JPH0539295A - Surface-treating agent for metal - Google Patents

Surface-treating agent for metal

Info

Publication number
JPH0539295A
JPH0539295A JP21655091A JP21655091A JPH0539295A JP H0539295 A JPH0539295 A JP H0539295A JP 21655091 A JP21655091 A JP 21655091A JP 21655091 A JP21655091 A JP 21655091A JP H0539295 A JPH0539295 A JP H0539295A
Authority
JP
Japan
Prior art keywords
imidazole
copper foil
compound
agent
silane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21655091A
Other languages
Japanese (ja)
Inventor
Katsuyuki Tsuchida
克之 土田
Masashi Kumagai
正志 熊谷
Yukio Ogino
幸男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP21655091A priority Critical patent/JPH0539295A/en
Publication of JPH0539295A publication Critical patent/JPH0539295A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject treating agent having excellent rust-proofing action on metal surface and heat-resistance, capable of improving the adhesivity between metal and a resin substrate and useful especially as a silane-coupling agent for copper foil by using a specific imidazole silane compound as an active component. CONSTITUTION:The objective treating agent contains an imidazole silane compound of formula (R and R' are H or 1-20C alkyl; R'' is methyl or ethyl; (n) is 1-3) as an active component. The compound of formula is e.g. N- imidazolemethyltrimethoxysilane. The compound of formula can be produced by reacting an-imidazole or its derivative (e.g. imidazole and 2-methylimidazole) with a silane compound such as chloromethyl trimethoxysilane in the presence of a dehydrochlorination agent (e.g. triethylamine) at room temperature to 200 deg.C for 0.5-30 hr.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は金属表面の防錆或いは接
着性の改善等を行うための表面処理剤、特にプリント回
路用銅張積層板等に用いられる銅箔用シランカップリン
グ剤に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment agent for preventing rust or improving adhesion of a metal surface, and more particularly to a silane coupling agent for copper foil used for copper clad laminates for printed circuits.

【0002】[0002]

【従来の技術】プリント回路用の銅張積層板は銅箔に紙
−フェノール樹脂含浸基材やガラス−エポキシ樹脂含浸
基材等と加熱、加圧して積層して形成され、これをエッ
チングして回路網を形成し、これに半導体装置等の素子
を搭載することにより電子機器用のボードが作られる。
これらの過程では、銅箔と基材との接着、加熱、酸やア
ルカリ液への浸漬、レジストインクの塗布、ハンダ付け
等が行われるため、銅箔には接着性、耐熱性、耐薬品性
等の性能が要求される。さらに、保管時に銅箔の酸化変
色のないことも要求される。
2. Description of the Related Art A copper clad laminate for a printed circuit is formed by laminating a paper-phenol resin-impregnated base material or glass-epoxy resin-impregnated base material on a copper foil by heating and pressing, and etching this. A board for electronic equipment is made by forming a circuit network and mounting an element such as a semiconductor device on the circuit network.
In these processes, adhesion of copper foil and substrate, heating, immersion in acid or alkaline liquid, application of resist ink, soldering, etc. are performed, so copper foil has adhesiveness, heat resistance, chemical resistance. Performance such as is required. Further, it is required that the copper foil should not be oxidized and discolored during storage.

【0003】これらの要求を満たすために、銅箔の各種
表面処理方法が提案されている。例えば銅箔の黄銅層形
成処理(特公昭51−35711号公報、同54−67
01号公報)、クロメート処理、亜鉛または酸化亜鉛と
クロム酸化物とからなる亜鉛−クロム基混合物被覆処理
等(特公昭58−7077号公報)があり、またこれら
にシランカップリング剤を塗布して銅箔と樹脂基板との
接着性向上させる方法も提案されている(特公平2−1
9994号公報、特開昭63−183178号公報、特
開平2−26097号公報)。
In order to meet these requirements, various surface treatment methods for copper foil have been proposed. For example, a brass layer forming treatment of a copper foil (Japanese Patent Publication No. 51-35711, 54-67).
No. 01), chromate treatment, zinc-chromium group mixture coating treatment of zinc or zinc oxide and chromium oxide (Japanese Patent Publication No. 58-7077), and a silane coupling agent is applied to these. A method for improving the adhesion between the copper foil and the resin substrate has also been proposed (Japanese Patent Publication 2-1).
9994, JP-A-63-183178, and JP-A-2-26097).

【0004】この種のシランカップリング剤としては、
ビニルトリエトキシシラン、ビニルトリス(2−メトキ
シエトキシ)シラン、3−メタクリロキシプロピルトリ
メトキシシラン、3−グリシドキシプロピルトリメトキ
シシラン、2−(3,4−エポキシシクロヘキシル)エ
チルトリメトキシシラン、N−2−(アミノエチル)−
3−アミノプロピルトリメトキシシラン、N−2−(ア
ミノエチル)−3−アミノプロピルメチルジメトキシシ
ラン、3−アミノプロピルトリエトキシシラン、N−フ
ェニル−3−アミノプロピルトリメトキシシラン、3−
メルカプトプロピルトリメトキシシラン、3−クロロプ
ロピルトリメトキシシラン等が知られている(「高分子
添加剤の最新技術」120〜134頁、シーエムシー、
1988年1月6日発行)。
As this type of silane coupling agent,
Vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-methacryloxypropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, N- 2- (aminoethyl)-
3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-
Mercaptopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane and the like are known ("Latest Technology of Polymer Additives", pages 120-134, CMC,
Published January 6, 1988).

【0005】[0005]

【発明が解決しようとする課題】しかし、最近プリント
回路が緻密化しているので、接着性その他使用されるプ
リント回路用銅箔に要求される特性はますます厳しくな
っており、上記の如きシランカップリング剤を用いた表
面処理によっても充分満足すべき結果は得られていな
い。本発明者はかかる現状に鑑み鋭意研究を進めた結
果、イミダゾール環を有するシラン化合物が金属表面に
対し優れた防錆作用を有するとともに、金属と樹脂基板
との接着性を著しく向上させることを見出した。
[Problems to be Solved by the Invention] However, since the printed circuit is becoming denser recently, the adhesiveness and other properties required for the copper foil for the printed circuit used are becoming more and more severe. Sufficiently satisfactory results have not been obtained even by surface treatment with a ring agent. As a result of intensive studies conducted by the present inventors in view of the present situation, it was found that a silane compound having an imidazole ring has an excellent anticorrosive action on a metal surface and significantly improves the adhesiveness between the metal and the resin substrate. It was

【0006】本発明は、かかる知見に基づきなされたも
ので、本発明の目的は、耐熱性に優れ、金属表面に対す
る防錆作用が高く、しかも金属と樹脂基板との接着性を
著しく向上させることができる金属表面処理剤、特に銅
箔用シランカップリング剤を提供することにある。
The present invention has been made on the basis of such findings, and an object of the present invention is to have excellent heat resistance, a high rust preventive action on a metal surface, and a markedly improved adhesion between a metal and a resin substrate. Another object of the present invention is to provide a metal surface treating agent capable of achieving the above, particularly a silane coupling agent for copper foil.

【0007】[0007]

【課題を解決するための手段】本発明は、下記の一般式
(I)
The present invention has the following general formula:
(I)

【化2】 (R,R’は水素または炭素数が1〜20のアルキル
基、R”はメチル又はエチル基を、nは1〜3のいずれ
かの整数を表わす)で表わされるイミダゾールシラン化
合物を有効成分とする金属表面処理剤、特に上記イミダ
ゾールシラン化合物を有効成分とする銅箔用シランカッ
プリング剤である。
[Chemical 2] (R and R ′ are hydrogen or an alkyl group having 1 to 20 carbon atoms, R ″ is a methyl or ethyl group, and n is an integer of 1 to 3) and an imidazole silane compound is used as an active ingredient. And a silane coupling agent for copper foil containing the above-mentioned imidazole silane compound as an active ingredient.

【0008】上記一般式(I) で表わされるイミダゾール
シラン化合物の代表的なものを次に例示する。 N−イミダゾールメチルトリメトキシシラン、N−2−
メチルイミダゾールメチルトリメトキシシラン、N−2
−エチルイミダゾールメチルトリメトキシシラン、N−
2−iso−プロピルイミダゾールメチルトリメトキシ
シラン、N−2−エチル−4−メチルイミダゾールメチ
ルトリメトキシシラン、N−2−ウンデシルイミダゾー
ルメチルトリメトキシシラン、N−2−ヘプタデシルイ
ミダゾールメチルトリメトキシシラン、N−イミダゾー
ルメチルトリエトキシシラン、N−2−メチルイミダゾ
ールエチルトリメトキシシラン、N−2−エチルイミダ
ゾールメチルトリエトキシシラン、N−2−iso−プ
ロピルイミダゾールメチルトリエトキシシラン、N−2
−エチル−4−メチルイミダゾールメチルトリエトキシ
シラン、N−2−ウンデシルイミダゾールメチルトリエ
トキシシラン、N−2−ヘプタデシルイミダゾールメチ
ルトリエトキシシラン、2−(N−イミダゾール)エチ
ルトリメトキシシラン、2−(N−2−メチルイミダゾ
ール)エチルトリメトキシシラン、2−(N−2−エチ
ルイミダゾール)エチルトリメトキシシラン、2−(N
−2−iso−プロピルイミダゾール)エチルトリメト
キシシラン、2−(N−2−エチル−4−メチルイミダ
ゾール)エチルトリメトキシシラン、2−(N−2−ウ
ンデシルイミダゾール)エチルトリメトキシシラン、2
−(N−2−ヘプタデシルイミダゾール)エチルトリメ
トキシシラン、2−(N−イミダゾール)エチルトリエ
トキシシラン、2−(N−2−メチルイミダゾール)エ
チルトリエトキシシラン、2−(N−2−エチルイミダ
ゾール)エチルトリエトキシシラン、2−(N−2−i
so−プロピルイミダゾール)エチルトリエトキシシラ
ン、2−(N−2−エチル−4−メチルイミダゾール)
エチルトリエトキシシラン、2−(N−2−ウンデシル
イミダゾール)エチルトリエトキシシラン、2−(N−
2−ヘプタデシルイミダゾール)エチルトリエトキシシ
ラン、3−(N−イミダゾール)プロピルトリメトキシ
シラン、3−(N−2−メチルイミダゾール)プロピル
トリメトキシシラン、3−(N−2−エチルイミダゾー
ル)プロピルトリメトキシシラン、3−(N−2−is
o−プロピルイミダゾール)プロピルトリメトキシシラ
ン、3−(N−2−エチル−4−メチルイミダゾール)
プロピルトリメトキシシラン、3−(N−2−ウンデシ
ルイミダゾール)プロピルトリメトキシシラン、3−
(N−2−ヘプタデシルイミダゾール)プロピルトリメ
トキシシラン、3−(N−イミダゾール)プロピルトリ
エトキシシラン、3−(N−2−メチルイミダゾール)
プロピルトリエトキシシラン、3−(N−2−エチルイ
ミダゾール)プロピルトリエトキシシラン、3−(N−
2−iso−プロピルイミダゾール)プロピルトリエト
キシシラン、3−(N−2−エチル−4−メチルイミダ
ゾール)プロピルトリエトキシシラン、3−(N−2−
ウンデシルイミダゾール)プロピルトリエトキシシラ
ン、3−(N−2−ヘプタデシルイミダゾール)プロピ
ルトリエトキシシラン。
Typical examples of the imidazolesilane compound represented by the above general formula (I) are shown below. N-imidazolemethyltrimethoxysilane, N-2-
Methylimidazole methyltrimethoxysilane, N-2
-Ethylimidazole methyltrimethoxysilane, N-
2-iso-propylimidazolemethyltrimethoxysilane, N-2-ethyl-4-methylimidazolemethyltrimethoxysilane, N-2-undecylimidazolemethyltrimethoxysilane, N-2-heptadecylimidazolemethyltrimethoxysilane, N-imidazolemethyltriethoxysilane, N-2-methylimidazoleethyltrimethoxysilane, N-2-ethylimidazolemethyltriethoxysilane, N-2-iso-propylimidazolemethyltriethoxysilane, N-2
-Ethyl-4-methylimidazolemethyltriethoxysilane, N-2-undecylimidazolemethyltriethoxysilane, N-2-heptadecylimidazolemethyltriethoxysilane, 2- (N-imidazole) ethyltrimethoxysilane, 2- (N-2-methylimidazole) ethyltrimethoxysilane, 2- (N-2-ethylimidazole) ethyltrimethoxysilane, 2- (N
-2-iso-propylimidazole) ethyltrimethoxysilane, 2- (N-2-ethyl-4-methylimidazole) ethyltrimethoxysilane, 2- (N-2-undecylimidazole) ethyltrimethoxysilane, 2
-(N-2-heptadecylimidazole) ethyltrimethoxysilane, 2- (N-imidazole) ethyltriethoxysilane, 2- (N-2-methylimidazole) ethyltriethoxysilane, 2- (N-2-ethyl) Imidazole) ethyltriethoxysilane, 2- (N-2-i
So-propylimidazole) ethyltriethoxysilane, 2- (N-2-ethyl-4-methylimidazole)
Ethyltriethoxysilane, 2- (N-2-undecylimidazole) ethyltriethoxysilane, 2- (N-
2-heptadecylimidazole) ethyltriethoxysilane, 3- (N-imidazole) propyltrimethoxysilane, 3- (N-2-methylimidazole) propyltrimethoxysilane, 3- (N-2-ethylimidazole) propyltrimethoxysilane Methoxysilane, 3- (N-2-is
o-Propylimidazole) propyltrimethoxysilane, 3- (N-2-ethyl-4-methylimidazole)
Propyltrimethoxysilane, 3- (N-2-undecylimidazole) propyltrimethoxysilane, 3-
(N-2-heptadecylimidazole) propyltrimethoxysilane, 3- (N-imidazole) propyltriethoxysilane, 3- (N-2-methylimidazole)
Propyltriethoxysilane, 3- (N-2-ethylimidazole) propyltriethoxysilane, 3- (N-
2-iso-propylimidazole) propyltriethoxysilane, 3- (N-2-ethyl-4-methylimidazole) propyltriethoxysilane, 3- (N-2-
Undecylimidazole) propyltriethoxysilane, 3- (N-2-heptadecylimidazole) propyltriethoxysilane.

【0009】これらのイミダゾールシラン化合物は、イ
ミダゾール、2−メチルイミダゾール、2−エチルイミ
ダゾール、2−iso−プロピルイミダゾール、2−エ
チル−4−メチルイミダゾール、2−ウンデシルイミダ
ゾール、2−ヘプタデシルイミダゾール等のイミダゾー
ル又はその誘導体と、クロロメチルトリメトキシシラ
ン、クロロメチルトリエトキシシラン、2−クロロエチ
ルトリメトキシシラン、2−クロロエチルトリエトキシ
シラン、3−クロロプロピルトリメトキシシラン、3−
クロロプロピルエチルトリエトキシシラン等のシラン類
を、脱塩化水素剤の存在下に反応させることにより簡便
に得られる。すなわち、上記イミダゾール誘導体とシラ
ン類とを0.1 〜10モル比で混合し、これに脱塩化水素
剤を前記イミダゾールの0.1〜10モル倍の範囲で添
加し、室温〜200℃の範囲の温度で、0.5〜30時
間反応させるとよい。尚、脱塩化水素剤としては、トリ
エチルアミン、トリプロピルアミン等のアミン化合物を
用いることができるが、この反応の原料化合物であるイ
ミダゾール誘導体自身が脱塩化水素剤として作用するの
で、この反応原料の量を多くすることにより脱塩化水素
剤を兼ねさせることができる。この反応は必ずしも溶媒
を必要とはしないが、ジオキサン等の有機溶剤を反応溶
媒として用いてもよい。
These imidazole silane compounds include imidazole, 2-methylimidazole, 2-ethylimidazole, 2-iso-propylimidazole, 2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole and the like. Imidazole or a derivative thereof with chloromethyltrimethoxysilane, chloromethyltriethoxysilane, 2-chloroethyltrimethoxysilane, 2-chloroethyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-
It can be easily obtained by reacting silanes such as chloropropylethyltriethoxysilane in the presence of a dehydrochlorination agent. That is, the imidazole derivative and silanes are mixed in a molar ratio of 0.1 to 10 and a dehydrochlorinating agent is added thereto in a range of 0.1 to 10 mol times that of the imidazole, and the temperature is in the range of room temperature to 200 ° C. Then, it is recommended to react for 0.5 to 30 hours. As the dehydrochlorinating agent, an amine compound such as triethylamine or tripropylamine can be used, but since the imidazole derivative itself which is the starting material compound for this reaction acts as the dehydrochlorinating agent, the amount of this reaction starting material By increasing the amount, it can also serve as a dehydrochlorination agent. This reaction does not necessarily require a solvent, but an organic solvent such as dioxane may be used as a reaction solvent.

【0010】本発明は上記イミダゾールシラン化合物を
金属表面処理剤として用いるものであるが、この場合の
対象金属には特に制限はなく、各種の金属に対し防錆或
いは接着性改善の効果を与えることができ、合成樹脂等
と接着させる場合の接着性改良剤、あるいは防錆剤とし
て使用することができる。しかし、このイミダゾールシ
ラン化合物は特に銅の表面処理剤として用いることが好
適であり、特にプリント回路用銅張積層板等に用いられ
る銅箔のシランカップリング剤として用いると、本発明
の効果を十分に発揮することができる。このイミダゾー
ルシラン化合物を銅箔用シランカップリング剤として用
いる場合、銅箔にそのまま塗布しても良いが、銅箔の表
面を粗面化処理したもの、銅箔に黄銅層形成処理したも
の、クロメート処理したもの、亜鉛−クロム基混合物被
覆処理したものに適用することもできる。あらかじめこ
のような処理をすることにより、接着性の改良等、本発
明の効果を一段と向上させることができる。
The present invention uses the above-mentioned imidazole silane compound as a metal surface treating agent. In this case, the target metal is not particularly limited, and various metals can be provided with an effect of preventing rust or improving adhesion. It can be used as an adhesion improver or a rust preventive when it is bonded to a synthetic resin or the like. However, this imidazole silane compound is particularly suitable for use as a surface treatment agent for copper, and particularly when used as a silane coupling agent for copper foil used for copper clad laminates for printed circuits, the effect of the present invention is sufficiently obtained. Can be demonstrated to. When using this imidazole silane compound as a silane coupling agent for copper foil, it may be directly applied to the copper foil, but the surface of the copper foil is roughened, the copper foil is subjected to a brass layer formation treatment, and chromate is used. It can also be applied to the treated one and the one treated with the zinc-chromium group mixture. By performing such a treatment in advance, the effects of the present invention, such as the improvement of adhesiveness, can be further improved.

【0011】上記イミダゾールシラン化合物はそのまま
直接金属表面に塗布してもよいが、水、メタノール、エ
タノール等のアルコール類、更には、テトラヒドロフラ
ン、アセトン、酢酸エチル、トルエン等の溶剤で0.0
01〜20重量%になるように希釈し、この液に金属を
浸漬させる方法で塗布することが簡便で好ましい。尚、
このイミダゾールシラン化合物は単独で用いてもよい
が、複数のイミダゾールシラン化合物を混合して用いて
もよく、また他の防錆剤、或いはカップリング剤等と混
合して用いてもよい。
The above-mentioned imidazole silane compound may be directly coated on the metal surface as it is, but water, alcohols such as methanol and ethanol, and a solvent such as tetrahydrofuran, acetone, ethyl acetate and toluene may be used for 0.0
It is convenient and preferable to dilute so as to be 01 to 20% by weight and apply the solution by dipping a metal in this solution. still,
This imidazole silane compound may be used alone, or a plurality of imidazole silane compounds may be mixed and used, or may be mixed with another rust preventive agent, a coupling agent or the like.

【0012】[0012]

【実施例】以下実施例を挙げて本発明を具体的に説明す
る。
The present invention will be specifically described with reference to the following examples.

【0013】製造例1(イミダゾールシラン化合物の合
成) イミダゾール2.7g(0.04mol)に3−クロロ
プロピルトリメトキシシラン4.0g(0.02mo
l)を加え、150℃の温度で、15時間攪拌して反応
させた。反応終了後、塩酸塩を除去するために蒸留す
る。得られた留出液から更に未反応のイミダゾールを除
去するため、留出液を95℃に保持し、3−グリシドキ
シプロピルトリメトキシシラン(エポキシシラン)7.
9gを滴下し、1時間攪拌反応させ、蒸留して3−(N
−イミダゾール)プロピルトリメトキシシラン(以下
「イミダゾールシラン」と云う)0.9g(収率19重
量%)を得た。
Production Example 1 (Synthesis of Imidazole Silane Compound) 4.0 g (0.02 mo) of 3-chloropropyltrimethoxysilane was added to 2.7 g (0.04 mol) of imidazole.
1) was added, and the mixture was reacted by stirring at a temperature of 150 ° C. for 15 hours. After the reaction is complete, distillation is performed to remove the hydrochloride. In order to further remove unreacted imidazole from the obtained distillate, the distillate was kept at 95 ° C., and 3-glycidoxypropyltrimethoxysilane (epoxysilane) 7.
9 g was added dropwise, the mixture was reacted with stirring for 1 hour, and distilled to give 3- (N
-Imidazole) propyltrimethoxysilane (hereinafter referred to as "imidazole silane") (0.9 g, yield 19% by weight) was obtained.

【0014】実施例1 (1) 耐熱性試験 電解銅箔(厚さ75μm、4.5×4.5cm)をアセ
トンで脱脂し、3%の硫酸水溶液で洗浄した。この銅箔
上に、製造例1で得られたイミダゾールシランの6重量
%メタノール溶液をスピナーで塗布し、0.3μmのイ
ミダゾールシランの薄膜を作成し、これを試験片とし
た。
Example 1 (1) Heat resistance test An electrolytic copper foil (thickness: 75 μm, 4.5 × 4.5 cm) was degreased with acetone and washed with a 3% aqueous sulfuric acid solution. A 6 wt% methanol solution of the imidazole silane obtained in Production Example 1 was applied onto this copper foil with a spinner to prepare a thin film of imidazole silane having a thickness of 0.3 μm, which was used as a test piece.

【0015】この試験片をそれぞれ、180℃、200
℃、220℃、240℃の温度の恒温槽に30分間入れ
て加熱処理し、加熱後の変色の程度を観察して耐熱性を
評価した。結果を表1に示した。
The test pieces were tested at 180 ° C and 200 ° C, respectively.
The sample was placed in a constant temperature bath at temperatures of 220 ° C., 220 ° C. and 240 ° C. for 30 minutes for heat treatment, and the degree of discoloration after heating was observed to evaluate heat resistance. The results are shown in Table 1.

【0016】[0016]

【表1】 [Table 1]

【0017】(2) 耐湿性試験 上記耐熱性試験と同様にしてイミダゾールシランを塗布
した試験片を温度80℃、湿度95%の恒温槽に24時
間入れ、変色の程度を観察して耐湿性を評価した。この
結果も表1に併せて示した。
(2) Moisture resistance test In the same manner as in the heat resistance test, the test piece coated with imidazole silane was placed in a constant temperature bath at a temperature of 80 ° C. and a humidity of 95% for 24 hours, and the degree of discoloration was observed to check the moisture resistance. evaluated. The results are also shown in Table 1.

【0018】(3) 接着性試験 電解銅箔(33μm)に亜鉛−クロム基混合物をめっき
被覆した銅箔(25×25cm)を、イミダゾールシラ
ンの0.4重量%メタノール溶液に浸漬した。これをク
リップで吊り下げ、余分な液を落とした後、110℃の
乾燥器中で、5分間乾燥した。これをガラス繊維クロス
にエポキシ樹脂を含浸させた基板にエポキシ系接着剤を
用いて接着し、JIS C6481に規定する方法によ
り常態ピール強度を測定した。結果を表2に示す。
(3) Adhesion Test A copper foil (25 × 25 cm) obtained by plating an electrolytic copper foil (33 μm) with a zinc-chromium group mixture was immersed in a 0.4 wt% methanol solution of imidazolesilane. This was hung with a clip to remove excess liquid, and then dried in a dryer at 110 ° C. for 5 minutes. This was bonded to a substrate in which glass fiber cloth was impregnated with an epoxy resin using an epoxy adhesive, and the normal peel strength was measured by the method specified in JIS C6481. The results are shown in Table 2.

【0019】[0019]

【表2】 [Table 2]

【0020】比較例1、2 実施例1においてイミダゾールシランに代えて、シラン
カップリング剤として市販されている3−グリシドキシ
プロピルトリメトキシシラン(以下「エポキシシラン」
と云う)を用い、その6重量%メタノール溶液を実施例
1と同様に塗布した銅箔及び何も塗布しない銅箔(以下
「ブランク」とする)について実施例1と同様にして耐
熱性試験および耐湿性試験を行なった。結果を表1に併
せて示した。
Comparative Examples 1 and 2 In place of imidazolesilane in Example 1, 3-glycidoxypropyltrimethoxysilane (hereinafter referred to as "epoxysilane") commercially available as a silane coupling agent.
A copper foil coated with a 6% by weight methanol solution in the same manner as in Example 1 and a copper foil with no coating (hereinafter referred to as “blank”) in the same manner as in Example 1 A moisture resistance test was conducted. The results are also shown in Table 1.

【0021】また、イミダゾールシランの代わりにエポ
キシシランを用いて浸漬処理したもの及び浸漬処理を行
わないものについて実施例1と同様の接着性試験を行な
い、その結果を表2に示した。
Further, the same adhesiveness test as in Example 1 was conducted on the ones which were subjected to the immersion treatment using epoxysilane instead of the imidazolesilane and those which were not subjected to the immersion treatment, and the results are shown in Table 2.

【0022】表1の結果から本発明のイミダゾールシラ
ン化合物で表面処理された銅箔は、加熱時および多湿時
においても変色が少なく、優れた耐熱性と防錆作用があ
り、また表2の結果より樹脂基板との接着性向上作用も
優れていることがわかる。
From the results shown in Table 1, the copper foil surface-treated with the imidazole silane compound of the present invention shows little discoloration during heating and high humidity, and has excellent heat resistance and rust preventive action. It can be seen that the effect of improving the adhesiveness with the resin substrate is more excellent.

【0023】[0023]

【発明の効果】本発明のイミダゾールシラン化合物から
なる表面処理剤は、耐熱性及び防錆作用に優れ、しかも
金属と樹脂基板との接着性を著しく向上させることがで
き、金属表面処理剤、特に、銅箔用シランカップリング
剤として有用なものである。
The surface treatment agent comprising the imidazolesilane compound of the present invention has excellent heat resistance and rust preventive action, and can significantly improve the adhesion between the metal and the resin substrate. It is useful as a silane coupling agent for copper foil.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記の一般式(I) 【化1】 (R,R’は水素または炭素数が1〜20のアルキル
基、R”はメチル又はエチル基を、nは1〜3のいずれ
かの整数を表わす)で表わされるイミダゾールシラン化
合物を有効成分とする金属表面処理剤。
1. The following general formula (I): (R and R ′ are hydrogen or an alkyl group having 1 to 20 carbon atoms, R ″ is a methyl or ethyl group, and n is an integer of 1 to 3) and an imidazole silane compound is used as an active ingredient. Metal surface treatment agent.
【請求項2】 請求項1に記載の一般式(I) で表わされ
るイミダゾールシラン化合物を有効成分とする銅箔用シ
ランカップリング剤。
2. A silane coupling agent for copper foil, which comprises the imidazolesilane compound represented by the general formula (I) according to claim 1 as an active ingredient.
JP21655091A 1991-08-02 1991-08-02 Surface-treating agent for metal Pending JPH0539295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21655091A JPH0539295A (en) 1991-08-02 1991-08-02 Surface-treating agent for metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21655091A JPH0539295A (en) 1991-08-02 1991-08-02 Surface-treating agent for metal

Publications (1)

Publication Number Publication Date
JPH0539295A true JPH0539295A (en) 1993-02-19

Family

ID=16690196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21655091A Pending JPH0539295A (en) 1991-08-02 1991-08-02 Surface-treating agent for metal

Country Status (1)

Country Link
JP (1) JPH0539295A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0756443A1 (en) * 1995-07-24 1997-01-29 Gould Electronics Inc. Multi-layer structures containing an adhesion promoting layer
JP2000297094A (en) * 1999-04-15 2000-10-24 Japan Energy Corp New organosilicon compound, its production and surface treating agent and resin additive using the same
US7109273B2 (en) 2002-10-28 2006-09-19 Nikko Materials Co., Ltd. Solid silane coupling agent composition, process for producing the same, and resin composition containing the same
JP2009009824A (en) * 2007-06-28 2009-01-15 Hitachi Cable Ltd Insulated wire, and manufacturing method thereof
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WO2015002158A1 (en) * 2013-07-02 2015-01-08 四国化成工業株式会社 Azole silane compound, surface treatment solution, surface treatment method, and use thereof
JP2015010079A (en) * 2013-07-02 2015-01-19 四国化成工業株式会社 Azole silane compound, synthesis method therefor, and use thereof
JP2015044750A (en) * 2013-08-27 2015-03-12 四国化成工業株式会社 Azole silane compound, synthesis method of the compound and use thereof
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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0756443A1 (en) * 1995-07-24 1997-01-29 Gould Electronics Inc. Multi-layer structures containing an adhesion promoting layer
JP2000297094A (en) * 1999-04-15 2000-10-24 Japan Energy Corp New organosilicon compound, its production and surface treating agent and resin additive using the same
US7109273B2 (en) 2002-10-28 2006-09-19 Nikko Materials Co., Ltd. Solid silane coupling agent composition, process for producing the same, and resin composition containing the same
JP2009009824A (en) * 2007-06-28 2009-01-15 Hitachi Cable Ltd Insulated wire, and manufacturing method thereof
JP2010155898A (en) * 2008-12-26 2010-07-15 Dow Corning Toray Co Ltd Room temperature-curable organopolysiloxane composition
JP2015010079A (en) * 2013-07-02 2015-01-19 四国化成工業株式会社 Azole silane compound, synthesis method therefor, and use thereof
WO2015002158A1 (en) * 2013-07-02 2015-01-08 四国化成工業株式会社 Azole silane compound, surface treatment solution, surface treatment method, and use thereof
US9688704B2 (en) 2013-07-02 2017-06-27 Shikoku Chemicals Corporation Azole silane compound, surface treatment solution, surface treatment method, and use thereof
JP2015044750A (en) * 2013-08-27 2015-03-12 四国化成工業株式会社 Azole silane compound, synthesis method of the compound and use thereof
US11053593B2 (en) 2016-01-27 2021-07-06 Advanced Technologies, Inc. Copper or copper alloy article comprising surface-modified polyester-based resin and manufacturing method
WO2019026382A1 (en) * 2017-08-02 2019-02-07 株式会社新技術研究所 Composite of metal and resin
CN110997314A (en) * 2017-08-02 2020-04-10 株式会社新技术研究所 Composite material of metal and resin
US10941323B2 (en) 2017-08-02 2021-03-09 Advanced Technologies, Inc. Composite of metal and resin
WO2022091663A1 (en) 2020-10-27 2022-05-05 信越化学工業株式会社 Bile acid adsorbing agent composed of imidazole silane-treated silica

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