗浄可能に配設す る、HFと純水を供給可能のスプレーノズルからなる洗浄装置13は、共用配管 12に配管され、該共用配管12は、バルブ切り替え操作によりそれぞれ純水配 管63と循環水供給配管66とに連通可能になっている。該HFの供給時には、 特に供給弁12m、12n、64a、64bを開に、供給弁63aを閉に、その他の関係バ ルブを開に操作して、HF供給槽56、供給ポンプ59により循環タンク55に 移送された該HFを循環ポンプ58により流量計60により管理された該HFが 、前記循環液供給管66によって前記洗浄装置13へ供給可能になっている。ま た該純水の供給時には、特に供給弁12m、12n、63a、64aを開に、供給弁64b を閉に操作して、ここに図示しない純水供給手段により該純水が供給可能になっ ている。 図11は、本考案実施例に関連する、石英坩堝用の作業工程を説明するブロッ ク図で、坩堝1は搬入工程1Aにより、洗浄槽2内に導入される。そしてHF洗 浄工程1Bから純水洗浄工程1Cの後にN2 吹付工程、その後に乾燥槽3への移 送工程1Eがあって、乾燥工程1Fとなる。一対の搬送機構6の一方が操作され て、該乾燥工程1Fの時点に次の搬入工程2Aが平行して作業開始される。該乾 燥工程1Fの終了後に取出工程1Gが行われて、一連の全体の洗浄・乾燥工程が 終了する。FIG. 10 is a flow sheet of a cleaning device-related pipe for a quartz crucible according to the present invention, which is arranged so that it can be inserted into the crucible 1 and the outer surface of the crucible 1 can be cleaned. A cleaning device 13 including a HF and a spray nozzle capable of supplying pure water is connected to a common pipe 12, and the common pipe 12 is connected to a pure water pipe 63 and a circulating water supply pipe 66 by a valve switching operation. It is possible to communicate. At the time of supplying the HF, in particular, the supply valves 12m, 12n, 64a, 64b are opened, the supply valve 63a is closed, and the other related valves are opened, and the circulation tank is operated by the HF supply tank 56 and the supply pump 59. The HF transferred to 55 is controlled by a circulation pump 58 by a flow meter 60, and the HF can be supplied to the cleaning device 13 by the circulating liquid supply pipe 66. Further, when the pure water is supplied, the supply valves 12m, 12n, 63a and 64a are opened and the supply valve 64b is closed so that the pure water can be supplied by the pure water supply means (not shown). ing. FIG. 11 is a block diagram illustrating a working process for a quartz crucible, which is related to the embodiment of the present invention. The crucible 1 is introduced into the cleaning tank 2 by the carrying-in process 1A. The HF cleaning process 1B to the pure water cleaning process 1C are followed by a N2 spraying process and then a transfer process 1E to the drying tank 3 to form the drying process 1F. One of the pair of transport mechanisms 6 is operated, and at the time of the drying step 1F, the next loading step 2A is started in parallel. After the completion of the drying step 1F, the extracting step 1G is performed to complete the series of washing / drying steps.

【0014】 次に本考案装置の動作を、説明する。ここに図示しない手段により坩堝1が移 送されて、搬入部4の坩堝設置部位1aないし1bの所定位置に、該坩堝1をそ の開口面を下にして載置すると、その開口面周辺の端縁は一対の支持棒7の水平 な上面に置かれる。その位置が搬送機構6aのワーク台となる。そして洗浄・乾 燥工程装置の内部空間と外界を遮断している、シャッタが全開され、該搬入部4 と乾燥部3間の移送を分担する該搬送機構6aが、移動レール42を介して前記 搬入部4の前記坩堝1が載置された坩堝設置部位へ移される。移された前記搬送 機構6aはそのアーム部材46を前記坩堝1の周辺に移動させる。すなわちここ に図示しない搬送機構6全体に係わる公知の操作制御手段により、1組の左右の 移動部材46a、46bを左右に広げた状態で1組の左右の立ち下がり部材46e、46 f、いわゆるチャックシャフトが前記坩堝1の端縁高さまで垂下移動がなされる 。Next, the operation of the device of the present invention will be described. The crucible 1 is transferred by means not shown here, and when the crucible 1 is placed at a predetermined position of the crucible installation portions 1a or 1b of the carry-in section 4 with its opening face down, the periphery of the opening face is closed. The edges are placed on the horizontal upper surfaces of the pair of support bars 7. That position becomes the work table of the transport mechanism 6a. Then, the shutter, which shuts off the internal space of the cleaning / drying process apparatus from the outside, is fully opened, and the transfer mechanism 6a, which is responsible for the transfer between the carry-in section 4 and the drying section 3, is connected to the transfer rail 42 via the transfer rail 42. The carry-in section 4 is moved to the crucible installation site where the crucible 1 is placed. The transferred transfer mechanism 6a moves the arm member 46 to the periphery of the crucible 1. That is, a set of left and right moving members 46a and 46b is spread to the left and right by a well-known operation control unit related to the entire transport mechanism 6 (not shown). The shaft is drooped to the height of the edge of the crucible 1.

【0015】 その後にトルクモータからなる駆動源40による駆動力により、該部材46e、 46fを左右から前記坩堝1に近づけ、保持ブロック47の断面L字状顎部分に前 記端縁の稜線が合致して、その上部の補助ブロック48とともに密着状に挟み込 む。その挟む込む圧力はトルクとして検知され、予め決められた坩堝破壊圧力以 下の当該坩堝保持力に達すると、該挟み込み操作は終了する。ここに、該補助ブ ロック48は、バネ49とバネ受け50によって坩堝大きさに合わせて設定替え 可能となっている。 前記挟み込み操作終了によって、前記搬送機構6aにより所定高まで前記坩堝 1は持ち上げられ、開放されたシャッタを通過して次工程の坩堝設置部位へ搬送 される。その所定の搬送先は、本考案の正規構成が設置された坩堝設置部位であ り、前記した搬入部4での移送手段が成したと同様にして、ワーク台である水平 で平行な一対の支持棒7上に、静かに載置する。前記洗浄槽2から乾燥槽3へ搬 送する場合は、そのワーク台は前記石英坩堝支持体26上に設けられた坩堝設置 部位となる。乾燥工程が済むと、前記搬送機構6aに代わって、搬送機構6bが 前記した搬送機構6aと同様に操作されて、全く同様な作用を現す。After that, the members 46e and 46f are brought closer to the crucible 1 from the left and right by the driving force of the driving source 40 composed of a torque motor, and the ridge line of the above-mentioned edge is fitted to the L-shaped jaw section of the holding block 47. Then, it is tightly sandwiched together with the auxiliary block 48 above it. The sandwiching pressure is detected as a torque, and when the crucible holding force below a predetermined crucible breaking pressure is reached, the sandwiching operation ends. Here, the auxiliary block 48 can be set and changed according to the crucible size by a spring 49 and a spring receiver 50. Upon completion of the sandwiching operation, the crucible 1 is lifted to a predetermined height by the transport mechanism 6a, passes through the opened shutter, and is transported to the crucible installation site in the next step. The predetermined transfer destination is a crucible installation site in which the regular configuration of the present invention is installed, and in the same way as the transfer means in the carry-in section 4 described above, a pair of horizontal and parallel work tables is used. Gently place it on the support rod 7. In the case of transporting from the cleaning tank 2 to the drying tank 3, the work table is a crucible installation site provided on the quartz crucible support 26. When the drying process is completed, the transport mechanism 6b is operated in the same manner as the transport mechanism 6a in place of the transport mechanism 6a, and the same action is exhibited.

【0016】[0016]

【考案の効果】[Effect of the device]

以上記載したごとく本考案によれば、取扱の慎重さが求められる石英坩堝の洗 浄装置に坩堝破壊圧力に対する考慮を優先する保持能力を有する搬送機構を配設 して、取扱上の安全性の確保とその大きさが混在する坩堝を自在に搬送可能とす る機構による操作性の向上を図りつつ前記手動操作の混在を防止し、乾燥工程と 洗浄工程とを併用可能とする、操作の効率及び作業環境の良好な微小気泡を含有 する石英坩堝の洗浄装置を提供することが出来る、等の種々の著効を有し、本考 案にして始めて全てを遠隔的に省力性ある自動化要因を高めた石英坩堝の洗浄装 置の提供が可能になり、その実用的価値は極めて大である。 又前記実施例では石英坩堝の洗浄装置について詳細に説明したが、これのみに 限定されず他の取扱に慎重を要して、構成物質の破壊圧力を考慮して搬送すべき 工程を含む製造装置などにも適用可能である。 As described above, according to the present invention, a quartz crucible cleaning device, which requires careful handling, is provided with a transfer mechanism having a holding capacity that gives priority to consideration of crucible breaking pressure, thereby ensuring safe handling. The efficiency of the operation that prevents the manual operation from being mixed and enables the drying process and the cleaning process to be used together while improving the operability by the mechanism that can secure and secure the crucible in which the sizes are mixed can be freely transported. Also, it has various advantages such as being able to provide a cleaning device for a quartz crucible containing fine bubbles with a good working environment. It is possible to provide an enhanced quartz crucible cleaning device, and its practical value is extremely large. Although the quartz crucible cleaning apparatus has been described in detail in the above-mentioned embodiment, the manufacturing apparatus is not limited to this, and includes other steps that require careful handling and should be conveyed in consideration of the breaking pressure of the constituents. It is also applicable to.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案実施例の、乾燥室における搬送機構の要
部を示す、側面図である。
FIG. 1 is a side view showing a main part of a transfer mechanism in a drying chamber according to an embodiment of the present invention.

【図2】本考案実施例の、搬送機構の要部を示す、平面
図である。
FIG. 2 is a plan view showing a main part of a transport mechanism according to the embodiment of the present invention.

【図3】本考案実施例の、搬入部での搬送機構の全体を
示す、正面図である。
FIG. 3 is a front view showing the entire carrying mechanism at the carry-in section according to the embodiment of the present invention.

【図4】石英坩堝用の、本考案の洗浄・乾燥工程装置の
全体を示す、平面図である。
FIG. 4 is a plan view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible.

【図5】石英坩堝用の、本考案の洗浄・乾燥工程装置の
全体を示す、一部破断面を含む側面図である。
FIG. 5 is a side view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible, including a partially broken surface.

【図6】石英坩堝用の、本考案の実施例である洗浄装置
の要部を示す、側面図である。
FIG. 6 is a side view showing a main part of a cleaning device for a quartz crucible, which is an embodiment of the present invention.

【図7】本考案実施例に関連する、石英坩堝用の洗浄装
置の回転装置の作用を示す、要部平面図である。
FIG. 7 is a plan view of relevant parts showing the operation of the rotating device of the cleaning device for the quartz crucible, which is related to the embodiment of the present invention.

【図8】本考案実施例に関連する、石英坩堝用の乾燥装
置の作用を説明する、要部断面図である。
FIG. 8 is a sectional view of relevant parts for explaining the operation of the drying device for a quartz crucible, which is related to the embodiment of the present invention.

【図9】本考案実施例に関連する、石英坩堝用の乾燥装
置の全体を説明する、側面図である。
FIG. 9 is a side view illustrating the entire drying apparatus for the quartz crucible, which is related to the embodiment of the present invention.

【図10】本考案実施例に関連する、石英坩堝用の洗浄
装置関係配管のフローシートである。
FIG. 10 is a flow sheet of a cleaning device-related pipe for a quartz crucible, which is related to an embodiment of the present invention.

【図11】本考案実施例に関連する、石英坩堝用の作業
工程を説明する、ブロック図である。
FIG. 11 is a block diagram illustrating a work process for a quartz crucible, which is related to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 石英坩堝 1aないし1r 坩堝設置部位 2 洗浄槽 3 乾燥槽 4 搬入部 6 搬送機構 7 支持棒 8 搬出部 13 スプレーノズルないし洗浄装置 39 駆動系 40 駆動源 42 移動レール 46 アーム部材 47 保持ブロック 48 補助ブロック 1 Quartz crucible 1a to 1r Crucible installation site 2 Cleaning tank 3 Drying tank 4 Carry-in section 6 Transfer mechanism 7 Support rod 8 Carry-out section 13 Spray nozzle or cleaning device 39 Drive system 40 Drive source 42 Moving rail 46 Arm member 47 Holding block 48 Auxiliary block

Claims (3)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 開口面を下向きに設置された坩堝を、搬
入部、洗浄槽、乾燥槽および搬出部のそれぞれの隣接す
る処理工程へ搬送する一または複数の搬送機構を備えた
石英坩堝の洗浄装置において、該搬送機構6を、下方に
垂下した一対のアーム部材46と、該アーム部材46を
坩堝1外周面から左右に離接可能に揺動させる駆動系3
9と、所定圧のトルクを発生可能な該駆動系39の駆動
源40とにより構成し、前記駆動系39の駆動により前
記アーム部材46を坩堝1外周面に挟持させた状態で坩
堝1を、隣接する処理工程へ搬送可能に構成するととも
に、該搬送時に前記駆動源40のトルク圧を利用して前
記坩堝1に坩堝破壊圧力より小なる挟持圧を常時付勢可
能に構成したことを特徴とする石英坩堝の洗浄装置。
1. Cleaning of a quartz crucible having one or a plurality of transfer mechanisms for transferring a crucible having an opening face downward to an adjacent processing step of each of a loading section, a cleaning tank, a drying tank and an unloading section. In the apparatus, a pair of arm members 46 that hang down the transport mechanism 6 and a drive system 3 that swings the arm members 46 from the outer peripheral surface of the crucible 1 so as to be separable left and right.
9 and a drive source 40 of the drive system 39 capable of generating a torque of a predetermined pressure, and the crucible 1 is held in a state where the arm member 46 is sandwiched by the outer peripheral surface of the crucible 1 by the drive of the drive system 39, It is configured such that it can be conveyed to an adjacent processing step, and at the time of the conveyance, a clamping pressure smaller than a crucible breaking pressure can be constantly applied to the crucible 1 by utilizing the torque pressure of the drive source 40. Cleaning equipment for quartz crucible.
【請求項2】 洗浄室および乾燥室をそれぞれ複数個配
設した請求項1記載の洗浄装置において、前記搬送機構
6を搬入部4側と搬出部8側にそれぞれ配し、これらを
同一移動レール42に沿って相互に独立して移動可能に
構成したことを特徴とする石英坩堝の洗浄装置。
2. The cleaning device according to claim 1, wherein a plurality of cleaning chambers and a plurality of drying chambers are provided, and the transfer mechanism 6 is provided on each of the carry-in section 4 side and the carry-out section 8 side, and these are arranged on the same moving rail. A cleaning device for a quartz crucible, which is configured to be movable independently of each other along 42.
【請求項3】 搬入部4、洗浄槽2、乾燥槽3および搬
出部8のそれぞれの坩堝1設置部位を、水平に平行に配
設した一対の支持棒7で形成するとともに、該支持棒7
を介して坩堝1開口端面の一部を保持可能に構成した請
求項1記載の石英坩堝の洗浄装置。
3. The crucible 1 installation site of each of the carry-in section 4, the cleaning tank 2, the drying tank 3 and the carry-out section 8 is formed by a pair of support rods 7 arranged in parallel in the horizontal direction, and the support rods 7 are also provided.
The quartz crucible cleaning apparatus according to claim 1, wherein a part of the opening end surface of the crucible 1 can be held via the above.
JP10577391U 1991-11-29 1991-11-29 Quartz crucible cleaning equipment Expired - Fee Related JP2557463Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10577391U JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10577391U JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Publications (2)

Publication Number Publication Date
JPH0546966U true JPH0546966U (en) 1993-06-22
JP2557463Y2 JP2557463Y2 (en) 1997-12-10

Family

ID=14416485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10577391U Expired - Fee Related JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Country Status (1)

Country Link
JP (1) JP2557463Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108358462A (en) * 2018-04-18 2018-08-03 东海县晶盛源硅微粉有限公司 A kind of quartz crucible surface brushing fixing device
CN116689431A (en) * 2023-07-31 2023-09-05 辽宁拓邦鸿基半导体材料有限公司 Cleaning device for quartz products and cleaning method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108358462A (en) * 2018-04-18 2018-08-03 东海县晶盛源硅微粉有限公司 A kind of quartz crucible surface brushing fixing device
CN116689431A (en) * 2023-07-31 2023-09-05 辽宁拓邦鸿基半导体材料有限公司 Cleaning device for quartz products and cleaning method thereof
CN116689431B (en) * 2023-07-31 2023-10-10 辽宁拓邦鸿基半导体材料有限公司 Cleaning device for quartz products and cleaning method thereof

Also Published As

Publication number Publication date
JP2557463Y2 (en) 1997-12-10

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