JPH0525086B2 - - Google Patents

Info

Publication number
JPH0525086B2
JPH0525086B2 JP59169639A JP16963984A JPH0525086B2 JP H0525086 B2 JPH0525086 B2 JP H0525086B2 JP 59169639 A JP59169639 A JP 59169639A JP 16963984 A JP16963984 A JP 16963984A JP H0525086 B2 JPH0525086 B2 JP H0525086B2
Authority
JP
Japan
Prior art keywords
mirror
concave
concave mirror
systems
convex
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59169639A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6147914A (ja
Inventor
Takamasa Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59169639A priority Critical patent/JPS6147914A/ja
Priority to US06/764,001 priority patent/US4701035A/en
Publication of JPS6147914A publication Critical patent/JPS6147914A/ja
Publication of JPH0525086B2 publication Critical patent/JPH0525086B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59169639A 1984-08-14 1984-08-14 反射光学系 Granted JPS6147914A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59169639A JPS6147914A (ja) 1984-08-14 1984-08-14 反射光学系
US06/764,001 US4701035A (en) 1984-08-14 1985-08-09 Reflection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59169639A JPS6147914A (ja) 1984-08-14 1984-08-14 反射光学系

Publications (2)

Publication Number Publication Date
JPS6147914A JPS6147914A (ja) 1986-03-08
JPH0525086B2 true JPH0525086B2 (fr) 1993-04-09

Family

ID=15890219

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59169639A Granted JPS6147914A (ja) 1984-08-14 1984-08-14 反射光学系

Country Status (1)

Country Link
JP (1) JPS6147914A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2603225B2 (ja) * 1986-07-11 1997-04-23 キヤノン株式会社 Ｘ線投影露光装置及び半導体製造方法
JPS63311315A (ja) * 1987-06-15 1988-12-20 Canon Inc 物体・像変換装置
JPH0789537B2 (ja) * 1986-09-02 1995-09-27 日本電信電話株式会社 Ｘ線縮小投影露光装置
IL113789A (en) * 1994-05-23 1999-01-26 Hughes Aircraft Co A non-focusing device with three hinged mirrors and a corrective mirror
KR100452852B1 (ko) 2002-01-09 2004-10-14 삼성전자주식회사 확대 광학계 및 그것을 갖는 화상형성 장치
KR101656534B1 (ko) * 2008-03-20 2016-09-09 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투영 대물렌즈

Also Published As

Publication number Publication date
JPS6147914A (ja) 1986-03-08

Similar Documents

Publication Publication Date Title
US5071240A (en) Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JP3747958B2 (ja) 反射屈折光学系
US4685777A (en) Reflection and refraction optical system
US4701035A (en) Reflection optical system
US7092168B2 (en) Projection optical system and projection exposure apparatus
JP3747951B2 (ja) 反射屈折光学系
US7317571B2 (en) Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
JP2002040326A (ja) 反射型結像光学系
JP2003114387A (ja) 反射屈折光学系および該光学系を備える投影露光装置
US5257139A (en) Reflection reduction projection optical system
JPH0533368B2 (fr)
US6538821B2 (en) Projection optical system
EP0604093B1 (fr) Système de projection de réduction catadioptrique
JP3724517B2 (ja) 露光装置
JPH0525086B2 (fr)
JPH0525087B2 (fr)
JPH05188298A (ja) 反射屈折縮小投影光学系
JPS6147917A (ja) 反射光学系
JPH0525088B2 (fr)
JP2000098230A (ja) 反射縮小結像光学系、該光学系を備えた露光装置および、該光学系を用いた露光方法
US7046459B1 (en) Catadioptric reductions lens
JPH1010429A (ja) ２回結像光学系
JP4375826B2 (ja) 直筒型反射屈折光学系、走査型露光装置及び走査露光方法
JPS6147916A (ja) 反射光学系
JPH0533369B2 (fr)