JPH052119B2 - - Google Patents
Info
- Publication number
- JPH052119B2 JPH052119B2 JP59273693A JP27369384A JPH052119B2 JP H052119 B2 JPH052119 B2 JP H052119B2 JP 59273693 A JP59273693 A JP 59273693A JP 27369384 A JP27369384 A JP 27369384A JP H052119 B2 JPH052119 B2 JP H052119B2
- Authority
- JP
- Japan
- Prior art keywords
- slit
- zone plate
- optical axis
- ray
- control signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 36
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 6
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 claims description 4
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000005469 synchrotron radiation Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Spectrometry And Color Measurement (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59273693A JPS61153550A (ja) | 1984-12-27 | 1984-12-27 | X線分光器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59273693A JPS61153550A (ja) | 1984-12-27 | 1984-12-27 | X線分光器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61153550A JPS61153550A (ja) | 1986-07-12 |
JPH052119B2 true JPH052119B2 (enrdf_load_stackoverflow) | 1993-01-11 |
Family
ID=17531235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59273693A Granted JPS61153550A (ja) | 1984-12-27 | 1984-12-27 | X線分光器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61153550A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010230481A (ja) * | 2009-03-27 | 2010-10-14 | Fujitsu Ltd | 試料分析装置及び試料分析方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7191311B2 (ja) * | 2018-03-05 | 2022-12-19 | 国立大学法人徳島大学 | 集光機能を有する分光素子を利用した分光装置 |
CN110133709B (zh) * | 2019-06-06 | 2022-06-14 | 中国工程物理研究院激光聚变研究中心 | 类δ响应软X射线能谱仪 |
CN114295082B (zh) * | 2021-12-10 | 2024-01-26 | 散裂中子源科学中心 | 一种基于近场散斑的曲面波前与面形高精度检测方法 |
-
1984
- 1984-12-27 JP JP59273693A patent/JPS61153550A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010230481A (ja) * | 2009-03-27 | 2010-10-14 | Fujitsu Ltd | 試料分析装置及び試料分析方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS61153550A (ja) | 1986-07-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69225915T2 (de) | Abbildungseinrichtung mit einer Vorrichtung zur Detektion eines Fokussierfehlers und/oder einer Verkantung | |
DE69228338T2 (de) | Ausrichtvorrichtung | |
JP3064433B2 (ja) | 位置合わせ装置およびそれを備えた投影露光装置 | |
NL8101776A (nl) | Werkwijze en inrichting voor het in lijn brengen van een masker en een wafelplak. | |
JPH0348705A (ja) | 位置検出装置 | |
US4948983A (en) | Alignment of mask and semiconductor wafer using linear fresnel zone plate | |
TW201535065A (zh) | 微影系統 | |
NL8601278A (nl) | Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. | |
JP2756331B2 (ja) | 間隔測定装置 | |
JPH052119B2 (enrdf_load_stackoverflow) | ||
JP2926325B2 (ja) | 走査露光方法 | |
JPH0694515A (ja) | 光発散特性測定装置 | |
JPH0360367B2 (enrdf_load_stackoverflow) | ||
EP0163743B1 (en) | Monochromator | |
JP3143514B2 (ja) | 面位置検出装置及びこれを有する露光装置 | |
JP2556126B2 (ja) | 間隔測定装置及び間隔測定方法 | |
JP2827251B2 (ja) | 位置検出装置 | |
US2071952A (en) | Sound film apparatus | |
JPH021503A (ja) | 位置検出装置 | |
JP2546356B2 (ja) | 位置合わせ装置 | |
JP2517638B2 (ja) | 位置検出装置 | |
JPH07111377B2 (ja) | ポリクロメ−タ− | |
JP2833145B2 (ja) | 位置検出装置 | |
JP3211246B2 (ja) | 投影露光装置及び素子製造方法 | |
JPH02167405A (ja) | 位置検出装置 |