JPH0519250B2 - - Google Patents

Info

Publication number
JPH0519250B2
JPH0519250B2 JP58030835A JP3083583A JPH0519250B2 JP H0519250 B2 JPH0519250 B2 JP H0519250B2 JP 58030835 A JP58030835 A JP 58030835A JP 3083583 A JP3083583 A JP 3083583A JP H0519250 B2 JPH0519250 B2 JP H0519250B2
Authority
JP
Japan
Prior art keywords
etching
shadow mask
resist film
hole side
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58030835A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59158051A (ja
Inventor
Yasuhisa Ootake
Yutaka Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58030835A priority Critical patent/JPS59158051A/ja
Priority to US06/583,329 priority patent/US4565755A/en
Publication of JPS59158051A publication Critical patent/JPS59158051A/ja
Publication of JPH0519250B2 publication Critical patent/JPH0519250B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
JP58030835A 1983-02-28 1983-02-28 シヤドウマスクの製造方法 Granted JPS59158051A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58030835A JPS59158051A (ja) 1983-02-28 1983-02-28 シヤドウマスクの製造方法
US06/583,329 US4565755A (en) 1983-02-28 1984-02-24 Method of manufacturing shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58030835A JPS59158051A (ja) 1983-02-28 1983-02-28 シヤドウマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS59158051A JPS59158051A (ja) 1984-09-07
JPH0519250B2 true JPH0519250B2 (cg-RX-API-DMAC7.html) 1993-03-16

Family

ID=12314752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58030835A Granted JPS59158051A (ja) 1983-02-28 1983-02-28 シヤドウマスクの製造方法

Country Status (2)

Country Link
US (1) US4565755A (cg-RX-API-DMAC7.html)
JP (1) JPS59158051A (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4800840A (en) * 1986-09-24 1989-01-31 Rockwell International Corporation Method and apparatus for vapor stream discrimination
US4865953A (en) * 1987-09-28 1989-09-12 Rca Licensing Corp. Method for making a stencil with a borax-free, low-dichromate, casein photoresist composition
US5006432A (en) * 1987-10-28 1991-04-09 Kabushiki Kaisha Toshiba Method for manufacturing a shadow mask
JP2670835B2 (ja) * 1989-02-10 1997-10-29 日本シイエムケイ株式会社 微細パターン形成用エッチング方法とエッチング装置
US5484074A (en) * 1994-05-03 1996-01-16 Bmc Industries, Inc. Method for manufacturing a shadow mask
KR100796617B1 (ko) * 2006-12-27 2008-01-22 삼성에스디아이 주식회사 마스크 장치와 마스크 장치의 제조방법 및 이를 이용한유기전계발광표시장치의 제조방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2762149A (en) * 1953-04-27 1956-09-11 Buckbee Mears Co Method and apparatus for producing perforated metal webs
US3666462A (en) * 1969-03-28 1972-05-30 Zenith Radio Corp Process of screening a shadow mask color tube
US3676914A (en) * 1970-05-01 1972-07-18 Zenith Radio Corp Manufacture of shadow mask color picture tube
US4126510A (en) * 1977-10-06 1978-11-21 Rca Corporation Etching a succession of articles from a strip of sheet metal
JPS5579067A (en) * 1978-12-11 1980-06-14 Toshiba Corp Coating method and apparatus for photosensitive liquid
JPS612678Y2 (cg-RX-API-DMAC7.html) * 1979-12-27 1986-01-28
JPS5772232A (en) * 1980-10-22 1982-05-06 Toshiba Corp Production of shadow mask for color picture tube

Also Published As

Publication number Publication date
US4565755A (en) 1986-01-21
JPS59158051A (ja) 1984-09-07

Similar Documents

Publication Publication Date Title
US4339528A (en) Etching method using a hardened PVA stencil
US5730887A (en) Display apparatus having enhanced resolution shadow mask and method of making same
US3663997A (en) Method for making a kinescope comprising production and treatment of a temporary mask
JPS59158051A (ja) シヤドウマスクの製造方法
US3653901A (en) Color kinescope production with a temporary mask
US3707640A (en) Shadow mask having double-sized apertures
JPH01194232A (ja) シャドウマスクの製造方法
JPS6145530A (ja) カラ−ブラウン管螢光面の製造方法
US3787939A (en) Method of manufacturing shadow masks
JPH059755A (ja) 金属薄板への微細透孔形成方法
KR900001704B1 (ko) 슬롯형 구멍 새도우마스크의 제조방법
JP3171061B2 (ja) シャドウマスクの製造方法
JP2001325881A (ja) 透孔形成方法及び透孔形成装置
JPH09324285A (ja) 金属薄板への微細透孔形成方法
KR100337871B1 (ko) 칼라음극선관용섀도우마스크
JPH0447419B2 (cg-RX-API-DMAC7.html)
JP2000345373A (ja) 金属薄板への微細透孔形成方法及びシャドウマスクの製造方法
JPH04349328A (ja) カラー受像管用シャドウマスクの製造方法
KR930010667B1 (ko) 음극선관용 새도우 마스크의 제조방법
JPH01243335A (ja) シャドウマスクの製造方法
JPH06338254A (ja) シャドウマスクの製造方法
JPH0450388B2 (cg-RX-API-DMAC7.html)
JPH05135690A (ja) シヤドウマスクの製造方法
JPH02298283A (ja) シャドマスクの製造方法
JPS60187682A (ja) シヤドウマスクの製造方法