JPH0544798B2 - - Google Patents

Info

Publication number
JPH0544798B2
JPH0544798B2 JP14303685A JP14303685A JPH0544798B2 JP H0544798 B2 JPH0544798 B2 JP H0544798B2 JP 14303685 A JP14303685 A JP 14303685A JP 14303685 A JP14303685 A JP 14303685A JP H0544798 B2 JPH0544798 B2 JP H0544798B2
Authority
JP
Japan
Prior art keywords
microwave
dielectric layer
waveguide
plasma
upper chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14303685A
Other languages
English (en)
Japanese (ja)
Other versions
JPS625600A (ja
Inventor
Kyoichi Komachi
Sumio Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP14303685A priority Critical patent/JPS625600A/ja
Publication of JPS625600A publication Critical patent/JPS625600A/ja
Publication of JPH0544798B2 publication Critical patent/JPH0544798B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
JP14303685A 1985-06-28 1985-06-28 マイクロ波プラズマ処理装置 Granted JPS625600A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14303685A JPS625600A (ja) 1985-06-28 1985-06-28 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14303685A JPS625600A (ja) 1985-06-28 1985-06-28 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS625600A JPS625600A (ja) 1987-01-12
JPH0544798B2 true JPH0544798B2 (OSRAM) 1993-07-07

Family

ID=15329410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14303685A Granted JPS625600A (ja) 1985-06-28 1985-06-28 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS625600A (OSRAM)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5611864A (en) * 1994-03-24 1997-03-18 Matsushita Electric Industrial Co., Ltd. Microwave plasma processing apparatus and processing method using the same
DE69512376D1 (de) * 1994-07-14 1999-10-28 Sumitomo Metal Ind Plasma-bearbeitungsvorrichtung
US5645644A (en) * 1995-10-20 1997-07-08 Sumitomo Metal Industries, Ltd. Plasma processing apparatus
EP0771017A1 (en) 1995-10-27 1997-05-02 Sumitomo Metal Industries, Ltd. Plasma processing apparatus
EP0831680A4 (en) * 1996-03-28 2000-02-02 Sumitomo Metal Ind DEVICE AND METHOD FOR TREATING PLASMA
TW409487B (en) 1998-04-10 2000-10-21 Sumitomo Metal Ind Microwave plasma treatment apparatus and microwave plasma treatment method
JP4014300B2 (ja) 1998-06-19 2007-11-28 東京エレクトロン株式会社 プラズマ処理装置
JP6453727B2 (ja) * 2015-07-31 2019-01-16 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置およびそれを用いた半導体装置の製造方法

Also Published As

Publication number Publication date
JPS625600A (ja) 1987-01-12

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