JPH0526755Y2 - - Google Patents
Info
- Publication number
- JPH0526755Y2 JPH0526755Y2 JP7480287U JP7480287U JPH0526755Y2 JP H0526755 Y2 JPH0526755 Y2 JP H0526755Y2 JP 7480287 U JP7480287 U JP 7480287U JP 7480287 U JP7480287 U JP 7480287U JP H0526755 Y2 JPH0526755 Y2 JP H0526755Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holders
- adjacent
- rotate
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 65
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7480287U JPH0526755Y2 (US07923587-20110412-C00001.png) | 1987-05-19 | 1987-05-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7480287U JPH0526755Y2 (US07923587-20110412-C00001.png) | 1987-05-19 | 1987-05-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63182536U JPS63182536U (US07923587-20110412-C00001.png) | 1988-11-24 |
| JPH0526755Y2 true JPH0526755Y2 (US07923587-20110412-C00001.png) | 1993-07-07 |
Family
ID=30920358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7480287U Expired - Lifetime JPH0526755Y2 (US07923587-20110412-C00001.png) | 1987-05-19 | 1987-05-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0526755Y2 (US07923587-20110412-C00001.png) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012224878A (ja) * | 2011-04-15 | 2012-11-15 | Nissan Motor Co Ltd | 蒸着装置用ワーク移動機構とこれを用いた蒸着方法 |
| JP7044627B2 (ja) * | 2018-05-08 | 2022-03-30 | 株式会社アルバック | 成膜装置 |
| JP2020176326A (ja) * | 2019-04-22 | 2020-10-29 | キヤノン電子管デバイス株式会社 | 真空蒸着装置及び蒸着膜の製造方法 |
-
1987
- 1987-05-19 JP JP7480287U patent/JPH0526755Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63182536U (US07923587-20110412-C00001.png) | 1988-11-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6800183B2 (en) | Sputtering device | |
| KR101019529B1 (ko) | 성막 장치 및 성막 방법 | |
| JPH0526755Y2 (US07923587-20110412-C00001.png) | ||
| US3749058A (en) | Rotary substrate holder assembly | |
| JP3458450B2 (ja) | スパッタリング方法 | |
| JPS6254089A (ja) | ウエハ自公転機構 | |
| JPH01184277A (ja) | 基板回転装置 | |
| KR100358760B1 (ko) | 인시츄 물리기상 증착기 | |
| JPS5918638A (ja) | ドライエツチング装置 | |
| JPH05320892A (ja) | 真空薄膜形成装置 | |
| JP3281926B2 (ja) | 薄膜形成装置 | |
| KR200208493Y1 (ko) | 물리기상 증착기 | |
| KR200191059Y1 (ko) | 인시츄 물리기상 증착기 | |
| JP2001323371A (ja) | スパッタリング装置 | |
| JPH0343233Y2 (US07923587-20110412-C00001.png) | ||
| JP2002293427A (ja) | 回転台車 | |
| JPH0226935Y2 (US07923587-20110412-C00001.png) | ||
| JPS6281030A (ja) | 半導体基板乾燥装置 | |
| JPH0345947Y2 (US07923587-20110412-C00001.png) | ||
| JPH0373630B2 (US07923587-20110412-C00001.png) | ||
| JP7193369B2 (ja) | スパッタリング装置 | |
| JPH01108368A (ja) | スパッタ装置 | |
| JPH0726361Y2 (ja) | 蒸着装置の基板反転機構 | |
| JPH07188922A (ja) | 蒸着方法 | |
| JP2001127135A (ja) | 真空処理装置 |
