JPH052637B2 - - Google Patents

Info

Publication number
JPH052637B2
JPH052637B2 JP58225194A JP22519483A JPH052637B2 JP H052637 B2 JPH052637 B2 JP H052637B2 JP 58225194 A JP58225194 A JP 58225194A JP 22519483 A JP22519483 A JP 22519483A JP H052637 B2 JPH052637 B2 JP H052637B2
Authority
JP
Japan
Prior art keywords
substrate
atmosphere
selected area
compound
crystal growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58225194A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60118689A (ja
Inventor
Katsunobu Aoyanagi
Susumu Nanba
Juzaburo Segawa
Sohachi Iwai
Konen Doi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP22519483A priority Critical patent/JPS60118689A/ja
Publication of JPS60118689A publication Critical patent/JPS60118689A/ja
Publication of JPH052637B2 publication Critical patent/JPH052637B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/04Pattern deposit, e.g. by using masks
JP22519483A 1983-11-29 1983-11-29 結晶成長方法 Granted JPS60118689A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22519483A JPS60118689A (ja) 1983-11-29 1983-11-29 結晶成長方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22519483A JPS60118689A (ja) 1983-11-29 1983-11-29 結晶成長方法

Publications (2)

Publication Number Publication Date
JPS60118689A JPS60118689A (ja) 1985-06-26
JPH052637B2 true JPH052637B2 (fr) 1993-01-12

Family

ID=16825440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22519483A Granted JPS60118689A (ja) 1983-11-29 1983-11-29 結晶成長方法

Country Status (1)

Country Link
JP (1) JPS60118689A (fr)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244562A (en) * 1975-10-07 1977-04-07 Fujitsu Ltd Epitaxial growth method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244562A (en) * 1975-10-07 1977-04-07 Fujitsu Ltd Epitaxial growth method

Also Published As

Publication number Publication date
JPS60118689A (ja) 1985-06-26

Similar Documents

Publication Publication Date Title
US4664940A (en) Process for the formation of a flux of atoms and its use in an atomic beam epitaxy process
JPH02144910A (ja) エピタキシャル成長中またはその後の化合物薄膜の光誘導蒸発による熱パターン化方法
JPH05144744A (ja) 半導体薄膜形成方法
JPH052637B2 (fr)
JP2736655B2 (ja) 化合物半導体結晶成長方法
JP2687371B2 (ja) 化合物半導体の気相成長法
JPS59148325A (ja) 化合物半導体単結晶薄膜の成長方法並びにその装置
JPH052638B2 (fr)
JPH0388324A (ja) 化合物半導体薄膜の形成方法
JPH0267721A (ja) 化合物半導体薄膜の製造方法
JPH0431391A (ja) エピタキシャル成長方法
JP2714920B2 (ja) 半導体薄膜の製造装置および製造方法
JP3047523B2 (ja) 選択エピタキシャル成長方法
JPH0682622B2 (ja) ガリウム砒素薄膜形成方法
JPH01103982A (ja) 3−5族化合物半導体単結晶の製造方法
JP2620546B2 (ja) 化合物半導体のエピタキシヤル層の製造方法
JPS62232919A (ja) 結晶成長方法
JPH0532482A (ja) 分子線エピタキシヤル法及び化合物半導体膜
JPH02307894A (ja) 化合物半導体の成長方法
JPH08264446A (ja) ガリウム砒素基板における選択的結晶成長方法
JP2717165B2 (ja) 化合物半導体の構造形成方法
JPH01239097A (ja) 化合物半導体の分子線エピタキシャル成長法
JPH02158125A (ja) 化合物半導体薄膜の形成方法
Arakawa Mesoscopic size fabrication technology
JPH01230495A (ja) 半導体結晶の成長方法