JP2557463Y2 - Quartz crucible cleaning equipment - Google Patents

Quartz crucible cleaning equipment

Info

Publication number
JP2557463Y2
JP2557463Y2 JP10577391U JP10577391U JP2557463Y2 JP 2557463 Y2 JP2557463 Y2 JP 2557463Y2 JP 10577391 U JP10577391 U JP 10577391U JP 10577391 U JP10577391 U JP 10577391U JP 2557463 Y2 JP2557463 Y2 JP 2557463Y2
Authority
JP
Japan
Prior art keywords
crucible
cleaning
quartz crucible
drying
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10577391U
Other languages
Japanese (ja)
Other versions
JPH0546966U (en
Inventor
光男 松村
宏 松井
享 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to JP10577391U priority Critical patent/JP2557463Y2/en
Publication of JPH0546966U publication Critical patent/JPH0546966U/en
Application granted granted Critical
Publication of JP2557463Y2 publication Critical patent/JP2557463Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • ing And Chemical Polishing (AREA)

Description

【考案の詳細な説明】[Detailed description of the invention]

【0001】[0001]

【産業上の利用分野】本考案は、半導体製造に用いる単
結晶引き上げ用坩堝について、その坩堝製造の洗浄・乾
燥工程に使用する搬送手段を有する装置に係わり、特に
微小気泡を含有する石英坩堝の洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal pulling crucible used in the manufacture of semiconductors, and to an apparatus having a conveying means used in the washing and drying steps of the crucible manufacture. The present invention relates to a cleaning device.

【0002】[0002]

【従来の技術】従来より半導体製造に用いる単結晶引き
上げ用石英坩堝は、その坩堝表面を良好な温度分布に保
持することが、良質な単結晶を製造する一要因であるの
で、その温度環境を実現するために、計画的に微小気泡
を坩堝内部に含むように、微小気泡を含有する石英坩堝
は製造される(特開昭60−215534号公報)。一方、石英
坩堝は特にその内面層が不純物元素を含む等汚染されて
いると、引き上げられる単結晶に対して大きな悪影響を
与えるので、製造の最終工程において化学洗浄(例:弗
化水素酸液使用)が行なわれる。この化学洗浄は、当該
坩堝を一定時間化学洗浄液に滞留させ、表面を液に浸食
させてから純水により化学洗浄液の脱液処理を行い、そ
の純水洗浄を終えてから、乾燥工程に移される。従来の
石英坩堝の洗浄・乾燥工程は、搬入→HF洗浄→純水洗
浄→乾燥→搬出、の各工程の1連から成り、その間に当
該坩堝を所要場所へ運ぶ、移送作業が行われる。
2. Description of the Related Art Conventionally, in a quartz crucible for pulling a single crystal used in semiconductor manufacturing, maintaining a good temperature distribution on the surface of the crucible is one factor for producing a high-quality single crystal. In order to realize this, a quartz crucible containing microbubbles is manufactured so that the microbubbles are intentionally included in the crucible (Japanese Patent Application Laid-Open No. 60-215534). On the other hand, the quartz crucible, when its inner surface layer is contaminated such as containing an impurity element, has a great adverse effect on the single crystal to be pulled. Therefore, chemical cleaning (for example, using a hydrofluoric acid solution) ) Is performed. In this chemical cleaning, the crucible is kept in the chemical cleaning liquid for a certain period of time, the surface is eroded by the liquid, and then the chemical cleaning liquid is subjected to a dewatering treatment with pure water. . The conventional quartz crucible washing / drying process includes a series of steps of carry-in → HF washing → pure water washing → drying → unloading, during which a transfer operation is performed to transport the crucible to a required place.

【0003】従来その坩堝の搬出入に使用の搬送機構
は、その表面に紐状の滑り止めを施し、移送する坩堝外
形に合わせた円弧状に形成した架台上に坩堝の左右底面
を均等になるように載せ、その架台をクレーンにより移
動させ、架台よりの坩堝の落下防止に対策するもの(特
開昭63−62543号公報)や、坩堝保持アームが坩堝の表
面の汚染源にならないように該アームにコーティングを
施して、その上に坩堝を保持する構造のものを移動クレ
ーンで移送可能に構成するものなどがあった。そしてそ
れらは結局は、坩堝の一定寸法およびその重量に合わせ
た構造となっていて、坩堝の形状が変われば搬送機構も
変えることが一般であった。ところで石英坩堝は外表面
部にクラックが一旦発生すると、緻密な内面へそのクラ
ックが速く伸びる傾向が知られ(前記、特開昭60−2155
34号公報)、この性質が坩堝を搬入する際に、その取扱
を注意深くさせる要因となっている。上記した坩堝製造
において、坩堝自体は年々大型になりその大型化傾向に
伴い、洗浄のための液タンク、乾燥のための装置と同じ
く、搬出入装置においてもそれらに使用する治具・装置
に対し、数々の改良と投資が行われてきたが、それにも
拘らず、例えば坩堝の重量の増大化や取り扱う化学洗浄
液の危険性とともに搬出入装置による、坩堝表面に対す
るクラック発生要因の付与、落下障害、坩堝への汚染を
含むマイナス要因は減ることはなく、それらに多くの注
意を増やさなければならない作業者に対する、精神的、
肉体的な作業環境の悪化は無視し得ない状態である。換
言すれば、これら従来技術における改善努力は、規模の
大きさに伴うものであっても、技術的にマイナーな改良
に留まっていた。すなわち洗浄装置の従来技術では、坩
堝の大型化のたびに関係装置・治具を取り替えるなど、
対症療法的改良範囲内にあった。
Conventionally, a transfer mechanism used for loading and unloading the crucible is provided with a string-shaped non-slip on its surface, and the left and right bottom surfaces of the crucible are evenly arranged on a base formed in an arc shape corresponding to the outer shape of the crucible to be transferred. And the crane is moved by a crane to prevent the crucible from falling from the crane (Japanese Patent Laid-Open No. 63-62543), and the crucible holding arm is used to prevent the crucible from becoming a contamination source on the surface of the crucible. There is a type in which a coating is applied to a material and a structure in which a crucible is held thereon is configured to be transported by a movable crane. In the end, they have a structure corresponding to a certain size and weight of the crucible, and if the shape of the crucible changes, the transport mechanism is generally changed. By the way, it is known that, once a crack is generated on the outer surface of a quartz crucible, the crack is apt to be quickly extended to a dense inner surface (see the above-mentioned JP-A-60-2155).
No. 34), this property causes the crucible to be carefully handled when being carried in. In the above crucible production, the crucible itself becomes larger and larger each year, and as with the liquid tank for cleaning and the equipment for drying, the jigs and equipment used for them are also used in the loading and unloading equipment. Nevertheless, many improvements and investments have been made. Nevertheless, for example, the increase in the weight of the crucible and the danger of the chemical cleaning liquid to be handled, as well as the loading / unloading device, the provision of crack generation factors to the crucible surface, drop obstacles, Negative factors, including contamination of the crucible, do not diminish, and the mental,
The deterioration of the physical working environment cannot be ignored. In other words, the improvement efforts in these prior arts, albeit with the scale, have been only technically minor improvements. In other words, in the conventional technology of the cleaning device, every time the crucible is enlarged, related devices and jigs are replaced.
It was within the range of symptomatic improvement.

【0004】[0004]

【考案が解決しようとする課題】しかしながら従来の石
英坩堝の洗浄装置は、その搬送機構が一定大きさ、ない
し重量に対処するもので、その坩堝が有する構造が持つ
内部応力または強度に対応して、当該搬送機構の保持能
力を設定するという概念から作られていなかった。その
ため当該坩堝重量の全体を保持する性能を持っていて
も、搬出機構と当該坩堝との当接位置における単位荷重
と当該坩堝部位の構成素材が有する単位当り内部強度と
が整合しないときは、クラック発生要因を蓄積し、また
は一度の搬出入で当接する坩堝部位にクラックを発生さ
せるか、引いてはその時間経過、保持回数頻度が増える
に連れて、その坩堝を使用不能にさせることも可能とな
る。
However, in the conventional apparatus for cleaning a quartz crucible, the transport mechanism of the conventional apparatus is designed to cope with a certain size or weight, and it is necessary to cope with the internal stress or strength of the structure of the crucible. However, it has not been made from the concept of setting the holding capacity of the transport mechanism. Therefore, even if the crucible has the ability to hold the entire weight of the crucible, if the unit load at the contact position between the unloading mechanism and the crucible does not match the internal strength per unit of the constituent material of the crucible portion, cracking may occur. It is possible to accumulate the cause of occurrence, or to generate a crack in the crucible part that comes into contact with one carry-in / out, and to make the crucible unusable as the time elapses and the frequency of holding times increases Become.

【0005】ところで坩堝の大型化に伴い、同一の搬送
機構を使用し続けると前記した不整合状態は増々大きく
なるばかりか、坩堝が小型であったときは整合していた
ものも、そして重量、大きさともその搬送機構の能力に
余力が残されている場合にあっても、前記坩堝の有する
強度との関係が不整合状態に変わることが生ずる。従っ
て石英坩堝の大きさが、短いサイクルで変更が生じるこ
とで、搬送機構の装置・治具の大きさを一定し続けるこ
との不具合と、一方でその坩堝大きさの変更のたびに搬
送機構を変更しざるを得ないことと合わせて、前記した
従来の搬送手段の持つ技術方式が、能率的な自動化を進
める障害の1つとなっていた。
[0005] By the way, as the size of the crucible increases, if the same transport mechanism is continuously used, the above-mentioned mismatched state is not only increased, but also when the crucible is small, the unmatched state is increased. Regardless of the size, even if the capacity of the transfer mechanism has an extra capacity, the relationship with the strength of the crucible may change to an inconsistent state. Therefore, the size of the quartz crucible is changed in a short cycle, causing the problem of keeping the size of the equipment and jig of the transfer mechanism constant.On the other hand, the transfer mechanism is changed every time the size of the crucible is changed. In addition to the necessity of changing, the technical method of the above-mentioned conventional transport means has been one of the obstacles for promoting efficient automation.

【0006】本考案の目的は、かかる従来技術の欠点に
鑑み、前記石英坩堝の構造の特性を充分考慮し、該坩堝
の大きさの増大化など社会的需要の対応を図りつつ、効
果的搬送方式の採用によって石英坩堝の直径に無関係な
手段により、図らずも石英坩堝が障害を受けることのな
い搬送機構を有し、かつ搬送工程での自動化機構の導入
による良好な製造環境の作出、もしくはアイドル時間の
縮小と作業環境の向上を図った、石英坩堝の洗浄装置を
提供することを目的とする。
In view of the drawbacks of the prior art, the object of the present invention is to sufficiently consider the characteristics of the structure of the quartz crucible and to increase the size of the crucible while responding to social demands while effectively transporting the material. By adopting the method, by means irrespective of the diameter of the quartz crucible, a quartz crucible has a transfer mechanism that will not be hindered unintentionally, and a good manufacturing environment is created by introducing an automatic mechanism in the transfer process, or It is an object of the present invention to provide a quartz crucible cleaning apparatus that reduces idle time and improves a working environment.

【0007】[0007]

【課題を解決するための手段】本考案は、前記坩堝を開
口面を下向きに設置した状態で、その坩堝を洗浄工程の
各工程、すなわち搬入部、洗浄槽、乾燥槽および搬出部
のそれぞれの隣接する処理工程へ搬送する、一または複
数の搬送機構を備えた石英坩堝の洗浄装置において、該
搬送機構6を、下方に垂下した一対のアーム部材46
と、該アーム部材46を坩堝1外周面から左右に離接可
能に揺動させる駆動系39と、所定圧のトルクを発生可
能な該駆動系39の駆動源40とにより構成し、前記駆
動系39の駆動により前記アーム部材46を坩堝1外周
面に挟持させた状態で坩堝1を、隣接する処理工程へ搬
送可能に構成するとともに、該搬送時に前記駆動源40
のトルク圧を利用して前記坩堝1に坩堝破壊圧力より小
なる挟持圧を常時付勢可能に構成したことを特徴とする
ものである。また、洗浄室および乾燥室をそれぞれ複数
個配設した前記洗浄装置において、前記搬送機構6を搬
入部4側と搬出部8側にそれぞれ配し、これらを同一移
動レール42に沿って相互に独立して移動可能に構成し
たことを特徴とするものである。さらに搬入部4、洗浄
槽2、乾燥槽3および搬出部8のそれぞれの坩堝1設置
部位を、水平にかつ平行に配設した、該洗浄槽2におい
ては一対の支持棒7で形成するとともに、該支持棒7を
介して坩堝1開口端面の一部を保持可能に構成した洗浄
装置を特徴とするものである。なお該乾燥槽3において
は石英坩堝支持体26が前記支持棒7と同様な作用を有
する保持が可能に構成されている。この場合前記支持棒
7を含む、それぞれの坩堝1設置部位を固定的に配設す
る必要はなく、必要に応じて、その坩堝設置面が水平に
保たれ、所定の位置への移動と停止が可能になされ、か
つ信頼できるロック手段を付設するものであれば、全体
を移動可能に構成してもよい。
According to the present invention, the crucible is placed in a state where the opening face is downwardly directed, and the crucible is subjected to each step of a washing process, that is, each of a loading section, a washing tank, a drying tank and an unloading section. In a quartz crucible cleaning device provided with one or a plurality of transport mechanisms for transporting to an adjacent processing step, the transport mechanism 6 is moved downward by a pair of arm members 46
A drive system 39 for swinging the arm member 46 so as to be able to move to and away from the outer peripheral surface of the crucible 1 to the left and right, and a drive source 40 for the drive system 39 capable of generating a torque of a predetermined pressure. The crucible 1 is configured to be conveyable to an adjacent processing step in a state where the arm member 46 is held between the outer peripheral surfaces of the crucible 1 by the driving of the drive source 39, and the driving source 40
By using the above torque pressure, a clamping pressure smaller than the crucible breaking pressure can be constantly applied to the crucible 1. Further, in the cleaning apparatus in which a plurality of cleaning chambers and a plurality of drying chambers are provided, the transport mechanism 6 is provided on the loading section 4 side and the unloading section 8 side, respectively, and these are independent from each other along the same moving rail 42. And is configured to be movable. Further, the crucible 1 installation sites of the carry-in section 4, the washing tank 2, the drying tank 3 and the carry-out section 8 are arranged horizontally and in parallel. The washing tank 2 is formed by a pair of support rods 7, The cleaning apparatus is characterized in that a part of the opening end face of the crucible 1 can be held through the support rod 7. In the drying tank 3, the quartz crucible support 26 is configured to be able to hold the same function as the support rod 7. In this case, it is not necessary to fixedly dispose each crucible 1 installation site including the support rod 7, and if necessary, the crucible installation surface is kept horizontal, and the crucible 1 is moved and stopped at a predetermined position. As long as it is made possible and provided with a reliable locking means, the whole may be configured to be movable.

【0008】なお本考案において、請求項1は図1と図
2に、請求項2は図5に、請求項3は図3ないし図5に
その内容をそれぞれ図示する。
In the present invention, claim 1 is shown in FIGS. 1 and 2, claim 2 is shown in FIG. 5, and claim 3 is shown in FIGS. 3 to 5.

【0009】[0009]

【作用】かかる技術手段によれば、前記従来発明のよう
に、搬送坩堝の重量やその大きさにのみに基く保持能力
を有して搬送するのでなく、図1に示すごとく坩堝の大
きさが変わっても、それに対応可能の保持機構を有し
て、すなわち当該坩堝を左右に挟み込んでその時のトル
クを制御可能とさせて保持するので、坩堝の直径に関係
なく保持するとともに、該搬出機構の能力を常に数値に
捉えて、予知された前記坩堝の破壊圧力以下で搬送する
ことが出来る。本考案装置を、洗浄槽と乾燥槽とに共通
する同一移動レール上で連係可能にかつ個別に配設し
て、洗浄、乾燥それぞれの工程に専属的な自由な搬送操
作を可能としたので、前工程あるいは後工程の処理操作
遅れによる隣接工程でのアイドル時間を最小とするとと
もに、一方の故障または調整期間中の緊急時の予備機と
して、他方を実工程に使用して工程管理を保全可能とす
ることが出来る。さらに常に一定の、坩堝載置に安定
し、かつ搬送機構の搬送に都合のよいように配設する、
一対の支持棒で構成する坩堝1の設定部位は、該坩堝の
大きさの種類に拘らずその配設位置を固定するので、搬
送機構の制御操作を容易に且つ確実にすることが出来る
とともに、搬送工程の管理を円滑にして、この搬送機構
を公知の自動化技術に結合して、隣接する他の工程の時
間管理と連係させることを可能にする。この結果、坩堝
の大形化また、大小の坩堝が混在する洗浄処理の何れに
も対処可能な搬送機構を提供することとなり、従って本
考案装置に関連する製造工程管理を融通可能のものとす
ることが出来る。
According to such a technical means, as shown in FIG. 1, the size of the crucible is not changed as shown in FIG. 1, instead of being transferred with a holding capacity based only on the weight and size of the crucible as in the prior art. Even if it changes, it has a holding mechanism that can respond to it, that is, it holds the crucible sandwiched left and right so that the torque at that time can be controlled, so that it is held regardless of the diameter of the crucible, and It is possible to convey the crucible at a pressure equal to or less than the predicted breaking pressure of the crucible by always grasping the capacity as a numerical value. Since the device of the present invention can be linked and individually arranged on the same moving rail common to the washing tank and the drying tank, it enables free transfer operation exclusive to each of the washing and drying processes. Minimize idle time in adjacent processes due to delays in pre- or post-process operations, and maintain maintenance of processes by using one as an actual spare during a failure or adjustment period as an emergency spare It can be. Further, always fixed, stable to crucible mounting, and arranged so as to be convenient for transport by the transport mechanism,
Since the set position of the crucible 1 composed of a pair of support rods is fixed regardless of the size of the crucible, the control operation of the transport mechanism can be easily and reliably performed. It facilitates the management of the transport process and allows the transport mechanism to be coupled to known automation techniques and to be coordinated with the time management of other adjacent processes. As a result, it is possible to provide a transport mechanism capable of coping with both the enlargement of the crucible and the cleaning process in which large and small crucibles are mixed, and accordingly, the manufacturing process management related to the present invention can be flexibly controlled. I can do it.

【0010】[0010]

【実施例】以下、図面を参照して本考案の好適な実施例
を例示的に詳しく説明する。ただしこの実施例に記載さ
れている構成部品の寸法、材質、形状、その相対配置な
どは特に特定的な記載がない限りは、この考案の範囲を
それのみに限定する趣旨ではなく、単なる説明例に過ぎ
ない。図1は、本考案実施例の、乾燥室における搬送機
構の要部を示す、側面図で、石英坩堝支持体26に載置
する坩堝1は、その両側端底部に搬送機構6の一対の保
持ブロック47が密着状に差し込まれ、同じくその坩堝
1側面に密着状に当接する補助ブロック48とともに前
記坩堝1を左右から挟み込んで、上下に移動させ且つ搬
送可能になっている。該保持ブロック47は、支持枠4
4に支えられて駆動系39を構成するアーム部材46、
ドライブ軸45および反転ギアボックス39aを介して、
トルクモータ40からなる駆動源40によって移動制御
可能となっている。このとき前記当接面を介し発生する
保持トルクが予知された坩堝破壊圧力以下であるように
ここに図示しない公知技術により制御可能になってい
る。なお前記保持ブロック47と前記補助ブロック48
の外表面は、前記坩堝1の表面に接触する際に汚染が生
じない物性材料により、樹脂コーティングがなされてい
る。図2は、本考案実施例の、搬送機構の要部を示す平
面図で、駆動源40は反転ギアボックスを介して、その
端部を支持枠44の桁44aと44bとに嵌設する軸受け
51aに保持されたドライブ軸45の各軸45aと45bと
を反転させて、それぞれの各軸が逆回転可能になって、
該ドライブ軸45に連接する、左右の横桟46aと46bと
を求心的にまたは遠心的に移動可能にしている。図3
は、本考案実施例の、搬入部での搬送機構の全体を示
す、正面図で、搬送機構6は2個一対の石英坩堝1を個
別に保持可能になって配設してなり、その一連の搬出機
構6は、車輪42a、42bを付設するレール部材43を介
して洗浄・乾燥工程装置に共通して形成する移動架台受
梁38上の、移動レール42上に前後移動可能になって
いて、ここに図示しない装置外の操作手段により、その
制御操作がなされる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will now be described in detail with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the components described in this embodiment are not intended to limit the scope of the present invention to only those components, unless otherwise specified. It's just FIG. 1 is a side view showing an essential part of a transport mechanism in a drying chamber according to an embodiment of the present invention. A crucible 1 placed on a quartz crucible support 26 has a pair of holding mechanisms of a transport mechanism 6 at the bottoms on both side ends. A block 47 is inserted tightly, and the crucible 1 is sandwiched from the left and right together with an auxiliary block 48 which is also in close contact with the side surface of the crucible 1, and can be moved up and down and conveyed. The holding block 47 is attached to the support frame 4.
An arm member 46 supported by 4 and constituting a drive system 39;
Via the drive shaft 45 and the reversing gearbox 39a,
The movement can be controlled by a drive source 40 including a torque motor 40. At this time, it can be controlled by a known technique (not shown) so that the holding torque generated through the contact surface is equal to or less than the predicted crucible breaking pressure. The holding block 47 and the auxiliary block 48
Is coated with a resin material that does not cause contamination when it comes into contact with the surface of the crucible 1. FIG. 2 is a plan view showing a main part of the transport mechanism according to the embodiment of the present invention. The drive source 40 has a reversing gearbox, and its end is fitted to the beams 44a and 44b of the support frame 44. By inverting each shaft 45a and 45b of the drive shaft 45 held by 51a, each shaft can be reversely rotated,
The left and right horizontal rails 46a and 46b connected to the drive shaft 45 can be moved centrifugally or centrifugally. FIG.
FIG. 2 is a front view showing the entire transfer mechanism in the loading section of the embodiment of the present invention. The transfer mechanism 6 is provided so that two pairs of quartz crucibles 1 can be individually held. The unloading mechanism 6 can be moved back and forth on a moving rail 42 on a moving gantry receiving beam 38 formed in common with the washing / drying process apparatus via a rail member 43 provided with wheels 42a and 42b. The control operation is performed by operating means outside the apparatus not shown here.

【0011】図4は、石英坩堝用の、本考案の洗浄・乾
燥工程装置の全体を示す、平面図で、右から左に搬入部
4、洗浄槽2、乾燥槽3そして搬出部8が設けられてい
る。前記各槽は、一対の石英坩堝1が設置可能のように
区分されて各室を形成し、前記洗浄槽2には各室毎に排
気口31が配設され、機外で処理可能に排気主管33に
配管されている。前記乾燥槽3には各室毎に、一方の側
壁面に空気取入口28が新鮮空気Jを取入れ可能に設け
られ、他方の側壁面に自動開閉型の排気ダンパー35を
有する排気口36が、室内空気を排気可能に排気主管3
7に案内して、機外で処理可能になっている。該各室に
は、石英坩堝1が載置さるべき坩堝設置部位1aないし
1qが、平行で水平な一対の支持棒7を付設して各工程
部位に設けられている。搬出部8には前記坩堝1の存在
を検知するフォトセンサーからなる検知器8aを配す
る。図5は、石英坩堝用の、本考案の洗浄・乾燥工程装
置の全体を示す、一部破断面を含む側面図で、前記した
搬入部4と搬出部8には、搬出機構6a、6bが、坩堝
1を保持して搬送可能に、洗浄槽2と乾燥槽3を通して
連なる一対の移動レール42に配設して、タイミングベ
ルト41で左右に移動可能になっている。前記洗浄槽2
には坩堝設置部位1g、1hをそれぞれ設け、スプレー
ノズルからなる洗浄装置13を付設する回転装置10が
坩堝1を載置して回転可能に配設され、同様に前記乾燥
槽3には坩堝設置部位1k、1lをそれぞれ設ける乾燥
装置20が配設される。前記槽内部の要所に空間遮断用
のシャッタ54が、その槽壁面要所には点検扉69が設
けられている。前記各槽2、3の下部には排液集水用の
ピット15が設けられ、洗浄・乾燥工程装置の全体は、
搬出・搬入時の便宜のための移動車52上にあって、堅
固な基礎53に載置している。
FIG. 4 is a plan view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible. The carry-in section 4, the washing tank 2, the drying tank 3 and the carry-out section 8 are provided from right to left. Have been. Each of the tanks is divided so that a pair of quartz crucibles 1 can be installed therein to form respective chambers, and the cleaning tank 2 is provided with an exhaust port 31 for each of the chambers so that the exhaust can be performed outside the machine. The pipe is connected to the main pipe 33. The drying tank 3 is provided with an air inlet 28 on one side wall surface for each chamber so that fresh air J can be taken in, and an exhaust port 36 having an automatic opening / closing type exhaust damper 35 on the other side wall surface. Main exhaust pipe 3 for exhausting indoor air
7 and can be processed outside the machine. In each of the chambers, crucible installation sites 1a to 1q where the quartz crucible 1 is to be mounted are provided at each process site with a pair of parallel and horizontal support rods 7 attached thereto. A detector 8a composed of a photo sensor for detecting the presence of the crucible 1 is disposed in the unloading section 8. FIG. 5 is a side view showing the entirety of the cleaning / drying process apparatus of the present invention for a quartz crucible, including a partially broken surface. The above-mentioned loading unit 4 and discharging unit 8 include discharge mechanisms 6a and 6b. The crucible 1 is held and transported, and is disposed on a pair of moving rails 42 connected to each other through the washing tank 2 and the drying tank 3, and can be moved right and left by a timing belt 41. The washing tank 2
Are provided with crucible installation portions 1g and 1h, respectively, and a rotating device 10 provided with a washing device 13 composed of a spray nozzle is mounted rotatably with the crucible 1 placed thereon. A drying device 20 provided with portions 1k and 1l is provided. A shutter 54 for blocking the space is provided at a key point inside the tank, and an inspection door 69 is provided at a key point on the wall surface of the tank. A pit 15 for collecting drainage is provided at a lower portion of each of the tanks 2 and 3.
It is mounted on a solid base 53 on a moving vehicle 52 for convenience in carrying out and carrying in.

【0012】図6は、石英坩堝用の、本考案の実施例で
ある洗浄装置の要部を示す側面図で、回転装置10が固
設する洗浄装置13を中心にモータボックス19により
回転可能に配設している。図7は、本考案実施例に関連
する、石英坩堝用の洗浄装置の回転装置の作用を示す要
部平面図で、一対の該回転装置10のターンテーブル1
1が、モータ19aによって回転伝達歯車18a、18bを介
して回転可能になっている。第8図は、本考案実施例に
関連する、石英坩堝用の乾燥装置の作用を説明する、要
部断面図で、室内内壁面に熱反射体22bを付設する乾燥
室9に配設する赤外線ヒータ21の下側に半円弧上に熱
反射体22aを配する、熱放射域rを有する該赤外線ヒー
タ21が、赤外線を損失なく透過する透明石英ガラスか
ら成る石英坩堝支持体26上の、最大坩堝投影空間大き
さRをもち微小気泡を含有する石英坩堝1に対し、熱損
失少なく効果的に加熱作用を可能の構成になっている。
図9は、本考案実施例に関連する、乾燥装置の全体を説
明する側面図で、天井開閉機構17により開閉天井16
を有して密閉可能の、乾燥槽3内の区分された1なる乾
燥室9へ、高性能のフィルタ29と遮光ルーバー30を
通って、排気口34から排出するようにして、室内は換
気可能となっている。床面はヒータ支持台23上に赤外
線ヒータ21が、その端子を端子カバー24に保護され
て配設され、その上方にベース板25が支持ベース27
を保持して、平行で水平状態にある、一対の石英坩堝支
持体26を固設して、坩堝設置部位を形成し、当該坩堝
1が移送された時に正規位置に載置可能になっている。
FIG. 6 is a side view showing a main part of a cleaning device for a quartz crucible according to an embodiment of the present invention, which is rotatable by a motor box 19 around a cleaning device 13 to which a rotating device 10 is fixed. It is arranged. FIG. 7 is a plan view showing the operation of a rotating device of a cleaning device for a quartz crucible according to an embodiment of the present invention.
1 is rotatable by a motor 19a via rotation transmission gears 18a and 18b. FIG. 8 is a sectional view of an essential part for explaining the operation of a drying apparatus for a quartz crucible related to the embodiment of the present invention, and an infrared ray disposed in a drying chamber 9 provided with a heat reflector 22b on the inner wall surface of the room. An infrared heater 21 having a heat radiating region r, on which a heat reflector 22a is arranged on a semicircular arc below the heater 21, is provided on a quartz crucible support 26 made of transparent quartz glass which transmits infrared rays without loss. The quartz crucible 1 having a crucible projection space size R and containing microbubbles can be effectively heated with little heat loss.
FIG. 9 is a side view illustrating the entire drying apparatus related to the embodiment of the present invention.
The air can be ventilated through a high-performance filter 29 and a light-shielding louver 30 and discharged from an exhaust port 34 to a single drying chamber 9 in the drying tank 3 which can be closed and has a sealing. It has become. On the floor surface, an infrared heater 21 is disposed on a heater support 23 with its terminals protected by a terminal cover 24, and a base plate 25 is provided above the support base 27.
And a pair of parallel and horizontal quartz crucible supports 26 is fixed to form a crucible installation site, and can be placed at a regular position when the crucible 1 is transferred. .

【0013】図10は、本考案に関連する、石英坩堝用
の洗浄装置関係配管のフローシートで、坩堝1に内挿可
能に配設するとともに、該坩堝1の外面を洗浄可能に配
設する、HFと純水を供給可能のスプレーノズルからな
る洗浄装置13は、共用配管12に配管され、該共用配
管12は、バルブ切り替え操作によりそれぞれ純水配管
63と循環水供給配管66とに連通可能になっている。
該HFの供給時には、特に供給弁12m、12n、64a、64
bを開に、供給弁63aを閉に、その他の関係バルブを開
に操作して、HF供給槽56、供給ポンプ59により循
環タンク55に移送された該HFを循環ポンプ58によ
り流量計60により管理された該HFが、前記循環液供
給管66によって前記洗浄装置13へ供給可能になって
いる。また該純水の供給時には、特に供給弁12m、12
n、63a、64aを開に、供給弁64bを閉に操作して、こ
こに図示しない純水供給手段により該純水が供給可能に
なっている。図11は、本考案実施例に関連する、石英
坩堝用の作業工程を説明するブロック図で、坩堝1は搬
入工程1Aにより、洗浄槽2内に導入される。そしてH
F洗浄工程1Bから純水洗浄工程1Cの後にN2 吹付工
程、その後に乾燥槽3への移送工程1Eがあって、乾燥
工程1Fとなる。一対の搬送機構6の一方が操作され
て、該乾燥工程1Fの時点に次の搬入工程2Aが平行し
て作業開始される。該乾燥工程1Fの終了後に取出工程
1Gが行われて、一連の全体の洗浄・乾燥工程が終了す
る。
FIG. 10 is a flow sheet of a piping related to a cleaning device for a quartz crucible according to the present invention. The flow sheet is provided so as to be inserted into the crucible 1 and the outer surface of the crucible 1 is provided so as to be washable. , And a cleaning device 13 composed of a spray nozzle capable of supplying pure water are connected to a common pipe 12, and the common pipe 12 can be connected to a pure water pipe 63 and a circulating water supply pipe 66 by a valve switching operation, respectively. It has become.
When supplying the HF, in particular, supply valves 12m, 12n, 64a, 64
b is opened, the supply valve 63a is closed, and the other related valves are opened, and the HF transferred to the circulation tank 55 by the HF supply tank 56 and the supply pump 59 is collected by the circulation pump 58 by the flow meter 60. The controlled HF can be supplied to the cleaning device 13 by the circulating liquid supply pipe 66. In addition, when supplying the pure water, in particular, the supply valve 12m, 12m
By operating n, 63a, 64a to open and the supply valve 64b to close, pure water can be supplied by pure water supply means (not shown). FIG. 11 is a block diagram illustrating a working process for a quartz crucible related to the embodiment of the present invention. The crucible 1 is introduced into the cleaning tank 2 by the loading process 1A. And H
After the F cleaning step 1B to the pure water cleaning step 1C, there is an N2 spraying step, and then there is a transfer step 1E to the drying tank 3 to form a drying step 1F. One of the pair of transport mechanisms 6 is operated, and at the time of the drying step 1F, the next loading step 2A is started in parallel. After the completion of the drying step 1F, an extraction step 1G is performed, and a series of entire washing / drying steps is completed.

【0014】次に本考案装置の動作を、説明する。ここ
に図示しない手段により坩堝1が移送されて、搬入部4
の坩堝設置部位1aないし1bの所定位置に、該坩堝1
をその開口面を下にして載置すると、その開口面周辺の
端縁は一対の支持棒7の水平な上面に置かれる。その位
置が搬送機構6aのワーク台となる。そして洗浄・乾燥
工程装置の内部空間と外界を遮断している、シャッタが
全開され、該搬入部4と乾燥部3間の移送を分担する該
搬送機構6aが、移動レール42を介して前記搬入部4
の前記坩堝1が載置された坩堝設置部位へ移される。移
された前記搬送機構6aはそのアーム部材46を前記坩
堝1の周辺に移動させる。すなわちここに図示しない搬
送機構6全体に係わる公知の操作制御手段により、1組
の左右の移動部材46a、46bを左右に広げた状態で1組
の左右の立ち下がり部材46e、46f、いわゆるチャック
シャフトが前記坩堝1の端縁高さまで垂下移動がなされ
る。
Next, the operation of the present invention will be described. Here, the crucible 1 is transferred by means not shown, and
At a predetermined position of the crucible installation site 1a or 1b of the crucible 1
Is placed with its opening face down, the edge around the opening face is placed on the horizontal upper surface of the pair of support bars 7. That position becomes the work table of the transport mechanism 6a. The shutter, which fully shuts off the internal space and the outside world of the washing / drying process apparatus, is fully opened, and the transport mechanism 6a, which is responsible for the transfer between the loading section 4 and the drying section 3, is moved through the moving rail 42. Part 4
Is moved to the crucible installation site where the crucible 1 is placed. The transferred transfer mechanism 6a moves the arm member 46 to the periphery of the crucible 1. That is, by a well-known operation control means relating to the entire transport mechanism 6 (not shown), a set of left and right falling members 46e and 46f, a so-called chuck shaft, is formed in a state where the set of left and right moving members 46a and 46b is spread left and right. Moves down to the edge height of the crucible 1.

【0015】その後にトルクモータからなる駆動源40
による駆動力により、該部材46e、46fを左右から前記
坩堝1に近づけ、保持ブロック47の断面L字状顎部分
に前記端縁の稜線が合致して、その上部の補助ブロック
48とともに密着状に挟み込む。その挟む込む圧力はト
ルクとして検知され、予め決められた坩堝破壊圧力以下
の当該坩堝保持力に達すると、該挟み込み操作は終了す
る。ここに、該補助ブロック48は、バネ49とバネ受
け50によって坩堝大きさに合わせて設定替え可能とな
っている。前記挟み込み操作終了によって、前記搬送機
構6aにより所定高まで前記坩堝1は持ち上げられ、開
放されたシャッタを通過して次工程の坩堝設置部位へ搬
送される。その所定の搬送先は、本考案の正規構成が設
置された坩堝設置部位であり、前記した搬入部4での移
送手段が成したと同様にして、ワーク台である水平で平
行な一対の支持棒7上に、静かに載置する。前記洗浄槽
2から乾燥槽3へ搬送する場合は、そのワーク台は前記
石英坩堝支持体26上に設けられた坩堝設置部位とな
る。乾燥工程が済むと、前記搬送機構6aに代わって、
搬送機構6bが前記した搬送機構6aと同様に操作され
て、全く同様な作用を現す。
Thereafter, a driving source 40 composed of a torque motor is provided.
The members 46e and 46f are brought closer to the crucible 1 from the left and right by the driving force of the above, the ridge line of the edge coincides with the L-shaped cross section of the holding block 47, and the holding block 47 is brought into close contact with the upper auxiliary block 48. Pinch it. The sandwiching pressure is detected as a torque, and when the crucible holding force is equal to or lower than a predetermined crucible breaking pressure, the sandwiching operation ends. Here, the setting of the auxiliary block 48 can be changed according to the size of the crucible by a spring 49 and a spring receiver 50. Upon completion of the sandwiching operation, the crucible 1 is lifted up to a predetermined height by the transfer mechanism 6a, passed through an opened shutter, and transferred to the crucible installation site in the next step. The predetermined transport destination is a crucible installation site where the regular configuration of the present invention is installed, and a pair of horizontal and parallel supports serving as a work table are formed in the same manner as the transfer means in the above-described loading section 4. Place gently on rod 7. When the wafer is transferred from the washing tank 2 to the drying tank 3, the worktable is a crucible installation site provided on the quartz crucible support 26. When the drying step is completed, instead of the transport mechanism 6a,
The transport mechanism 6b is operated in the same manner as the transport mechanism 6a described above, and exhibits exactly the same operation.

【0016】[0016]

【考案の効果】以上記載したごとく本考案によれば、取
扱の慎重さが求められる石英坩堝の洗浄装置に坩堝破壊
圧力に対する考慮を優先する保持能力を有する搬送機構
を配設して、取扱上の安全性の確保とその大きさが混在
する坩堝を自在に搬送可能とする機構による操作性の向
上を図りつつ前記手動操作の混在を防止し、乾燥工程と
洗浄工程とを併用可能とする、操作の効率及び作業環境
の良好な微小気泡を含有する石英坩堝の洗浄装置を提供
することが出来る、等の種々の著効を有し、本考案にし
て始めて全てを遠隔的に省力性ある自動化要因を高めた
石英坩堝の洗浄装置の提供が可能になり、その実用的価
値は極めて大である。又前記実施例では石英坩堝の洗浄
装置について詳細に説明したが、これのみに限定されず
他の取扱に慎重を要して、構成物質の破壊圧力を考慮し
て搬送すべき工程を含む製造装置などにも適用可能であ
る。
As described above, according to the present invention, a conveying mechanism having a holding capacity that gives priority to consideration for the crucible breaking pressure is provided in a quartz crucible cleaning apparatus that requires careful handling. While ensuring safety and improving the operability by a mechanism capable of freely transporting crucibles of which the sizes are mixed, the mixing of the manual operation is prevented, and the drying step and the washing step can be used together. It is possible to provide a quartz crucible containing microbubbles cleaning device with good operation efficiency and working environment. It is possible to provide a quartz crucible cleaning device with increased factors, and its practical value is extremely large. Further, in the above embodiment, a quartz crucible cleaning apparatus has been described in detail. However, the present invention is not limited to this. It is also applicable to such as.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本考案実施例の、乾燥室における搬送機構の要
部を示す、側面図である。
FIG. 1 is a side view showing a main part of a transport mechanism in a drying chamber according to an embodiment of the present invention.

【図2】本考案実施例の、搬送機構の要部を示す、平面
図である。
FIG. 2 is a plan view showing a main part of a transport mechanism according to the embodiment of the present invention.

【図3】本考案実施例の、搬入部での搬送機構の全体を
示す、正面図である。
FIG. 3 is a front view showing the entirety of the transport mechanism in the loading section according to the embodiment of the present invention;

【図4】石英坩堝用の、本考案の洗浄・乾燥工程装置の
全体を示す、平面図である。
FIG. 4 is a plan view showing the entire cleaning / drying process apparatus of the present invention for a quartz crucible.

【図5】石英坩堝用の、本考案の洗浄・乾燥工程装置の
全体を示す、一部破断面を含む側面図である。
FIG. 5 is a side view showing the whole of the cleaning / drying process apparatus of the present invention for a quartz crucible, including a partially broken surface.

【図6】石英坩堝用の、本考案の実施例である洗浄装置
の要部を示す、側面図である。
FIG. 6 is a side view showing a main part of a cleaning apparatus for a quartz crucible according to an embodiment of the present invention.

【図7】本考案実施例に関連する、石英坩堝用の洗浄装
置の回転装置の作用を示す、要部平面図である。
FIG. 7 is a plan view showing the operation of the rotating device of the cleaning device for the quartz crucible according to the embodiment of the present invention;

【図8】本考案実施例に関連する、石英坩堝用の乾燥装
置の作用を説明する、要部断面図である。
FIG. 8 is a sectional view of an essential part for explaining the operation of the drying device for the quartz crucible according to the embodiment of the present invention.

【図9】本考案実施例に関連する、石英坩堝用の乾燥装
置の全体を説明する、側面図である。
FIG. 9 is a side view illustrating the entire drying apparatus for the quartz crucible according to the embodiment of the present invention.

【図10】本考案実施例に関連する、石英坩堝用の洗浄
装置関係配管のフローシートである。
FIG. 10 is a flow sheet of piping related to a cleaning device for a quartz crucible according to an embodiment of the present invention.

【図11】本考案実施例に関連する、石英坩堝用の作業
工程を説明する、ブロック図である。
FIG. 11 is a block diagram illustrating a working process for a quartz crucible according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 石英坩堝 1aないし1r 坩堝設置部位 2 洗浄槽 3 乾燥槽 4 搬入部 6 搬送機構 7 支持棒 8 搬出部 13 スプレーノズルないし洗浄装置 39 駆動系 40 駆動源 42 移動レール 46 アーム部材 47 保持ブロック 48 補助ブロック DESCRIPTION OF SYMBOLS 1 Quartz crucible 1a to 1r Crucible installation site 2 Cleaning tank 3 Drying tank 4 Carry-in part 6 Transport mechanism 7 Support rod 8 Carry-out part 13 Spray nozzle or cleaning device 39 Drive system 40 Drive source 42 Moving rail 46 Arm member 47 Holding block 48 Auxiliary block

Claims (3)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】 開口面を下向きに設置された坩堝を、搬
入部、洗浄槽、乾燥槽および搬出部のそれぞれの隣接す
る処理工程へ搬送する一または複数の搬送機構を備えた
石英坩堝の洗浄装置において、該搬送機構6を、下方に
垂下した一対のアーム部材46と、該アーム部材46を
坩堝1外周面から左右に離接可能に揺動させる駆動系3
9と、所定圧のトルクを発生可能な該駆動系39の駆動
源40とにより構成し、前記駆動系39の駆動により前
記アーム部材46を坩堝1外周面に挟持させた状態で坩
堝1を、隣接する処理工程へ搬送可能に構成するととも
に、該搬送時に前記駆動源40のトルク圧を利用して前
記坩堝1に坩堝破壊圧力より小なる挟持圧を常時付勢可
能に構成したことを特徴とする石英坩堝の洗浄装置。
1. A quartz crucible provided with one or a plurality of transport mechanisms for transporting a crucible having an opening face downward to adjacent processing steps of a loading section, a cleaning tank, a drying tank, and an unloading section. In the apparatus, a pair of arm members 46 that hang down the transport mechanism 6 and a drive system 3 that swings the arm members 46 so as to be able to move left and right away from the outer peripheral surface of the crucible 1.
9 and a drive source 40 of the drive system 39 capable of generating a torque of a predetermined pressure, and the crucible 1 is held in a state where the arm member 46 is held on the outer peripheral surface of the crucible 1 by the drive of the drive system 39. It is configured to be able to be conveyed to an adjacent processing step, and is configured to be able to constantly bias a clamping pressure smaller than a crucible breaking pressure to the crucible 1 using the torque pressure of the driving source 40 during the conveyance. Quartz crucible cleaning equipment.
【請求項2】 洗浄室および乾燥室をそれぞれ複数個配
設した請求項1記載の洗浄装置において、前記搬送機構
6を搬入部4側と搬出部8側にそれぞれ配し、これらを
同一移動レール42に沿って相互に独立して移動可能に
構成したことを特徴とする石英坩堝の洗浄装置。
2. The cleaning apparatus according to claim 1, wherein a plurality of cleaning chambers and a plurality of drying chambers are provided, respectively, wherein said transport mechanism 6 is disposed on the side of the loading section 4 and on the side of the unloading section 8, respectively. An apparatus for cleaning a quartz crucible, wherein the apparatus is configured to be movable independently of each other along 42.
【請求項3】 搬入部4、洗浄槽2、乾燥槽3および搬
出部8のそれぞれの坩堝1設置部位を、水平に平行に配
設した一対の支持棒7で形成するとともに、該支持棒7
を介して坩堝1開口端面の一部を保持可能に構成した請
求項1記載の石英坩堝の洗浄装置。
3. The crucible 1 installation site of each of the carry-in section 4, the washing tank 2, the drying tank 3 and the carry-out section 8 is formed by a pair of support rods 7 arranged in parallel and horizontally.
The apparatus for cleaning a quartz crucible according to claim 1, wherein a part of the opening end face of the crucible (1) can be held through the opening.
JP10577391U 1991-11-29 1991-11-29 Quartz crucible cleaning equipment Expired - Fee Related JP2557463Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10577391U JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10577391U JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Publications (2)

Publication Number Publication Date
JPH0546966U JPH0546966U (en) 1993-06-22
JP2557463Y2 true JP2557463Y2 (en) 1997-12-10

Family

ID=14416485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10577391U Expired - Fee Related JP2557463Y2 (en) 1991-11-29 1991-11-29 Quartz crucible cleaning equipment

Country Status (1)

Country Link
JP (1) JP2557463Y2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108358462A (en) * 2018-04-18 2018-08-03 东海县晶盛源硅微粉有限公司 A kind of quartz crucible surface brushing fixing device
CN116689431B (en) * 2023-07-31 2023-10-10 辽宁拓邦鸿基半导体材料有限公司 Cleaning device for quartz products and cleaning method thereof

Also Published As

Publication number Publication date
JPH0546966U (en) 1993-06-22

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