JPH0543170B2 - - Google Patents

Info

Publication number
JPH0543170B2
JPH0543170B2 JP60002204A JP220485A JPH0543170B2 JP H0543170 B2 JPH0543170 B2 JP H0543170B2 JP 60002204 A JP60002204 A JP 60002204A JP 220485 A JP220485 A JP 220485A JP H0543170 B2 JPH0543170 B2 JP H0543170B2
Authority
JP
Japan
Prior art keywords
exposure
wafer
stepper
light source
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60002204A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61161719A (ja
Inventor
Makoto Torigoe
Michio Kono
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60002204A priority Critical patent/JPS61161719A/ja
Priority to US06/690,940 priority patent/US4653903A/en
Priority to GB08501765A priority patent/GB2155648B/en
Publication of JPS61161719A publication Critical patent/JPS61161719A/ja
Priority to GB08723949A priority patent/GB2195031A/en
Publication of JPH0543170B2 publication Critical patent/JPH0543170B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60002204A 1984-01-24 1985-01-11 露光装置 Granted JPS61161719A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP60002204A JPS61161719A (ja) 1985-01-11 1985-01-11 露光装置
US06/690,940 US4653903A (en) 1984-01-24 1985-01-14 Exposure apparatus
GB08501765A GB2155648B (en) 1984-01-24 1985-01-24 An exposure apparatus
GB08723949A GB2195031A (en) 1984-01-24 1987-10-12 Exposing wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60002204A JPS61161719A (ja) 1985-01-11 1985-01-11 露光装置

Publications (2)

Publication Number Publication Date
JPS61161719A JPS61161719A (ja) 1986-07-22
JPH0543170B2 true JPH0543170B2 (enExample) 1993-06-30

Family

ID=11522824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60002204A Granted JPS61161719A (ja) 1984-01-24 1985-01-11 露光装置

Country Status (1)

Country Link
JP (1) JPS61161719A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62165916A (ja) * 1986-01-17 1987-07-22 Matsushita Electric Ind Co Ltd 露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5583232A (en) * 1978-12-20 1980-06-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Method and apparatus for x ray exposure
JPS57169242A (en) * 1981-04-13 1982-10-18 Hitachi Ltd X-ray transferring device

Also Published As

Publication number Publication date
JPS61161719A (ja) 1986-07-22

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