JPH052142B2 - - Google Patents
Info
- Publication number
- JPH052142B2 JPH052142B2 JP60158744A JP15874485A JPH052142B2 JP H052142 B2 JPH052142 B2 JP H052142B2 JP 60158744 A JP60158744 A JP 60158744A JP 15874485 A JP15874485 A JP 15874485A JP H052142 B2 JPH052142 B2 JP H052142B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- film
- forming
- uneven surface
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 34
- 238000005530 etching Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 239000012780 transparent material Substances 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Optical Integrated Circuits (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158744A JPS6218561A (ja) | 1985-07-17 | 1985-07-17 | 凹凸面形成方法 |
CA000504383A CA1270934A (en) | 1985-03-20 | 1986-03-18 | Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings |
DE8686400592T DE3687845T2 (de) | 1985-03-20 | 1986-03-20 | Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern. |
EP86400592A EP0195724B1 (en) | 1985-03-20 | 1986-03-20 | Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings |
US06/841,801 US4806442A (en) | 1985-03-20 | 1986-03-20 | Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158744A JPS6218561A (ja) | 1985-07-17 | 1985-07-17 | 凹凸面形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6218561A JPS6218561A (ja) | 1987-01-27 |
JPH052142B2 true JPH052142B2 (ko) | 1993-01-11 |
Family
ID=15678386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60158744A Granted JPS6218561A (ja) | 1985-03-20 | 1985-07-17 | 凹凸面形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6218561A (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR900002964B1 (en) * | 1987-05-08 | 1990-05-03 | Korea Electronics Telecomm | Making method for adiffraiction grating |
JP2730893B2 (ja) * | 1987-06-24 | 1998-03-25 | 三菱電機株式会社 | 回折格子製造方法 |
-
1985
- 1985-07-17 JP JP60158744A patent/JPS6218561A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6218561A (ja) | 1987-01-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |