JPH0523585Y2 - - Google Patents
Info
- Publication number
- JPH0523585Y2 JPH0523585Y2 JP18677687U JP18677687U JPH0523585Y2 JP H0523585 Y2 JPH0523585 Y2 JP H0523585Y2 JP 18677687 U JP18677687 U JP 18677687U JP 18677687 U JP18677687 U JP 18677687U JP H0523585 Y2 JPH0523585 Y2 JP H0523585Y2
- Authority
- JP
- Japan
- Prior art keywords
- melt
- substrate
- substrate holder
- shutter
- epitaxial growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 69
- 239000000155 melt Substances 0.000 claims description 38
- 239000007791 liquid phase Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000004973 liquid crystal related substance Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000463 material Substances 0.000 description 6
- 238000007598 dipping method Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18677687U JPH0523585Y2 (enrdf_load_stackoverflow) | 1987-12-07 | 1987-12-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18677687U JPH0523585Y2 (enrdf_load_stackoverflow) | 1987-12-07 | 1987-12-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0189965U JPH0189965U (enrdf_load_stackoverflow) | 1989-06-13 |
| JPH0523585Y2 true JPH0523585Y2 (enrdf_load_stackoverflow) | 1993-06-16 |
Family
ID=31477984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18677687U Expired - Lifetime JPH0523585Y2 (enrdf_load_stackoverflow) | 1987-12-07 | 1987-12-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0523585Y2 (enrdf_load_stackoverflow) |
-
1987
- 1987-12-07 JP JP18677687U patent/JPH0523585Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0189965U (enrdf_load_stackoverflow) | 1989-06-13 |
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