JPH05261954A - Substrate for thermal head and manufacture thereof - Google Patents

Abstract

PURPOSE:To reduce the surface roughness at respective corners of a substrate for thermal head, in which the angle formed by the extension line of the major surface of the substrate and the tilted surface, and the angle formed by the tilted surface and the end surface are different. CONSTITUTION:An angle A formed by the extension line of a major surface 2 and a tilted surface 4, and an angle formed by the extension line of the tilted surface 4 and an end surface 6 are compared, and the corner with a larger angle, i.e., either one of a rubbing area B at a tilted surface major surface side edge 3 or a rubbing area C at a tilted surface end surface side edge 5 is made larger than the other rubbing area.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermal head substrate and a method of manufacturing the same.

[0002]

2. Description of the Related Art A conventional thermal head substrate (hereinafter referred to as a "slope type substrate") having a slope for forming a heating element at a corner where a main surface and an end surface intersect will be described below.

FIG. 3 is a sectional view of a conventional slope type substrate.
However, the glaze layer on the substrate surface was omitted. In FIG. 3, reference numeral 1 is a substrate, 2 is a main surface of the substrate 1, 3 is an edge of a main surface of a slope where the main surface 2 and a slope 4 described later intersect, and 4 is a substrate 1.
, 5 is an edge of the slope end surface where the slope 4 intersects with an end surface 6 which will be described later, 6 is an end surface of the substrate 1, A is an angle between the extension of the main surface 2 and the slope 4, and B is the main surface side of the slope. An edge polishing area, C is an edge polishing area on the end surface of the inclined surface.

In the conventional sloped substrate, the sizes of the polishing regions B and C are the same regardless of the size of the angle A formed by the extension line of the main surface 2 shown in FIG. 3 and the slope 4.

[0005]

However, in the above-mentioned conventional configuration, the angle A formed by the extension line of the main surface 2 and the slope 4 is formed.
If the angle is not 45 degrees, the angle A and the extension line of the slope 4 and the end face 6
Since the angle formed by and is different, the slope main surface side edge 3 and the slope end surface side edge 5 when the glaze layer is formed on the substrate 1
The conditions of surface roughness in are not equal. That is, when the angle formed by the extension line of the slope 4 and the end face 6 is larger than the angle A (angle A is less than 45 degrees), the slope end face side edge 5 and conversely, the angle A is the extension line of the slope 4. When the angle is larger than the angle formed by the end surface 6 (angle A is larger than 45 degrees), there is a problem that the surface 3 on the side of the inclined main surface is significantly roughened.

The present invention solves the above-mentioned conventional problems, and is a good slope type thermal head substrate with less surface roughness than when the angle A formed by the extension line of the main surface and the slope is other than 45 degrees, and the same. It is intended to provide a manufacturing method.

[0007]

In order to achieve this object, in the thermal head substrate of the present invention, the size of the polishing area at the edge portion of the slope is determined by the size of the angle formed between the extension line of the main surface and the slope. Have different configurations on the slope main surface side and the slope end surface side.

[0008]

With this structure, when the angle between the extension line of the main surface and the slope is less than 45 degrees, the surface roughness at the edge portion of the slope end face side is reduced, and conversely, the extension line of the main surface and the slope surface are reduced. When the angle formed is greater than 45 degrees, surface roughness at the edge portion of the inclined main surface side is reduced and a good thermal head substrate can be obtained.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a sectional view of a thermal head substrate in an embodiment of the present invention. However, the glaze layer on the substrate surface is omitted. Further, the same parts as those in the conventional example shown in FIG. In this embodiment, the angle A formed by the extension line of the main surface 1 and the slope 4 is the slope 4
Is larger than the angle formed by the extension line and the end surface 6, that is, the angle A is less than 45 degrees, the polishing area C at the slope end surface side edge 5 is more than the polishing area B at the slope main surface side edge 3. Is also getting bigger. In this case, needless to say, the polishing area B may be omitted.
With this configuration, it is possible to prevent the surface roughness of the edge 5 on the end surface of the slope from becoming significantly larger than that of the edge 3 on the main surface of the slope.

FIG. 2 is a cross-sectional view of a thermal head substrate according to another embodiment of the present invention. When the angle between the extension line of the slope and the end face is larger than the angle A, that is, the angle A is 45 degrees. If it is larger. Further, the same parts as those in the conventional example shown in FIG.
In the present embodiment, the polishing area B on the edge 3 on the main surface side of the inclined surface
Is larger than the polishing region C on the edge 5 on the slope end face side. In this case, it goes without saying that the polishing region C may be omitted. With this configuration, it is possible to prevent the surface roughness of the slope main surface side edge 3 from becoming significantly larger than the surface roughness of the slope end surface side edge 5 in the conventional case.

The thermal head substrate of the present invention described above is applied to the polishing area B of the edge 3 on the inclined main surface side and the polishing area C of the edge 5 on the end surface of the inclined surface for the polishing area which needs to be largely polished. As a result, it can be easily manufactured by increasing the number of polishing times or increasing the polishing load.

[0013]

As described above, according to the present invention, the angle formed by the extension line of the main surface of the substrate and the slope is compared with the angle formed by the extension line of the slope and the end face, and the angle on the slope of the large angle portion is compared. By enlarging the polishing area, it is possible to realize a thermal head substrate and a manufacturing method thereof which are suitable for a slope type with small surface roughness.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a thermal head substrate according to an embodiment of the present invention.

FIG. 2 is a sectional view of a thermal head substrate according to another embodiment of the present invention.

FIG. 3 is a sectional view of a conventional thermal head substrate.

[Explanation of symbols]

 1 Substrate 2 Main surface 4 Sloping surface 6 End surface A Angle formed by extension line of main surface and slope surface B Slope surface of main surface side edge (slope surface edge portion) C Slope surface end surface side edge polishing area (slope surface edge portion)

Claims (2)

[Claims] 1. A substrate has an inclined surface for forming a heating element at a corner where the main surface and the end surface intersect with each other, and an angle formed by the extension line of the main surface and the inclination surface and an extension line of the slope surface and the end surface. A thermal head substrate in which a beveled edge portion of a corner forming a larger one of the formed angles is polished to be larger than a beveled edge of the other corner. 2. An angle formed by the extension line of the main surface and the slope, and an angle formed by the extension line of the slope and the end face, having a slope for forming a heating element at a corner where the main face and the end face intersect. When processing the corners of the thermal head substrate different from each other, either the number of times of polishing the beveled edge portion of the corner having the larger angle of the two angles is greater than the number of times of polishing of the other beveled edge portion, or A method of manufacturing a substrate for a thermal head, wherein a polishing load on a beveled edge portion of a corner having a larger angle is made larger than a polishing load on another beveled edge portion.