JP2009009824A - Insulated wire, and manufacturing method thereof - Google Patents
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本発明は、導体と絶縁皮膜との密着性を向上させた絶縁電線及びその製造方法に関する。 The present invention relates to an insulated wire having improved adhesion between a conductor and an insulating film, and a method for manufacturing the insulated wire.
近年、世界的な省エネルギー政策の推進に伴い、高効率モータの開発が進んでいる。モータの高効率化に効果的なのは、スロット部に挿入するエナメル線の占積率を向上させることである。一方、スロット部に挿入するとき、エナメル線は大きな機械的力を受けるため、絶縁皮膜に傷が発生しやすくなる。この問題を解決するため、例えば、絶縁皮膜表面の滑り性を向上させること、および、絶縁皮膜と導体の密着性を向上させることなどが効果的である。 In recent years, development of high-efficiency motors has progressed with the promotion of global energy conservation policies. Effectively increasing the efficiency of the motor is to improve the space factor of the enameled wire inserted into the slot. On the other hand, since the enamel wire receives a large mechanical force when inserted into the slot portion, the insulating film is likely to be damaged. In order to solve this problem, for example, it is effective to improve the slipperiness of the surface of the insulating film and to improve the adhesion between the insulating film and the conductor.
従来、密着性を向上させる手段の例として、シランカップリング剤を用いる方法が提案されている(例えば、特許文献1)。 Conventionally, as an example of means for improving adhesion, a method using a silane coupling agent has been proposed (for example, Patent Document 1).
従来のシランカップリング剤としては、例えば、メルカプトアルコキシシラン、アミノアルコキシシラン、エポキシアルコキシシラン、ビニルアルコキシシラン、アリルアルコキシシランなどが挙げられる。 Examples of conventional silane coupling agents include mercaptoalkoxysilane, aminoalkoxysilane, epoxyalkoxysilane, vinylalkoxysilane, allylalkoxysilane, and the like.
しかしながら、従来のシランカップリング剤では、初期(常温)での密着性向上には効果があるが、熱劣化後は密着性の低下が大きいという問題点があった。 However, the conventional silane coupling agent is effective in improving the adhesion at the initial stage (normal temperature), but has a problem that the decrease in adhesion is large after the thermal deterioration.
例えば、モータ作製時、処理ワニスを硬化させる際に、150〜160℃で数時間加熱する場合があり、このような場合、熱劣化後の密着性が重要となる。 For example, when the treatment varnish is cured at the time of producing the motor, it may be heated at 150 to 160 ° C. for several hours, and in such a case, the adhesion after thermal deterioration becomes important.
そこで、本発明の目的は、上記の従来技術の問題点を解決し、初期の密着性が良好で、かつ熱劣化後における密着性の低下が少ない絶縁電線及びその製造方法を提供することにある。 Accordingly, an object of the present invention is to solve the above-mentioned problems of the prior art, and to provide an insulated wire that has good initial adhesion and that has little decrease in adhesion after thermal degradation, and a method for manufacturing the same. .
本発明は上記目的を達成するために創案されたものであり、請求項1の発明は、導体の外周に、アゾールシラン化合物からなる皮膜が被覆されており、その皮膜の外周に、ポリエステルイミド、ポリアミドイミド、ポリイミド、ポリエステル、ポリウレタンのいずれかを含む樹脂組成物からなるエナメル塗料を塗布、焼付して絶縁皮膜が被覆されている絶縁電線である。
The present invention was devised to achieve the above object, and the invention of
請求項2の発明は、上記アゾールシラン化合物は、アゾール環とアルコキシシリル基、またはアゾール環とベンゼン環の縮合環とアルコキシシリル基とを1分子中に有するイミダゾールシラン、ベンズイミダゾールシラン、ベンゾトリアゾールシランまたはそれらの誘導体から選択された1種以上の化合物である請求項1に記載の絶縁電線である。
According to a second aspect of the present invention, the azole silane compound includes an imidazole silane, a benzimidazole silane, and a benzotriazole silane having an azole ring and an alkoxysilyl group, or a condensed ring of an azole ring and a benzene ring and an alkoxysilyl group in one molecule. The insulated wire according to
請求項3の発明は、導体の外周に絶縁体を設けた絶縁電線の製造方法において、導体の外周に、アゾール環とアルコキシシリル基、またはアゾール環とベンゼン環の縮合環とアルコキシシリル基とを1分子中に有するアゾールシラン化合物からなる皮膜を形成し、その皮膜の外周に、ポリエステルイミド、ポリアミドイミド、ポリイミド、ポリエステル、ポリウレタンのいずれかを含む樹脂組成物からなるエナメル塗料を塗布、焼付して絶縁皮膜を被覆する絶縁電線の製造方法である。 According to a third aspect of the invention, there is provided a method of manufacturing an insulated wire in which an insulator is provided on an outer periphery of a conductor, and an azole ring and an alkoxysilyl group, or a condensed ring of an azole ring and a benzene ring and an alkoxysilyl group are provided on the outer periphery of the conductor. A film made of an azolesilane compound in one molecule is formed, and an enamel paint made of a resin composition containing any of polyesterimide, polyamideimide, polyimide, polyester, and polyurethane is applied to the outer periphery of the film and baked. It is a manufacturing method of the insulated wire which coat | covers an insulating film.
請求項4の発明は、上記導体の外周に、上記アゾールシラン化合物を水またはアルコールからなる溶剤に溶解させたアゾールシラン溶液を塗布し、その後加熱乾燥して上記溶剤を除去する請求項3に記載の絶縁電線の製造方法である。 According to a fourth aspect of the present invention, in the outer periphery of the conductor, an azole silane solution in which the azole silane compound is dissolved in a solvent made of water or alcohol is applied, and then heated and dried to remove the solvent. It is a manufacturing method of this insulated wire.
請求項5の発明は、上記アゾールシラン溶液を吸液性材に吸収させ、その吸液性材を上記導体に接触させて塗布する請求項4に記載の絶縁電線の製造方法である。 The invention of claim 5 is the method for producing an insulated wire according to claim 4, wherein the azole silane solution is absorbed by a liquid absorbent material, and the liquid absorbent material is applied in contact with the conductor.
本発明によれば、導体と絶縁皮膜の密着性(初期および熱劣化後とも)に優れた絶縁電線を提供できる。 ADVANTAGE OF THE INVENTION According to this invention, the insulated wire excellent in the adhesiveness (initial and after heat deterioration) of a conductor and an insulating film can be provided.
以下、本発明の好適な実施形態を添付図面にしたがって説明する。 Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.
図1は、本発明の好適な実施形態を示す絶縁電線の横断面図である。 FIG. 1 is a cross-sectional view of an insulated wire showing a preferred embodiment of the present invention.
図1に示すように、本実施形態に係る絶縁電線1は、導体2の外周に、アゾールシラン化合物をコーティングして形成したアゾールシラン化合物皮膜3が設けられ、そのアゾールシラン化合物皮膜3の外周に、エナメル樹脂皮膜4が設けられたものである。
As shown in FIG. 1, an insulated
アゾールシラン化合物は、アゾール環とアルコキシシリル基とを、またはアゾール環とベンゼン環の縮合環とアルコキシシリル基とを1分子中に有するものである。 An azolesilane compound has an azole ring and an alkoxysilyl group, or a condensed ring of an azole ring and a benzene ring and an alkoxysilyl group in one molecule.
ここで、アゾール環またはアゾール環とベンゼン環の縮合環は、硬化促進作用、防錆作用などを付与する。一方、アルコキシシリル基は、加水分解によってシロキサン結合を生じることにより、無機材料(導体2)と有機材料(エナメル樹脂皮膜4)との密着性を向上させる。さらに、シロキサンネットワークを形成することによって耐熱性・耐湿性も付与する。 Here, an azole ring or a condensed ring of an azole ring and a benzene ring imparts a curing accelerating action, an antirust action, and the like. On the other hand, the alkoxysilyl group improves the adhesion between the inorganic material (conductor 2) and the organic material (enamel resin film 4) by generating a siloxane bond by hydrolysis. Furthermore, heat resistance and moisture resistance are imparted by forming a siloxane network.
エナメル樹脂皮膜4は、ポリエステルイミド、あるいはポリアミドイミド、あるいはポリイミド、あるいはポリエステル、あるいはポリウレタンを含む樹脂組成物からなるエナメル塗料をアゾールシラン化合物皮膜3の周囲に塗布し、焼付硬化したものである。
The enamel resin film 4 is obtained by applying an enamel paint made of a resin composition containing polyesterimide, polyamideimide, polyimide, polyester, or polyurethane around the
アゾールシラン化合物は、イミダゾールシラン、ベンズイミダゾールシラン、ベンゾトリアゾールシランまたはそれらの誘導体から選択された1種以上の化合物であるとよい。 The azole silane compound may be one or more compounds selected from imidazole silane, benzimidazole silane, benzotriazole silane, or derivatives thereof.
次に、本実施形態に係る絶縁電線1の製造方法を説明する。
Next, the manufacturing method of the insulated
絶縁電線1の製造方法は、まず、導体2の外周に、アゾールシラン化合物をコーティングしてアゾールシラン化合物皮膜3を形成する。
In the method for manufacturing the
シラン化合物は一般に希釈して用いる。アゾールシラン化合物は、水またはアルコールに溶解するので、好ましくは、水またはアルコールなどの溶剤に溶解させ、アゾールシラン溶液として用いるとよい。 The silane compound is generally diluted before use. Since the azole silane compound is dissolved in water or alcohol, the azole silane compound is preferably dissolved in a solvent such as water or alcohol and used as an azole silane solution.
アゾールシラン溶液を導体2表面に塗布した後、これを加熱乾燥して溶剤を除去することによりアゾールシラン化合物皮膜3が得られる。
After the azole silane solution is applied to the surface of the conductor 2, the azole
ここで、導体2表面へのアゾールシラン溶液の塗布方法としては、アゾールシラン溶液をフェルト等の吸液性材に吸収させ、その吸液性材を上記導体に接触させて塗布するとよい。ただし、これに限定されず、ダイス塗装、刷毛塗り、噴霧などにより塗布してもよいし、導体2をアゾールシラン溶液に浸漬させてもよい。 Here, as a method of applying the azole silane solution to the surface of the conductor 2, the azole silane solution may be absorbed by a liquid absorbent material such as felt and the liquid absorbent material may be applied in contact with the conductor. However, the present invention is not limited to this, and it may be applied by die coating, brushing, spraying, or the like, or the conductor 2 may be immersed in an azolesilane solution.
アゾールシラン化合物皮膜3を形成した後、ポリエステルイミド、あるいはポリアミドイミド、あるいはポリイミド、あるいはポリエステル、あるいはポリウレタンを含む樹脂組成物からなるエナメル塗料を塗布し、焼付けすると、絶縁電線1が得られる。
After the azole silane
本実施形態に係る絶縁電線1の作用を説明する。
The effect | action of the insulated
本実施形態に係る絶縁電線1は、導体2の外周に、アゾールシラン化合物をコーティングしてアゾールシラン化合物皮膜3が被覆され、その外周に、ポリエステルイミド、あるいはポリアミドイミド、あるいはポリイミド、あるいはポリエステル、あるいはポリウレタンを含む樹脂組成物からなるエナメル塗料を塗布、焼付してエナメル樹脂皮膜4が被覆されて、構成されている。
In the insulated
アゾールシラン化合物は硬化促進作用、耐熱性、耐湿性などを付与するため、従来のシランカップリング剤を用いた場合と比較して、導体2とエナメル樹脂皮膜4との初期(常温)での密着性および熱劣化後の密着性がともに向上する。このため、例えば、高温での処理が必要なモータなどに絶縁電線1を用いるとき、その信頼性を向上することができる。同様の理由により、自動車、電車、電気機器などにも有用である。
Since the azole silane compound imparts hardening accelerating action, heat resistance, moisture resistance, etc., the adhesion between the conductor 2 and the enamel resin film 4 at the initial stage (room temperature) is higher than when a conventional silane coupling agent is used. And adhesion after heat deterioration are improved. For this reason, for example, when the insulated
導体2は、共通に、直径1mmの銅線を用いた。 The conductor 2 was commonly a copper wire having a diameter of 1 mm.
アゾールシラン化合物は、イミダゾールシランを用いた。このイミダゾールシランを2wt%メタノール溶液に溶解させ、その溶液に導体2を浸漬した後、メタノールを乾燥・除去した。イミダゾールシラン化合物の分子構造を以下に示す。 As the azole silane compound, imidazole silane was used. This imidazole silane was dissolved in a 2 wt% methanol solution, the conductor 2 was immersed in the solution, and then the methanol was dried and removed. The molecular structure of the imidazole silane compound is shown below.
比較する従来のシランカップリング剤として、代表的メルカプトシランである、3−メルカプトプロピルトリメトキシシランを用いた。これも同様に2wt%のメタノール溶液に溶解させ、その溶液に導体2を浸漬した後、メタノールを乾燥・除去した。 As a conventional silane coupling agent to be compared, 3-mercaptopropyltrimethoxysilane, which is a typical mercaptosilane, was used. This was similarly dissolved in a 2 wt% methanol solution, the conductor 2 was immersed in the solution, and then the methanol was dried and removed.
絶縁電線1の密着性評価は、以下の方法に従って実施した。
The adhesion evaluation of the insulated
絶縁電線1の直線状サンプルを同軸上で250mm離れた2つのクランプに固定し、サンプルの長さ方向に平行な2辺の皮膜を導体2に達するまで取り除く。その後、常温において、一方のクランプを回転させ、皮膜が浮いた時点の回転回数を測定することにより初期の密着性を得た。
The linear sample of the
熱劣化後の密着性は、直線状サンプルを160℃の恒温槽中で6時間加熱した後、初期と同様の方法にて皮膜が浮いた時点の回転回数を測定したものである。 The adhesion after thermal deterioration is obtained by measuring the number of rotations when the film floats by the same method as the initial stage after heating the linear sample in a thermostat at 160 ° C. for 6 hours.
(実施例1)
導体2に、イミダゾールシラン化合物を表面処理し、その外周に、ポリエステルイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が90回、熱劣化後が86回と、ともに優れていた。
Example 1
The conductor 2 was surface-treated with an imidazole silane compound, and a polyesterimide coating was applied and baked on the outer periphery thereof so as to have a film thickness of 30 μm. After that, as a result of evaluating the adhesiveness after the initial stage and after the thermal deterioration, the initial stage was 90 times and the post-thermal degradation stage was 86 times.
(実施例2)
導体2に、イミダゾールシラン化合物皮膜を表面処理し、その外周に、ポリアミドイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が60回、熱劣化後が55回と、ともに優れていた。
(Example 2)
The conductor 2 was surface-treated with an imidazole silane compound film, and a polyamide-imide paint was applied and baked on the outer periphery thereof so as to have a film thickness of 30 μm. After that, as a result of evaluating the adhesiveness after the initial stage and after the thermal deterioration, the initial stage was 60 times and the post-thermal degradation stage was 55 times.
(比較例1)
導体に、ポリエステルイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が81回、熱劣化後が82回であった。
(Comparative Example 1)
A polyesterimide coating was applied to the conductor and baked to a film thickness of 30 μm. Thereafter, as a result of evaluating the adhesiveness after the initial stage and after the thermal deterioration, the initial stage was 81 times and the thermal degradation was 82 times.
(比較例2)
導体に、メルカプトシラン化合物皮膜を表面処理し、その外周に、ポリエステルイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が93回と優れていたが、熱劣化後が44回と、非常に劣っていた。
(Comparative Example 2)
The conductor was surface-treated with a mercaptosilane compound film, and a polyesterimide coating was applied and baked on the outer periphery so as to have a film thickness of 30 μm. Thereafter, as a result of evaluating the adhesiveness after the initial stage and after the heat deterioration, the initial stage was excellent at 93 times, but after the thermal deterioration was very poor at 44 times.
(比較例3)
導体に、ポリアミドイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が49回、熱劣化後が51回であった。
(Comparative Example 3)
The conductor was coated and baked with a polyamideimide coating so as to have a film thickness of 30 μm. Thereafter, as a result of evaluating the adhesiveness after the initial stage and after the thermal deterioration, the initial stage was 49 times and the thermal degradation was 51 times.
(比較例4)
導体に、メルカプトシラン化合物皮膜を表面処理し、その外周に、ポリアミドイミド塗料を皮膜厚30μmとなるように塗布および焼付けした。しかる後に、初期および熱劣化後の密着性を評価した結果、初期が62回と優れていたが、熱劣化後が31回と、非常に劣っていた。
(Comparative Example 4)
The conductor was surface-treated with a mercaptosilane compound film, and a polyamide-imide paint was applied and baked on the outer periphery so as to have a film thickness of 30 μm. Thereafter, as a result of evaluating the adhesiveness after the initial stage and after the thermal degradation, the initial stage was excellent at 62 times, but after the thermal degradation, it was very poor at 31 times.
実施例1、2および比較例1〜4の実験結果をまとめて表1に示す。 The experimental results of Examples 1 and 2 and Comparative Examples 1 to 4 are summarized in Table 1.
表1より、実施例1、2の絶縁電線1は、比較例1〜4の絶縁電線と比較して初期密着性および熱劣化後の密着性が高いことが確認できた。
From Table 1, it has confirmed that the
1 絶縁電線
2 導体
3 アゾールシラン化合物皮膜
4 エナメル樹脂皮膜
1 Insulated wire 2
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WO2013058318A1 (en) | 2011-10-19 | 2013-04-25 | 古河電気工業株式会社 | Insulating coating material, insulated wire, and method for producing insulated wire |
JP2014179348A (en) * | 2014-07-02 | 2014-09-25 | Hitachi Metals Ltd | Twisted pair wire using stranded conductor having humidity resistance and twisted pair cable |
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JP2004214103A (en) * | 2003-01-07 | 2004-07-29 | Toagosei Co Ltd | Manufacturing method of magnet wire having deformed cross-section |
JP2007146289A (en) * | 2005-10-31 | 2007-06-14 | Mitsui Mining & Smelting Co Ltd | Method for manufacture of electrolytic copper foil, electrolytic copper foil manufactured by the method, surface-treated copper foil manufactured using the electrolytic copper foil, and copper-clad laminate manufactured using the electrolytic copper foil or surface-treated copper foil |
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WO2013058318A1 (en) | 2011-10-19 | 2013-04-25 | 古河電気工業株式会社 | Insulating coating material, insulated wire, and method for producing insulated wire |
KR20140020839A (en) | 2011-10-19 | 2014-02-19 | 후루카와 덴키 고교 가부시키가이샤 | Insulating coating material, insulated wire, and method for producing insulated wire |
JP2014179348A (en) * | 2014-07-02 | 2014-09-25 | Hitachi Metals Ltd | Twisted pair wire using stranded conductor having humidity resistance and twisted pair cable |
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