JPH0522376B2 - - Google Patents
Info
- Publication number
- JPH0522376B2 JPH0522376B2 JP63292203A JP29220388A JPH0522376B2 JP H0522376 B2 JPH0522376 B2 JP H0522376B2 JP 63292203 A JP63292203 A JP 63292203A JP 29220388 A JP29220388 A JP 29220388A JP H0522376 B2 JPH0522376 B2 JP H0522376B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- reactive gas
- pair
- electrodes
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63292203A JPH01157520A (ja) | 1988-11-18 | 1988-11-18 | プラズマ気相反応方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63292203A JPH01157520A (ja) | 1988-11-18 | 1988-11-18 | プラズマ気相反応方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57163730A Division JPS5952835A (ja) | 1982-09-20 | 1982-09-20 | プラズマ気相反応装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01157520A JPH01157520A (ja) | 1989-06-20 |
JPH0522376B2 true JPH0522376B2 (enrdf_load_stackoverflow) | 1993-03-29 |
Family
ID=17778864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63292203A Granted JPH01157520A (ja) | 1988-11-18 | 1988-11-18 | プラズマ気相反応方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01157520A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW237562B (enrdf_load_stackoverflow) | 1990-11-09 | 1995-01-01 | Semiconductor Energy Res Co Ltd | |
JP3255942B2 (ja) | 1991-06-19 | 2002-02-12 | 株式会社半導体エネルギー研究所 | 逆スタガ薄膜トランジスタの作製方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5578524A (en) * | 1978-12-10 | 1980-06-13 | Shunpei Yamazaki | Manufacture of semiconductor device |
JPS5731130A (en) * | 1980-07-31 | 1982-02-19 | Matsushita Electric Ind Co Ltd | Method and device for plasma chemical vapour deposition |
-
1988
- 1988-11-18 JP JP63292203A patent/JPH01157520A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH01157520A (ja) | 1989-06-20 |
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