JPH0533816B2 - - Google Patents

Info

Publication number
JPH0533816B2
JPH0533816B2 JP61219475A JP21947586A JPH0533816B2 JP H0533816 B2 JPH0533816 B2 JP H0533816B2 JP 61219475 A JP61219475 A JP 61219475A JP 21947586 A JP21947586 A JP 21947586A JP H0533816 B2 JPH0533816 B2 JP H0533816B2
Authority
JP
Japan
Prior art keywords
plasma
frequency power
processing chamber
power source
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61219475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6376434A (ja
Inventor
Norio Nakazato
Fujitsugu Nakatsui
Seiichi Watanabe
Kimio Muramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP21947586A priority Critical patent/JPS6376434A/ja
Publication of JPS6376434A publication Critical patent/JPS6376434A/ja
Publication of JPH0533816B2 publication Critical patent/JPH0533816B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP21947586A 1986-09-19 1986-09-19 プラズマ処理装置及びプラズマクリーニング方法 Granted JPS6376434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21947586A JPS6376434A (ja) 1986-09-19 1986-09-19 プラズマ処理装置及びプラズマクリーニング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21947586A JPS6376434A (ja) 1986-09-19 1986-09-19 プラズマ処理装置及びプラズマクリーニング方法

Publications (2)

Publication Number Publication Date
JPS6376434A JPS6376434A (ja) 1988-04-06
JPH0533816B2 true JPH0533816B2 (enrdf_load_stackoverflow) 1993-05-20

Family

ID=16736016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21947586A Granted JPS6376434A (ja) 1986-09-19 1986-09-19 プラズマ処理装置及びプラズマクリーニング方法

Country Status (1)

Country Link
JP (1) JPS6376434A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0760819B2 (ja) * 1987-10-29 1995-06-28 古河電気工業株式会社 プラズマｃｖｄ装置のクリーニング方法
JP2684381B2 (ja) * 1988-05-24 1997-12-03 株式会社半導体エネルギー研究所 プラズマ気相反応方法
JP2680065B2 (ja) * 1988-09-22 1997-11-19 株式会社日立製作所 プラズマクリーニング方法
US5228939A (en) * 1991-12-30 1993-07-20 Cheng Chu Single wafer plasma etching system
JPH07142444A (ja) * 1993-11-12 1995-06-02 Hitachi Ltd マイクロ波プラズマ処理装置および処理方法
US5585012A (en) * 1994-12-15 1996-12-17 Applied Materials Inc. Self-cleaning polymer-free top electrode for parallel electrode etch operation
JP4931548B2 (ja) * 2006-10-27 2012-05-16 津田駒工業株式会社 傾斜テーブル装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615044A (en) * 1979-07-18 1981-02-13 Toshiba Corp Plasma cleaning method
JPS5812347A (ja) * 1981-07-15 1983-01-24 Toshiba Corp 半導体ウエ−ハ
JPS5846639A (ja) * 1981-09-14 1983-03-18 Hitachi Ltd プラズマ処理装置

Also Published As

Publication number Publication date
JPS6376434A (ja) 1988-04-06

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