JPH0517879Y2 - - Google Patents
Info
- Publication number
- JPH0517879Y2 JPH0517879Y2 JP16288688U JP16288688U JPH0517879Y2 JP H0517879 Y2 JPH0517879 Y2 JP H0517879Y2 JP 16288688 U JP16288688 U JP 16288688U JP 16288688 U JP16288688 U JP 16288688U JP H0517879 Y2 JPH0517879 Y2 JP H0517879Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- boat
- load lock
- large number
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 235000012431 wafers Nutrition 0.000 claims description 68
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16288688U JPH0517879Y2 (US20020051482A1-20020502-M00012.png) | 1988-12-14 | 1988-12-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16288688U JPH0517879Y2 (US20020051482A1-20020502-M00012.png) | 1988-12-14 | 1988-12-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0282032U JPH0282032U (US20020051482A1-20020502-M00012.png) | 1990-06-25 |
| JPH0517879Y2 true JPH0517879Y2 (US20020051482A1-20020502-M00012.png) | 1993-05-13 |
Family
ID=31447121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16288688U Expired - Lifetime JPH0517879Y2 (US20020051482A1-20020502-M00012.png) | 1988-12-14 | 1988-12-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0517879Y2 (US20020051482A1-20020502-M00012.png) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0715729B2 (ja) * | 1987-10-02 | 1995-02-22 | キヤノン株式会社 | データ再生装置 |
| JP2696265B2 (ja) * | 1990-09-28 | 1998-01-14 | 株式会社半導体プロセス研究所 | 半導体装置の製造装置 |
| JPH04188721A (ja) * | 1990-11-22 | 1992-07-07 | Tokyo Electron Ltd | 縦型熱処理装置 |
| JP2947380B2 (ja) * | 1992-01-22 | 1999-09-13 | 東京応化工業株式会社 | プラズマ処理装置 |
| JP2682468B2 (ja) * | 1994-09-13 | 1997-11-26 | 日本電気株式会社 | 半導体装置の製造装置 |
| WO1996024949A1 (fr) * | 1995-02-10 | 1996-08-15 | Tokyo Electron Limited | Procede de traitement thermique et appareil |
| KR100203782B1 (ko) * | 1996-09-05 | 1999-06-15 | 윤종용 | 반도체 웨이퍼 열처리장치 |
-
1988
- 1988-12-14 JP JP16288688U patent/JPH0517879Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0282032U (US20020051482A1-20020502-M00012.png) | 1990-06-25 |
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