JPH0521988B2 - - Google Patents
Info
- Publication number
- JPH0521988B2 JPH0521988B2 JP28306486A JP28306486A JPH0521988B2 JP H0521988 B2 JPH0521988 B2 JP H0521988B2 JP 28306486 A JP28306486 A JP 28306486A JP 28306486 A JP28306486 A JP 28306486A JP H0521988 B2 JPH0521988 B2 JP H0521988B2
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- processing apparatus
- plasma processing
- aperture plate
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 17
- 238000005192 partition Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 238000010926 purge Methods 0.000 claims description 4
- 239000007769 metal material Substances 0.000 description 9
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28306486A JPS63137168A (ja) | 1986-11-29 | 1986-11-29 | マイクロ波プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28306486A JPS63137168A (ja) | 1986-11-29 | 1986-11-29 | マイクロ波プラズマ処理装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13394890A Division JPH0317273A (ja) | 1990-05-25 | 1990-05-25 | マイクロ波プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63137168A JPS63137168A (ja) | 1988-06-09 |
| JPH0521988B2 true JPH0521988B2 (enrdf_load_stackoverflow) | 1993-03-26 |
Family
ID=17660735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28306486A Granted JPS63137168A (ja) | 1986-11-29 | 1986-11-29 | マイクロ波プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63137168A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07116593B2 (ja) * | 1988-05-19 | 1995-12-13 | 日本電信電話株式会社 | 薄膜形成装置 |
| JPH0379421U (enrdf_load_stackoverflow) * | 1989-12-01 | 1991-08-13 |
-
1986
- 1986-11-29 JP JP28306486A patent/JPS63137168A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63137168A (ja) | 1988-06-09 |
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