JPH0517653B2 - - Google Patents

Info

Publication number
JPH0517653B2
JPH0517653B2 JP59066899A JP6689984A JPH0517653B2 JP H0517653 B2 JPH0517653 B2 JP H0517653B2 JP 59066899 A JP59066899 A JP 59066899A JP 6689984 A JP6689984 A JP 6689984A JP H0517653 B2 JPH0517653 B2 JP H0517653B2
Authority
JP
Japan
Prior art keywords
state
synchrotron radiation
ion beam
ionization
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59066899A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60208039A (ja
Inventor
Yoshihiro Ueda
Koichi Ono
Tatsuo Oomori
Shigeto Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59066899A priority Critical patent/JPS60208039A/ja
Publication of JPS60208039A publication Critical patent/JPS60208039A/ja
Publication of JPH0517653B2 publication Critical patent/JPH0517653B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/24Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59066899A 1984-04-02 1984-04-02 イオンビ−ム発生装置 Granted JPS60208039A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59066899A JPS60208039A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59066899A JPS60208039A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Publications (2)

Publication Number Publication Date
JPS60208039A JPS60208039A (ja) 1985-10-19
JPH0517653B2 true JPH0517653B2 (enrdf_load_stackoverflow) 1993-03-09

Family

ID=13329238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59066899A Granted JPS60208039A (ja) 1984-04-02 1984-04-02 イオンビ−ム発生装置

Country Status (1)

Country Link
JP (1) JPS60208039A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3914655A (en) * 1973-06-28 1975-10-21 Ibm High brightness ion source

Also Published As

Publication number Publication date
JPS60208039A (ja) 1985-10-19

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