JPH053749B2 - - Google Patents

Info

Publication number
JPH053749B2
JPH053749B2 JP61009584A JP958486A JPH053749B2 JP H053749 B2 JPH053749 B2 JP H053749B2 JP 61009584 A JP61009584 A JP 61009584A JP 958486 A JP958486 A JP 958486A JP H053749 B2 JPH053749 B2 JP H053749B2
Authority
JP
Japan
Prior art keywords
base
scattering
electrons
collector
mini
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61009584A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62166564A (ja
Inventor
Itaru Nakagawa
Kimihiro Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP958486A priority Critical patent/JPS62166564A/ja
Publication of JPS62166564A publication Critical patent/JPS62166564A/ja
Publication of JPH053749B2 publication Critical patent/JPH053749B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/7606Transistor-like structures, e.g. hot electron transistor [HET]; metal base transistor [MBT]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
JP958486A 1986-01-20 1986-01-20 半導体装置 Granted JPS62166564A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP958486A JPS62166564A (ja) 1986-01-20 1986-01-20 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP958486A JPS62166564A (ja) 1986-01-20 1986-01-20 半導体装置

Publications (2)

Publication Number Publication Date
JPS62166564A JPS62166564A (ja) 1987-07-23
JPH053749B2 true JPH053749B2 (ko) 1993-01-18

Family

ID=11724363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP958486A Granted JPS62166564A (ja) 1986-01-20 1986-01-20 半導体装置

Country Status (1)

Country Link
JP (1) JPS62166564A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8810032D0 (en) * 1988-04-28 1988-06-02 Secr Defence Hot electron transistors
US5477060A (en) * 1993-06-25 1995-12-19 The United States Of America As Represented By The Secretary Of The Army Infrared hot electron transistor with a superlattice base
JP5182775B2 (ja) * 2006-03-22 2013-04-17 国立大学法人大阪大学 トランジスタ素子及びその製造方法、電子デバイス、発光素子並びにディスプレイ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61210679A (ja) * 1985-03-15 1986-09-18 Sony Corp 半導体装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61210679A (ja) * 1985-03-15 1986-09-18 Sony Corp 半導体装置

Also Published As

Publication number Publication date
JPS62166564A (ja) 1987-07-23

Similar Documents

Publication Publication Date Title
EP0177374B1 (en) High-speed semiconductor device
JPH0586658B2 (ko)
KR0134095B1 (ko) 열 전자 트랜지스터
JP2731089B2 (ja) 高速動作半導体装置およびその製造方法
US5543749A (en) Resonant tunneling transistor
JPH053749B2 (ko)
WO2002080284A1 (fr) Dispositif a effet de champ a resistance negative
US4672404A (en) Ballistic heterojunction bipolar transistor
EP0186301B1 (en) High-speed semiconductor device
US5349202A (en) Tunneling transistor
US4825269A (en) Double heterojunction inversion base transistor
US4916495A (en) Semiconductor device with semi-metal
US6031245A (en) Semiconductor device
JP2546483B2 (ja) トンネルトランジスタおよびその製造方法
US5773842A (en) Resonant-tunnelling hot electron transistor
KR100199024B1 (ko) 두개의 비대칭 양자점을 갖는 평면 공명관통 트랜지스터
JP2513118B2 (ja) トンネルトランジスタおよびその製造方法
GB2288691A (en) High-speed semiconductor device and production method therefor
Cheng et al. Investigation of an AlInAs/GaInAs long-period-superlattice resonant-tunneling transistor
KR100275499B1 (ko) 에미터 서브-메사 어레이 구조를 갖는 양자 공진터널링 소자
JPH0831471B2 (ja) 共鳴トンネリングトランジスタ
JP2592302B2 (ja) 量子効果半導体装置
EP0366861A1 (en) Semiconductor ballistic transistor
JP3138824B2 (ja) 共鳴トンネル半導体装置
JPH01251661A (ja) 高速トランジスタ

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term