JPH0519832B2 - - Google Patents

Info

Publication number
JPH0519832B2
JPH0519832B2 JP59146402A JP14640284A JPH0519832B2 JP H0519832 B2 JPH0519832 B2 JP H0519832B2 JP 59146402 A JP59146402 A JP 59146402A JP 14640284 A JP14640284 A JP 14640284A JP H0519832 B2 JPH0519832 B2 JP H0519832B2
Authority
JP
Japan
Prior art keywords
thin film
cds
cdse
heat treatment
cdcl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59146402A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6124285A (ja
Inventor
Kosuke Ikeda
Yoichi Harada
Mikihiko Nishitani
Toshio Yamashita
Noboru Yoshigami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59146402A priority Critical patent/JPS6124285A/ja
Publication of JPS6124285A publication Critical patent/JPS6124285A/ja
Publication of JPH0519832B2 publication Critical patent/JPH0519832B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/125—The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe

Landscapes

  • Light Receiving Elements (AREA)
JP59146402A 1984-07-13 1984-07-13 光導電性薄膜の製造方法 Granted JPS6124285A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59146402A JPS6124285A (ja) 1984-07-13 1984-07-13 光導電性薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59146402A JPS6124285A (ja) 1984-07-13 1984-07-13 光導電性薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS6124285A JPS6124285A (ja) 1986-02-01
JPH0519832B2 true JPH0519832B2 (enrdf_load_stackoverflow) 1993-03-17

Family

ID=15406887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59146402A Granted JPS6124285A (ja) 1984-07-13 1984-07-13 光導電性薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6124285A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07110711B2 (ja) * 1986-10-23 1995-11-29 三田工業株式会社 給紙装置
JP2658078B2 (ja) * 1987-10-12 1997-09-30 松下電器産業株式会社 光センサの製造方法

Also Published As

Publication number Publication date
JPS6124285A (ja) 1986-02-01

Similar Documents

Publication Publication Date Title
JPH0519832B2 (enrdf_load_stackoverflow)
JPH0476223B2 (enrdf_load_stackoverflow)
EP0047651B1 (en) Method of producing image sensor
US4614891A (en) Photoconductive target of image pickup tube
JPH0133955B2 (enrdf_load_stackoverflow)
JPH08330232A (ja) カルコパイライト構造半導体薄膜の製造装置及びその製造方法
JPH0510833B2 (enrdf_load_stackoverflow)
JPH058593B2 (enrdf_load_stackoverflow)
JPS6047752B2 (ja) 擦像管タ−ゲット
JPH0510832B2 (enrdf_load_stackoverflow)
JPS59121119A (ja) 強誘電体薄膜の製造方法
US4608514A (en) Photoconductive target of the image pickup tube
JPS61248572A (ja) 光導電性薄膜の製造方法
JP3206760B2 (ja) 真空蒸着用ｋセル
JPH082916A (ja) カルコパイライト薄膜の製造方法および製造装置
JPS6163067A (ja) 光導電性薄膜の製造方法
JPS6212676B2 (enrdf_load_stackoverflow)
RU2020635C1 (ru) Испаритель для получения фоточувствительных слоев
JPS6138627B2 (enrdf_load_stackoverflow)
JPS62149176A (ja) 光センサの製造方法
JPH0310094B2 (enrdf_load_stackoverflow)
Imamura et al. Amorphous Silicon Image Pickup Devices
JPH0482066B2 (enrdf_load_stackoverflow)
JPS638747A (ja) 長波長光用電子写真感光体の製造方法
JPS63205969A (ja) 非晶質シリコン薄膜デバイス