JPH05275572A - Semiconductor sealing resin composition - Google Patents

Semiconductor sealing resin composition

Info

Publication number
JPH05275572A
JPH05275572A JP9854192A JP9854192A JPH05275572A JP H05275572 A JPH05275572 A JP H05275572A JP 9854192 A JP9854192 A JP 9854192A JP 9854192 A JP9854192 A JP 9854192A JP H05275572 A JPH05275572 A JP H05275572A
Authority
JP
Japan
Prior art keywords
resin composition
resin
sealing resin
parts
semiconductor sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9854192A
Other languages
Japanese (ja)
Inventor
Shigeaki Tauchi
茂顕 田内
Yasuo Uchimiya
康夫 内宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical Co Ltd filed Critical Nippon Steel Chemical Co Ltd
Priority to JP9854192A priority Critical patent/JPH05275572A/en
Publication of JPH05275572A publication Critical patent/JPH05275572A/en
Withdrawn legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide a semiconductor sealing resin composition having excellent solder heat resistance, reliability and moldability. CONSTITUTION:A semiconductor sealing resin composition contains resin mixture obtained by previously mixing 20-100 pts.wt. of phenol series curing agent and curing accelerator in solvent and removing the solvent, 100 pts.wt. of epoxy resin and 300-2000 pts.wt. of filling silica and as main components.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、はんだ耐熱性、信頼
性、成形性に優れた半導体封止用樹脂組成物に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for semiconductor encapsulation which is excellent in solder heat resistance, reliability and moldability.

【0002】[0002]

【従来の技術】近年、半導体装置の高集積化が急速に進
められており、素子サイズの大型化と配線幅の微細化が
著しく進展している。これら高集積化された半導体装置
も含め、半導体装置は現在ほとんどが樹脂封止されてい
る。これは、信頼性の高い、優れた性能を有する封止用
樹脂の開発によるところが大きい。
2. Description of the Related Art In recent years, high integration of semiconductor devices has been rapidly advanced, and the size of elements and the miniaturization of wiring width have been remarkably advanced. Currently, most of the semiconductor devices including these highly integrated semiconductor devices are resin-sealed. This is largely due to the development of a highly reliable sealing resin having excellent performance.

【0003】一方、プリント基板への部品実装において
は、高密度実装、作業合理化のため、挿入型パッケージ
であるDIPパッケージから、表面実装型パッケージで
あるSOPパッケージに変化してきた。
On the other hand, in mounting components on a printed circuit board, a DIP package which is an insertion type package has been changed to a SOP package which is a surface mounting type package for high-density mounting and streamlining of work.

【0004】また、近年では、より高密度実装化のた
め、表面実装素子第1世代であるSOP、QFPパッケ
ージから、薄型化が進められたTSOP、TQFPパッ
ケージに移行しつつある。
Further, in recent years, in order to achieve higher density packaging, the SOP and QFP packages, which are the first generation of surface mount devices, are being shifted to TSOP and TQFP packages which have been made thinner.

【0005】パッケージの薄型化にともない、チップ上
面の樹脂厚が非常に薄くなってきている。このため、実
装時における加熱による、樹脂部分のクラックが、より
深刻な問題となっている。
With the thinning of the package, the resin thickness on the upper surface of the chip has become very thin. Therefore, cracking of the resin portion due to heating during mounting has become a more serious problem.

【0006】その対策として封止用樹脂の改良も検討さ
れてきた。たとえば、封止用樹脂にゴム成分を配合し、
内部応力を低下させる方法、充填剤を高充填し線膨張係
数を低下させる方法などがある(特開昭63−1894
21号公報、昭63ー16445号公報)。また、充填
剤表面をカップリング剤で処理し、樹脂と充填剤の界面
の密着性を向上させ、強度を上げる方法が提案されてい
る(特開昭61−221222号公報)。また、硬化剤
と硬化促進剤を除く他の成分をあらかじめ溶融混合し、
冷却したのち残りの成分を混合させ、均一性を高めるこ
とで強度を上げる方法も提案されている(特開平3−1
95764号公報)。
As a countermeasure, improvement of the sealing resin has been studied. For example, compounding the rubber component with the sealing resin,
There is a method of reducing the internal stress, a method of highly filling a filler to reduce the linear expansion coefficient, and the like (JP-A-63-1894)
21 gazette, Sho 63-16445 gazette). Further, a method has been proposed in which the surface of the filler is treated with a coupling agent to improve the adhesiveness at the interface between the resin and the filler and increase the strength (JP-A-61-221222). In addition, other components except the curing agent and the curing accelerator are melt-mixed in advance,
A method has also been proposed in which the strength is increased by cooling and then mixing the remaining components to improve the homogeneity (JP-A 3-1).
95764).

【0007】[0007]

【発明が解決しようとする問題点】上記従来技術におい
て、各種方法で改良された封止材は、それぞれ少しずつ
効果をあげてきているが、実装技術の進歩にともなうよ
り高度なはんだ耐熱要求に応えるには十分でない。
In the above-mentioned prior art, the encapsulants improved by various methods have been gradually effective, but the higher solder heat resistance requirements have been met with the progress of mounting technology. Not enough to respond.

【0008】たとえば、ゴム成分の添加は、表面実装第
1世代であるSOPパッケージには有効な方法である
が、近年の第2世代であるTSOP、TQFPには、な
お不十分である。応力を低下するため、ゴム成分を配合
することでは曲げ強度の低下を招き、はんだ耐熱性が低
下する。さらにこれらの可とう化剤の添加は吸水特性の
低下を招き、TSOP、TQFPのような薄型パッケー
ジに対しては、はんだ耐熱性を低下させる。
For example, the addition of the rubber component is an effective method for the SOP package which is the first generation of surface mounting, but it is still insufficient for the second generation TSOP and TQFP which are the second generation in recent years. In order to reduce the stress, compounding a rubber component causes a decrease in bending strength and a decrease in solder heat resistance. Furthermore, the addition of these softening agents leads to deterioration of water absorption characteristics, and lowers solder heat resistance for thin packages such as TSOP and TQFP.

【0009】また、充填剤を高充填する方法では、破砕
シリカ高充填は流動性の低下を招き、成形が困難にな
り、球状シリカの使用は強度低下を招くといった欠点が
ある。充填剤表面をカップリング剤で処理することによ
る効果も要求に答えるには十分でない。
In addition, in the method of filling the filler with a high amount, the high filling of crushed silica causes a decrease in fluidity, making molding difficult, and the use of spherical silica causes a decrease in strength. The effect of treating the filler surface with a coupling agent is also not sufficient to meet the demand.

【0010】また、硬化剤、硬化促進剤を除く成分をあ
らかじめ溶融混合する方法は、操作が煩雑となるわりに
は要求を満足する強度は得られず、はんだ付け時のクラ
ックを完全に防止することはできなかった。そこで、よ
りはんだ耐熱性に優れた封止用樹脂の開発が望まれてい
る。
In addition, the method of previously melt-mixing the components excluding the curing agent and the curing accelerator does not provide sufficient strength to meet the requirements in spite of complicated operations, and cracks during soldering should be completely prevented. I couldn't. Therefore, it is desired to develop a sealing resin that is more excellent in solder heat resistance.

【0011】本発明の目的は上記問題点を解決し、はん
だ耐熱性、信頼性、成形性に優れた半導体封止用樹脂組
成物を提供することにある。
An object of the present invention is to solve the above problems and provide a resin composition for semiconductor encapsulation which is excellent in solder heat resistance, reliability and moldability.

【0012】[0012]

【課題を解決するための手段】本発明者等は上記目的を
達成するために鋭意研究を行った結果、フェノール系硬
化剤と硬化促進剤を溶媒中で完全に均一分散させた混合
物を使用することによる反応性向上、強度向上により解
決できるという知見に基づき本発明を完成するに至っ
た。
Means for Solving the Problems As a result of intensive studies for achieving the above object, the present inventors have found that a phenolic curing agent and a curing accelerator are used as a mixture in which they are completely and uniformly dispersed in a solvent. The present invention has been completed based on the finding that it can be solved by improving the reactivity and the strength.

【0013】すなわち、本発明は、硬化剤と硬化促進剤
をあらかじめ溶媒中で混合し、その後溶媒を除去して得
られる混合物を含有することを特徴とする半導体封止用
樹脂組成物である。
That is, the present invention is a resin composition for semiconductor encapsulation, which comprises a mixture obtained by previously mixing a curing agent and a curing accelerator in a solvent and then removing the solvent.

【0014】本発明によるフェノールノボラック硬化剤
と硬化促進剤の混合は、例えばフェノールノボラック硬
化剤50重量部を、300重量部のアセトンに溶解さ
せ、ここに、硬化促進剤トリフェニルホスフィン1.0
重量部を添加、溶解させ、完全溶解後減圧蒸留にてアセ
トンを除去するなどして得られる、
The mixing of the phenol novolac curing agent and the curing accelerator according to the present invention is carried out, for example, by dissolving 50 parts by weight of the phenol novolac curing agent in 300 parts by weight of acetone and adding the curing accelerator triphenylphosphine 1.0.
It is obtained by adding and dissolving parts by weight and completely removing the acetone by vacuum distillation after complete dissolution.

【0015】エポキシ樹脂としては、少なくとも2個以
上のエポキシ基を持つものであれば、特に分子量、構造
に制限はない。例えば、フェノールノボラック型エポキ
シ樹脂、クレゾールノボラック型エポキシ樹脂、ビフェ
ニル型エポキシ樹脂、ビスフェノールA型エポキシ樹
脂、ビスフェノールF型エポキシ樹脂、ビスフェノール
S型エポキシ樹脂等が用いられる。
The epoxy resin is not particularly limited in molecular weight and structure as long as it has at least two epoxy groups. For example, phenol novolac type epoxy resin, cresol novolac type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin and the like are used.

【0016】フェノール樹脂としては、例えば通常のフ
ェノールノボラック樹脂、クレゾールノボラック樹脂等
が用いられる。また、エポキシ樹脂100部に対して、
フェノール樹脂は30部〜80部、望ましくは、エポキ
シ当量とフェノール性水酸基当量の比率を1:0.8〜
1.2とすることが望ましい。これ以外では、硬化性、
強度、吸水特性が低下し、はんだ耐熱性が低下する。
As the phenol resin, for example, a usual phenol novolac resin, cresol novolac resin or the like is used. Also, for 100 parts of epoxy resin,
Phenolic resin is 30 to 80 parts, preferably, the ratio of epoxy equivalent to phenolic hydroxyl group equivalent is 1: 0.8 to.
It is desirable to set to 1.2. Other than this, curability,
Strength and water absorption properties are reduced, and solder heat resistance is reduced.

【0017】本発明による効果を最大限に引き出すた
め、充填剤は、300〜2000重量部添加する。この
範囲以上では、流動性が低下し、また、これ以下では強
度低下が起こり、所望の効果が得られない。
To maximize the effect of the present invention, the filler is added in an amount of 300 to 2000 parts by weight. If it is above this range, the fluidity will be lowered, and if it is below this range, the strength will be lowered and the desired effect cannot be obtained.

【0018】本発明においては、エポキシ樹脂の硬化剤
の他に硬化促進剤を配合する。硬化促進剤としては公知
のものが使用できるが、好適な硬化剤として、例えば、
トリフェニルフォスフィン、イミダゾール、1,8−ジ
アザビシクロ(5,4,0)ウンデセン−1などがあ
る。添加量としては、例えば、トリフェニルフォスフィ
ンでは、エポキシ樹脂100重量部に対して、0.5〜
5重量部が望ましい。
In the present invention, a curing accelerator is blended in addition to the epoxy resin curing agent. Known curing accelerators can be used, but suitable curing agents include, for example,
Examples include triphenylphosphine, imidazole, and 1,8-diazabicyclo (5,4,0) undecene-1. The amount of addition of triphenylphosphine is 0.5 to 100 parts by weight of the epoxy resin.
5 parts by weight is desirable.

【0019】また、本発明の半導体封止用樹脂組成物に
は、必要に応じてOPワックス、カルナバワックスなど
の離型剤、γーグリシトキシプロピルトリメトキシシラ
ンなどのカップリング剤、カーボンブラックなどの着色
剤、三酸化アンチモンなどの難燃剤を添加することもで
きる。
In the resin composition for semiconductor encapsulation of the present invention, if necessary, a release agent such as OP wax and carnauba wax, a coupling agent such as γ-glycitoxypropyltrimethoxysilane, carbon black and the like. It is also possible to add a colorant, a flame retardant such as antimony trioxide.

【0020】本発明の半導体封止用樹脂組成物は、従来
公知の方法にしたがって混合、混練され、粉砕されたの
ち、加熱成形することによって半導体素子を封入した半
導体装置とすることができる。
The resin composition for semiconductor encapsulation of the present invention can be mixed, kneaded, pulverized, and then heat-molded according to a conventionally known method to obtain a semiconductor device having a semiconductor element enclosed therein.

【0021】[0021]

【実施例】以下に本発明の実施例を示し本発明を更に詳
しく説明する。 実施例 あらかじめアセトンに溶解させたフェノールノボラック
硬化剤(商品名タマノル758;荒川化学社製、これを
フェノール樹脂Aとする)350部(硬化剤50重量
部、アセトン300重量部)に、硬化促進剤としてトリ
フェニルホスフィン1.0重量部を90℃にて溶融混合
し、次にアセトンを減圧下で蒸留し、樹脂混合物Aを得
た。
The present invention will be described in more detail below by showing Examples of the present invention. Example A phenol novolac curing agent (trade name: Tamanor 758; manufactured by Arakawa Chemical Co., Ltd., which is referred to as Phenolic Resin A) 350 parts (curing agent 50 parts by weight, acetone 300 parts by weight) previously dissolved in acetone was added to a curing accelerator. As a resin mixture A, 1.0 part by weight of triphenylphosphine was melt-mixed at 90 ° C., and then acetone was distilled off under reduced pressure.

【0022】次にこの樹脂混合物Aとo−クレゾールノ
ボラック型エポキシ樹脂(商品名YDCN−702;東
都化成社製、これをエポキシAとする)100部、平均
粒径21μmの球状溶融シリカ粉末、その他添加剤を表
1に示す割合で混合したのち、ミキシングロールを用
い、110℃で4分混練し、冷却後粉砕し、封止用樹脂
組成物を調製した。これらの封止用樹脂組成物を用い
て、スパイラルフローを測定した。また、おなじ封止用
樹脂組成物を用いて、試験片を作成し、曲げ強度、曲げ
弾性率を測定した。さらに、84pinICを成形し、
ポストキュア後、85℃、85%の恒温恒湿機中で吸湿
を24時間、48時間、および72時間行った後、吸水
率を測定し、超音波探傷装置でダイパット裏面の剥離を
観察した後、260℃のはんだ浴に10秒間浸漬させ、
パッケージのクラックを観察した。これらの結果を表1
に示す。
Next, 100 parts of this resin mixture A and o-cresol novolac type epoxy resin (trade name YDCN-702; manufactured by Tohto Kasei Co., Ltd., which is referred to as Epoxy A), spherical fused silica powder having an average particle size of 21 μm, etc. After mixing the additives in the proportions shown in Table 1, the mixture was kneaded at 110 ° C. for 4 minutes using a mixing roll, cooled and pulverized to prepare a sealing resin composition. The spiral flow was measured using these sealing resin compositions. In addition, test pieces were prepared using the same resin composition for sealing, and bending strength and bending elastic modulus were measured. Furthermore, 84pin IC is molded,
After post-cure, after absorbing moisture for 24 hours, 48 hours, and 72 hours in a constant temperature and humidity chamber at 85 ° C. and 85%, measure the water absorption rate, and observe the peeling of the back surface of the die pad with an ultrasonic flaw detector. Immerse in a solder bath at 260 ° C for 10 seconds,
The cracks in the package were observed. These results are shown in Table 1.
Shown in.

【0023】比較例 エポキシ樹脂A100部、フェノール樹脂A50部と平
均粒径21μmの球状溶融シリカ粉末、硬化促進剤(ト
リフェニルフォスフィン)、その他添加剤を表1に示す
割合で混合したのち、ミキシングロールを用い、110
℃で4分混練し、冷却後粉砕し、封止用樹脂組成物を調
製した。これらの封止用樹脂組成物を用いて、実施例1
と同様にして各物性を測定した。
Comparative Example 100 parts of epoxy resin A, 50 parts of phenol resin A, spherical fused silica powder having an average particle size of 21 μm, a curing accelerator (triphenylphosphine), and other additives were mixed in the proportions shown in Table 1, and then mixed. Using a roll, 110
The mixture was kneaded at 4 ° C. for 4 minutes, cooled, and then pulverized to prepare a sealing resin composition. Using these sealing resin compositions, Example 1
Each physical property was measured in the same manner as.

【0024】表1に示した結果より、本発明の半導体封
止用樹脂組成物は、強度、はんだ耐熱性に優れているこ
とがわかる。
From the results shown in Table 1, it can be seen that the resin composition for semiconductor encapsulation of the present invention is excellent in strength and solder heat resistance.

【表1】 [Table 1]

【0025】[0025]

【発明の効果】以上のように本発明の樹脂組成物を使用
すれば高強度ではんだ耐熱性に優れた硬化物を得ること
が出来るので、これを用いることにより、クラックの発
生しない良好な半導体を得ることが出来る。
As described above, when the resin composition of the present invention is used, it is possible to obtain a cured product having high strength and excellent solder heat resistance. Can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 硬化剤と硬化促進剤をあらかじめ溶媒中
で混合し、その後溶媒を除去して得られる混合物を含有
することを特徴とする半導体封止用樹脂組成物。
1. A resin composition for semiconductor encapsulation, comprising a mixture obtained by previously mixing a curing agent and a curing accelerator in a solvent and then removing the solvent.
【請求項2】 エポキシ樹脂100重量部に対し、フェ
ノール系硬化剤20〜100重量部、充填用シリカ30
0〜2000重量部を必須の成分とする請求項1記載の
半導体封止用樹脂組成物。
2. A phenolic curing agent, 20 to 100 parts by weight, and a silica 30 for filling, relative to 100 parts by weight of an epoxy resin.
The resin composition for semiconductor encapsulation according to claim 1, wherein 0 to 2000 parts by weight is an essential component.
JP9854192A 1992-03-26 1992-03-26 Semiconductor sealing resin composition Withdrawn JPH05275572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9854192A JPH05275572A (en) 1992-03-26 1992-03-26 Semiconductor sealing resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9854192A JPH05275572A (en) 1992-03-26 1992-03-26 Semiconductor sealing resin composition

Publications (1)

Publication Number Publication Date
JPH05275572A true JPH05275572A (en) 1993-10-22

Family

ID=14222549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9854192A Withdrawn JPH05275572A (en) 1992-03-26 1992-03-26 Semiconductor sealing resin composition

Country Status (1)

Country Link
JP (1) JPH05275572A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7268191B2 (en) * 2003-12-04 2007-09-11 Nitto Denko Corporation Method for producing epoxy resin composition for semiconductor encapsulation and epoxy resin composition for semiconductor encapsulation and semiconductor device obtained thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7268191B2 (en) * 2003-12-04 2007-09-11 Nitto Denko Corporation Method for producing epoxy resin composition for semiconductor encapsulation and epoxy resin composition for semiconductor encapsulation and semiconductor device obtained thereby

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Effective date: 19990608