JPH06177535A - Metal surface treatment agent - Google Patents

Metal surface treatment agent

Info

Publication number
JPH06177535A
JPH06177535A JP32930492A JP32930492A JPH06177535A JP H06177535 A JPH06177535 A JP H06177535A JP 32930492 A JP32930492 A JP 32930492A JP 32930492 A JP32930492 A JP 32930492A JP H06177535 A JPH06177535 A JP H06177535A
Authority
JP
Japan
Prior art keywords
metal surface
carbon atoms
treating agent
compound
treatment agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32930492A
Other languages
Japanese (ja)
Inventor
Katsuyuki Tsuchida
克之 土田
Masashi Kumagai
正志 熊谷
Yukio Ogino
幸男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP32930492A priority Critical patent/JPH06177535A/en
Publication of JPH06177535A publication Critical patent/JPH06177535A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To realize a metal surface treating agent which enables a metal surface to be enhanced in rust-resisting properties and adhesive properties to a resin board by a method wherein a mixture of specific imidazolyl silane compound and specific bistrialkoxysilyl compound is used as a metal surface treating agent. CONSTITUTION:Metal surface treating agent is a mixture of new imidazole silane compound represented by formulas I, II, and/or III and bistrialkoxysilyl compound B represented by a formula, (R<4>O)3SiR<6>Si(OR<5>)3, as effective constituents, wherein R<5>O denotes a lower alkoxyl group where the number of carbon atoms is 1 to 4, and R<6> indicates an alkylene group whose number of carbon atoms is 1 to 8. In the formulas I, II, and III, R<1> is an alkyl group where the number of carbon or hydrogen atoms is 1 to 20, R<2> denotes an alkyl group whose number of hydrogen atoms, vinyl groups, or carbon atoms is 1 to 5, R<3> and R<4> are an alkyl group whose number of carbons is 1 to 3, and n denotes an integer of 1 to 3. By this setup, when a printed board is treated by the above treating agent and then mounted, it is hardly separated off under conditions that temperature and humidty are both high, so that it can be improved in reliability.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は金属表面の防錆あるいは
接着性の改善等を行うための金属表面処理剤に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal surface treating agent for preventing rust or improving adhesiveness of a metal surface.

【0002】[0002]

【従来の技術】プリント回路用の銅張積層板は銅箔を紙
−フェノール樹脂含浸基材やガラス−エポキシ樹脂含浸
基材等に加熱、加圧して積層して形成され、これをエッ
チングして回路網を形成し、これに半導体装置等の素子
を搭載することにより電子機器用のボードが作られる。
これらの過程では、基材との接着、加熱、酸やアルカリ
液への浸漬、レジストインクの塗布、ハンダ付け等が行
われるため、銅箔には各種の性能が要求される。たとえ
ば、通常M面(粗化面、以下同様)と呼称されている基
材と接着される側には主として基材との接着性、耐薬品
性等が要求され、又M面の反対側の通常S面(光沢面、
以下同様)と呼称されている側には主として耐熱性、耐
湿性等が要求されている。又これらの両面には保管時に
銅箔の酸化変色のないことも要求されている。これらの
要求を満たすために、銅箔のM面には黄銅層形成処理
(特公昭51−35711号公報、同54−6701号
公報)、M、S双方の面にはクロメート処理、亜鉛また
は酸化亜鉛とクロム酸化物とからなる亜鉛−クロム基混
合物被覆処理等(特公昭58−7077号公報)が行わ
れている。ところで、最近銅箔のS面の耐熱性に関して
は、高耐熱樹脂等の出現により、従来の200℃×30
分からより高温の例えば220℃又は240℃×30分
の高温条件下でも酸化変色が起こらないこと等が要求さ
れるようになってきている。加えて、近年プリント配線
板の微細化への要請がますます増大化しているが、これ
に伴うエッチング精度の向上に対応するためM面にはさ
らに低い表面粗さ(ロープロファイル)も求められてい
る。しかし、M面の表面粗さは一方では基材との接着に
あたって、アンカー効果をもたらしているので、M面に
対するこのロープロファイルの要求と接着力の向上とは
二律背反の関係にあり、ロープロファイル化によるアン
カー効果の低減分は別の手段による接着力の向上で補償
することが必要である。
A copper clad laminate for a printed circuit is formed by laminating a copper foil on a paper-phenol resin-impregnated base material or glass-epoxy resin-impregnated base material by heating and pressurizing it. A board for electronic equipment is made by forming a circuit network and mounting an element such as a semiconductor device on the circuit network.
In these processes, adhesion with a base material, heating, immersion in an acid or alkaline solution, application of resist ink, soldering, etc. are performed, so that various performances are required for the copper foil. For example, the side that is usually called the M surface (roughened surface, the same applies below) is mainly required to have adhesiveness with the base material, chemical resistance, etc. Usually S side (glossy surface,
The same shall apply hereinafter) is mainly required to have heat resistance and moisture resistance. It is also required that the copper foils on both sides of the copper foil do not undergo oxidative discoloration during storage. In order to satisfy these requirements, a brass layer forming treatment (Japanese Patent Publication No. S51-35711, No. 54-6701) on the M side of the copper foil, chromate treatment, zinc or oxidation on both sides of M and S. A coating treatment of a zinc-chromium group mixture consisting of zinc and chromium oxide (Japanese Patent Publication No. 58-7077) has been carried out. By the way, recently, regarding the heat resistance of the S side of copper foil, due to the advent of high heat resistant resins, etc.
Therefore, it is required that oxidative discoloration does not occur even under high temperature conditions such as 220 ° C. or 240 ° C. × 30 minutes. In addition, the demand for finer printed wiring boards has increased more and more in recent years, and in order to respond to the improvement in etching accuracy accompanying this, lower surface roughness (low profile) is also required for the M surface. There is. On the other hand, the surface roughness of the M-side, on the other hand, brings about an anchoring effect in adhering to the substrate. Therefore, there is a trade-off relationship between the requirement of the low profile for the M-side and the improvement of the adhesive strength, and the low profile is required. It is necessary to compensate for the reduction in the anchor effect due to the above by improving the adhesive force by another means.

【0003】また接着力の増強手段としてあるいは前記
したロープロファイル化に伴う接着力の増強手段として
M面にシランカップリング剤を塗布する方法も提案され
ている(特公平2−19994号公報、特開昭63−1
83178号公報、特開平2−26097号公報)。
Further, a method of applying a silane coupling agent to the M surface has also been proposed as a means for increasing the adhesive force or a means for increasing the adhesive force due to the above-mentioned low profile (Japanese Patent Publication No. 2-19994, Kai 63-1
83,178, and JP-A-2-26097).

【0004】この種のシランカップリング剤としては、
ビニルトリエトキシシラン、ビニルトリス(2−メトキ
シエトキシ)シラン、3−メタクリロキシプロピルトリ
メトキシシラン、3−グリシドキシプロピルトリメトキ
シシラン、2−(3,4−エポキシシクロヘキシル)エ
チルトリメトキシシラン、N−2−(アミノエチル)−
3−アミノプロピルトリメトキシシラン、N−2−(ア
ミノエチル)−3−アミノプロピルメチルジメトキシシ
ラン、3−アミノプロピルトリエトキシシラン、N−フ
ェニル−3−アミノプロピルトリメトキシシラン、3−
メルカプトプロピルトリメトキシシラン、3−クロロプ
ロピルトリメトキシシラン等が知られている[「高分子
添加剤の最新技術」120〜134頁、シーエムシー、
1988年1月6日発行]。
As this type of silane coupling agent,
Vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-methacryloxypropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, N- 2- (aminoethyl)-
3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-
Mercaptopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, etc. are known ["Latest Technology of Polymer Additives", pp. 120-134, CMC,
Published January 6, 1988].

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記し
たように最近プリント回路が緻密化しているので、使用
されるプリント回路用銅箔に要求される特性はますます
厳しくなっている。本発明は、こうした要請に対応でき
る、すなわち、金属表面に対する防錆作用が高く、しか
も金属と樹脂基板との接着性を著しく向上させることが
できる特定のシラン化合物を用いた新規な金属表面処理
剤、特に銅箔用表面処理剤を提供することを目的とする
ものである。
However, since the printed circuit has been densified recently as described above, the characteristics required for the copper foil for the printed circuit used have become more and more severe. The present invention can meet these requirements, that is, a novel metal surface treatment agent using a specific silane compound that has a high rust preventive effect on the metal surface and can significantly improve the adhesion between the metal and the resin substrate. In particular, the object is to provide a surface treatment agent for copper foil.

【0006】[0006]

【課題を解決するための手段】本発明者は、鋭意研究を
進めた結果、特定のイミダゾールシラン化合物と特定の
ビストリアルコキシシリル化合物との混合物が金属表面
に対し優れた防錆作用を有するとともに、金属と樹脂基
板との接着性を著しく向上させることを見出した。
Means for Solving the Problems As a result of intensive research, the present inventor has found that a mixture of a specific imidazole silane compound and a specific bistrialkoxysilyl compound has an excellent rust preventive action on a metal surface, It has been found that the adhesion between the metal and the resin substrate is significantly improved.

【0007】本発明は、かかる知見に基づきなされたも
のであり、その要旨は、下記一般式(1)、(2)及び
/又は(3)で表される新規イミダゾールシラン化合物
(A)及び下記一般式(4)で表されるビストリアルコ
キシシリル化合物(B)を有効成分とする金属表面処理
The present invention has been made based on such findings, and the gist thereof is a novel imidazole silane compound (A) represented by the following general formulas (1), (2) and / or (3) and the following: Metal surface treating agent containing a bistrialkoxysilyl compound (B) represented by the general formula (4) as an active ingredient

【0008】[0008]

【化2】 [Chemical 2]

【0009】(ただし、一般式(1),(2)又は
(3)において、R1は水素又は炭素数が1〜20のア
ルキル基、R2は水素、ビニル基又は炭素数が1〜5の
アルキル基、R3,R4は炭素数が1〜3のアルキル基、
nは1〜3) (R5O)3SiR6Si(OR53 (4) (ただし、R5Oは炭素数1〜4の低級アルコキシ基、
6は炭素数1〜8のアルキレン基を示す)にある。
(However, in the general formula (1), (2) or (3), R 1 is hydrogen or an alkyl group having 1 to 20 carbon atoms, R 2 is hydrogen, a vinyl group or 1 to 5 carbon atoms. Alkyl group, R 3 and R 4 are alkyl groups having 1 to 3 carbon atoms,
n is 1 to 3) (R 5 O) 3 SiR 6 Si (OR 5 ) 3 (4) (wherein R 5 O is a lower alkoxy group having 1 to 4 carbon atoms,
R 6 represents an alkylene group having 1 to 8 carbon atoms).

【0010】本発明の金属処理剤の(A)成分であるイ
ミダゾールシラン化合物(1)、(2)及び/又は
(3)は、一般式(5)で表されるイミダゾール化合物
と一般式(6)で表される3−グリシドキシプロピルシ
ラン化合物とを、80〜200℃で反応させることによ
り製造することができる。その反応を式で示すと次のよ
うになる。
The imidazole silane compound (1), (2) and / or (3), which is the component (A) of the metal treating agent of the present invention, comprises the imidazole compound represented by the general formula (5) and the general formula (6). ) And the 3-glycidoxy propyl silane compound represented by these are reacted at 80-200 degreeC, and it can manufacture. The reaction is expressed by the following equation.

【0011】[0011]

【化3】 [Chemical 3]

【0012】(上記式中、R1は水素又は炭素数が1〜
20のアルキル基、R2は水素、ビニル基又は炭素数1
〜5のアルキル基、R3及びR4は炭素数1〜3のアルキ
ル基、nは1〜3を表す)上記一般式(5)で表される
イミダゾール化合物として好ましいのは、イミダゾー
ル、2−アルキルイミダゾール、2,4−ジアルキルイ
ミダゾール、4−ビニルイミダゾール等である。これら
のうちとくに好ましいのは、イミダゾール;2−アルキ
ルイミダゾールとしては、2−メチルイミダゾール、2
−エチルイミダゾール、2−ウンデシルイミダゾール、
2−ヘプタデシルイミダゾール;また、2,4−ジアル
キルイミダゾールとしては、2−エチル−4−メチルイ
ミダゾール等を挙げることができる。又上記一般式
(6)で表される3−グリシドキシプロピルシラン化合
物は、3−グリシドキシプロピルトリアルコキシシラ
ン、3−グリシドキシプロピルジアルコキシアルキルシ
ラン、3−グリシドキシプロピルアルコキシジアルキル
シランであり、これらのうちとくに好ましいものを挙げ
れば、3−グリシドキシプロピルトリアルコキシシラン
としては、3−グリシドキシプロピルトリメトキシシラ
ン、3−グリシドキシプロピルトリエトキシシラン、ま
た3−グリシドキシプロピルジアルコキシアルキルシラ
ンとしては、3−グリシドキシプロピルジメトキシメチ
ルシラン、3−グリシドキシプロピルアルコキシジアル
キルシランとしては、3−グリシドキシプロピルエトキ
シジメチルシラン等である。
(In the above formula, R 1 is hydrogen or has 1 to 1 carbon atoms.
20 alkyl groups, R 2 is hydrogen, vinyl group or 1 carbon atom
~ 5 alkyl group, R 3 and R 4 are alkyl groups having 1 to 3 carbon atoms, and n represents 1 to 3) The imidazole compound represented by the general formula (5) is preferably imidazole, 2- Alkylimidazole, 2,4-dialkylimidazole, 4-vinylimidazole and the like. Among these, particularly preferable are imidazole; 2-alkylimidazole is 2-methylimidazole, 2
-Ethyl imidazole, 2-undecyl imidazole,
2-Heptadecylimidazole; As the 2,4-dialkylimidazole, 2-ethyl-4-methylimidazole and the like can be mentioned. The 3-glycidoxypropylsilane compound represented by the general formula (6) is 3-glycidoxypropyltrialkoxysilane, 3-glycidoxypropyldialkoxyalkylsilane, 3-glycidoxypropylalkoxydialkyl. Silanes, and particularly preferable ones among these, include 3-glycidoxypropyltrialkoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, and 3-glycidoxypropyltriethoxysilane. Examples of the sidoxypropyl dialkoxyalkylsilane include 3-glycidoxypropyldimethoxymethylsilane, and examples of the 3-glycidoxypropylalkoxydialkylsilane include 3-glycidoxypropylethoxydimethylsilane.

【0013】上記イミダゾール化合物と3−グリシドキ
シプロピルシラン化合物との反応は、80〜200℃の
温度に加熱したイミダゾール化合物に0.1〜10モル
倍量の3−グリシドキシプロピルシラン化合物を滴下さ
せながら行うと良く、反応時間は5分〜2時間程度で十
分である。この反応は特には溶媒を必要とはしないが、
クロロホルム、ジオキサン、メタノール、エタノール等
の有機溶剤を反応溶媒として用いてもよい。尚、この反
応は、水分を嫌うので、水分が混入しないように、乾燥
した窒素、アルゴン等の水分を含まない気体の雰囲気下
で行うことが好ましい。
The reaction between the imidazole compound and the 3-glycidoxypropylsilane compound is carried out by adding 0.1- to 10-fold molar amount of the 3-glycidoxypropylsilane compound to the imidazole compound heated to a temperature of 80 to 200 ° C. It is advisable to carry out the reaction while dropping, and a reaction time of about 5 minutes to 2 hours is sufficient. This reaction does not require a solvent, but
An organic solvent such as chloroform, dioxane, methanol or ethanol may be used as a reaction solvent. Since this reaction does not like water, it is preferable to carry out the reaction in an atmosphere of a gas containing no water such as dry nitrogen or argon so as not to mix water.

【0014】この反応において、上記一般式(1)、
(2)及び(3)で示したイミダゾールシラン化合物は
混合物の状態で得られるが、これらの化合物は、溶解度
の差を利用する方法、カラムクロマトグラフィー等の既
知の手段により精製され、単離されうる。尚、本発明の
金属表面処理剤として用いる場合は、これらのイミダゾ
ールシラン化合物は必ずしも単離する必要はなく、混合
物のまま用いることが簡便で好ましい。なお、生成物中
の各成分組成は、一般に一般式(1):同(2):同
(3)=(40〜80):(10〜30):(5〜4
0)(液体クロマトグラフィーで分析したときの面積
比)である。
In this reaction, in the above general formula (1),
The imidazolesilane compounds shown in (2) and (3) are obtained in the form of a mixture, and these compounds are purified and isolated by a known means such as a method utilizing the difference in solubility or column chromatography. sell. When used as the metal surface treating agent of the present invention, these imidazole silane compounds do not necessarily have to be isolated, and it is preferable to use the mixture as it is because it is simple. The composition of each component in the product is generally expressed by the general formula (1): the same (2): the same (3) = (40 to 80): (10 to 30): (5 to 4)
0) (area ratio when analyzed by liquid chromatography).

【0015】本発明の金属処理剤の(B)成分であるビ
ストリアルコキシシリル化合物の好ましいものを例示す
ると以下のものを挙げることができる。
The preferred examples of the bistrialkoxysilyl compound which is the component (B) of the metal treating agent of the present invention include the following.

【0016】(CH3O)3Si(CH22Si(OCH
33、(CH3O)3Si(CH23Si(OCH33
(CH3O)3Si(CH24Si(OCH33、(CH
3O)3Si(CH26Si(OCH33、本発明に使用
するビストリアルコキシシリル化合物は、いずれも公知
の方法により合成することができる。例えば、ビストリ
アルコキシシリルアルキレン化合物はリチウムの存在下
でクロロアルキルトリアルコキシシラン、テトラアルコ
キシシランを反応させることにより合成することができ
る(特開昭64−6036)。あるいは市販品[例えば
チッ素(株)、東芝シリコーン(株)製等]を利用する
こともできる。
(CH 3 O) 3 Si (CH 2 ) 2 Si (OCH
3 ) 3 , (CH 3 O) 3 Si (CH 2 ) 3 Si (OCH 3 ) 3 ,
(CH 3 O) 3 Si ( CH 2) 4 Si (OCH 3) 3, (CH
All of 3 O) 3 Si (CH 2 ) 6 Si (OCH 3 ) 3 and the bistrialkoxysilyl compound used in the present invention can be synthesized by known methods. For example, a bistrialkoxysilylalkylene compound can be synthesized by reacting a chloroalkyltrialkoxysilane or a tetraalkoxysilane in the presence of lithium (JP-A-64-6036). Alternatively, a commercially available product [eg, manufactured by Nitto Corp. or Toshiba Silicone Co., Ltd.] can be used.

【0017】本発明の金属処理剤において(A)成分と
(B)成分の混合割合は、耐湿性が要求される場合(銅
箔ではS面側)はA:B=90:10〜1:99の範囲
で使用することができ、好ましくは75:25〜1:9
9であり、また接着性が要求される場合(銅箔ではM面
側)は60:40〜1:99、好ましくは50:50〜
1:99である。塗布厚はとくに限定されないが、耐湿
性が要求される場合は、通常0.01μm以上、好まし
くは0.1μm以上である。
In the metal treating agent of the present invention, the mixing ratio of the components (A) and (B) is A: B = 90: 10 to 1: 1 when moisture resistance is required (in the copper foil, the S surface side). It can be used in the range of 99, preferably 75:25 to 1: 9
9 and when adhesiveness is required (in copper foil, M side), 60:40 to 1:99, preferably 50:50 to
It is 1:99. The coating thickness is not particularly limited, but when moisture resistance is required, it is usually 0.01 μm or more, preferably 0.1 μm or more.

【0018】本発明の金属表面処理剤が対象とする金属
には特に制限はない。たとえば銅、亜鉛及びこれらの合
金等の表面処理剤として有用である。しかし、銅の表面
処理剤として用いることが好適であり、特にはプリント
回路用銅張積層板等に用いられる銅箔の表面処理剤とし
て用いると本発明の効果を十分に発揮することができ
る。この銅箔には銅箔の表面を粗面化処理したもの、銅
箔に黄銅層形成処理したもの、クロメート処理したも
の、亜鉛−クロム基混合物被覆処理したもの等も包含さ
れる。
The metal targeted by the metal surface treating agent of the present invention is not particularly limited. For example, it is useful as a surface treatment agent for copper, zinc and alloys thereof. However, it is suitable to be used as a surface treatment agent for copper, and particularly when used as a surface treatment agent for a copper foil used for a copper clad laminate for printed circuits, the effects of the present invention can be sufficiently exhibited. The copper foil includes a copper foil whose surface has been roughened, a copper foil which has been subjected to a brass layer formation treatment, a chromate treatment, a zinc-chromium group mixture coating treatment, and the like.

【0019】本発明の表面処理剤は、そのまま直接金属
表面に塗布してもよいが、水、メタノール、エタノール
等のアルコール類、更には、アセトン、酢酸エチル、ト
ルエン等の溶剤で0.001〜10重量%、好ましくは
0.01〜6重量%になるように希釈し、この液に金属
を浸漬させる方法で塗布することが簡便で好ましい。
尚、イミダゾールシラン化合物及びビストリアルコキシ
シリル化合物の混合物は、各単独で用いてもよいが、各
複数の化合物を混合して用いてもよく、また他の防錆
剤、或いは、カップリング剤等と混合して用いてもよ
い。
The surface-treating agent of the present invention may be directly applied to the metal surface as it is, but 0.001 to 0.001 of a solvent such as water, alcohol such as methanol and ethanol, and a solvent such as acetone, ethyl acetate and toluene. It is convenient and preferable to dilute the solution to 10% by weight, preferably 0.01 to 6% by weight, and apply the metal by dipping in the solution.
The mixture of the imidazolesilane compound and the bistrialkoxysilyl compound may be used alone, or may be used as a mixture of a plurality of compounds, and may be used as another rust preventive agent or a coupling agent. You may mix and use it.

【0020】[0020]

【実施例】実施例1イミダゾールシラン化合物(A−1)の合成 イミダゾールと3−グリシドキシプロピルトリメトキシ
シランとを特願平4−183783号の実施例1と同様
に反応させて以下の3成分の混合物[イミダゾールシラ
ン化合物(A−1)]を得た。
Example 1 Synthesis of imidazole silane compound (A-1) Imidazole and 3-glycidoxypropyltrimethoxysilane were reacted in the same manner as in Example 1 of Japanese Patent Application No. 4-183783 to give the following 3 A mixture of components [imidazole silane compound (A-1)] was obtained.

【0021】[0021]

【化4】 [Chemical 4]

【0022】これらの混合組成比は、式(1−1):
(2−1):(3−1)=45:22:33である。
The mixed composition ratio of these is expressed by the formula (1-1):
(2-1) :( 3-1) = 45: 22: 33.

【0023】表面処理剤(1)の調製 上記イミダゾールシラン化合物の混合物(A−1)にビ
ストリメトキシシリルエタンを各種の割合で混合し、表
1に示す6%濃度(トータル濃度、以下同様)のメタノ
ール溶液を調製し、表面処理剤(1)とした。
Preparation of Surface Treatment Agent (1) Bistrimethoxysilylethane was mixed with the mixture (A-1) of the above imidazole silane compound at various ratios to obtain a 6% concentration (total concentration, hereinafter the same) shown in Table 1. A methanol solution was prepared and used as a surface treatment agent (1).

【0024】表面処理剤(1)の評価 本発明の表面処理剤(1)を評価するため、以下のよう
にしてサンプルを調製した。次いでそれらについて耐湿
性の評価を行った。
Evaluation of Surface Treatment Agent (1) In order to evaluate the surface treatment agent (1) of the present invention, a sample was prepared as follows. Then, they were evaluated for moisture resistance.

【0025】耐湿性評価サンプル 2oz生箔(4.5×4.5cm)をアセトンで5分間
超音波洗浄した。水でアセトンを除去し、3%H2SO4
水溶液で1分間洗浄した後、水、アセトンの順で洗浄し
ドライヤーで乾燥した。この銅箔のS面上に上記のよう
にして調製した表面処理剤(1)をスピンコーターで6
×10-4g塗布し(比重1と仮定したときの膜厚は約
0.3μm)、表面処理箔を作成した。
Moisture resistance evaluation sample 2oz raw foil (4.5 × 4.5 cm) was ultrasonically cleaned with acetone for 5 minutes. Acetone is removed with water and 3% H 2 SO 4
After being washed with the aqueous solution for 1 minute, it was washed with water and then with acetone and dried with a dryer. The surface treatment agent (1) prepared as described above was applied to the S side of this copper foil by a spin coater 6
× 10 -4 g was applied (the film thickness when assuming a specific gravity of 1 is about 0.3 μm) to prepare a surface-treated foil.

【0026】耐湿性試験 前記耐湿性評価用サンプルを80℃、95%(相対湿
度)の恒温槽で24時間放置し、銅箔の変色を目視によ
り評価した。その結果を表1に示す。
Humidity resistance test The above-mentioned humidity resistance evaluation sample was left standing in a thermostat at 80 ° C. and 95% (relative humidity) for 24 hours, and the discoloration of the copper foil was visually evaluated. The results are shown in Table 1.

【0027】[0027]

【表1】 [Table 1]

【0028】* 耐湿性の評価は、以下の基準によって
行った。
* Moisture resistance was evaluated according to the following criteria.

【0029】1:黒褐色に変色 2:橙色又は黄色に変色 3:少し変色 4:わずかに変色 5:変色なし 実施例2イミダゾールシラン化合物(A−2)の合成 前記のイミダゾールシラン化合物(1)の合成法におい
て、イミダゾールに代えて、2−エチル−4−メチルイ
ミダゾールを用い、反応温度を95℃とした以外は同様
にして前記一般式(1),(2)及び(3)に対応する
成分の混合物であるイミダゾールシラン化合物(A−
2)を合成した。
1: Discoloration to black brown 2: Discoloration to orange or yellow 3: Discoloration 4: Slight discoloration 5: No discoloration Example 2 Synthesis of imidazole silane compound (A-2) In the synthetic method, 2-ethyl-4-methylimidazole was used in place of imidazole, and components corresponding to the general formulas (1), (2) and (3) were similarly prepared except that the reaction temperature was 95 ° C. An imidazole silane compound (A-
2) was synthesized.

【0030】表面処理剤の調製 上記イミダゾールシラン化合物(A−2)にビストリメ
トキシシリルエタンを各種の割合で混合し、表2に示す
6%濃度のメタノール溶液を調製した。
Preparation of Surface Treatment Agent The imidazolesilane compound (A-2) was mixed with bistrimethoxysilylethane at various ratios to prepare a 6% concentration methanol solution shown in Table 2.

【0031】表面処理剤(2)の評価 前記表面処理剤(2)を用い、実施例1と同様にして耐
湿性サンプルを作成し、耐湿性試験を行った。その結果
を表2に示す。
Evaluation of Surface Treatment Agent (2) A moisture resistance sample was prepared in the same manner as in Example 1 using the surface treatment agent (2), and a moisture resistance test was conducted. The results are shown in Table 2.

【0032】[0032]

【表2】 [Table 2]

【0033】* 耐湿性の評価は表1と同じ 実施例3イミダゾールシラン化合物(A−3)の合成 前記のイミダゾールシラン化合物(1)の合成法におい
て、イミダゾールに代えて2−ウンデシルイミダゾール
を用い、3−グリシドキシプロピルトリメトキシシラン
に代えて3−グリシドキシプロピルジメトキシメチルシ
ランを用い、反応温度を95℃とした以外は同様にして
前記一般式(1),(2)及び(3)に対応する成分の
混合物であるイミダゾールシラン化合物(A−3)を合
成した。 表面処理剤(3)の調製 上記イミダゾールシラン化合物(A−3)にビストリメ
トキシシリルエタンを各種の割合で混合し、表3に示す
6%濃度のメタノール溶液を調製し、表面処理剤(3)
とした。
* Moisture resistance evaluation is the same as in Table 1. Example 3Synthesis of imidazole silane compound (A-3) In the synthesis method of the above-mentioned imidazole silane compound (1)
2-undecylimidazole instead of imidazole
Using 3-glycidoxypropyltrimethoxysilane
Instead of 3-glycidoxypropyl dimethoxymethyl
The same procedure was used except that the orchid was used and the reaction temperature was 95 ° C.
Of the components corresponding to the general formulas (1), (2) and (3)
Combine the imidazole silane compound (A-3), which is a mixture,
I made it. Preparation of surface treatment agent (3) The above imidazole silane compound (A-3) has
Toxylsilylethane was mixed in various proportions and is shown in Table 3.
A 6% concentration methanol solution was prepared, and a surface treatment agent (3)
And

【0034】表面処理剤(3)の評価 前記処理剤(3)を用い、実施例1と同様にして耐湿性
サンプルを作成し、耐湿性試験を行った。その結果を表
3に示す。
Evaluation of Surface Treatment Agent (3) A moisture resistance sample was prepared in the same manner as in Example 1 using the above treatment agent (3), and a moisture resistance test was conducted. The results are shown in Table 3.

【0035】[0035]

【表3】 [Table 3]

【0036】* 耐湿性の評価は表1と同じ 実施例4イミダゾールシラン化合物(A−4)の合成 前記のイミダゾールシラン化合物(1)の合成法におい
て、イミダゾールに代えて2−ウンデシルイミダゾール
を用い、3−グリシドキシプロピルトリメトキシシラン
に代えて3−グリシドキシプロピルエトキシジメチルシ
ランを用い、反応温度を95℃とした以外は同様にして
前記一般式(1),(2)及び(3)に対応する成分の
混合物であるイミダゾールシラン化合物(A−4)を合
成した。 表面処理剤(4)の調製 上記イミダゾールシラン化合物(A−4)にビストリメ
トキシシリルエタンを各種の割合で混合し、表4に示す
6%濃度のメタノール溶液を調製し、表面処理剤(4)
とした。
* Moisture resistance evaluation is the same as in Table 1. Example 4Synthesis of imidazole silane compound (A-4) In the synthesis method of the above-mentioned imidazole silane compound (1)
2-undecylimidazole instead of imidazole
Using 3-glycidoxypropyltrimethoxysilane
Instead of 3-glycidoxypropylethoxydimethyl
The same procedure was used except that the orchid was used and the reaction temperature was 95 ° C.
Of the components corresponding to the general formulas (1), (2) and (3)
Combine the imidazole silane compound (A-4), which is a mixture,
I made it. Preparation of surface treatment agent (4) The above imidazole silane compound (A-4) has
Toxylsilylethane was mixed in various proportions and is shown in Table 4.
A 6% concentration methanol solution was prepared, and a surface treatment agent (4)
And

【0037】表面処理剤(4)の評価 前記表面処理剤(4)を用い、実施例1と同様にして耐
湿性サンプルを作成し、耐湿性試験を行った。その結果
を表4に示す。
Evaluation of Surface Treatment Agent (4) A moisture resistance sample was prepared in the same manner as in Example 1 using the surface treatment agent (4), and a moisture resistance test was conducted. The results are shown in Table 4.

【0038】[0038]

【表4】 [Table 4]

【0039】* 耐湿性の評価は表1と同じ 実施例5〜8 前記の表1〜4に示す各表面処理剤(1)〜(4)(た
だし、0.4%濃度)を用いて以下のようにして接着性
の評価を行った。
* Moisture resistance was evaluated in the same manner as in Table 1. Examples 5 to 8 Using the surface treatment agents (1) to (4) (however, 0.4% concentration) shown in Tables 1 to 4 below, The adhesiveness was evaluated as described above.

【0040】接着性評価サンプル 1ozJTC箔(S面に亜鉛又は酸化亜鉛とクロム酸化
物との亜鉛−クロム基混合物層を有し、M面に黄銅層を
介して前記亜鉛−クロム基混合物層を有する箔;25×
25cm)のM面上に酢酸でpH5に調整した本発明の
表面処理剤の水溶液(0.4%濃度)を少量滴下し、S
US製ロールをころがし処理剤を塗布した。塗布後、1
00℃で5分間乾燥器で乾燥した。
Adhesion Evaluation Sample 1oz JTC foil (having a zinc-chromium group mixture layer of zinc or zinc oxide and chromium oxide on the S side, and having the zinc-chromium group mixture layer on the M side via a brass layer). Foil; 25 ×
25 cm) on the M surface, a small amount of an aqueous solution (0.4% concentration) of the surface treating agent of the present invention adjusted to pH 5 with acetic acid was dropped, and S
A US roll was rolled and the treatment agent was applied. After application, 1
It was dried in an oven at 00 ° C for 5 minutes.

【0041】接着性試験 前記接着性評価用サンプルを、エポキシ樹脂が含浸され
たプリプレグと加熱プレスし、銅張積層体を作成した。
この銅張積層体の銅箔側をエッチングして0.2mm幅
回路×10本を形成し、沸騰水に2時間浸漬後ピール強
度を測定し、その強度と煮沸処理前のピール強度との差
を求め、それを後者で除して得られた%を劣化率とし
た。その結果を図1に示す。また、比較例としてγ−グ
リシドキシプロピルトリメトキシシラン、イミダゾール
シラン化合物及びビストリメトキシシリルエタンの評価
結果も図1に示す。
Adhesion Test The above-mentioned adhesion evaluation sample was hot pressed with a prepreg impregnated with an epoxy resin to prepare a copper clad laminate.
The copper foil side of this copper clad laminate was etched to form 0.2 mm width circuit × 10 pieces, and the peel strength was measured after soaking in boiling water for 2 hours, and the difference between the strength and the peel strength before boiling treatment was measured. Was obtained, and it was divided by the latter, and the obtained percentage was taken as the deterioration rate. The result is shown in FIG. In addition, FIG. 1 also shows the evaluation results of γ-glycidoxypropyltrimethoxysilane, imidazolesilane compound and bistrimethoxysilylethane as comparative examples.

【0042】[0042]

【発明の効果】以上説明したように、本発明の処理剤に
よりS面の耐湿性が向上し、長期間高温・高湿の状態で
保管しても酸化されることがない。又M面側では樹脂と
の接着性が向上し煮沸後のピール強度・劣化率を小さく
することができるので、たとえばプリント基板として実
装した場合、高温・高湿の条件下でも剥離せず信頼性を
高めることができる。
As described above, the treating agent of the present invention improves the moisture resistance of the S surface and is not oxidized even if it is stored in a high temperature / high humidity state for a long period of time. Also, on the M side, the adhesiveness with the resin is improved and the peel strength and deterioration rate after boiling can be reduced, so when mounted as a printed circuit board, for example, it does not peel even under high temperature and high humidity conditions Can be increased.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明表面処理剤の煮沸後ピール強度(劣化
率)を示す図。
FIG. 1 is a graph showing peel strength (deterioration rate) of a surface treating agent of the present invention after boiling.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(1)、(2)及び/又は
(3)で表される新規イミダゾールシラン化合物(A)
及び下記一般式(4)で表されるビストリアルコキシシ
リル化合物(B)を有効成分とする金属表面処理剤。 【化1】 (ただし、一般式(1),(2)又は(3)において、
1は水素又は炭素数が1〜20のアルキル基、R2は水
素、ビニル基又は炭素数が1〜5のアルキル基、R3
4は炭素数が1〜3のアルキル基、nは1〜3) (R5O)3SiR6Si(OR53 (4) (ただし、R5Oは炭素数1〜4の低級アルコキシ基、
6は炭素数1〜8のアルキレン基を示す)
1. A novel imidazole silane compound (A) represented by the following general formulas (1), (2) and / or (3):
And a metal surface treatment agent containing a bistrialkoxysilyl compound (B) represented by the following general formula (4) as an active ingredient. [Chemical 1] (However, in the general formula (1), (2) or (3),
R 1 is hydrogen or an alkyl group having 1 to 20 carbon atoms, R 2 is hydrogen, a vinyl group or an alkyl group having 1 to 5 carbon atoms, R 3 ,
R 4 is an alkyl group having 1 to 3 carbon atoms, n is 1 to 3) (R 5 O) 3 SiR 6 Si (OR 5 ) 3 (4) (wherein R 5 O is a lower one having 1 to 4 carbon atoms) An alkoxy group,
R 6 represents an alkylene group having 1 to 8 carbon atoms)
JP32930492A 1992-12-09 1992-12-09 Metal surface treatment agent Pending JPH06177535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32930492A JPH06177535A (en) 1992-12-09 1992-12-09 Metal surface treatment agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32930492A JPH06177535A (en) 1992-12-09 1992-12-09 Metal surface treatment agent

Publications (1)

Publication Number Publication Date
JPH06177535A true JPH06177535A (en) 1994-06-24

Family

ID=18219967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32930492A Pending JPH06177535A (en) 1992-12-09 1992-12-09 Metal surface treatment agent

Country Status (1)

Country Link
JP (1) JPH06177535A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0756443A1 (en) * 1995-07-24 1997-01-29 Gould Electronics Inc. Multi-layer structures containing an adhesion promoting layer
JP2000297094A (en) * 1999-04-15 2000-10-24 Japan Energy Corp New organosilicon compound, its production and surface treating agent and resin additive using the same
JP2001342578A (en) * 2000-05-31 2001-12-14 Honda Motor Co Ltd Surface treatment agent for metal
JP2006316300A (en) * 2005-05-11 2006-11-24 Hitachi Chem Co Ltd Method for surface-treating copper, and copper surface
JPWO2005031037A1 (en) * 2003-09-29 2007-11-15 東レ株式会社 Titanium or titanium alloy, adhesive resin composition, prepreg and composite material
KR101411731B1 (en) * 2009-09-11 2014-06-25 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Copper foil for lithium ion battery current collector
JP2017043845A (en) * 2015-08-25 2017-03-02 住友金属鉱山株式会社 Metal material surface treatment agent, metal joint body and method for bonding metal material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0756443A1 (en) * 1995-07-24 1997-01-29 Gould Electronics Inc. Multi-layer structures containing an adhesion promoting layer
JP2000297094A (en) * 1999-04-15 2000-10-24 Japan Energy Corp New organosilicon compound, its production and surface treating agent and resin additive using the same
JP2001342578A (en) * 2000-05-31 2001-12-14 Honda Motor Co Ltd Surface treatment agent for metal
JPWO2005031037A1 (en) * 2003-09-29 2007-11-15 東レ株式会社 Titanium or titanium alloy, adhesive resin composition, prepreg and composite material
JP4501861B2 (en) * 2003-09-29 2010-07-14 東レ株式会社 Titanium or titanium alloy, adhesive resin composition, prepreg and composite material
JP2006316300A (en) * 2005-05-11 2006-11-24 Hitachi Chem Co Ltd Method for surface-treating copper, and copper surface
KR101411731B1 (en) * 2009-09-11 2014-06-25 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Copper foil for lithium ion battery current collector
JP2017043845A (en) * 2015-08-25 2017-03-02 住友金属鉱山株式会社 Metal material surface treatment agent, metal joint body and method for bonding metal material

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