JPH0530351Y2 - - Google Patents
Info
- Publication number
- JPH0530351Y2 JPH0530351Y2 JP1985043374U JP4337485U JPH0530351Y2 JP H0530351 Y2 JPH0530351 Y2 JP H0530351Y2 JP 1985043374 U JP1985043374 U JP 1985043374U JP 4337485 U JP4337485 U JP 4337485U JP H0530351 Y2 JPH0530351 Y2 JP H0530351Y2
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- gas
- reaction
- vapor phase
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP1985043374U JPH0530351Y2 (OSRAM) | 1985-03-26 | 1985-03-26 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP1985043374U JPH0530351Y2 (OSRAM) | 1985-03-26 | 1985-03-26 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS61158947U JPS61158947U (OSRAM) | 1986-10-02 | 
| JPH0530351Y2 true JPH0530351Y2 (OSRAM) | 1993-08-03 | 
Family
ID=30554984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP1985043374U Expired - Lifetime JPH0530351Y2 (OSRAM) | 1985-03-26 | 1985-03-26 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPH0530351Y2 (OSRAM) | 
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JP2733518B2 (ja) * | 1989-04-29 | 1998-03-30 | 豊田合成株式会社 | 化合物半導体膜の気相成長装置 | 
| EP0605725B1 (en) * | 1991-09-27 | 1999-08-25 | Komatsu Electronic Metals Co., Ltd | Apparatus for introducing gas, and apparatus and method for epitaxial growth | 
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS55121650A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device | 
| JPS5678497A (en) * | 1979-11-27 | 1981-06-27 | Fujitsu Ltd | Vapor growth apparatus | 
| JPS56137639A (en) * | 1980-03-31 | 1981-10-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Decompression vapor growth device | 
- 
        1985
        - 1985-03-26 JP JP1985043374U patent/JPH0530351Y2/ja not_active Expired - Lifetime
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS61158947U (OSRAM) | 1986-10-02 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| JP2731855B2 (ja) | 減圧気相成長装置 | |
| US5534072A (en) | Integrated module multi-chamber CVD processing system and its method for processing subtrates | |
| KR101677438B1 (ko) | 향상된 가스 유동 분포를 가진 열 반응기 | |
| US6720531B1 (en) | Light scattering process chamber walls | |
| EP0910868A1 (en) | Method and apparatus for contactless treatment of a semiconductor substrate in wafer form | |
| US6262393B1 (en) | Epitaxial growth furnace | |
| JPH01107519A (ja) | 気相成長装置 | |
| CN112585730B (zh) | 基片处理方法和基片处理装置 | |
| US5711815A (en) | Film forming apparatus and film forming method | |
| JPH0530351Y2 (OSRAM) | ||
| KR20070019689A (ko) | 기상 성장 장치 | |
| JPS5826658B2 (ja) | 気相成長装置 | |
| US6254687B1 (en) | Chemical vapor deposition system with reduced material deposition on chamber wall surfaces | |
| JPH0518452B2 (OSRAM) | ||
| JPS62222631A (ja) | 気相成長装置 | |
| JPH0325928A (ja) | 半導体ウェハーのランプ式熱処理装置 | |
| JP2515775B2 (ja) | 表面処理方法および装置 | |
| JPS6298718A (ja) | 気相成長装置 | |
| JPH0532902B2 (OSRAM) | ||
| JPH0697094A (ja) | 気相成長装置 | |
| JPS62124737A (ja) | 低圧気相成長装置 | |
| JPS61187326A (ja) | 気相成長装置 | |
| JPH0736385B2 (ja) | 気相成長装置 | |
| JPH0574718A (ja) | 成膜方法および装置 | |
| JPH09213640A (ja) | 減圧cvd膜生成装置及び方法 |