JP3035154B2 - Enamelled copper wire with enhanced adhesion to copper conductors - Google Patents

Enamelled copper wire with enhanced adhesion to copper conductors

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Publication number
JP3035154B2
JP3035154B2 JP6101856A JP10185694A JP3035154B2 JP 3035154 B2 JP3035154 B2 JP 3035154B2 JP 6101856 A JP6101856 A JP 6101856A JP 10185694 A JP10185694 A JP 10185694A JP 3035154 B2 JP3035154 B2 JP 3035154B2
Authority
JP
Japan
Prior art keywords
copper
copper wire
copper conductor
enameled
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6101856A
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Japanese (ja)
Other versions
JPH07282637A (en
Inventor
雄三 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Totoku Electric Co Ltd
Original Assignee
Totoku Electric Co Ltd
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Filing date
Publication date
Application filed by Totoku Electric Co Ltd filed Critical Totoku Electric Co Ltd
Priority to JP6101856A priority Critical patent/JP3035154B2/en
Publication of JPH07282637A publication Critical patent/JPH07282637A/en
Application granted granted Critical
Publication of JP3035154B2 publication Critical patent/JP3035154B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はエナメル銅線に関する。
更に詳しくはフライバックトランス(FBT),イグニ
ションコイル(IGC)等の使用に好適な、導体径が
0. 05〜0.08mm,絶縁皮膜厚さが4.0〜5.
0μmと細径で、銅導体と絶縁皮膜の密着性に優れ、薄
皮膜でも皮膜に欠陥がなく、破壊電圧特性が良い細径の
エナメル銅線に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an enameled copper wire.
More specifically, the conductor diameter is 0.05 to 0.08 mm and the thickness of the insulating film is 4.0 to 5.0, which is suitable for use in a flyback transformer (FBT), an ignition coil (IGC), or the like.
The present invention relates to a fine-diameter enameled copper wire having a small diameter of 0 μm, having excellent adhesion between a copper conductor and an insulating film, having no defects even in a thin film, and having good breakdown voltage characteristics.

【0002】[0002]

【従来の技術】従来より用いらているエナメル銅線は、
ポリウレタン樹脂,ポリエステル樹脂,ポリエステルイ
ミド樹脂或はポリアミドイミド樹脂等の合成樹脂をクレ
ゾール,N−メチルピロリドン等の有機溶剤に溶解した
粘調な絶縁塗料を銅導体上に複数回塗布,焼付けした構
造で、例えば銅導体上にポリウレタン絶縁塗料を塗布焼
付し、規定の皮膜厚さになるまで、複数回繰り返して製
造される。このエナメル銅線は、コイル巻線され、各種
電子機器の部品として広く用いられている。そして、巻
線されたコイルは電気エネルギーと磁気エネルギーを相
互に変換するという機能を有している。
2. Description of the Related Art Conventionally used enameled copper wires are:
A viscous insulating paint in which a synthetic resin such as a polyurethane resin, polyester resin, polyesterimide resin or polyamideimide resin is dissolved in an organic solvent such as cresol or N-methylpyrrolidone is applied and baked a plurality of times on a copper conductor. For example, it is manufactured by applying and baking a polyurethane insulating paint on a copper conductor and repeating it a plurality of times until a prescribed film thickness is obtained. This enameled copper wire is coil-wound and widely used as a component of various electronic devices. The wound coil has a function of mutually converting electric energy and magnetic energy.

【0003】近年、各種電子機器の軽薄短小化に伴い、
コイルの形状も小型化が進み、線材の占積率の向上が図
られている。従ってコイルに用いられるエナメル銅線も
必然的に細径化が図られ、銅導体の径が細くなり、かつ
絶縁皮膜の厚さも薄くなってきている。特にこの傾向
は、巻数が数千ターンの小型コイル,例えばFBT,I
GCになるほど顕著であり、更にコイルの外径寸法も制
約されている。従って,これらのコイルに使用する細径
エナメル銅線の絶縁皮膜厚さも,例えば5μm厚さでサ
ブミクロンの精度管理が要求されている。
In recent years, as various electronic devices have become lighter, thinner and smaller,
The shape of the coil has also been reduced in size, and the space factor of the wire has been improved. Accordingly, the diameter of the enameled copper wire used for the coil is inevitably reduced, the diameter of the copper conductor is reduced, and the thickness of the insulating film is also reduced. Particularly, this tendency is caused by a small coil having a number of turns of several thousand turns, for example, FBT, I
It becomes more remarkable as it becomes GC, and the outer diameter of the coil is also restricted. Therefore, the thickness of the insulating film of the fine-diameter enameled copper wire used for these coils is required to be, for example, 5 μm thick and to have a submicron precision control.

【0004】細径エナメル銅線をコイル巻線する際、エ
ナメル銅線は強い張力を受けたり、巻線機のプーリー等
でこすられるため,絶縁皮膜は加工劣化を受けている。
その結果、各種特性値,例えば絶縁破壊電圧値の低下は
避けられなかった。このため、一般に特性値の低下を補
おうとして、絶縁皮膜厚さを規格の上限近くで,厚く設
計して製造しており、その結果、実装面でコイル寸法に
制約を受けていた。そのため、皮膜厚さが薄くても皮膜
に欠陥がなく、巻線性の優れた細径エナメル銅線の開発
がコイル巻線業界から強く要請されていた。
[0004] When a small diameter enameled copper wire is coiled, the enameled copper wire is subjected to strong tension or rubbed by a pulley of a winding machine, so that the insulating film is deteriorated by processing.
As a result, a decrease in various characteristic values, for example, a dielectric breakdown voltage value was inevitable. For this reason, generally, in order to compensate for the decrease in the characteristic value, the thickness of the insulating film is designed and manufactured close to the upper limit of the standard, and as a result, the coil dimensions are restricted on the mounting surface. For this reason, there has been a strong demand from the coil winding industry for the development of a fine-diameter enameled copper wire which has no defects even when the film thickness is small and has excellent winding properties.

【0005】[0005]

【発明が解決しようとする課題】前記したように,エナ
メル銅線は、例えばポリウレタン絶縁塗料を銅導体上に
複数回塗布,焼付けることにより形成される。この際、
塗料の樹脂の分子鎖間で架橋が起こり、三次元綱目構造
の絶縁皮膜が形成される。しかしながら、この方式で銅
導体上に焼付された絶縁皮膜と銅導体表面の結合は単に
機械的な接着のみで、化学結合に基づく強固な接着は期
待できなかった。その結果、細径エナメル銅線におい
て、絶縁皮膜にピンホールや微細な傷等の機械的欠陥が
あると、この欠陥の部分より湿気が侵入し、皮膜が銅表
面から浮き上がり、皮膜剥離の一原因となっていた。更
にこのような状況下でエナメル銅線がコイルに巻線加工
されると,浮きの部分の絶縁皮膜の密着性が極端に低下
し、電気特性の著しい低下が認められた。すなわち、第
1の課題は、銅導体と絶縁皮膜の接着界面に関する問
題、すなわちエナメル銅線の銅導体と絶縁皮膜との密着
性に関する問題が挙げられる。
As described above, an enameled copper wire is formed by, for example, applying and baking a polyurethane insulating paint on a copper conductor a plurality of times. On this occasion,
Crosslinking occurs between the molecular chains of the resin of the paint, and an insulating film having a three-dimensional network structure is formed. However, the bonding between the insulating film baked on the copper conductor and the copper conductor surface by this method is merely mechanical bonding, and strong bonding based on chemical bonding cannot be expected. As a result, if there is a mechanical defect such as pinholes or fine scratches in the insulating film of the fine-diameter enameled copper wire, moisture will penetrate from the defect, and the film will rise from the copper surface, causing one of the causes of film peeling. Had become. Further, when an enameled copper wire is wound around a coil in such a situation, the adhesion of the insulating film at the floating portion is extremely reduced, and a remarkable decrease in electric characteristics is recognized. That is, the first problem is a problem relating to the adhesive interface between the copper conductor and the insulating film, that is, a problem relating to the adhesion between the copper conductor of the enameled copper wire and the insulating film.

【0006】また、銅導体表面には伸線加工時のダイス
傷が残っている。なおこの傷を皆無にすることは不可能
であり、組ダイスの減面率を最小にして伸線しても数μ
m程度のダイス傷は取り除くことができない。このダイ
ス傷をミクロ的に見た場合,この傷の形状は凹状で直線
状の溝を形成し、銅導体の長さ方向に渡って発生してい
る。
[0006] Die scratches during wire drawing remain on the copper conductor surface. In addition, it is impossible to eliminate such scratches.
Die scratches of about m cannot be removed. When the dice scratches are viewed microscopically, the shape of the scratches is concave and forms a linear groove, and occurs along the length direction of the copper conductor.

【0007】前記ダイス傷のある銅導体表面に絶縁塗料
を塗布焼付して絶縁皮膜を形成させると、導体表面と絶
縁皮膜の界面に微小な空隙(ミクロボイド)が形成され
る危険性が大である。このミクロボイドが形成された場
合、ボイド中の電界は誘電体(絶縁皮膜)中より大であ
り、かつ一般に気体の絶縁耐力は固体のそれよりも小さ
いから、高電圧が印加されるとボイド放電が開始する。
そして絶縁皮膜のtanδは比較的急激に上昇し、耐電
圧寿命が低下する。また、ダイス傷の角の部分は局部的
に電界が集中されやすい場所であるので、この部分でコ
ロナ放電が始まり、絶縁皮膜を劣化させる。従ってダイ
ス傷は絶縁皮膜の破壊電圧特性を低下させる原因とな
る。すなわち、第2の課題は、エナメル銅線の破壊電圧
特性に関する銅導体の表面の問題、すなわちダイス傷が
絶縁皮膜の破壊電圧特性を低下させる問題が挙げられ
る。
When an insulating coating is formed by applying and baking an insulating paint on the surface of the copper conductor having the dice scratches, there is a great risk that minute voids (microvoids) are formed at the interface between the conductor surface and the insulating film. . When this microvoid is formed, the electric field in the void is larger than that in the dielectric (insulating film), and the dielectric strength of gas is generally smaller than that of a solid. Therefore, when a high voltage is applied, void discharge occurs. Start.
Then, tan δ of the insulating film increases relatively sharply, and the withstand voltage life decreases. Further, since the corner portion of the die flaw is a place where the electric field is easily concentrated locally, corona discharge starts at this portion, and the insulating film is deteriorated. Therefore, the die scratches cause the breakdown voltage characteristics of the insulating film to deteriorate. That is, the second problem is a problem of the surface of the copper conductor with respect to the breakdown voltage characteristics of the enameled copper wire, that is, a problem that the dice scratch reduces the breakdown voltage characteristics of the insulating film.

【0008】本発明は、上記従来技術が有する各種問題
点を解決するために為されたものであり、細径エナメル
銅線の銅導体と絶縁皮膜との密着性および破壊電圧特性
を向上させるには前記2つの大きな課題を解決しなけれ
ばならないと考え、絶縁皮膜と銅導体の接着の界面およ
びダイス傷に照準をあてて検討を加え,鋭意研究した結
果得られたものであり、絶縁皮膜の密着性に優れ,薄皮
膜厚さでも皮膜に欠陥がなく,ピンホール特性,破壊電
圧特性が良い細径エナメル銅線を提供することを目的と
する。
The present invention has been made to solve the above-mentioned various problems of the prior art, and is intended to improve the adhesion between a copper conductor of a fine-diameter enameled copper wire and an insulating film and a breakdown voltage characteristic. Considers that the above two major problems must be solved and focuses on the interface between the insulation film and the copper conductor and the dice flaws. An object of the present invention is to provide a fine-diameter enameled copper wire which has excellent adhesion, has no defects even in a thin film thickness, and has good pinhole characteristics and breakdown voltage characteristics.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に本発明は、アルキルイミダゾール化合物の塩の水溶液
に、ポリオレフィンオキサイドに過塩素酸アルカリ金属
塩を溶解させた高分子固体電解質を添加してなるアルキ
ルイミダゾール溶液を、銅導体の表面に塗布,加熱乾燥
して、導電性中間層となる高分子固体電解質含有アルキ
ルイミダゾール銅錯体皮膜(以下、銅錯体皮膜という)
を設け、この外周に絶縁塗料を塗布焼付して絶縁皮膜を
設けた銅導体との密着性を強めたエナメル銅線(以下強
密着性エナメル銅線と略記する)にある。
In order to achieve the above object, the present invention provides an aqueous solution of a salt of an alkylimidazole compound, comprising adding a solid polymer electrolyte in which an alkali metal perchlorate is dissolved in a polyolefin oxide. Is applied to the surface of a copper conductor and heated and dried to form a conductive solid intermediate polymer-containing alkylimidazole copper complex film (hereinafter referred to as copper complex film).
An enameled copper wire (hereinafter abbreviated as a strongly adherent enameled copper wire) having an adhesion to a copper conductor provided with an insulating coating by applying and baking an insulating paint on the outer periphery thereof.

【0010】また本発明は、前記アルキルイミダゾール
化合物が、イミダゾール,2−メチルイミダゾール,4
−メチルイミダゾールまたは4−メチル−5−ヒドロキ
シメチルイミダゾールであり、また前記ポリオレフィン
オキサイドが、ポリエチレンオキサイドまたはポリプロ
ピレンオキサイドであり、また前記過塩素酸アルカリ金
属塩が、過塩素酸リチウムである強密着性エナメル銅線
にある。なお銅錯体皮膜の厚さは0.5〜1.0μm有
れば十分である。
[0010] The present invention also relates to the present invention, wherein the alkylimidazole compound is imidazole, 2-methylimidazole,
A strong adhesion enamel, wherein the polyolefin oxide is polyethylene oxide or polypropylene oxide, and the alkali metal perchlorate is lithium perchlorate.-Methylimidazole or 4-methyl-5-hydroxymethylimidazole On the copper wire. It is sufficient that the thickness of the copper complex film is 0.5 to 1.0 μm.

【0011】[0011]

【作用】本発明の強密着性エナメル銅線は、銅と容易に
キレート化合物(錯体)を形成するアルキルイミダゾー
ルを使用し、銅導体表面と絶縁皮膜との異種材質の界面
に中間層を形成させているので導体と絶縁皮膜との密着
が良好となる。更に前記アルキルイミダゾールの中間層
にポリオレフィンオキサイドに過塩素酸アルカリ金属塩
を溶解させた高分子固体電解質を含有せしめることによ
り、中間層にイオン伝導性が付与されるのでコロナ発生
が防止され、破壊電圧特性が良好となる。
The enamelled copper wire of the present invention uses an alkylimidazole which easily forms a chelate compound (complex) with copper, and forms an intermediate layer at the interface between different surfaces of the copper conductor surface and the insulating film. Therefore, the adhesion between the conductor and the insulating film is improved. Further, by adding a polymer solid electrolyte in which an alkali metal perchlorate is dissolved in polyolefin oxide to the intermediate layer of the alkylimidazole, ionic conductivity is imparted to the intermediate layer, so that corona generation is prevented, and the breakdown voltage is reduced. The characteristics are good.

【0012】更に詳しく説明する。本発明のアルキルイ
ミダゾール溶液が銅導体表面に塗布されると、アルキル
イミダゾールが直ちに銅に作用し、銅導体表面の酸化皮
膜中の酸化第一銅(Cu2 O)と反応し銅導体表面にア
ルキルイミダゾール銅錯体の中間層が形成される。その
化学式を下記に示す。
This will be described in more detail. When the alkylimidazole solution of the present invention is applied to the copper conductor surface, the alkylimidazole immediately acts on copper, reacts with cuprous oxide (Cu 2 O) in the oxide film on the copper conductor surface, and forms an alkyl on the copper conductor surface. An intermediate layer of the imidazole copper complex is formed. The chemical formula is shown below.

【0013】[0013]

【化1】 Embedded image

【0014】このようにしてアルキルイミダゾール銅錯
体が銅導体表面に形成されると、溶液中の残余のイミダ
ゾールが長鎖アルキル基特有のファンデルワールス力と
イミダゾール特有の水素結合によってアルキルイミダゾ
ールのミセルができ、銅導体の表面は、該ミセルで被覆
され、導体表面の絶縁塗料の“ぬれ”性が大幅に改善さ
れる。さらに銅導体上に形成された前記ミセルを介して
絶縁塗料が塗布されると、アルキルイミダゾールのアル
キル基と絶縁塗料の主成分である合成樹脂の側鎖を形成
しているアルキル基が相互に作用し、アルキル基特有の
ファンデルワールス力により、銅導体表面と絶縁皮膜が
強固に接着される。
When the alkylimidazole copper complex is formed on the copper conductor surface in this manner, the remaining imidazole in the solution is converted into alkylimidazole micelles by van der Waals force specific to long-chain alkyl groups and hydrogen bond specific to imidazole. As a result, the surface of the copper conductor is coated with the micelle, and the "wetting" property of the insulating paint on the conductor surface is greatly improved. Further, when the insulating paint is applied through the micelle formed on the copper conductor, the alkyl group of the alkylimidazole and the alkyl group forming the side chain of the synthetic resin which is a main component of the insulating paint interact with each other. The surface of the copper conductor and the insulating film are firmly adhered to each other due to the van der Waals force unique to the alkyl group.

【0015】また、前記したように絶縁塗料の“ぬれ”
性が良くなるので、前記ミクロボイドの生成が抑えられ
耐電圧寿命が良好となる。更に前記高分子固体電解質が
導電性付与剤としてアルキルイミダゾールのミセル中に
含有されているので、中間層はイオン伝導性の薄膜とし
て作用し、銅導体表面のダイス傷のエッジ部分の先端で
局部的に電界が集中されやすい場合に発生する電位を緩
和し、コロナ放電を防止する。その結果,絶縁皮膜の劣
化が防止でき、破壊電圧特性が大幅に改善される。
Further, as described above, the "wetting" of the insulating paint
As a result, the generation of the microvoids is suppressed and the withstand voltage life is improved. Furthermore, since the polymer solid electrolyte is contained in the alkyl imidazole micelle as a conductivity-imparting agent, the intermediate layer acts as an ion-conductive thin film, and is locally formed at the tip of the edge portion of the die scratch on the copper conductor surface. The potential generated when the electric field is easily concentrated on the surface is reduced, and corona discharge is prevented. As a result, the deterioration of the insulating film can be prevented, and the breakdown voltage characteristics are greatly improved.

【0016】[0016]

【実施例】以下に本発明の内容を実施例を挙げて説明す
る。なお本発明は本実施例に限定されるものではない。
図1は本発明の強密着性細径エナメル銅線の一実施例を
示す横断面図で、1は銅導体,2は銅錯体皮膜(導電性
中間層)また3は絶縁皮膜(ポリウレタン皮膜)を示
す。
EXAMPLES The contents of the present invention will be described below with reference to examples. Note that the present invention is not limited to the present embodiment.
FIG. 1 is a cross-sectional view showing an embodiment of a strongly-adhesive fine-diameter enameled copper wire according to the present invention, wherein 1 is a copper conductor, 2 is a copper complex film (conductive intermediate layer), and 3 is an insulating film (polyurethane film). Is shown.

【0017】実施例1 強密着性細径エナメル銅線の製
造 (1)高分子固体電解質の調製 ポリエチレンオキサイド(分子量1700)100gに
リチウム含有が10%になるように過塩素酸リチウム1
64gを添加し、常温で30分攪拌し、溶解させて、イ
オン伝導性の導電性付与剤である高分子固体電解質を調
製した。 (2)アルキルイミダゾール溶液(導電性中間層形成処
理剤)の調製 高級アルキルイミダゾール塩の水溶液であるグリコート
−L(四国化成工業社商品名)1000mlに前記(1)で調
製した高分子固体電解質50gを添加し、常温で30分
攪拌してアルキルイミダゾール溶液を調製した。 (3)ポリウレタン銅線0.05mmの製造 強密着性のポリウレタン銅線0.05mmの製造について図
1を用いて説明する。直径0.05mmの銅導体1上に前記
(2)で調製したアルキルイミダゾール溶液をフェルト
を用いて塗布し、続いて炉長1.4m,炉入口温度40
0℃,炉出口温度450℃の乾燥兼焼付炉を用い、線速
180m/分で乾燥し、0.5μm厚の導電性中間層2
を設けた。次にこの中間層2上に、ポリウレタン塗料T
PU−20(東特塗料社商品名)をフェルトを用いて塗
布し、続いて前記炉を用い、同温度,同線速で焼付する
という操作を5回繰り返し、ポリウレタン皮膜3を設け
て、仕上外径0.058 mmのポリウレタン銅線を製造し
た。なお、前記中間層2の乾燥度合は銅導体表面の変色
の程度で評価した。
Example 1 Production of a strongly-adhesive fine-diameter enameled copper wire (1) Preparation of polymer solid electrolyte Lithium perchlorate was added so that lithium content was 10% in 100 g of polyethylene oxide (molecular weight 1700).
64 g was added, and the mixture was stirred at room temperature for 30 minutes and dissolved to prepare a solid polymer electrolyte as an ion-conductive conductivity imparting agent. (2) Preparation of alkyl imidazole solution (conductive intermediate layer forming agent) 50 g of polymer solid electrolyte prepared in the above (1) in 1000 ml of Glyquat-L (trade name of Shikoku Chemicals), which is an aqueous solution of higher alkyl imidazole salt Was added and stirred at room temperature for 30 minutes to prepare an alkylimidazole solution. (3) Production of 0.05 mm Polyurethane Copper Wire Production of 0.05 mm polyurethane copper wire having strong adhesion will be described with reference to FIG. 1. The alkylimidazole solution prepared in the above (2) was applied on a copper conductor 1 having a diameter of 0.05 mm using a felt, followed by a furnace length of 1.4 m and a furnace inlet temperature of 40 m.
Using a drying and baking oven at 0 ° C. and a furnace outlet temperature of 450 ° C., drying at a linear velocity of 180 m / min.
Was provided. Next, on this intermediate layer 2, a polyurethane paint T
The operation of applying PU-20 (trade name of Totoku Paint Co., Ltd.) using a felt and then baking at the same temperature and the same linear speed using the above furnace was repeated 5 times to provide a polyurethane film 3 and finish. A polyurethane copper wire having an outer diameter of 0.058 mm was produced. The degree of drying of the intermediate layer 2 was evaluated based on the degree of discoloration of the copper conductor surface.

【0018】比較例 細径エナメル銅線の製造 ポリウレタン銅線0.05mmの製造について図2を用いて
説明する。直径0.05mmの銅導体1上に前記実施例1で
用いたのと同じポリウレタン塗料TPU−20を前記実
施例1で用いたのと同じ焼付炉を用い、同一条件,同一
線速で塗布,焼付し、ポリウレタン皮膜3を設けて、仕
上外径 0.058mmのポリウレタン銅線を製造した。
Comparative Example Production of Fine Diameter Enamelled Copper Wire Production of a polyurethane copper wire of 0.05 mm will be described with reference to FIG. The same polyurethane coating TPU-20 as used in the first embodiment was applied on the copper conductor 1 having a diameter of 0.05 mm in the same baking furnace as in the first embodiment under the same conditions and at the same linear speed. Then, a polyurethane film 3 was provided to produce a polyurethane copper wire having a finish outer diameter of 0.058 mm.

【0019】特性試験 前記実施例1及び比較例で製造した細径エナメル銅線に
ついて、JIS C3003「エナメル銅線及びエナメ
ルアルミニウム銅線試験方法」に準拠して試験を行っ
た。その結果を下記表1に示す。
Characteristics Tests The small-diameter enameled copper wires produced in Example 1 and Comparative Example were tested in accordance with JIS C3003 “Testing methods for enameled copper wires and enameled aluminum copper wires”. The results are shown in Table 1 below.

【0020】[0020]

【表1】 [Table 1]

【0021】上記表1から明らかなように、本発明の細
径エナメル銅線は比較例の細径エナメル銅線と比較して
各種特性が優れていることが分かる。すなわち、水中伸
長ピンホールの発生が少ないことから銅導体との密着性
が優れていることが分かり、また絶縁破壊電圧及びコロ
ナ発生電圧が高いことから破壊電圧特性が優れているこ
とが分かる。
As is clear from Table 1 above, it can be seen that the thin enameled copper wire of the present invention has various properties superior to those of the comparative example. That is, it can be seen that the occurrence of pinholes in the water is small, so that the adhesion to the copper conductor is excellent, and that the breakdown voltage and the corona generation voltage are high, so that the breakdown voltage characteristics are excellent.

【0022】[0022]

【発明の効果】本発明の細径エナメル銅線の第一の効果
は銅導体表面にアルキルイミダゾール銅錯体を形成し、
かつイオン伝導性を有する中間層を形成したので、該中
間層を介して焼付けられた絶縁皮膜の銅導体表面に対す
る密着性が大幅に改善される。第二の効果は、中間層の
構成成分の高分子固体電解質のイオン性キャリアにより
イオン伝導性が付与され、ダイス傷等による微細傷のエ
ッジ効果に起因する局部的に電界が集中する現象が緩和
される。従ってこのエッジ部分から発生するコロナ放電
が防止され、コロナ発生電圧が高くなり、破壊電圧特性
が良好となる。以上の効果1及び2から、コイルの信頼
性の向上を図ることが可能となったので、フライバック
トランス,イグニッションコイル等,高圧発生部品のト
ランスに広く利用でき,産業上に寄与する効果は極めて
大である。
The first effect of the small-diameter enameled copper wire of the present invention is to form an alkylimidazole copper complex on the copper conductor surface,
In addition, since the intermediate layer having ion conductivity is formed, the adhesion of the insulating film baked through the intermediate layer to the copper conductor surface is greatly improved. The second effect is that ionic conductivity is imparted by the ionic carrier of the polymer solid electrolyte as a component of the intermediate layer, and the phenomenon that the electric field is locally concentrated due to the edge effect of fine scratches such as dice scratches is reduced. Is done. Therefore, corona discharge generated from the edge portion is prevented, the corona generation voltage is increased, and the breakdown voltage characteristics are improved. From the effects 1 and 2 described above, it has become possible to improve the reliability of the coil, so that it can be widely used in transformers for high-voltage generating parts such as flyback transformers and ignition coils, and the effect contributing to industry is extremely large. Is big.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の、銅導体との密着性を強めた細径エナ
メル銅線の一実施例を示す横断面図である。
FIG. 1 is a cross-sectional view showing one embodiment of a small-diameter enameled copper wire having enhanced adhesion to a copper conductor according to the present invention.

【図2】従来の細径エナメル銅線を示す横断面図であ
る。
FIG. 2 is a cross-sectional view showing a conventional small-diameter enameled copper wire.

【符号の説明】[Explanation of symbols]

1 銅導体 2 高分子固体電解質含有アルキルイミダゾール銅錯体
皮膜(導電性中間層) 3 絶縁皮膜(ポリウレタン皮膜)
DESCRIPTION OF SYMBOLS 1 Copper conductor 2 Polymer solid electrolyte containing alkyl imidazole copper complex film (conductive intermediate layer) 3 Insulation film (polyurethane film)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルキルイミダゾール化合物の塩の水溶
液に、ポリオレフィンオキサイドに過塩素酸アルカリ金
属塩を溶解させた高分子固体電解質を添加してなるアル
キルイミダゾール溶液を、銅導体の表面に塗布,加熱乾
燥して、導電性中間層となる高分子固体電解質含有アル
キルイミダゾール銅錯体皮膜を設け、この外周に絶縁塗
料を塗布,焼付して絶縁皮膜を設けたことを特徴とする
銅導体との密着性を強めたエナメル銅線
An alkylimidazole solution obtained by adding a polymer solid electrolyte obtained by dissolving an alkali metal perchlorate in polyolefin oxide to an aqueous solution of a salt of an alkylimidazole compound, is applied to the surface of a copper conductor, and heated and dried. Then, an alkyl imidazole copper complex film containing a polymer solid electrolyte as a conductive intermediate layer is provided, and an insulating paint is applied to the outer periphery of the film and baked to provide an insulating film. Strengthened enameled copper wire
【請求項2】 前記アルキルイミダゾール化合物が、イ
ミダゾール,2−メチルイミダゾール,4−メチルイミ
ダゾールまたは4−メチル−5−ヒドロキシメチルイミ
ダゾールであることを特徴とする請求項1記載のエナメ
ル銅線。
2. The enameled copper wire according to claim 1, wherein said alkylimidazole compound is imidazole, 2-methylimidazole, 4-methylimidazole or 4-methyl-5-hydroxymethylimidazole.
【請求項3】 前記ポリオレフィンオキサイドが、ポリ
エチレンオキサイドまたはポリプロピレンオキサイドで
あることを特徴とする請求項1または2記載の銅導体と
の密着性を強めたエナメル銅線。
3. The enameled copper wire with enhanced adhesion to a copper conductor according to claim 1, wherein the polyolefin oxide is polyethylene oxide or polypropylene oxide.
【請求項4】 前記過塩素酸アルカリ金属塩が、過塩素
酸リチウムであることを特徴とする請求項1,2または
3記載の銅導体との密着性を強めたエナメル銅線。
4. The enameled copper wire with enhanced adhesion to a copper conductor according to claim 1, wherein the alkali metal perchlorate is lithium perchlorate.
JP6101856A 1994-04-14 1994-04-14 Enamelled copper wire with enhanced adhesion to copper conductors Expired - Fee Related JP3035154B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6101856A JP3035154B2 (en) 1994-04-14 1994-04-14 Enamelled copper wire with enhanced adhesion to copper conductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6101856A JP3035154B2 (en) 1994-04-14 1994-04-14 Enamelled copper wire with enhanced adhesion to copper conductors

Publications (2)

Publication Number Publication Date
JPH07282637A JPH07282637A (en) 1995-10-27
JP3035154B2 true JP3035154B2 (en) 2000-04-17

Family

ID=14311673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6101856A Expired - Fee Related JP3035154B2 (en) 1994-04-14 1994-04-14 Enamelled copper wire with enhanced adhesion to copper conductors

Country Status (1)

Country Link
JP (1) JP3035154B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102145317B1 (en) * 2014-03-10 2020-08-18 삼성전기주식회사 Chip electronic component and manufacturing method thereof
JP2023163459A (en) * 2022-04-28 2023-11-10 株式会社Totoku Insulated wire and coil therewith as well as method for manufacturing insulated wire

Also Published As

Publication number Publication date
JPH07282637A (en) 1995-10-27

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