JPH0527212B2 - - Google Patents

Info

Publication number
JPH0527212B2
JPH0527212B2 JP59066901A JP6690184A JPH0527212B2 JP H0527212 B2 JPH0527212 B2 JP H0527212B2 JP 59066901 A JP59066901 A JP 59066901A JP 6690184 A JP6690184 A JP 6690184A JP H0527212 B2 JPH0527212 B2 JP H0527212B2
Authority
JP
Japan
Prior art keywords
state
laser beam
laser
substance
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59066901A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60211752A (ja
Inventor
Yoshihiro Ueda
Koichi Ono
Tatsuo Oomori
Shigeto Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59066901A priority Critical patent/JPS60211752A/ja
Publication of JPS60211752A publication Critical patent/JPS60211752A/ja
Publication of JPH0527212B2 publication Critical patent/JPH0527212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/24—Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59066901A 1984-04-02 1984-04-02 イオンビ−ム発生装置 Granted JPS60211752A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59066901A JPS60211752A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59066901A JPS60211752A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Publications (2)

Publication Number Publication Date
JPS60211752A JPS60211752A (ja) 1985-10-24
JPH0527212B2 true JPH0527212B2 (enrdf_load_stackoverflow) 1993-04-20

Family

ID=13329301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59066901A Granted JPS60211752A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Country Status (1)

Country Link
JP (1) JPS60211752A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3914655A (en) * 1973-06-28 1975-10-21 Ibm High brightness ion source

Also Published As

Publication number Publication date
JPS60211752A (ja) 1985-10-24

Similar Documents

Publication Publication Date Title
US4692627A (en) Ion beam generator
Tissandier et al. Two-color soft x-ray lasing in a high-density nickel-like krypton plasma
JPH0527211B2 (enrdf_load_stackoverflow)
US4716295A (en) Ion beam generator
JPH0527212B2 (enrdf_load_stackoverflow)
JPH0512813B2 (enrdf_load_stackoverflow)
JPS60235346A (ja) イオンビ−ム発生装置
JPH0512814B2 (enrdf_load_stackoverflow)
JPH0527214B2 (enrdf_load_stackoverflow)
JPH0518220B2 (enrdf_load_stackoverflow)
JPH0441459B2 (enrdf_load_stackoverflow)
JPH0527213B2 (enrdf_load_stackoverflow)
JPH0441458B2 (enrdf_load_stackoverflow)
JPS6127040A (ja) イオンビ−ム発生装置
JPS60235345A (ja) イオンビ−ム発生装置
JPS60235342A (ja) イオンビ−ム発生装置
JPS6127038A (ja) イオンビ−ム発生装置
JPH0441461B2 (enrdf_load_stackoverflow)
JPS60235337A (ja) イオンビ−ム発生装置
JPS60235341A (ja) イオンビ−ム発生装置
JPS60208038A (ja) イオンビ−ム発生装置
JPH0517653B2 (enrdf_load_stackoverflow)
JPS60235338A (ja) イオンビ−ム発生装置
JPS60208034A (ja) イオンビ−ム発生装置
Grout et al. Propagation effects in optical-field-induced gas mixture breakdown for recombination x-ray lasers