JPH0524943A - Active metallic brazing filler metal and method for joining metallic member and ceramic member by using this active metallic brazing filler metal - Google Patents
Active metallic brazing filler metal and method for joining metallic member and ceramic member by using this active metallic brazing filler metalInfo
- Publication number
- JPH0524943A JPH0524943A JP18136591A JP18136591A JPH0524943A JP H0524943 A JPH0524943 A JP H0524943A JP 18136591 A JP18136591 A JP 18136591A JP 18136591 A JP18136591 A JP 18136591A JP H0524943 A JPH0524943 A JP H0524943A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- brazing material
- joining
- active
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Ceramic Products (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、活性金属ろう材および
活性金属ろう材を用いた金属部材とセラミックス部材と
の接合方法に関し、一層詳細には、製造工程の短縮化と
接合強度を向上させることが可能な活性金属ろう材およ
び活性金属ろう材を用いた金属部材とセラミックス部材
との接合方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active metal brazing material and a method for joining a metal member and a ceramic member using the active metal brazing material. More specifically, the manufacturing process is shortened and the bonding strength is improved. The present invention relates to an active metal brazing material that can be used and a method for joining a metal member and a ceramic member using the active metal brazing material.
【0002】[0002]
【従来の技術】従来より、電気、電子部品等の製造分野
では、電気特性、放熱性等に優れたセラミックス製の部
材が広く用いられている。2. Description of the Related Art Conventionally, ceramic members having excellent electric characteristics and heat dissipation have been widely used in the field of manufacturing electric and electronic parts.
【0003】そこで例えば、電気、電子部品を構成する
セラミックス基板に金属部材を接合する際には、先ずセ
ラミックス部材上の金属部材接合部位にタングテン
(W)、モリブデン(Mo)等の金属ペーストを印刷・
塗布し、次いで乾燥した後、焼成してメタライズ層を形
成させ、次に、該メタライズ層の金属部材接合部位の表
面にろう材とのぬれ性の向上を目的としてニッケルメッ
キ等を施し、その後、銀ろう(Ag−Cu合金)により
ろう付けして、セラミックス部材と金属部材の接合を遂
行する。Therefore, for example, when a metal member is bonded to a ceramic substrate that constitutes an electric or electronic component, first, a metal paste such as Tungten (W) or molybdenum (Mo) is printed on the metal member bonding site on the ceramic member.・
After coating and then drying, firing is performed to form a metallized layer, and then nickel plating or the like is applied to the surface of the metal member bonding portion of the metallized layer for the purpose of improving wettability with a brazing material, and thereafter, The ceramic member and the metal member are joined by brazing with silver brazing (Ag—Cu alloy).
【0004】[0004]
【発明が解決しようとする課題】前記の接合方法では、
セラミックス部材上に形成されたメタライズ層上にニッ
ケルメッキを施した後に、銀ろう(Ag−Cu合金)に
よりセラミックス部材と金属部材を接合している。In the above joining method,
After plating the metallized layer formed on the ceramic member with nickel, the ceramic member and the metal member are joined by silver brazing (Ag-Cu alloy).
【0005】しかしながら、一般に、セラミックス部材
上の金属部材の接合位置のメタライズ層の寸法精度は、
金属部材の寸法精度よりも悪く、位置合わせには困難を
伴い、所定の部位に好適に位置決めがなされないために
接合後十分な強度が得られているとは言い難い。また、
ニッケルメッキが、所定の部位よりはみ出したり、残渣
を生ずるために隣接する金属部材や接合部位との電気的
絶縁性に信頼性を欠く不都合がある。However, in general, the dimensional accuracy of the metallized layer at the joining position of the metal member on the ceramic member is
It is difficult to say that sufficient strength is obtained after joining because the dimensional accuracy is poorer than that of the metal member, alignment is difficult, and proper positioning is not performed at a predetermined site. Also,
The nickel plating has a disadvantage that the electric insulation between the adjacent metal member and the joint portion is unreliable because the nickel plating protrudes from a predetermined portion or produces a residue.
【0006】従って、前記不都合を未然に回避すべく、
隣接する金属部材相互の距離を十分に保つ必要があるの
で、電気、電子部品自体の小型化を図ることはすこぶる
困難である。Therefore, in order to avoid the inconvenience,
Since it is necessary to maintain a sufficient distance between adjacent metal members, it is extremely difficult to miniaturize the electric and electronic components themselves.
【0007】また、銀ろう(Ag−Cu合金)のろう付
け温度が高いために、接合部位には残留応力が発生す
る。従って、セラミックス部材と金属部材との間では、
形状、熱膨張係数等の拘束条件を増す。Further, since the brazing temperature of silver braze (Ag-Cu alloy) is high, residual stress is generated at the joint. Therefore, between the ceramic member and the metal member,
Increase constraints such as shape and coefficient of thermal expansion.
【0008】そこで、前記不都合を克服すべく、銀ろう
(Ag−Cu合金)に代えて隣接する他成分への拡散能
の大きなTiを有するAg−Cu−Ti箔を用い、溶融
・冷却して直接セラミックス部材に接合する方法が案出
された。Therefore, in order to overcome the inconvenience, instead of silver brazing (Ag-Cu alloy), an Ag-Cu-Ti foil having Ti having a large diffusibility to other adjacent components is used and melted and cooled. A method of directly bonding to a ceramic member has been devised.
【0009】しかしながら、前記方法では、ニッケルメ
ッキを施す工程の省略をなし得たものの、前記Ag−C
u−Ti箔溶融に780℃から890℃の高温を要する
ために、溶融に続く冷却時には、セラミックス部材と熱
膨張係数との差異により、セラミックス部材と金属部材
の接合界面には、残留応力が発生し、セラミックス部材
と金属部材の厚さによっては、残留応力の一部を取り除
くために反りを生じ、また、残留応力がより大である場
合には、セラミックス部材にクラックを生じ、この結
果、接合強度の低下を招いている。この反りは、セラミ
ックス部材と熱膨張係数との差異により生じるものであ
り、反りがなくなっても大きな残留応力が残るために、
金属部材を押圧しながら冷却しても接合強度の低下は、
解決されない。However, in the above method, although the step of applying nickel plating can be omitted, the above-mentioned Ag-C is used.
Since a high temperature of 780 ° C. to 890 ° C. is required for melting the u-Ti foil, residual stress is generated at the bonding interface between the ceramic member and the metal member due to the difference between the ceramic member and the coefficient of thermal expansion during cooling after melting. However, depending on the thickness of the ceramic member and the metal member, a warp occurs in order to remove a part of the residual stress, and when the residual stress is larger, a crack occurs in the ceramic member, resulting in a joint. This causes a decrease in strength. This warp is caused by the difference between the ceramic member and the coefficient of thermal expansion, and a large residual stress remains even if the warp disappears.
Even if the metal member is pressed and cooled, the joint strength will decrease.
Not resolved.
【0010】また、Tiは金属成分中に拡散して金属部
材の材質を脆化するので、当該方法も実用に供するに
は、至っていない。Further, since Ti diffuses into the metal component and embrittles the material of the metal member, this method has not yet been put to practical use.
【0011】従って、本発明の目的は、金属部材とセラ
ミックス部材との接合方法に際し、製造工程の短縮化と
接合強度を向上させることが可能な活性金属ろう剤を提
供することを目的とする。Therefore, it is an object of the present invention to provide an active metal brazing agent capable of shortening the manufacturing process and improving the bonding strength in the method of bonding a metal member and a ceramic member.
【0012】また、本発明の別異の目的は、当該活性金
属ろう材を電気、電子部品に適用することにより、小型
化と信頼性の向上を図ることが可能なセラミックス部材
と金属部材との接合方法を提供することを目的とする。Another object of the present invention is to provide a ceramic member and a metal member which can be downsized and improved in reliability by applying the active metal brazing material to electric and electronic parts. An object is to provide a joining method.
【0013】[0013]
【課題を解決するための手段】前記課題を解決するため
に、本発明の活性金属ろう剤は、金属Cuと、金属Sn
と、Ag−Cu−Ti合金とを金属材料として含有する
活性金属ろう材において、前記金属Cuは、前記金属材
料の合計重量に対して5重量%以上15重量%以下の組
成範囲にあり、前記金属Snは、前記金属材料の合計重
量に対して5重量%以上15重量%以下の組成範囲にあ
り、前記Ag−Cu−Ti合金中のTiの含有量は、前
記Ag−Cu−Ti合金の全体重量に対して1重量%以
上10重量%以下であることを特徴とする。In order to solve the above-mentioned problems, the active metal brazing agent of the present invention comprises metal Cu and metal Sn.
And an Ag-Cu-Ti alloy as a metal material in the active metal brazing material, the metal Cu is in the composition range of 5 wt% or more and 15 wt% or less with respect to the total weight of the metal material, The metal Sn is in a composition range of 5% by weight or more and 15% by weight or less with respect to the total weight of the metal material, and the content of Ti in the Ag-Cu-Ti alloy is the same as that of the Ag-Cu-Ti alloy. It is characterized by being 1% by weight or more and 10% by weight or less with respect to the total weight.
【0014】また、本発明の接合方法では、セラミック
ス部材と当接すべき金属部材表面に、金属Cu粉末、金
属Sn粉末およびAg−Cu−Ti合金粉末からなる金
属材料と、有機バインダと、可塑剤と、溶剤とを含有す
る活性金属ろう材であって、前記金属Cu粉末は、前記
金属材料の合計重量に対して5重量%以上15重量%以
下の組成範囲にあり、前記金属Sn粉末は、前記金属材
料の合計重量に対して5重量%以上15重量%以下の組
成範囲にあり、前記Ag−Cu−Ti合金粉末中のTi
の含有量は、前記Ag−Cu−Ti合金粉末の全体重量
に対して1重量%以上10重量%以下であるペースト状
の活性金属ろう材を塗布した後、溶剤を除去することに
より活性金属ろう材付金属部材を得る第1の工程と、前
記活性金属ろう材付金属部材の活性金属ろう材塗布面と
セラミックス部材とを当接させ、真空炉中で昇温するこ
とにより、脱バインダし、次いで該金属部材とセラミッ
クス部材とをろう付けすることにより接合する第2の工
程と、を含むことを特徴とする。Further, in the joining method of the present invention, on the surface of the metal member to be brought into contact with the ceramic member, a metal material composed of metal Cu powder, metal Sn powder and Ag-Cu-Ti alloy powder, an organic binder, and a plastic An active metal brazing material containing an agent and a solvent, wherein the metal Cu powder is in a composition range of 5% by weight or more and 15% by weight or less based on the total weight of the metal material, and the metal Sn powder is , In the composition range of 5% by weight or more and 15% by weight or less based on the total weight of the metal material, and the Ti in the Ag-Cu-Ti alloy powder is
Content of 1 to 10% by weight based on the total weight of the Ag-Cu-Ti alloy powder is applied, and then the solvent is removed by removing the solvent. A first step of obtaining a metal member with material, and the active metal brazing material coated surface of the metal member with active metal brazing material and the ceramic member are brought into contact with each other, and the temperature is raised in a vacuum furnace to remove the binder, Next, a second step of joining the metal member and the ceramic member by brazing is included.
【0015】さらにまた、本発明の接合方法は、セラミ
ックス部材と当接すべき金属部材表面に、Ag−Cu−
Ti合金粉末と、金属Cu粉末と、金属Sn粉末と、ア
クリル樹脂と、可塑剤と、溶剤とを含有するペースト状
の活性金属ろう材を塗布した後、溶剤を除去することに
より活性金属ろう材付金属部材を得る第1の工程と、前
記活性金属ろう材付金属部材の活性金属ろう材塗布面と
セラミックス部材とを当接させ、真空炉中で昇温するこ
とにより、脱バインダし、次いで該金属部材とセラミッ
クス部材とをろう付けすることにより接合する第2の工
程と、を含むことを特徴とする。Furthermore, according to the joining method of the present invention, Ag-Cu-
After applying a paste-like active metal brazing material containing a Ti alloy powder, a metal Cu powder, a metal Sn powder, an acrylic resin, a plasticizer and a solvent, the solvent is removed to remove the active metal brazing material. The first step of obtaining a coated metal member, the active metal brazing material coated surface of the metal member with active metal brazing material and the ceramic member are brought into contact with each other, and the temperature is raised in a vacuum furnace to remove the binder, and A second step of joining the metal member and the ceramic member by brazing.
【0016】ここで、セラミックス部材には、セラミッ
クスのみからなる部材のみならず、セラミックスと金属
との複合部材、例えば、一般的にメタライズとして用い
られる、モリブデン(Mo)またはタングステン(W)
とガラスとの複合部材も含まれる。Here, the ceramic member is not only a member made of only ceramics but also a composite member of ceramics and metal, for example, molybdenum (Mo) or tungsten (W) which is generally used as metallization.
A composite member of glass and glass is also included.
【0017】なお、セラミックスと金属との複合部材お
よびセラミックスのみからなる部材の両者からなる部材
と、金属部材との接合も当然のことながら本発明の活性
金属ろう材および接合方法により接合することができ
る。It should be noted that the joining of the member made of both the composite member of ceramics and metal and the member made of only ceramics and the metallic member can be performed by the active metal brazing material and the joining method of the present invention. it can.
【0018】[0018]
【構成の具体的説明】本発明では、セラミックス部材と
当接する金属部材の表面に粉末からなる活性金属ろう材
のペーストを塗布した後、該活性金属ろう材のペースト
を加熱し溶融させ冷却させてセラミックス部材とのろう
付けを行い接合する。[Detailed Description of the Structure] In the present invention, after the paste of the active metal brazing material made of powder is applied to the surface of the metal member in contact with the ceramic member, the active metal brazing material paste is heated, melted and cooled. It is brazed to the ceramic member and joined.
【0019】該活性金属ろう材には、Ag−Cu−Ti
合金の全体重量に対して1重量%以上10重量%以下の
Tiを有するAg−Cu−Ti合金が含有される。Ti
は、図1に示すように粒界に沿って、金属部材では、金
属粒界に拡散し、また、セラミックス部材では、セラミ
ックス粒界中の表面近傍部に拡散して金属部材とセラミ
ックス部材を接合している。Ag-Cu-Ti is used as the active metal brazing material.
An Ag-Cu-Ti alloy having Ti of 1% by weight or more and 10% by weight or less based on the total weight of the alloy is contained. Ti
As shown in FIG. 1, along the grain boundaries, the metal member diffuses to the metal grain boundary, and the ceramic member diffuses to the vicinity of the surface in the ceramic grain boundary to join the metal member and the ceramic member. is doing.
【0020】Tiは、単体では、活性が高く、TiHで
も高温雰囲気では容易に炭素、窒素、酸素と反応を起こ
して化合物を形成し、セラミックス、金属等との反応を
困難とする。ペースト化する時に均一な分散能を得るた
め、粉末を微細化すると表面の酸化が懸念されるのでA
g−Cu−Ti合金粉末として用いた。Ti has a high activity as a simple substance, and even TiH easily reacts with carbon, nitrogen and oxygen in a high temperature atmosphere to form a compound, which makes it difficult to react with ceramics, metals and the like. In order to obtain a uniform dispersibility when it is made into a paste, there is concern about surface oxidation when the powder is made fine.
Used as a g-Cu-Ti alloy powder.
【0021】また、活性状態にあるTiは、炭素(C)
との化学反応性に富む。従って、活性金属ろう材のペー
ストが焼成された後、炭素が残るとTiCを形成するた
めに、有機バインダーは、モノマーのままで熱分解する
アクリル樹脂を用いた。In addition, Ti in the active state is carbon (C).
Rich in chemical reactivity with. Therefore, in order to form TiC when carbon remains after firing the paste of the active metal brazing material, an acrylic resin that is thermally decomposed as a monomer is used as the organic binder.
【0022】さらにTiは、金属への拡散速度が大き
い。従って、過剰のTiが金属部材中に拡散して金属部
材を脆化させることを回避すべく、Ag−Cu−Ti合
金中におけるTiの含有量はAg−Cu−Ti合金の全
体重量に対して10重量%以下に設定した。なお、Ti
は、セラミックスへの拡散が緩やかな速度で進行するた
めに、セラミックス部材と好適な接合状態を得るために
Ag−Cu−Ti合金中におけるTiの含有量はAg−
Cu−Ti合金の全体重量に対して1重量%以上に設定
した。Further, Ti has a high diffusion rate into metal. Therefore, in order to prevent excessive Ti from diffusing into the metal member to embrittle the metal member, the content of Ti in the Ag-Cu-Ti alloy is relative to the total weight of the Ag-Cu-Ti alloy. It was set to 10% by weight or less. Note that Ti
Since the diffusion to the ceramics proceeds at a slow speed, the content of Ti in the Ag-Cu-Ti alloy is Ag-
It was set to 1% by weight or more based on the total weight of the Cu-Ti alloy.
【0023】また、金属部材中へのTiの過剰拡散によ
り、金属部材の脆化を回避すべく、該活性金属ろう材中
にSnを添加した。Further, Sn was added to the active metal brazing material in order to avoid embrittlement of the metal member due to excessive diffusion of Ti into the metal member.
【0024】次いで、金属Cu、金属SnおよびAg−
Cu−Ti合金とを金属材料として含有する活性金属ろ
う材のろう付けについて説明する。金属部材の表面に該
活性金属ろう材ペーストを塗布した後、所定温度まで加
熱して該Ag−Cu−Ti合金を溶融する。この時、7
00℃から800℃の温度領域でAg−Cu−Ti合金
中のAg−Cu成分が溶融する以前に、予め添加した金
属Cu粉末と金属Sn粉末の共晶合金が融点に達して融
解する。従って、このSn成分とTi成分が反応して金
属部材中への過剰なTiの拡散を回避すると共に、セラ
ミックス部材中にTiが拡散して好適なぬれ状態が得ら
れる。この好適なぬれ状態並びに当該実施例の配合比に
よるAg−Cu−Ti合金を用いることにより、活性金
属ろう材の融点を低下させることができるので、冷却時
の金属部材とセラミックス部材との熱膨張係数の差異に
よる影響を克服することができ、また、金属Cu粉末成
分とSn成分の添加により溶融は低い温度領域で開始さ
れるので、該金属部材とセラミックス部材との固着に際
して、反りを生じることなく隙間がなくボイドの少ない
ろう付けを行うことに寄与し接合強度を向上することが
できる。Then, metal Cu, metal Sn and Ag-
Brazing of an active metal brazing material containing a Cu-Ti alloy as a metal material will be described. After applying the active metal brazing paste to the surface of the metal member, it is heated to a predetermined temperature to melt the Ag-Cu-Ti alloy. At this time, 7
Before the Ag—Cu component in the Ag—Cu—Ti alloy melts in the temperature range of 00 ° C. to 800 ° C., the eutectic alloy of the metal Cu powder and the metal Sn powder added in advance reaches the melting point and melts. Therefore, the Sn component reacts with the Ti component to prevent excessive diffusion of Ti into the metal member, and Ti diffuses into the ceramic member to obtain a suitable wet state. By using the Ag-Cu-Ti alloy having this suitable wet state and the compounding ratio of the embodiment, the melting point of the active metal brazing material can be lowered, so that the thermal expansion of the metal member and the ceramic member during cooling. The influence due to the difference in the coefficient can be overcome, and since the melting is started in the low temperature region by the addition of the metallic Cu powder component and the Sn component, a warp occurs when the metallic member and the ceramic member are fixed. This contributes to brazing with no voids and few voids, thus improving the joint strength.
【0025】また、金属Sn粉末を添加するためにAg
−Cu−Ti合金の溶融温度は低下する。このため、金
属Cu粉末を添加して適性な溶融温度を設定した。従っ
て、溶融に必要な温度の上限を最も低く設定することが
可能となるので、金属部材の残留応力を下げることがで
き、接合強度を向上することができる。Also, to add the metal Sn powder, Ag is added.
The melting temperature of the -Cu-Ti alloy decreases. Therefore, an appropriate melting temperature is set by adding metallic Cu powder. Therefore, the upper limit of the temperature required for melting can be set to the lowest, so that the residual stress of the metal member can be reduced and the bonding strength can be improved.
【0026】[0026]
【実施例】次に本発明に係る活性金属ろう材および活性
金属ろう材を用いた金属部材とセラミックス部材との接
合方法について好適な実施例を挙げ、添付の図面を参照
ながら以下詳細に説明する。The preferred embodiments of the active metal brazing material and the method for joining a metal member and a ceramic member using the active metal brazing material according to the present invention will be described below in detail with reference to the accompanying drawings. .
【0027】なお、本実施例においては、電気、電子部
品におけるセラミックス基板への金属部材の取り付け方
法に沿って説明する。In the present embodiment, a method of attaching a metal member to a ceramics substrate in an electric / electronic component will be described.
【0028】セラミックス基板への金属部材の取付けに
際しては、先ず,導電性金属からなる金属部材がセラミ
ックス基板と当接する面に、ペースト状の活性金属ろう
材をスクリーン印刷法、カレンダーロール法等の好適な
印刷法により印刷塗布し、次いで、金属部材がセラミッ
クス基板と当接する当接面に塗布したペースト状の活性
金属ろう材を乾燥する第1工程を実施した。When attaching the metal member to the ceramic substrate, first, a paste-like active metal brazing material is preferably applied by a screen printing method, a calendar roll method, or the like on the surface where the metal member made of a conductive metal contacts the ceramic substrate. The first step of drying and applying the paste-like active metal brazing material applied to the contact surface where the metal member contacts the ceramic substrate was performed.
【0029】該活性金属ろう材は、Ag−Cu−Ti合
金の全体重量に対して5重量%のTiを含有するAg−
Cu−Ti合金の微細な粉末と、該活性金属ろう材の金
属材料の合計重量に対して10重量%の金属Cuの微細
な粉末と、金属材料の合計重量に対して10重量%の金
属Snの微細な粉末と、アクリル樹脂からなる有機バイ
ンダと、前記成分をペースト状にするための乾燥により
揮発可能な溶剤から構成された。前記合金、金属材料、
およびバインダは、溶剤中に均一に分散されペースト状
態として用いた。 なお、Ag−Cu−Ti合金におい
て、AgとCuの組成は、AgとCuの合計重量に対し
て、共晶点が得られるAg72重量%、Cu28重量%
の重量組成あるいは、Ag85重量%、Cu15重量%
等の重量組成を用いた。The active metal brazing material is Ag-containing 5% by weight of Ti based on the total weight of the Ag-Cu-Ti alloy.
Cu-Ti alloy fine powder, 10 wt% metal Cu fine powder with respect to the total metal weight of the active metal brazing material, and 10 wt% metal Sn with respect to the total metal weight. Of fine powder, an organic binder made of an acrylic resin, and a solvent which can be volatilized by drying to make the above components into a paste. The alloy, the metal material,
The binder was uniformly dispersed in the solvent and used as a paste. In addition, in the Ag-Cu-Ti alloy, the composition of Ag and Cu is Ag 72 wt% and Cu 28 wt% with respect to the total weight of Ag and Cu.
Weight composition or Ag 85% by weight, Cu 15% by weight
Etc. were used.
【0030】また、活性金属ろう材に用いた、Cu、S
n、Ag−Cu−Ti合金の粉末の平均粒子径はそれぞ
れ0.5〜10μmであった。Cu and S used for the active metal brazing material
The average particle diameters of the n and Ag—Cu—Ti alloy powders were 0.5 to 10 μm, respectively.
【0031】さらに、金属部材の活性金属ろう材の塗布
厚は、4μmから30μm程度とした。Further, the coating thickness of the active metal brazing material of the metal member is set to about 4 μm to 30 μm.
【0032】該第1工程では、後述の第2工程において
真空炉を用いてろう付けを行う際に、真空炉に掛かる余
分な負荷を除去するために、溶剤並びに有機バインダの
揮発成分を除去した。In the first step, the solvent and the volatile components of the organic binder were removed in order to remove an extra load applied to the vacuum furnace when brazing was performed using the vacuum furnace in the second step described later. .
【0033】次いで、活性金属ろう材を塗布した金属部
材をセラミックス基板の所定の接合位置に当接させ、脱
バインダした後、ろう付けをする第2工程を実施した。Then, a second step of brazing was performed after the metal member coated with the active metal brazing material was brought into contact with a predetermined joining position of the ceramic substrate to remove the binder, and then brazing.
【0034】該第2工程では、真空炉を用い10-5mm
Hg以下の真空度で、一定の昇温速度で750℃まで昇
温した。昇温の過程において、先ず、脱バインダがなさ
れアクリル樹脂がモノマーのまま分解される。次いで、
ろう材であるAg−Cuが溶融する以前に、予め添加し
た金属Cu粉末成分と金属Sn粉末成分が融点に達して
融解した。従って、図1に示すようにこのSn成分2と
Ti4とが反応して金属部材6中への過剰なTi4の拡
散を回避すると共に、セラミックス基板8中にTi4が
拡散して好適なぬれ状態が得られた。In the second step, a vacuum furnace is used and the pressure is 10 -5 mm.
The temperature was raised to 750 ° C. at a constant heating rate at a vacuum degree of Hg or less. In the process of raising the temperature, first, the binder is removed and the acrylic resin is decomposed as a monomer. Then
Before the brazing material Ag-Cu was melted, the metal Cu powder component and the metal Sn powder component added in advance reached the melting points and melted. Therefore, as shown in FIG. 1, the Sn component 2 reacts with Ti4 to prevent excessive diffusion of Ti4 into the metal member 6, and at the same time, Ti4 diffuses into the ceramic substrate 8 to provide a suitable wet state. Was obtained.
【0035】さらに金属Sn粉末を添加するためにAg
−Cu−Ti合金の最終的な溶融温度は低下し、650
℃近傍の温度領域で該活性金属ろう材は、溶融を開始し
た。In order to add more metal Sn powder, Ag is added.
The final melting temperature of the -Cu-Ti alloy is reduced to 650
The active metal brazing material started melting in the temperature range near ℃.
【0036】本実施例では、750℃まで一定速度で昇
温を続行した後、冷却してろう付けを完了した。なお、
接合後のろう材層の厚みは、2μmから15μm程度と
なった。In this example, the temperature was raised to 750 ° C. at a constant rate and then cooled to complete brazing. In addition,
The thickness of the brazing material layer after joining was about 2 μm to 15 μm.
【0037】また、必要に応じて、第2工程の実施前、
および第2工程実施後の少なくとも一つ以上の時期に金
属部材に加工を施すことも可能である。If necessary, before performing the second step,
It is also possible to process the metal member at least one or more times after performing the second step.
【0038】以上の工程より、前記ぬれ状態では、冷却
時の金属部材とセラミックス部材との熱膨張係数の差異
を克服することができ、また、金属Cu粉末成分と金属
Sn粉末成分の添加により溶融は低い温度領域で開始さ
れるので、該金属部材とセラミックス部材との固着に際
して、隙間のないろう付けを行うことができ、さらに
は、活性金属ろう材を構成するAg−Cu−Ti合金の
最終的な溶融温度を低下することができるので金属部材
の残留応力を低減し、接合強度を向上することができ
た。 さらにまた、従来セラミックスと金属のぬれ性を
向上するために施されていたニッケルメッキ層を得るた
めの一連の工程を省略することができる。従って、製造
工程の大幅の短縮化とコストの低減化が図れると共に、
ニッケルメッキによる所定部位以外へのはみ出しや残渣
により、隣接する金属部材およびその接合部位との電気
的絶縁性が破壊されることが回避される。従って、セラ
ミックス基板を用いて構成される電気、電子部品自体の
小型化を達成することができる。From the above steps, in the wet state, the difference in the coefficient of thermal expansion between the metal member and the ceramic member during cooling can be overcome, and the addition of the metal Cu powder component and the metal Sn powder component causes melting. Since it is started in a low temperature region, it is possible to perform brazing without a gap when the metal member and the ceramic member are fixed to each other, and further, the final Ag-Cu-Ti alloy constituting the active metal brazing material is formed. Since the typical melting temperature can be lowered, the residual stress of the metal member can be reduced and the joint strength can be improved. Furthermore, it is possible to omit a series of steps for obtaining a nickel plating layer which has been conventionally performed to improve the wettability of ceramics and metals. Therefore, the manufacturing process can be significantly shortened and the cost can be reduced.
It is possible to prevent the electric insulation between the adjacent metal member and its joining portion from being destroyed by the protrusion or residue of nickel plating other than the predetermined portion. Therefore, it is possible to achieve miniaturization of the electric and electronic components themselves that are formed by using the ceramic substrate.
【0039】また、本実施例に係る活性金属ろう材12
は、例えば、図2の電気、電子部品10の縦断面図に示
すように、アルミナ、ムライト、窒化アルミニウム、硝
子セラミックス等からなるセラミックス部材14とリー
ドフレーム16のような金属部材との接合、または、モ
リブデン(Mo)、タングステン(W)メタライズ等か
らなるビア部18aやセラミックス部材14の一部ある
いは全部を被覆するメタライズ部18b等と接合し且つ
電気的導通を得る場合にも用いることができる。なお、
メタライズとは金属(例えばW、Mo)とガラスとの複
合部材である。また、金属部材としては、外部端子であ
るピン、前記リードフレーム、シールリング、ヒートシ
ンク等の部品がある。Further, the active metal brazing material 12 according to the present embodiment.
Is, for example, as shown in the vertical cross-sectional view of the electric / electronic component 10 in FIG. 2, joining of a ceramic member 14 made of alumina, mullite, aluminum nitride, glass ceramics, etc. and a metal member such as a lead frame 16, or , Molybdenum (Mo), tungsten (W) metallized vias 18a, and the like, and the metallized portion 18b covering a part or the whole of the ceramic member 14 and the like, and can also be used to obtain electrical conduction. In addition,
Metallization is a composite member of metal (for example, W, Mo) and glass. Further, as the metal member, there are parts such as a pin which is an external terminal, the lead frame, a seal ring and a heat sink.
【0040】[0040]
【発明の効果】以上のように本発明に係る活性金属ろう
材および活性金属ろう材を用いた金属部材とセラミック
ス部材との接合方法では、該金属活性ろう材によりセラ
ミックス部材と金属部材に好適なぬれ状態を得ることが
できるから金属部材とセラミックス部材との接合に際し
て、接合強度を著しく向上させる効果を奏する。INDUSTRIAL APPLICABILITY As described above, the active metal brazing material and the method for joining a metal member and a ceramic member using the active metal brazing material according to the present invention are suitable for the ceramic member and the metal member by the metal active brazing material. Since the wet state can be obtained, the effect of significantly improving the bonding strength when the metal member and the ceramic member are bonded is obtained.
【0041】また、従来、好適なぬれ状態を得るために
施されていたニッケルメッキを得るための一連の工程を
省略することができるので、製造工程を大幅に短縮化
し、製造コストを低減化する効果を奏する。Further, since a series of steps for obtaining nickel plating, which has been conventionally performed for obtaining a suitable wet state, can be omitted, the manufacturing process can be greatly shortened and the manufacturing cost can be reduced. Produce an effect.
【0042】さらには、本発明に係る活性金属ろう材お
よび活性金属ろう材を用いた金属部材とセラミックス部
材との接合方法を用いて小型化と、信頼性の向上を図る
ことができると共に、放熱性、電気伝導性を容易に得る
ことができる。Furthermore, the active metal brazing material and the method for joining a metal member and a ceramic member using the active metal brazing material according to the present invention can be used to reduce the size and improve the reliability, and at the same time, heat dissipation can be achieved. And electrical conductivity can be easily obtained.
【図1】本発明に係る活性金属ろう材の溶融時における
TiとSnの動態を示す概念図である。FIG. 1 is a conceptual diagram showing the dynamics of Ti and Sn during melting of an active metal brazing material according to the present invention.
【図2】本発明に係る好適な実施例を示す縦断面図であ
る。FIG. 2 is a longitudinal sectional view showing a preferred embodiment according to the present invention.
2…Sn成分 4…Ti 6…金属部材 8…セラミックス部材 10…電気、電子部品 12…活性金属ろう材 14…セラミックス部材 16…リードフレーム 18a…ビア部 18b…メタライズ部 2 ... Sn component 4 ... Ti 6 ... Metal member 8 ... Ceramics member 10 ... Electrical and electronic parts 12 ... Active metal brazing material 14 ... Ceramics member 16 ... Lead frame 18a ... via part 18b ... Metallization section
───────────────────────────────────────────────────── フロントページの続き (72)発明者 白須 孝治 山梨県富士吉田市上吉田1192番地の57 (72)発明者 佐藤 明弘 山梨県富士吉田市下吉田3679番地の13 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Koji Shirasu 57, 1192 Kamiyoshida, Fujiyoshida City, Yamanashi Prefecture (72) Inventor Akihiro Sato 13 3679 Shimoyoshida, Fujiyoshida City, Yamanashi Prefecture
Claims (8)
i合金とを金属材料として含有する活性金属ろう材にお
いて、 前記金属Cuは、前記金属材料の合計重量に対して5重
量%以上15重量%以下の組成範囲にあり、 前記金属Snは、前記金属材料の合計重量に対して5重
量%以上15重量%以下の組成範囲にあり、 前記Ag−Cu−Ti合金中のTiの含有量は、前記A
g−Cu−Ti合金の全体重量に対して1重量%以上1
0重量%以下であることを特徴とする活性金属ろう材。1. A metal Cu, a metal Sn, and Ag—Cu—T.
In an active metal brazing material containing an i alloy as a metal material, the metal Cu is in a composition range of 5 wt% or more and 15 wt% or less with respect to the total weight of the metal materials, and the metal Sn is the metal The content of Ti in the Ag-Cu-Ti alloy is 5% by weight or more and 15% by weight or less with respect to the total weight of the materials.
1% by weight or more based on the total weight of the g-Cu-Ti alloy 1
An active metal brazing material characterized by being 0% by weight or less.
面に、金属Cu粉末、金属Sn粉末およびAg−Cu−
Ti合金粉末からなる金属材料と、有機バインダと、可
塑剤と、溶剤とを含有する活性金属ろう材であって、前
記金属Cu粉末は、前記金属材料の合計重量に対して5
重量%以上15重量%以下の組成範囲にあり、前記金属
Sn粉末は、前記金属材料の合計重量に対して5重量%
以上15重量%以下の組成範囲にあり、前記Ag−Cu
−Ti合金粉末中のTiの含有量は、前記Ag−Cu−
Ti合金粉末の全体重量に対して1重量%以上10重量
%以下であるペースト状の活性金属ろう材を塗布した
後、溶剤を除去することにより活性金属ろう材付金属部
材を得る第1の工程と、 前記活性金属ろう材付金属部材の活性金属ろう材塗布面
とセラミックス部材とを当接させ、真空炉中で昇温する
ことにより、脱バインダし、次いで該金属部材とセラミ
ックス部材とをろう付けすることにより接合する第2の
工程と、 を含むことを特徴とする活性金属ろう材を用いた金属部
材とセラミックス部材との接合方法。2. A metal Cu powder, a metal Sn powder and Ag-Cu-on the surface of a metal member to be brought into contact with a ceramic member.
An active metal brazing material containing a metal material composed of Ti alloy powder, an organic binder, a plasticizer, and a solvent, wherein the metal Cu powder is 5 to the total weight of the metal material.
In the composition range of 15 wt% or more and 15 wt% or less, the metal Sn powder is 5 wt% with respect to the total weight of the metal material.
In the composition range of not less than 15 wt% and not more than the Ag-Cu
The content of Ti in the -Ti alloy powder is Ag-Cu-
First step of obtaining a metal member with an active metal brazing material by applying a paste-like active metal brazing material in an amount of 1% by weight or more and 10% by weight or less based on the total weight of the Ti alloy powder, and then removing the solvent And a ceramic member is brought into contact with the active metal brazing material coated surface of the metal member with an active metal brazing material, and the temperature is raised in a vacuum furnace to remove the binder, and then the metal member and the ceramic member are brazed. And a second step of joining by joining. A method of joining a metal member and a ceramic member using an active metal brazing material, comprising:
面に、Ag−Cu−Ti合金粉末と、金属Cu粉末と、
金属Sn粉末と、アクリル樹脂と、可塑剤と、溶剤とを
含有するペースト状の活性金属ろう材を塗布した後、溶
剤を除去することにより活性金属ろう材付金属部材を得
る第1の工程と、 前記活性金属ろう材付金属部材の活性金属ろう材塗布面
とセラミックス部材とを当接させ、真空炉中で昇温する
ことにより、脱バインダし、次いで該金属部材とセラミ
ックス部材とをろう付けすることにより接合する第2の
工程と、 を含むことを特徴とする活性金属ろう材を用いた金属部
材とセラミックス部材との接合方法。3. An Ag-Cu-Ti alloy powder and a metallic Cu powder are provided on the surface of the metallic member to be brought into contact with the ceramic member.
A first step of obtaining a metal member with an active metal brazing material by applying a paste-like active metal brazing material containing metal Sn powder, an acrylic resin, a plasticizer, and a solvent, and then removing the solvent; , A ceramic member is brought into contact with the active metal brazing material coated surface of the metal member with an active metal brazing material, and the temperature is raised in a vacuum furnace to remove the binder, and then the metal member and the ceramic member are brazed. A second step of joining by doing so, and a joining method of a metal member and a ceramic member using an active metal brazing filler metal, which comprises:
て、前記セラミックス部材がセラミックスのみからなる
部材であることを特徴とする活性金属ろう材を用いた金
属部材とセラミックス部材との接合方法。4. The method for joining a metal member and a ceramic member using an active metal brazing material according to claim 2, wherein the ceramic member is a member made of only ceramics.
て、前記セラミックス部材がセラミックスと金属との複
合部材であることを特徴とする活性金属ろう材を用いた
金属部材とセラミックス部材との接合方法。5. The method for joining a metal member and a ceramic member using an active metal brazing material according to claim 2, wherein the ceramic member is a composite member of ceramic and metal. .
ラミックス部材が金属とガラスとの複合部材であること
を特徴とする活性金属ろう材を用いた金属部材とセラミ
ックス部材との接合方法。6. The joining method according to claim 5, wherein the ceramics member is a composite member of metal and glass, wherein the metal member and the ceramics member are made of an active metal brazing material.
属とガラスとの複合部材がメタライズであることを特徴
とする活性金属ろう材を用いた金属部材とセラミックス
部材との接合方法。7. The method for joining a metal member and a ceramic member using an active metal brazing material according to claim 6, wherein the composite member of metal and glass is metallized.
て、前記セラミックス部材が、セラミックスと金属との
複合部材およびセラミックスのみからなる部材の両者か
らなる部材であることを特徴とする活性金属ろう材を用
いた金属部材とセラミックス部材との接合方法。8. The active metal brazing material according to claim 2 or 3, wherein the ceramic member is a member made of both a composite member of ceramics and metal and a member made only of ceramics. A method for joining a metal member and a ceramic member using the.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3181365A JP2520334B2 (en) | 1991-07-22 | 1991-07-22 | Active metal brazing material and method for joining metal member and ceramic member using active metal brazing material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3181365A JP2520334B2 (en) | 1991-07-22 | 1991-07-22 | Active metal brazing material and method for joining metal member and ceramic member using active metal brazing material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0524943A true JPH0524943A (en) | 1993-02-02 |
JP2520334B2 JP2520334B2 (en) | 1996-07-31 |
Family
ID=16099454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3181365A Expired - Fee Related JP2520334B2 (en) | 1991-07-22 | 1991-07-22 | Active metal brazing material and method for joining metal member and ceramic member using active metal brazing material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2520334B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015190501A1 (en) * | 2014-06-13 | 2015-12-17 | 三菱マテリアル株式会社 | Method for sealing package, and sealing paste |
KR20160124724A (en) | 2013-03-29 | 2016-10-28 | 미쓰비시 마테리알 가부시키가이샤 | Method for producing solder powder and solder paste using the powder |
CN106312361A (en) * | 2016-10-12 | 2017-01-11 | 哈尔滨工业大学(威海) | Ceramic substrate and copper clad foil low-temperature connecting soldering paste and production process thereof |
CN106312220A (en) * | 2016-10-12 | 2017-01-11 | 哈尔滨工业大学(威海) | Ceramic substrate copper cladding low-temperature connection method for power module |
US10814436B2 (en) | 2014-04-30 | 2020-10-27 | Ngk Insulators, Ltd. | Joined body including ceramic member and metallic member and method for manufacturing joined body |
CN114951873A (en) * | 2022-06-14 | 2022-08-30 | 浙江亚通焊材有限公司 | Composite solder containing high-entropy alloy and method for connecting AlN and Cu through brazing |
WO2022202146A1 (en) * | 2021-03-24 | 2022-09-29 | デンカ株式会社 | Composite substrate |
WO2024009851A1 (en) * | 2022-07-05 | 2024-01-11 | 株式会社 東芝 | Bonded body, ceramic circuit board, semiconductor device, and method for manufacturing bonded body |
-
1991
- 1991-07-22 JP JP3181365A patent/JP2520334B2/en not_active Expired - Fee Related
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160124724A (en) | 2013-03-29 | 2016-10-28 | 미쓰비시 마테리알 가부시키가이샤 | Method for producing solder powder and solder paste using the powder |
US10814436B2 (en) | 2014-04-30 | 2020-10-27 | Ngk Insulators, Ltd. | Joined body including ceramic member and metallic member and method for manufacturing joined body |
WO2015190501A1 (en) * | 2014-06-13 | 2015-12-17 | 三菱マテリアル株式会社 | Method for sealing package, and sealing paste |
JP2016015483A (en) * | 2014-06-13 | 2016-01-28 | 三菱マテリアル株式会社 | Method for sealing package and sealing paste |
TWI645930B (en) * | 2014-06-13 | 2019-01-01 | 日商三菱綜合材料股份有限公司 | Package sealing method and sealing paste |
CN106312361A (en) * | 2016-10-12 | 2017-01-11 | 哈尔滨工业大学(威海) | Ceramic substrate and copper clad foil low-temperature connecting soldering paste and production process thereof |
CN106312220A (en) * | 2016-10-12 | 2017-01-11 | 哈尔滨工业大学(威海) | Ceramic substrate copper cladding low-temperature connection method for power module |
WO2022202146A1 (en) * | 2021-03-24 | 2022-09-29 | デンカ株式会社 | Composite substrate |
JPWO2022202146A1 (en) * | 2021-03-24 | 2022-09-29 | ||
CN114951873A (en) * | 2022-06-14 | 2022-08-30 | 浙江亚通焊材有限公司 | Composite solder containing high-entropy alloy and method for connecting AlN and Cu through brazing |
CN114951873B (en) * | 2022-06-14 | 2023-10-03 | 浙江亚通新材料股份有限公司 | Composite brazing filler metal containing high-entropy alloy and method for brazing and connecting AlN and Cu by composite brazing filler metal |
WO2024009851A1 (en) * | 2022-07-05 | 2024-01-11 | 株式会社 東芝 | Bonded body, ceramic circuit board, semiconductor device, and method for manufacturing bonded body |
Also Published As
Publication number | Publication date |
---|---|
JP2520334B2 (en) | 1996-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4770533B2 (en) | Semiconductor device manufacturing method and semiconductor device | |
JPS6230159B2 (en) | ||
JP2520334B2 (en) | Active metal brazing material and method for joining metal member and ceramic member using active metal brazing material | |
JP3834351B2 (en) | Ceramic circuit board | |
JP5016756B2 (en) | Nitride-based ceramic member and metal member joined body and nitride-based ceramic circuit board using the same | |
JP6509469B1 (en) | Junction structure, semiconductor device and method of manufacturing the same | |
JP2006120973A (en) | Circuit board and manufacturing method thereof | |
JP2000246482A (en) | Brazing filler metal paste | |
JP2002246717A (en) | Ceramic circuit board | |
US20230137460A1 (en) | Method for producing a via in a carrier layer produced from a ceramic and carrier layer having a via | |
JPH05319946A (en) | Ceramic substrate joined to metallic plate | |
JP2783577B2 (en) | Brazing filler metal paste for metal-ceramics and electronic components | |
EP3745448A1 (en) | Joining layer of semiconductor module, semiconductor module, and method for manufacturing same | |
JP3705779B2 (en) | Power device, manufacturing method thereof, and tin-based solder material | |
JP2001274534A (en) | Ceramics copper circuit board and method for manufacturing the same | |
JPH05221759A (en) | Aluminum nitride substrate with metallizing layer and metallizing method | |
JP4052557B2 (en) | Manufacturing method of heat dissipation substrate for semiconductor device comprising aluminum nitride-composite-aluminum bonded body | |
JP2512369B2 (en) | Package for semiconductor device and method of manufacturing the same | |
JP3302807B2 (en) | Joining method of ceramics and silicon | |
JP2000349098A (en) | Bonded body of ceramic substrate and semiconductor device, and its manufacture | |
JP2001094223A (en) | Ceramic circuit board | |
JP4295409B2 (en) | Manufacturing method of ceramic circuit board | |
JPH06344131A (en) | Method for joining part to semiconductor heat radiating base plate | |
JP2019135734A (en) | Sheet for joining, method for manufacturing the same, semiconductor module, and method for manufacturing the same | |
JP2020157326A (en) | Joining method of lead free solder material |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
LAPS | Cancellation because of no payment of annual fees |