JPH0518414B2 - - Google Patents

Info

Publication number
JPH0518414B2
JPH0518414B2 JP8353285A JP8353285A JPH0518414B2 JP H0518414 B2 JPH0518414 B2 JP H0518414B2 JP 8353285 A JP8353285 A JP 8353285A JP 8353285 A JP8353285 A JP 8353285A JP H0518414 B2 JPH0518414 B2 JP H0518414B2
Authority
JP
Japan
Prior art keywords
work
pattern
version
pattern printing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8353285A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61241758A (ja
Inventor
Teruo Origasa
Shigeo Sumi
Hiroshi Taguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP60083532A priority Critical patent/JPS61241758A/ja
Publication of JPS61241758A publication Critical patent/JPS61241758A/ja
Publication of JPH0518414B2 publication Critical patent/JPH0518414B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Audible And Visible Signals (AREA)
JP60083532A 1985-04-18 1985-04-18 パタ−ン焼付制御用表示装置 Granted JPS61241758A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60083532A JPS61241758A (ja) 1985-04-18 1985-04-18 パタ−ン焼付制御用表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60083532A JPS61241758A (ja) 1985-04-18 1985-04-18 パタ−ン焼付制御用表示装置

Publications (2)

Publication Number Publication Date
JPS61241758A JPS61241758A (ja) 1986-10-28
JPH0518414B2 true JPH0518414B2 (OSRAM) 1993-03-11

Family

ID=13805103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60083532A Granted JPS61241758A (ja) 1985-04-18 1985-04-18 パタ−ン焼付制御用表示装置

Country Status (1)

Country Link
JP (1) JPS61241758A (OSRAM)

Also Published As

Publication number Publication date
JPS61241758A (ja) 1986-10-28

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