JPH0521951A - Copper foil for copper-clad laminate - Google Patents

Copper foil for copper-clad laminate

Info

Publication number
JPH0521951A
JPH0521951A JP3201455A JP20145591A JPH0521951A JP H0521951 A JPH0521951 A JP H0521951A JP 3201455 A JP3201455 A JP 3201455A JP 20145591 A JP20145591 A JP 20145591A JP H0521951 A JPH0521951 A JP H0521951A
Authority
JP
Japan
Prior art keywords
copper
copper foil
foil
clad laminate
drum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3201455A
Other languages
Japanese (ja)
Inventor
Shin Kawakami
伸 川上
Nagatoshi Hosokawa
長利 細川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon CMK Corp
CMK Corp
Eneos Corp
Original Assignee
Nippon CMK Corp
CMK Corp
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon CMK Corp, CMK Corp, Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon CMK Corp
Priority to JP3201455A priority Critical patent/JPH0521951A/en
Priority to GB9204809A priority patent/GB2257714A/en
Publication of JPH0521951A publication Critical patent/JPH0521951A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/111Pads for surface mounting, e.g. lay-out
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1152Replicating the surface structure of a sacrificial layer, e.g. for roughening
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To enable strength and reliability when mounting electronic parts whose lengths are reduced and capacities are increased on a copper-clad laminate. CONSTITUTION:A copper foil 2 is joined to an insulation plate 3, thus forming a copper-clad laminate 1. A non-joined surface with the insulation plate 3 of the copper foil 2 is roughened. The copper foil is roughened by forming fine recessed and projecting portions on a drum surface at a raw foil production process and then performing transfer from the drum surface or by performing soft etching of the raw foil surface. The copper foil has fine recessed and projecting portions due to roughening and its surface area is increased, thus enabling the copper foil to be suited for a high-density mounting of electronic parts.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はプリント配線板の原板と
なる銅張積層板において、絶縁層に積層される銅箔に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper clad laminate, which is a base plate of a printed wiring board, and a copper foil laminated on an insulating layer.

【0002】[0002]

【従来の技術】プリント配線板は銅張積層板に感光性イ
ンキ塗布、回路パターン露光、現像、エッチング、ソル
ダーレジスト塗布などの種々の処理を施すことにより製
造され、電子部品はこのプリント配線板の接合ランドに
リードを接触させ、半田付けすることにより実装され
る。このプリント配線板の原板となる銅張積層板は、ベ
ークライトやガラスエポキシ樹脂からなる絶縁板に銅箔
を熱圧着するか、あるいは紙フェノールからなる絶縁板
に銅箔を接着することにより構成されている。かかる銅
張積層板の銅箔の製造は高純度の電線スクラップを硫酸
に溶解して銅イオン溶液とし、この銅イオン溶液を電気
分解することにより行われている。電気分解に際しては
表面がRa=0.43μm程度に調整されたドラムを陰
極とし、このドラムを銅イオン溶液中で回転しながら表
面に金属銅を電着させると共に、電着した銅箔をドラム
から連続的に剥離することによりロール状の生箔を成形
する。そして、この生箔における剥離側の面が非接合
面、反対側が接合面となるように絶縁板に積層して銅張
積層板とする。なお、かかる積層にあっては銅箔の接合
面に酸化銅を付着させて絶縁板との接着性の確保を行っ
ている。図5はこのようにして製造された銅張積層板を
示し、基板52上の銅箔51の表面(非接合面)がRa
=0.43μm程度の均一面となっている。
2. Description of the Related Art A printed wiring board is manufactured by subjecting a copper clad laminate to various treatments such as photosensitive ink application, circuit pattern exposure, development, etching, and solder resist application. It is mounted by bringing leads into contact with the joint land and soldering. The copper-clad laminate, which is the base plate for this printed wiring board, is formed by thermocompression bonding a copper foil to an insulating plate made of bakelite or glass epoxy resin, or by bonding a copper foil to an insulating plate made of paper phenol. There is. The copper foil of such a copper clad laminate is manufactured by dissolving high-purity electric wire scrap in sulfuric acid to form a copper ion solution and electrolyzing the copper ion solution. During electrolysis, a drum whose surface was adjusted to Ra = 0.43 μm was used as a cathode, and while this drum was rotated in a copper ion solution, metallic copper was electrodeposited on the surface and the electrodeposited copper foil was removed from the drum. Roll-shaped green foil is formed by continuously peeling. Then, the raw foil is laminated on an insulating plate such that the surface on the peeling side is the non-bonding surface and the surface on the opposite side is the bonding surface to form a copper clad laminate. In this lamination, copper oxide is adhered to the bonding surface of the copper foil to secure the adhesiveness with the insulating plate. FIG. 5 shows the copper clad laminate manufactured in this way, and the surface (non-bonding surface) of the copper foil 51 on the substrate 52 is Ra.
Is a uniform surface of about 0.43 μm.

【0003】[0003]

【発明が解決しようとする課題】ところで、プリント配
線板に実装される電子部品としては、デスクリート部品
よりもチップ部品が多くなる傾向にあり、しかも面実装
されるチップ部品の割合が多くなっている。一方、この
チップ部品は近年、短小化、大容量化されており、これ
に伴ってこれらのチップ部品の実装および電気的接続を
行うプリント配線板の接合ランドおよび回路も小さくな
っている。しかしながら、従来のプリント配線板の原板
となる銅張積層板の銅箔の表面が均一面であり、単位面
積当たりの接合ランドや回路の表面積を一定以上とする
ことができない。このため電子部品の実装強度や接続強
度に限界があり、これらの信頼性が低下していた。
By the way, as electronic components mounted on a printed wiring board, chip components tend to be more numerous than discrete components, and the ratio of surface-mounted chip components is also large. There is. On the other hand, in recent years, the chip parts have been made smaller and larger in capacity, and along with this, the joint lands and circuits of the printed wiring board for mounting and electrically connecting these chip parts have become smaller. However, the surface of the copper foil of the copper clad laminate, which is the original plate of the conventional printed wiring board, is a uniform surface, and the surface area of the bonding land and the circuit per unit area cannot be made constant or more. For this reason, the mounting strength and connection strength of electronic parts are limited, and the reliability of these parts is reduced.

【0004】本発明は、上記事情を考慮してなされたも
のであり、短小化、大容量化された電子部品であっても
信頼性のある強度で実装および接続することができるプ
リント配線板とするための銅張積層板用銅箔を提供する
ことを目的とする。
The present invention has been made in consideration of the above circumstances, and a printed wiring board that can be mounted and connected with reliable strength even for an electronic component having a short size and a large capacity. It is an object of the present invention to provide a copper foil for a copper-clad laminate for the purpose.

【0005】[0005]

【課題を解決するための手段および作用】本発明の銅張
積層板用銅箔は絶縁板との非接合面を粗化して微細な凹
凸を形成したことを特徴とする。
The copper foil for copper-clad laminate of the present invention is characterized in that the non-bonding surface with the insulating plate is roughened to form fine irregularities.

【0006】このように、銅箔の表面に微細な凹凸を形
成することにより、その後の処理で形成される接合ラン
ドの表面積が増大するため、電子部品の実装強度および
接続強度を大きくすることができ、信頼性が向上する。
By forming fine irregularities on the surface of the copper foil as described above, the surface area of the bonding land formed by the subsequent processing is increased, so that the mounting strength and connection strength of the electronic component can be increased. It is possible and reliability is improved.

【0007】この場合、生箔製造工程のドラム表面に微
細な凹凸を形成しておき、生箔製造時に凹凸を転写して
も良く、これにより、銅箔の製造と同時に凹凸を形成す
ることができる。
In this case, fine irregularities may be formed on the surface of the drum during the raw foil manufacturing process, and the irregularities may be transferred during the production of the raw foil, whereby the irregularities can be formed simultaneously with the production of the copper foil. it can.

【0008】また、生箔表面をソフトエッチングして凹
凸を形成しても良く、この場合は凹凸形成の調整、管理
が容易となる。
Further, the surface of the green foil may be soft-etched to form the unevenness, and in this case, the adjustment and management of the unevenness are facilitated.

【0009】[0009]

【実施例1】図2は、本発明の一実施例の銅箔の製造工
程を示す。銅原料21として電気銅と同程度の純度の電
線スクラップを使用し,この銅原料21を硫酸で溶解し
てイオン化させることにより、硫酸銅溶液22とする。
この硫酸銅溶液22にドラム23を陰極として浸漬させ
る。陽極24は銅板、鉛板、チタン板などが使用され、
ドラム23を回転しながら電気分解して、ドラム23表
面に金属銅を電着させる。ドラム23表面に付着した銅
箔25はドラム23の回転に伴って連続的に剥離され
る。図3はドラム23を示し、その表面23aには微細
な凹凸が形成されている。この凹凸はドラム表面をエッ
チング、研磨等することにより形成され、Ra=0.5
〜1.0μm程度の深さまたは高さとなっている。従っ
て、このドラム23の表面23aに電着した銅箔25に
おける少なくとも表面(ドラム側の面)には同程度(R
a=0.5〜1.0μm)の微細な凹凸が転写される。
このようにしてドラム23から剥離された銅箔はロール
状の生箔26となり、ロール状態から順次、引き出され
てトリートメントが行われる。図2において27はトリ
ートメント槽であり、複数の槽が連設して形成され、各
槽を通過することにより、絶縁板との接着力を保つため
の酸化銅の付着、表面への耐熱性の付与のための障壁層
の付着、防錆被膜処理等が行われる。このトリートメン
ト槽27を通過した銅箔25は接着剤塗布ローラ29を
通過して、裏面に接着剤28が塗布され、その後、乾燥
機30で乾燥される。そしてカッター31によって切断
が行われることにより、シート状の銅箔2となる。かか
る銅箔2は絶縁板との非接合面となる表面が粗化されて
微細な凹凸を有しており、裏面に塗布された接着剤によ
りベークライト,ガラスエポキシ樹脂,紙フェノールな
どの絶縁板に積層されて銅張積層板が製造される。
[Embodiment 1] FIG. 2 shows a manufacturing process of a copper foil according to an embodiment of the present invention. As the copper raw material 21, an electric wire scrap having a purity similar to that of electrolytic copper is used, and the copper raw material 21 is dissolved in sulfuric acid to be ionized to form a copper sulfate solution 22.
The drum 23 is immersed in this copper sulfate solution 22 as a cathode. A copper plate, a lead plate, a titanium plate or the like is used for the anode 24,
Electrolysis is performed while rotating the drum 23, and metal copper is electrodeposited on the surface of the drum 23. The copper foil 25 attached to the surface of the drum 23 is continuously peeled off as the drum 23 rotates. FIG. 3 shows the drum 23, on the surface 23a of which fine irregularities are formed. This unevenness is formed by etching or polishing the drum surface, and Ra = 0.5.
The depth or height is about 1.0 μm. Therefore, at least the surface (the surface on the drum side) of the copper foil 25 electrodeposited on the surface 23a of the drum 23 has the same degree (R
Fine irregularities (a = 0.5 to 1.0 μm) are transferred.
The copper foil thus peeled off from the drum 23 becomes a roll-shaped raw foil 26, which is sequentially drawn out from the roll state and treated. In FIG. 2, 27 is a treatment tank, which is formed by connecting a plurality of tanks in series. By passing through each tank, adhesion of copper oxide for maintaining the adhesive strength with the insulating plate and heat resistance of the surface Adhesion of a barrier layer for application, rust preventive film treatment, etc. are performed. The copper foil 25 that has passed through the treatment tank 27 passes through the adhesive application roller 29, the adhesive 28 is applied to the back surface thereof, and then dried by the dryer 30. Then, the cutter 31 cuts the sheet-shaped copper foil 2. The surface of the copper foil 2 which is not joined to the insulating plate is roughened and has fine irregularities. The adhesive applied to the back surface of the copper foil 2 makes it an insulating plate such as bakelite, glass epoxy resin or paper phenol. The copper clad laminate is manufactured by laminating the copper clad laminates.

【0010】図1はこの銅張積層板1を示し、基板3の
上面に銅箔2が積層されて一体化されている。かかる銅
箔2の表面には、微細な凹凸が形成されており、この状
態で銅箔2表面への感光性インキの塗布、回路パターン
が露光,現像,エッチング,ソルダーレジスト塗布など
が行われて,プリント配線板が製造される。
FIG. 1 shows this copper-clad laminate 1, in which a copper foil 2 is laminated and integrated on the upper surface of a substrate 3. Fine irregularities are formed on the surface of the copper foil 2, and in this state, the photosensitive ink is applied to the surface of the copper foil 2, the circuit pattern is exposed, developed, etched, and solder resist is applied. The printed wiring board is manufactured.

【0011】図4はプリント配線板4を示し、銅箔から
なる接合ランド5および回路6、ソルダーレジスト7が
基板3上に形成されている。接合ランド5にはICなど
の電子部品(図示省略)が実装される一方、回路6には
電子部品のリードが接続される。これら実装および接続
は半田付けで行われるが、接合ランド5および回路6の
表面に微細な凹凸が形成されているため、これらの表面
積が増大している。このため半田付け時の接合強度が接
続強度が飛躍的に向上し、信頼性の高い実装を行うこと
ができる。しかも、凹凸による表面積が増大した分だ
け、微細化することができるため、高密度の回路とする
ことができる。このため100μmの微小幅の回路とし
ても、十分な信頼性を得ることができ、電子部品の高密
度化に対応することができる。さらには、プリント配線
板のパターンレジストやソルダーレジストなどのための
インキの密着力も増大するため、高性能とすることがで
きる。
FIG. 4 shows a printed wiring board 4, on which a bonding land 5 made of copper foil, a circuit 6, and a solder resist 7 are formed on a substrate 3. An electronic component (not shown) such as an IC is mounted on the bonding land 5, while a lead of the electronic component is connected to the circuit 6. The mounting and connection are performed by soldering, but the surface area of the bonding land 5 and the circuit 6 is increased because the surface of the bonding land 5 and the circuit 6 has fine irregularities. For this reason, the bonding strength at the time of soldering is dramatically improved, and highly reliable mounting can be performed. Moreover, since the surface area due to the unevenness can be increased, the size can be reduced, so that a high-density circuit can be obtained. Therefore, it is possible to obtain sufficient reliability even for a circuit having a very small width of 100 μm, and it is possible to cope with high density of electronic components. Furthermore, the adhesion of the ink for the pattern resist or the solder resist of the printed wiring board is increased, so that high performance can be achieved.

【0012】上記実施例では、銅箔への微細な凹凸を生
箔工程のドラムの表面から転写したが、本発明では生箔
工程後の銅箔にソフトエッチング処理することにより粗
化して微細な凹凸を銅箔の表面に形成することができ
る。下記処方AおよびBはこのソフトエッチングにそれ
ぞれ使用することができるエッチング剤である。
In the above-mentioned embodiment, the fine irregularities on the copper foil were transferred from the surface of the drum in the raw foil process, but in the present invention, the copper foil after the raw foil process is roughened by a soft etching treatment to be fine. Unevenness can be formed on the surface of the copper foil. The following formulations A and B are etching agents that can be used in this soft etching, respectively.

【0013】 処方A 濃度98%(W/W)の硫酸 100cc/l 過硫酸ナトリウムまたは過硫酸アンモニウム 120〜90g/l 水 1l中の残分 処方B 濃度98%(W/W)の硫酸 8〜16cc/l 過酸化水素 6〜12cc/l 水 1l中の残分[0013] Prescription A   Sulfuric acid with a concentration of 98% (W / W) 100 cc / l   Sodium persulfate or ammonium persulfate 120-90 g / l   Residue in 1 liter of water Prescription B   Sulfuric acid with a concentration of 98% (W / W) 8-16 cc / l   Hydrogen peroxide 6-12 cc / l   Residue in 1 liter of water

【0014】このような処方のエッチング剤に対し、銅
箔を15〜30秒浸漬することにより、表面の粗化を行
うことができ、銅箔の表面全体にRa=0.3〜1.0
μmの微細な凹凸で形成することができる。なお、かか
るソフトエッチングはトリートメント工程以前の銅箔に
対して行うものである。このようなソフトエッチングに
よる銅箔の表面粗化では、前記実施例の作用に加えてエ
ッチング剤の処方、浸漬時間等を調整することにより、
任意の大きさの凹凸を形成することができるため、目的
に応じた粗化を行うことができるメリットがある。
The surface of the copper foil can be roughened by immersing the copper foil in the etching agent having such a formulation for 15 to 30 seconds, and Ra = 0.3 to 1.0 on the entire surface of the copper foil.
It can be formed with fine asperities of μm. The soft etching is performed on the copper foil before the treatment process. In the surface roughening of the copper foil by such soft etching, by adjusting the prescription of the etching agent, the immersion time, etc. in addition to the action of the above-mentioned example,
Since it is possible to form irregularities of any size, there is an advantage that roughening can be performed according to the purpose.

【0015】[0015]

【発明の効果】本発明は接合ランドや回路となるための
銅箔の表面を粗化して微細な凹凸を形成することによ
り、表面積を増大させたため、電子部品の実装の信頼性
が向上すると共に、高密度の電子部品の実装にも適用す
ることができる。
According to the present invention, since the surface area is increased by roughening the surface of the copper foil for forming the bonding land and the circuit to form fine irregularities, the reliability of the mounting of electronic parts is improved and It can also be applied to mounting high-density electronic components.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の銅箔が積層された銅張積層板の断面
図。
FIG. 1 is a cross-sectional view of a copper clad laminate in which the copper foil of the present invention is laminated.

【図2】本発明の銅箔の製造工程の説明図。FIG. 2 is an explanatory view of a manufacturing process of the copper foil of the present invention.

【図3】銅箔の生箔を製造するドラムの斜視図。FIG. 3 is a perspective view of a drum for producing a raw copper foil.

【図4】本発明の銅張積層板により製造されたプリント
配線板の断面図。
FIG. 4 is a cross-sectional view of a printed wiring board manufactured from the copper clad laminate of the present invention.

【図5】従来の銅張積層板の断面図。FIG. 5 is a sectional view of a conventional copper-clad laminate.

【符号の説明】[Explanation of symbols]

1 銅張積層板 2 銅箔 3 基板 4 プリント配線板 1 Copper clad laminate 2 copper foil 3 substrates 4 printed wiring board

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 絶縁板に積層される銅箔において、前記
絶縁板との非接合面を粗化して微細な凹凸を形成したこ
とを特徴とする銅張積層板用銅箔。
1. A copper foil to be laminated on an insulating plate, wherein a non-bonding surface to the insulating plate is roughened to form fine irregularities, and a copper foil for a copper-clad laminated plate.
【請求項2】 前記凹凸は生箔製造工程のドラム表面に
微細な凹凸を形成することにより、ドラム表面から転写
されることを特徴とする請求項1記載の銅張積層板用銅
箔。
2. The copper foil for copper-clad laminate according to claim 1, wherein the irregularities are transferred from the drum surface by forming fine irregularities on the drum surface in the raw foil manufacturing process.
【請求項3】 前記凹凸は生箔表面をソフトエッチング
して形成することを特徴とする請求項1記載の銅張積層
板用銅箔。
3. The copper foil for a copper-clad laminate according to claim 1, wherein the unevenness is formed by soft etching the surface of the green foil.
JP3201455A 1991-07-16 1991-07-16 Copper foil for copper-clad laminate Pending JPH0521951A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP3201455A JPH0521951A (en) 1991-07-16 1991-07-16 Copper foil for copper-clad laminate
GB9204809A GB2257714A (en) 1991-07-16 1992-03-04 Treated copper foil for copper laminated board of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3201455A JPH0521951A (en) 1991-07-16 1991-07-16 Copper foil for copper-clad laminate

Publications (1)

Publication Number Publication Date
JPH0521951A true JPH0521951A (en) 1993-01-29

Family

ID=16441379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3201455A Pending JPH0521951A (en) 1991-07-16 1991-07-16 Copper foil for copper-clad laminate

Country Status (2)

Country Link
JP (1) JPH0521951A (en)
GB (1) GB2257714A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10988388B2 (en) 2017-12-04 2021-04-27 Share Light Co., Ltd. Sterilizing apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5552234A (en) * 1993-03-29 1996-09-03 Japan Energy Corporation Copper foil for printed circuits
EP1796446B1 (en) * 1996-11-20 2011-05-11 Ibiden Co., Ltd. Printed circuit board

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5268971A (en) * 1975-12-05 1977-06-08 Hitachi Chemical Co Ltd Method of pretreating adhesion of multiple layers of multiilayer printed circuit board
US4073699A (en) * 1976-03-01 1978-02-14 Hutkin Irving J Method for making copper foil
US4113576A (en) * 1976-06-17 1978-09-12 Hutkin Irving J Method of making a thin-copper foil-carrier composite
GB8333753D0 (en) * 1983-12-19 1984-01-25 Thorpe J E Dielectric boards
JPH07832B2 (en) * 1987-01-23 1995-01-11 日本電解株式会社 Copper foil for printed circuit and manufacturing method thereof
JP2990676B2 (en) * 1987-06-23 1999-12-13 グールド エレクトロニクス インコーポレイテッド Cathode surface treatment for electroforming metal foil or strip
JPH0828404B2 (en) * 1990-03-27 1996-03-21 日立電線株式会社 TAB tape carrier and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10988388B2 (en) 2017-12-04 2021-04-27 Share Light Co., Ltd. Sterilizing apparatus

Also Published As

Publication number Publication date
GB2257714A (en) 1993-01-20
GB9204809D0 (en) 1992-04-15

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