JPH0519302B2 - - Google Patents

Info

Publication number
JPH0519302B2
JPH0519302B2 JP57032065A JP3206582A JPH0519302B2 JP H0519302 B2 JPH0519302 B2 JP H0519302B2 JP 57032065 A JP57032065 A JP 57032065A JP 3206582 A JP3206582 A JP 3206582A JP H0519302 B2 JPH0519302 B2 JP H0519302B2
Authority
JP
Japan
Prior art keywords
substrate
bias
electrode
insulating
substrate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57032065A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58148428A (ja
Inventor
Nobuyuki Hayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57032065A priority Critical patent/JPS58148428A/ja
Publication of JPS58148428A publication Critical patent/JPS58148428A/ja
Publication of JPH0519302B2 publication Critical patent/JPH0519302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H10P14/60—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
JP57032065A 1982-03-01 1982-03-01 絶縁膜形成方法 Granted JPS58148428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57032065A JPS58148428A (ja) 1982-03-01 1982-03-01 絶縁膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57032065A JPS58148428A (ja) 1982-03-01 1982-03-01 絶縁膜形成方法

Publications (2)

Publication Number Publication Date
JPS58148428A JPS58148428A (ja) 1983-09-03
JPH0519302B2 true JPH0519302B2 (member.php) 1993-03-16

Family

ID=12348474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57032065A Granted JPS58148428A (ja) 1982-03-01 1982-03-01 絶縁膜形成方法

Country Status (1)

Country Link
JP (1) JPS58148428A (member.php)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5342398A (en) * 1976-09-30 1978-04-17 Hitachi Metals Ltd Method of manufacturing multiicrystal garnet
JPS5711813A (en) * 1980-06-23 1982-01-21 Matsushita Electric Ind Co Ltd Preparation of carbide film resistor

Also Published As

Publication number Publication date
JPS58148428A (ja) 1983-09-03

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