JPH0523261Y2 - - Google Patents

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Publication number
JPH0523261Y2
JPH0523261Y2 JP1986013805U JP1380586U JPH0523261Y2 JP H0523261 Y2 JPH0523261 Y2 JP H0523261Y2 JP 1986013805 U JP1986013805 U JP 1986013805U JP 1380586 U JP1380586 U JP 1380586U JP H0523261 Y2 JPH0523261 Y2 JP H0523261Y2
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JP
Japan
Prior art keywords
film
irradiation
electron beam
irradiation chamber
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP1986013805U
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Japanese (ja)
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JPS62126279U (en
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Priority to JP1986013805U priority Critical patent/JPH0523261Y2/ja
Publication of JPS62126279U publication Critical patent/JPS62126279U/ja
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  • Physical Or Chemical Processes And Apparatus (AREA)

Description

【考案の詳細な説明】 (イ) 産業上の利用分野 この考案は、不活性ガス雰囲気において被照射
物に電子線照射をおこなう電子線照射装置に関す
る。
[Detailed description of the invention] (a) Industrial application field This invention relates to an electron beam irradiation device that irradiates an object with an electron beam in an inert gas atmosphere.

(ロ) 従来の技術 被照射物、例えば塗膜等を電子線硬化させるた
めに電子線照射を酸素雰囲気中で行なうと、塗料
が酸素と結合し、満足な硬化膜が得られない。そ
こで、たとえば窒素ガスなどの不活性ガスを照射
室に充填し、酸素濃度を下げて電子線照射を行な
うことが必要である。
(b) Prior Art When electron beam irradiation is performed in an oxygen atmosphere to cure an object to be irradiated, such as a coating film, etc., the coating material combines with oxygen, making it impossible to obtain a satisfactory cured film. Therefore, it is necessary to fill the irradiation chamber with an inert gas such as nitrogen gas to lower the oxygen concentration and perform electron beam irradiation.

(ハ) 考案が解決しようとする問題点 しかしながら照射室には連続的に搬送通過され
る被照射物の搬入・搬出口が形成されているの
で、どうしてもその部分から不活性ガスが流出し
て酸素と置換してしまい、よつて新たなる不活性
ガスを順次多量に供給されなければならず、製造
コストが高くなる問題があつた。
(c) Problems that the invention aims to solve However, since the irradiation chamber has an entrance for carrying in and out the irradiation object through which the irradiation object is continuously transported, inert gas inevitably flows out from that part and oxygen Therefore, a large amount of new inert gas must be successively supplied, resulting in a problem of increased manufacturing costs.

この考案は上記の事情に鑑みなしたもので、照
射室内からの不活性ガスの流出を最小限に止めえ
る電子線照射装置を提供するものである。
This invention was developed in view of the above circumstances, and is intended to provide an electron beam irradiation device that can minimize the outflow of inert gas from the irradiation chamber.

(ニ) 問題点を解決するための手段 この考案においては、被照射物の搬入・搬出口
の被照射物より下方に位置する開口部分をシール
部材によつて閉ざす構成とするもので、そのさら
に詳しい構成は、両側に電子線のフイルム状被照
射物の搬入口・搬出口を有する照射室と、照射室
に配置される電子線照射器と、照射室のフイルム
状被照射物の搬入口・搬出口近傍にそれぞれ配置
され電子線照射器に相対するフイルム状被照射物
の搬送路を形成するための搬送ローラと、不活性
ガスを照射室内へフイルム状被照射物の搬送方向
とはほぼ平行で逆方向に流すべく供給する不活性
ガス供給機構とからなり、さらにそれぞれの搬送
ローラの下部と照射室のフイルム状被照射物の搬
入口・搬出口の縁部との間に不活性ガスの流出を
防止するための弾性体からなるシール部材を備
え、かつそのシール部材が搬入口側では照射室外
に、搬出口側では照射室内にそれぞれ搬送ローラ
の順方向にて配設されてなる電子線照射装置であ
る。
(d) Means for solving the problem In this invention, the opening portion of the loading/unloading port for the irradiated object located below the irradiated object is closed with a sealing member. The detailed configuration consists of an irradiation chamber with entrances and exits for electron beam irradiation objects on both sides, an electron beam irradiator placed in the irradiation chamber, and an entrance and exit for film irradiation objects in the irradiation chamber. Conveyance rollers are arranged near the exit to form a conveyance path for the film-like irradiation object facing the electron beam irradiator, and the conveyance direction of the film-like irradiation object is almost parallel to the conveyance direction of the inert gas into the irradiation chamber. In addition, an inert gas supply mechanism is provided to supply the inert gas so that it flows in the opposite direction. An electron beam comprising a sealing member made of an elastic material to prevent leakage, and the sealing member is placed outside the irradiation chamber at the entrance side and inside the irradiation chamber at the exit side in the forward direction of the conveying roller. It is an irradiation device.

(ホ) 作用 ローラの回転搬送時においても常時シール材が
ローラの下部と、搬入口および搬出口の縁部間を
閉ざして不活性ガスの流出を防止する。
(E) Function Even when the rollers are being rotated and conveyed, the sealing material always closes the lower part of the rollers and the edges of the inlet and outlet to prevent inert gas from flowing out.

(ヘ) 実施例 以下この考案を実施例図面によつて詳述する
が、この考案は以下の実施例に限定されるもので
はない。
(f) Examples This invention will be described in detail below with reference to drawings of examples, but this invention is not limited to the following examples.

第1図は全体構成を示し、1が照射室で、両側
に電子線の被照射物である例えばフイルム2が連
続的に搬入、搬出される搬入口3と搬出口4とが
開設されている。この搬入口3と搬出口4の近傍
位置に搬送手段であるローラ5がそれぞれ矢印方
向に回転するように配置され、このそれぞれのロ
ーラ5によつてフイルム2の搬送路が形成され
る。6が電子線照射器で、電子線の照射窓7がフ
イルム2に相対するように照射室1の上部に設け
られている。
Fig. 1 shows the overall configuration, and numeral 1 is an irradiation chamber, on both sides of which are opened an inlet 3 and an outlet 4 through which objects to be irradiated with electron beams, for example, films 2, are continuously carried in and out. . Rollers 5 serving as conveying means are arranged near the inlet 3 and the outlet 4 so as to rotate in the directions of the arrows, and these rollers 5 form a conveying path for the film 2. Reference numeral 6 denotes an electron beam irradiator, which is provided at the upper part of the irradiation chamber 1 so that an electron beam irradiation window 7 faces the film 2.

8,9が不活性ガス送流機構を構成する不活性
ガスの吹出体(不活性ガスの供給体)と吸込体
で、吹出体8は第2図に示すような構成となつて
いる。吹出体8は給気管10が接続される吹出ダ
クト11とその前面に付設される複数枚の整流板
12と、さらに整流板12を連通するように配置
される複数本の冷却パイプ13とからなる。そし
て吹出ダクト11の整流板12の付設される側の
面には不活性ガス吹出し用のノズル穴14が多数
設けられている。吸込体9は上記吹出体8から冷
却パイプ13が除かれ、給気管10が排気管15
に変わる構成のものである。
Reference numerals 8 and 9 denote an inert gas blowing body (inert gas supply body) and a suction body which constitute an inert gas flow mechanism, and the blowing body 8 has a structure as shown in FIG. The blow-out body 8 is made up of a blow-off duct 11 to which an air supply pipe 10 is connected, a plurality of rectifying plates 12 attached to the front surface of the blow-off duct 11, and a plurality of cooling pipes 13 arranged to communicate with the rectifying plates 12. . A large number of nozzle holes 14 for blowing out inert gas are provided on the side of the blow-off duct 11 on which the current plate 12 is attached. In the suction body 9, the cooling pipe 13 is removed from the blowout body 8, and the air supply pipe 10 is replaced with the exhaust pipe 15.
It has a configuration that changes to .

もちろん冷却パイプ13は吸込体9側にも設け
られてもよく、また吹出体8への取り付けも整流
板12面上に蛇行するように配置してもよい。ま
た冷却パイプ13は吹出体8からの不活性ガスの
冷却のみならず、照射室1内雰囲気の冷却にも兼
用されればよい。
Of course, the cooling pipe 13 may also be provided on the suction body 9 side, and the cooling pipe 13 may be attached to the blowout body 8 so as to meander on the surface of the current plate 12. Further, the cooling pipe 13 may be used not only for cooling the inert gas from the blowing body 8 but also for cooling the atmosphere inside the irradiation chamber 1.

そして吹出体8と吸込体9のそれぞれは、搬送
路の上面に、かつ相対的に電子線照射器6の両側
に位置するようにそれぞれの整流板12を相対さ
せて配置され、しかも吹出体8と吸込体9間の不
活性ガスの送流方向が搬送路の搬送方向と逆とな
るように配置される。
Each of the blowing body 8 and the suction body 9 is disposed on the upper surface of the conveyance path, with the respective rectifying plates 12 facing each other so as to be located on both sides of the electron beam irradiator 6, and the blowing body 8 The suction body 9 is arranged so that the direction of flow of inert gas between the suction body 9 and the suction body 9 is opposite to the direction of conveyance of the conveyance path.

以下第3図によつて搬出口4部分の構成を説明
する。搬出口4の下縁部16には一体に枠材17
が固着されており、この枠材17の内面に基部1
8がネジ19止めされ合成ゴム材よりなるシール
部材20が取り付けられている。このシール部材
20はその上部においてローラ5に弾力的に密接
する。その際の弾力度合は、搬送のためのローラ
5の回転を妨げぬ程度で、かつ回転の際に連続し
てローラ5に当接する程度に設計される。搬入口
3側にもほぼ上記と同様にしてシール部材20が
取り付けられるもので、それぞれのシール部材2
0の取り付けによつて、搬入口3、搬出口4はと
もにその下半部が閉ざされる。
The construction of the discharge port 4 will be described below with reference to Fig. 3. A frame member 17 is integrally formed at the lower edge 16 of the discharge port 4.
The base 1 is fixed to the inner surface of the frame 17.
8 is secured by a screw 19, and a seal member 20 made of synthetic rubber is attached. The upper part of this seal member 20 elastically contacts the roller 5. The degree of elasticity is designed so as not to impede the rotation of the roller 5 for conveyance, and so as to continuously contact the roller 5 during rotation. A seal member 20 is attached to the carry-in entrance 3 side in a manner similar to that described above, and each seal member 2
By installing 0, the lower halves of both the loading entrance 3 and the loading exit 4 are closed.

なおシール部材20としては、ローラ5面を傷
付けないものとしてブラシ状のもの、またローラ
5が鏡面ローラである場合はドクターブレード状
のものを用いればよく、ドクターブレード状のも
のを用いた際には厳密にはローラとブレード間に
数ミクロンの間隔が保たれる。
As the sealing member 20, a brush-like material may be used so as not to damage the surface of the roller 5, and if the roller 5 is a mirror roller, a doctor blade-like material may be used. Strictly speaking, a spacing of several microns is maintained between the roller and the blade.

以下この装置の電子線照射時の動作を説明す
る。
The operation of this device during electron beam irradiation will be explained below.

それぞれのローラ5が回転されることによつて
フイルム2は矢印A方向に進み、電子線照射器6
の照射窓7の下方を通過する際に電子線が照射さ
れる。上記の動作の際、吹出体8のノズル穴14
から不活性ガスである、例えばN2ガスが常温
(10℃〜30℃程度)において吹き出され、このN2
ガスは整流板12によつて整流され、かつ水の連
通される冷却パイプ13によつて冷却される。そ
の際のN2ガスの吹出し速度は例えば1〜5m/
秒とされる。整流されることによつて層流構成と
なつたN2ガスは、フイルム2を冷却しながら送
流されて吸込体9に至つて吸込まれる。
As each roller 5 is rotated, the film 2 advances in the direction of arrow A, and the electron beam irradiator 6
The electron beam is irradiated when passing under the irradiation window 7 of the electron beam. During the above operation, the nozzle hole 14 of the blowing body 8
An inert gas such as N 2 gas is blown out at room temperature (approximately 10°C to 30°C), and this N 2
The gas is rectified by a rectifier plate 12 and cooled by a cooling pipe 13 through which water is communicated. The blowing speed of N2 gas at that time is, for example, 1 to 5 m/
Seconds. The N 2 gas, which has a laminar flow configuration by being rectified, is sent while cooling the film 2 and is sucked into the suction body 9 .

フイルム2はその移動に伴なつて室外より搬入
口3を通してO2ガスを一体に照射室1内に流入
しようとするが、N2ガスの送流方向が搬送路の
搬送方向と逆とされているので、O2ガスの流入
がN2ガスによつて妨げられ、搬入口3のフイル
ム2上面位置からのO2ガスの流入量は減少され
る。またN2ガスの送流方向がフイルム2の搬送
方向とはほぼ平行で逆に構成されているので、フ
イルム2の塗膜面にN2ガスが吹きつけられるこ
とが少なく、従つて塗膜面を荒らすことを防止で
きる。更に、被照射物がフイルム状であるので、
N2ガスの吹きつけによつてバタつきが生じやす
いところを、N2ガスの送流方向とフイルム2の
搬送方向がほぼ平行に構成されているので、バタ
つきを防止でき、搬送をスムースに行うことがで
きる。
As the film 2 moves, O 2 gas tries to flow into the irradiation chamber 1 from the outside through the entrance 3, but the direction of the N 2 gas is opposite to the direction of transport of the transport path. Therefore, the inflow of O 2 gas is blocked by the N 2 gas, and the amount of O 2 gas inflow from the upper surface of the film 2 at the entrance 3 is reduced. In addition, since the direction of flow of the N 2 gas is almost parallel to and opposite to the direction of conveyance of the film 2, the N 2 gas is rarely blown onto the coating surface of the film 2, and therefore the coating surface can be prevented from vandalizing. Furthermore, since the object to be irradiated is in the form of a film,
The N 2 gas flow direction and the transport direction of the film 2 are configured to be almost parallel, which prevents flapping and allows for smooth transport. It can be carried out.

一方搬入口3と搬出口4のそれぞれの下半部
は、ローラ5が回転しても常時シール部材20に
よつて閉鎖されているので、その部分からのO2
ガスの侵入は防止される。照射室1内のフイルム
2より上方の空間はN2ガスの吹出しによる充填
のため高圧となり、これによつて相対的にフイル
ム2の下方の空間が負圧となつてO2ガスの流入
が容易となるが、シール部材20がその流入を妨
げる。
On the other hand, the lower halves of each of the loading inlet 3 and the unloading outlet 4 are always closed by the sealing member 20 even when the roller 5 rotates, so O 2 from these parts is kept closed.
Gas intrusion is prevented. The space above the film 2 in the irradiation chamber 1 is filled with high pressure by blowing out N 2 gas, and as a result, the space below the film 2 becomes relatively negative pressure, making it easy for O 2 gas to flow in. However, the seal member 20 prevents the inflow.

第4図はこの考案の他実施例を示し、このもの
では吸込体9によつて吸い込まれる高温となつた
N2ガスが、冷却循環利用される構成とされてい
る。
FIG. 4 shows another embodiment of this invention, in which the high temperature is sucked by the suction body 9.
The structure is such that N 2 gas is used for cooling and circulation.

すなわち、このものはフイルム2の電子線照射
される部分の下方に位置するキヤツチヤー31に
冷却管21が配管されており、この冷却管21の
一部と熱交換器22で吸込体9からの不活性ガス
パイプ23が熱交換され、冷却されたN2ガスは
再び吹出体8から照射室1内に充填される構成と
されている。24は酸素吸収手段で、再充填され
る前にO2ガスを除去する。25はポンプである。
That is, in this device, a cooling pipe 21 is installed in a catcher 31 located below the part of the film 2 that is irradiated with the electron beam, and a part of the cooling pipe 21 and a heat exchanger 22 are used to remove waste from the suction body 9. The active gas pipe 23 undergoes heat exchange, and the cooled N 2 gas is again filled into the irradiation chamber 1 from the blower 8. 24 is an oxygen absorption means to remove O 2 gas before being refilled. 25 is a pump.

この実施例においてはさらにN2ガス供給源2
6からの給気管10途中に流量制御バルブ27、
流量計28を配置するとともに照射室1内に酸素
濃度計29を配置し、照射室1内の酸素濃度が所
定レベル以上になつた際にコントローラ30の指
令によつて流量制御バルブ27が開かれてN2
スの供給量が増大される。すなわちN2ガス濃度
の自動調整機構を備える構成とされている。
In this embodiment, the N2 gas supply source 2
Flow control valve 27 in the middle of the air supply pipe 10 from 6,
A flow meter 28 is disposed, and an oxygen concentration meter 29 is disposed within the irradiation chamber 1, and when the oxygen concentration within the irradiation chamber 1 reaches a predetermined level or higher, the flow control valve 27 is opened by a command from the controller 30. The amount of N2 gas supplied is increased. In other words, it is configured to include an automatic adjustment mechanism for N 2 gas concentration.

上記それぞれの実施例においては、被照射物で
あるフイルム2の搬送路は搬入口3、搬出口4に
位置して設けられるローラ5によつて直線的に形
成されたが、もちろん多数個のローラ5使用して
層流を構成する不活性ガスによつて被照射物の冷
却が効果的になされ、その結果良質の製品が得ら
れるとともに不活性ガスも節約されるものであ
る。
In each of the above embodiments, the transport path for the film 2, which is the object to be irradiated, is formed linearly by the rollers 5 located at the entrance 3 and the exit 4, but of course there are many rollers. 5. The inert gas used to form a laminar flow effectively cools the irradiated object, resulting in a product of good quality and saving inert gas.

(ト) 考案の効果 本願考案によれば、不活性ガスを被照射物の搬
送方向とは逆方向に流すと共に、シール部材を搬
入口側では照射室外に、搬出口側では照射室内に
それぞれ搬送ローラの順方向にて配設することに
よつて、被照射物の搬入に伴う空気の流入が防止
できると共に不活性ガスの漏れを防止でき、更に
照射室の下方部分が負圧状態であつてもO2ガス
の流入を防止でき、それによつて塗膜などの被照
射物に対する電子線照射を効果ある(満足な硬化
膜が得られる)ものにすることができる。また
N2ガスの送流方向がフイルムの搬送方向とはほ
ぼ平行で逆に構成されているので、フイルムの塗
膜面にN2ガスが吹きつけられることが少なく、
従つて塗膜面を荒らすことを防止できる。更に、
被照射物がフイルム状であるので、N2ガスの吹
きつけによつてバタつきが生じやすいところを、
N2ガスの送流方向とフイルムの搬送方向がほぼ
平行に構成されているので、バタつきを防止で
き、搬送をスムースに行うことができる。
(g) Effect of the invention According to the invention of the present application, the inert gas is caused to flow in the opposite direction to the direction in which the object to be irradiated is transported, and the sealing member is transported outside the irradiation chamber at the entrance and into the irradiation chamber at the exit. By arranging the rollers in the forward direction, it is possible to prevent air from entering when the object to be irradiated is brought in, and also to prevent inert gas from leaking. It is also possible to prevent the inflow of O 2 gas, thereby making electron beam irradiation of objects such as paint films more effective (satisfactory cured films can be obtained). Also
Since the flow direction of the N 2 gas is almost parallel to and opposite to the film transport direction, the N 2 gas is less likely to be blown onto the coating surface of the film.
Therefore, it is possible to prevent the coating surface from becoming rough. Furthermore,
Since the object to be irradiated is in the form of a film, the parts that are likely to flutter due to the blowing of N 2 gas are
Since the N 2 gas flow direction and the film transport direction are configured to be substantially parallel, flapping can be prevented and transport can be carried out smoothly.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の装置の実施例構成図、第2
図は吹出体を示す実施例斜視図、第3図は搬出口
部分の実施例斜視図、第4図はこの考案の装置の
他実施例構成図である。 1……照射室、2……フイルム(被照射物)、
3……搬入口、4……搬出口、5……搬送用ロー
ラ、6……電子線照射器、8……吹出体(不活性
ガスの供給体)、9……吸込体、12……整流板、
16……下縁部(縁部)、20……シール部材。
Figure 1 is a configuration diagram of an embodiment of the device of this invention;
FIG. 3 is a perspective view of an embodiment of the blowing body, FIG. 3 is a perspective view of the outlet portion of the embodiment, and FIG. 4 is a structural diagram of another embodiment of the device of this invention. 1... Irradiation chamber, 2... Film (irradiated object),
3... Carrying inlet, 4... Carrying out port, 5... Conveying roller, 6... Electron beam irradiator, 8... Blowing body (inert gas supply body), 9... Suction body, 12... rectifier,
16... lower edge (edge), 20... sealing member.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 両側に電子線のフイルム状被照射物2の搬入口
3・搬出口4を有する照射室1と、照射室1に配
置される電子線照射器6と、照射室1のフイルム
状被照射物2の搬入口3・搬出口4の近傍にそれ
ぞれ配置され電子線照射器6に相対するフイルム
状被照射物2の搬送路を形成するための搬送ロー
ラ5,5と、不活性ガスを照射室1内へフイルム
状被照射物2の搬送方向とはほぼ平行で逆方向に
流すべく供給する不活性ガス供給機構8,9とか
らなり、さらにそれぞれの搬送ローラ5,5の下
部と照射室1のフイルム状被照射物の搬入口3・
搬出口4の縁部との間に不活性ガスの流出を防止
するための弾性体からなるシール部材20,20
を備え、かつそのシール部材20,20が搬入口
3側では照射室1外に、搬出口4側では照射室1
内にそれぞれ搬送ローラ5,5の順方向にて配設
されてなる電子線照射装置。
An irradiation chamber 1 having an inlet 3 and an outlet 4 for an electron beam film-like irradiated object 2 on both sides, an electron beam irradiator 6 disposed in the irradiation chamber 1, and a film-like irradiated object 2 in the irradiation chamber 1. Conveyance rollers 5, 5 are arranged near the inlet 3 and outlet 4 of the irradiation chamber 1, respectively, to form a conveyance path for the film-like irradiation object 2 facing the electron beam irradiator 6, and inert gas is supplied to the irradiation chamber 1. It consists of inert gas supply mechanisms 8 and 9 that supply the film-like irradiation object 2 to the inside in a direction substantially parallel to and opposite to the direction of conveyance. Inlet 3 for film-like irradiated objects
Seal members 20, 20 made of an elastic body to prevent inert gas from flowing out between the edges of the outlet 4
and the sealing members 20, 20 are placed outside the irradiation chamber 1 on the loading port 3 side and outside the irradiating chamber 1 on the loading port 4 side.
The electron beam irradiation device is arranged in the forward direction of the transport rollers 5, 5, respectively.
JP1986013805U 1986-01-31 1986-01-31 Expired - Lifetime JPH0523261Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986013805U JPH0523261Y2 (en) 1986-01-31 1986-01-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986013805U JPH0523261Y2 (en) 1986-01-31 1986-01-31

Publications (2)

Publication Number Publication Date
JPS62126279U JPS62126279U (en) 1987-08-11
JPH0523261Y2 true JPH0523261Y2 (en) 1993-06-15

Family

ID=30803213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986013805U Expired - Lifetime JPH0523261Y2 (en) 1986-01-31 1986-01-31

Country Status (1)

Country Link
JP (1) JPH0523261Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS547022A (en) * 1977-06-10 1979-01-19 Bosch Gmbh Robert Device of distributing fuel for internal combustion engine

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS547022A (en) * 1977-06-10 1979-01-19 Bosch Gmbh Robert Device of distributing fuel for internal combustion engine

Also Published As

Publication number Publication date
JPS62126279U (en) 1987-08-11

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