JPH05303208A - リソグラフィ用現像液及びリソグラフィ工程 - Google Patents

リソグラフィ用現像液及びリソグラフィ工程

Info

Publication number
JPH05303208A
JPH05303208A JP4233082A JP23308292A JPH05303208A JP H05303208 A JPH05303208 A JP H05303208A JP 4233082 A JP4233082 A JP 4233082A JP 23308292 A JP23308292 A JP 23308292A JP H05303208 A JPH05303208 A JP H05303208A
Authority
JP
Japan
Prior art keywords
surfactant
resist
developer
lithographic
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4233082A
Other languages
English (en)
Japanese (ja)
Inventor
Tadahiro Omi
忠弘 大見
Hisayuki Shimada
久幸 島田
Shigeki Shimomura
茂樹 下村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to TW082100661A priority Critical patent/TW259850B/zh
Priority to DE69325043T priority patent/DE69325043T2/de
Priority to AT93300883T priority patent/ATE180583T1/de
Priority to MYPI93000187A priority patent/MY121957A/en
Priority to EP93300883A priority patent/EP0555098B1/en
Priority to KR1019930001611A priority patent/KR960015482B1/ko
Publication of JPH05303208A publication Critical patent/JPH05303208A/ja
Priority to US08/395,182 priority patent/US6007970A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • H10P76/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4233082A 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程 Pending JPH05303208A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
TW082100661A TW259850B (cg-RX-API-DMAC10.html) 1992-02-07 1993-02-02
DE69325043T DE69325043T2 (de) 1992-02-07 1993-02-05 Lithographischer Entwickler und lithographisches Verfahren
AT93300883T ATE180583T1 (de) 1992-02-07 1993-02-05 Lithographischer entwickler und lithographisches verfahren
MYPI93000187A MY121957A (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process.
EP93300883A EP0555098B1 (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process
KR1019930001611A KR960015482B1 (ko) 1992-02-07 1993-02-06 리토그라피용 현상액 및 리토그라피 공정
US08/395,182 US6007970A (en) 1992-02-07 1995-02-27 Lithographic developer containing surfactant

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4-57081 1992-02-07
JP5708192 1992-02-07

Publications (1)

Publication Number Publication Date
JPH05303208A true JPH05303208A (ja) 1993-11-16

Family

ID=13045534

Family Applications (2)

Application Number Title Priority Date Filing Date
JP4233082A Pending JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233080A Pending JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP4233080A Pending JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Country Status (4)

Country Link
JP (2) JPH05303208A (cg-RX-API-DMAC10.html)
KR (1) KR960015482B1 (cg-RX-API-DMAC10.html)
MY (1) MY121957A (cg-RX-API-DMAC10.html)
TW (1) TW259850B (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021095501A (ja) * 2019-12-17 2021-06-24 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒
JP2021095500A (ja) * 2019-12-17 2021-06-24 三井化学株式会社 アルキレンオキシド重合体の製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0150146B1 (ko) * 1995-12-20 1998-12-01 김광호 전자사진 현상방식 프린터의 전사전압 자동조절 제어방법
JP4015823B2 (ja) 2001-05-14 2007-11-28 株式会社東芝 アルカリ現像液の製造方法，アルカリ現像液，パターン形成方法，レジスト膜の剥離方法，及び薬液塗布装置
JP5619458B2 (ja) * 2010-03-31 2014-11-05 Hoya株式会社 レジストパターンの形成方法及びモールドの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021095501A (ja) * 2019-12-17 2021-06-24 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒
JP2021095500A (ja) * 2019-12-17 2021-06-24 三井化学株式会社 アルキレンオキシド重合体の製造方法

Also Published As

Publication number Publication date
JPH05303207A (ja) 1993-11-16
KR960015482B1 (ko) 1996-11-14
MY121957A (en) 2006-03-31
TW259850B (cg-RX-API-DMAC10.html) 1995-10-11
KR930018651A (ko) 1993-09-22

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