JPH05155694A - Optical waveguide material consisting of lithium niobate added with zinc and its production - Google Patents

Optical waveguide material consisting of lithium niobate added with zinc and its production

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Publication number
JPH05155694A
JPH05155694A JP32042391A JP32042391A JPH05155694A JP H05155694 A JPH05155694 A JP H05155694A JP 32042391 A JP32042391 A JP 32042391A JP 32042391 A JP32042391 A JP 32042391A JP H05155694 A JPH05155694 A JP H05155694A
Authority
JP
Japan
Prior art keywords
lithium niobate
optical waveguide
added
zinc oxide
lithium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32042391A
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Japanese (ja)
Other versions
JP2958408B2 (en
Inventor
Akira Terajima
彰 寺島
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Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
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Priority to JP32042391A priority Critical patent/JP2958408B2/en
Publication of JPH05155694A publication Critical patent/JPH05155694A/en
Application granted granted Critical
Publication of JP2958408B2 publication Critical patent/JP2958408B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To provide the optical waveguide material which is advantageous for use in a short wavelength region of <=500nm and has high resistance to optical damages, and the process for production of the material. CONSTITUTION:This optical waveguide material consisting of lithium niobate added with zinc and having an epitaxially grown layer is formed on a single crystal substrate consisting of lithium niobate by using a lithium niobate melt added with >=11mol% zinc oxide. The melt temp. is 940 to 860 deg.C and the growth speed is 1pm per minute. The propagation loss of the optical waveguide which is formed by epitaxial growth and has 10mum thickness is 2dB/cm after annealing for two hours. The optical waveguide by the epitaxial layer allows propagation of both TM mode and TE mode and the optical damages are not admitted even when an argon laser of 488nm is made incident at 1KW/cm<2> intensity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ニオブ酸リチウム結晶
を用いた光導波路デバイスにおいて、光誘起屈折率変化
(光損傷)を起こしやすい短波長領域、特に500nm
以下の波長領域を利用したデバイスに関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical waveguide device using a lithium niobate crystal in a short wavelength region where a photo-induced refractive index change (optical damage) is likely to occur, particularly 500 nm.
The present invention relates to devices using the following wavelength regions.

【0002】[0002]

【従来の技術】従来、ニオブ酸リチウム光導波路を形成
する方法として、イオン拡散法では金属チタンを蒸着し
拡散するチタン拡散法、安息香酸又はピロリン酸をプロ
トン源とするプロトン交換法がある。また、エピタキシ
ャル法ではマグネシウムを添加したニオブ酸リチウムに
無添加ニオブ酸リチウムをエピタキシャル成長させる方
法、又はタンタル酸リチウム基板上にニオブ酸リチウム
をエピタキシャル成長させる方法がある。
2. Description of the Related Art Conventionally, as a method for forming a lithium niobate optical waveguide, there are an ion diffusion method such as a titanium diffusion method in which metallic titanium is deposited and diffused, and a proton exchange method using benzoic acid or pyrophosphoric acid as a proton source. In the epitaxial method, there is a method of epitaxially growing undoped lithium niobate on lithium niobate to which magnesium is added, or a method of epitaxially growing lithium niobate on a lithium tantalate substrate.

【0003】[0003]

【発明が解決しようとする課題】上述のなかで、チタン
拡散法による光導波路の形成方法が最も多く用いられて
いるが、これにより得られる光導波路は、800nm以
上の長波長領域が使用範囲である。これ以下の波長領
域、特に500nm以下の波長領域では、強い光が入射
すると、チタン拡散導波路部分の屈折率が変化する、い
わゆる光損傷が顕著に起きる。プロトン交換法はこの光
損傷に強いが、プロトン交換部分では、異常光屈折率だ
けが増加する。そのため、異常光に対してのみの光導波
路であり、常光は導波しない欠点がある。
Among the above, the method of forming an optical waveguide by the titanium diffusion method is most often used, and the optical waveguide obtained by this method has a long wavelength region of 800 nm or more in a usable range. is there. In the wavelength region below this range, particularly in the wavelength region below 500 nm, when strong light is incident, the so-called optical damage in which the refractive index of the titanium diffusion waveguide portion is changed remarkably occurs. Although the proton exchange method is resistant to this optical damage, only the extraordinary light refractive index increases in the proton exchange part. Therefore, there is a drawback that the optical waveguide is only for extraordinary light and ordinary light is not guided.

【0004】一方、無添加のニオブ酸リチウムをエピタ
キシャル成長させた場合も、光損傷が顕著に起きる。そ
のために、マグネシウムを添加したニオブ酸リチウムが
試みられている。マグネシウムを5モル%添加すると、
無添加のニオブ酸リチウムと比較し、光損傷の耐性が1
00倍以上に増加することが報告されている(例えば、
D.A.Bryan, R.Crouson, H.E.Tomaschke, Appl.Phys.Let
t.44(1984)847〜849)。しかし、マグネシウムを添加し
たニオブ酸リチウムは、無添加のニオブ酸リチウムと比
べ常光屈折率、異常光屈折率ともに、添加量に伴って単
調減少する(例えば、佐藤、古川、応用物理学会結晶工
学分科会第93回研究会テキスト(1990,31〜38))。
On the other hand, even when undoped lithium niobate is epitaxially grown, optical damage occurs remarkably. Therefore, lithium niobate containing magnesium has been tried. When 5 mol% of magnesium is added,
Compared to non-added lithium niobate, the resistance to light damage is 1
It has been reported to increase more than 00 times (for example,
DABryan, R. Crouson, HETomaschke, Appl.Phys.Let
t. 44 (1984) 847-849). However, compared with undoped lithium niobate, both the ordinary and extraordinary refractive indices of magnesium-added lithium niobate monotonically decrease with the addition amount (for example, Sato, Furukawa, Japan Society of Applied Physics, Department of Crystal Engineering). The 93rd meeting of the society textbook (1990, 31-38)).

【0005】そのため、無添加ニオブ酸リチウム基板上
に、マグネシウム添加のニオブ酸リチウムをエピタキシ
ャル成長させても、エピタキシャル成長層の屈折率は基
板の屈折率より小さいので、光導波路とならない。そこ
で、マグネシウム添加ニオブ酸リチウムに比較して、常
光屈折率及び異常光屈折率が小さいタンタル酸リチウム
基板上に、マグネシウム添加ニオブ酸リチウムをエピタ
キシャル成長させることが行われている。しかし、タン
タル酸リチウムとニオブ酸リチウムは格子定数、熱膨張
係数が大きく異なるため、歪みの小さいエピタキシャル
層の形成は容易ではない。
Therefore, even if magnesium-added lithium niobate is epitaxially grown on a non-doped lithium niobate substrate, the refractive index of the epitaxial growth layer is smaller than the refractive index of the substrate, so that it does not serve as an optical waveguide. Therefore, as compared with magnesium-added lithium niobate, magnesium-added lithium niobate is epitaxially grown on a lithium tantalate substrate having a smaller ordinary light refractive index and extraordinary light refractive index. However, since lithium tantalate and lithium niobate have large differences in lattice constant and thermal expansion coefficient, it is not easy to form an epitaxial layer having a small strain.

【0006】本発明は、上記の事情に鑑み、常光、異常
光ともに導波し、しかも光損傷に強い光導波路を、エピ
タキシャル層により形成する光導波路材料及びその製造
方法の提供を目的としている。
In view of the above circumstances, the present invention has an object to provide an optical waveguide material in which an optical waveguide that guides both ordinary light and extraordinary light and is resistant to optical damage is formed by an epitaxial layer, and a method for manufacturing the same.

【0007】[0007]

【課題を解決するための手段】本発明の光導波路材料
は、ニオブ酸リチウム単結晶基板上に、酸化亜鉛を11
モル%以上添加したニオブ酸リチウム融液を用いてエピ
タキシャル成長させることによって形成せしめたエピタ
キシャル成長層を有することを特徴としている。
The optical waveguide material of the present invention comprises zinc oxide on a lithium niobate single crystal substrate.
It is characterized by having an epitaxial growth layer formed by performing epitaxial growth using a lithium niobate melt added at a mol% or more.

【0008】すなわち、本発明者は、光損傷に強い光導
波路材料を種々検討した結果、ニオブ酸リチウム融液に
酸化亜鉛を5モル%以上添加すると、光損傷に対する耐
性が向上し、特に10モル%以上添加すれば、光損傷に
対する耐性が100倍以上増加することを見いだすとと
もに、11モル%添加した場合は、常光屈折率と異常光
屈折率のどちらも、無添加のニオブ酸リチウムよりも大
きくなることを発見した。そうして、無添加のニオブ酸
リチウム基板上に、酸化亜鉛を11モル%以上添加した
ニオブ酸リチウムをエピタキシャル成長させれば、、そ
のエピタキシャル成長層に常光、異常光ともに導波し、
しかも光損傷に強い光導波路が形成できることを確認し
て、本発明を完成するに至った。以下、これを更に詳述
する。
That is, the present inventor has conducted various studies on optical waveguide materials resistant to optical damage. As a result, when zinc oxide of 5 mol% or more is added to the lithium niobate melt, the resistance to optical damage is improved, particularly 10 mol. %, It was found that the resistance to photodamage increased 100 times or more, and when 11 mol% was added, both the ordinary and extraordinary refractive indexes were higher than those of undoped lithium niobate. I found that. Then, if lithium niobate containing 11 mol% or more of zinc oxide is epitaxially grown on an undoped lithium niobate substrate, both ordinary light and extraordinary light are guided to the epitaxial growth layer,
Moreover, it was confirmed that an optical waveguide resistant to optical damage can be formed, and the present invention was completed. This will be described in more detail below.

【0009】[0009]

【作用】図1は、ニオブに対しリチウム組成が0.94
2の工業的に用いられているニオブ酸リチウム(LiN
bO3 )に、酸化亜鉛(ZnO)を様々な濃度で添加
し、その融液からチョコラルスキー法により育成した単
結晶の波長632.8nmにおける屈折率を、酸化亜鉛
の添加濃度に対して示したものである。図1に示すよう
に、常光屈折率は、酸化亜鉛の添加濃度の増加に伴っ
て、単調に増加する。一方、異常光屈折率は、5モル%
以下の領域において、酸化亜鉛の添加濃度の増加に伴い
減少している。しかし、5モル%以上の領域では、逆に
酸化亜鉛の添加濃度の増加に伴って異常光屈折率も増大
し、添加濃度11モル%では、無添加のニオブ酸リチウ
ムの異常光屈折率の値と等しくなる。そうして、添加濃
度11モル%以上では、添加した方が大きくなることが
分かる。
In FIG. 1, the lithium composition is 0.94 with respect to niobium.
2 industrially used lithium niobate (LiN
bO 3 ), zinc oxide (ZnO) was added at various concentrations, and the refractive index at a wavelength of 632.8 nm of a single crystal grown from the melt by the Czochralski method was shown with respect to the added concentration of zinc oxide. It is a thing. As shown in FIG. 1, the ordinary refractive index monotonically increases with an increase in the concentration of zinc oxide added. On the other hand, the extraordinary light refractive index is 5 mol%
In the following region, it decreases as the added concentration of zinc oxide increases. However, in the region of 5 mol% or more, on the contrary, the extraordinary light refractive index also increases with the increase of the added concentration of zinc oxide, and at the added concentration of 11 mol%, the value of the extraordinary optical refractive index of undoped lithium niobate is increased. Is equal to Then, it can be seen that the added amount becomes larger when the added concentration is 11 mol% or more.

【0010】図2は、ニオブに対しリチウム組成が0.
942の工業的に用いられているニオブ酸リチウム(L
iNbO3 )に、酸化亜鉛(ZnO)を様々な濃度で添
加し、その融液からチョコラルスキー法により育成した
単結晶について、波長488nmのアルゴン・レーザー
光に対する光誘起屈折率変化(光損傷)の時間依存性
を、酸化亜鉛の添加濃度をパラメータとし示したもので
ある。酸化亜鉛の添加濃度は、0(無添加),3,5,
7,10モル%と5段階に変化した。添加濃度が5モル
%以下では、酸化亜鉛を添加した効果はみられない。し
かし、それ以上の添加濃度では、光損傷に対する耐性が
増加して、添加濃度10モル%以上では、時間が経過し
ても屈折率変化はみられない。
FIG. 2 shows that when the lithium composition is 0.
942 industrially used lithium niobate (L
iNbO 3 ) was added with zinc oxide (ZnO) at various concentrations, and a single crystal grown from the melt by the Czochralski method was subjected to photoinduced refractive index change (photodamage) to an argon laser beam with a wavelength of 488 nm. The time dependence is shown with the added concentration of zinc oxide as a parameter. The added concentration of zinc oxide is 0 (no addition), 3, 5,
It changed to 7, 10 mol% and 5 steps. When the addition concentration is 5 mol% or less, the effect of adding zinc oxide is not seen. However, if the added concentration is higher than that, the resistance to optical damage increases, and if the added concentration is 10 mol% or higher, no change in the refractive index is observed over time.

【0011】上述のように、ニオブに対しリチウム組成
が0.942の工業的に用いられているニオブ酸リチウ
ム(LiNbO3 )に、酸化亜鉛(ZnO)を様々な濃
度で添加し、その融液からチョコラルスキー法により育
成した単結晶は、酸化亜鉛の添加濃度が11モル%以上
では、無添加のニオブ酸リチウムと比べて、常光屈折率
及び異常光屈折率が大きいばかりでなく、光損傷に対す
る耐性も大幅に向上する。したがって、工業的に用いら
れているニオブ酸リチウム基板上に、酸化亜鉛を11モ
ル%以上添加したニオブ酸リチウム融液を用いて、高屈
折率層をエピタキシャル成長させれば、常光、異常光と
もに導波し、しかも光損傷に強い光導波路を形成するこ
とができる。
As described above, zinc oxide (ZnO) is added at various concentrations to industrially used lithium niobate (LiNbO 3 ) having a lithium composition of 0.942 with respect to niobium, and a melt thereof is prepared. In the single crystal grown by the Czochralski method, when the concentration of zinc oxide added was 11 mol% or more, not only the ordinary and extraordinary refractive indices were higher than those of non-added lithium niobate, but also the optical damage to Resistance is also greatly improved. Therefore, if a high-refractive-index layer is epitaxially grown on a lithium niobate substrate that is industrially used, using a lithium niobate melt in which zinc oxide is added at 11 mol% or more, both ordinary light and extraordinary light can be conducted. It is possible to form an optical waveguide that is undulating and is resistant to optical damage.

【0012】[0012]

【実施例】ニオブに対しリチウム組成が0.942であ
るニオブ酸リチウムに、酸化亜鉛を13モル%添加し、
更にフラックスとしてバナジウム酸リチウム(LiVO
3 )を50モル%(ニオブと酸化亜鉛の総体を100と
したとき)添加して加熱し融液を準備した。ニオブに対
しリチウム組成が0.942であり、−Z軸を主面とし
たニオブ酸リチウム基板上に、この融液を用いてエピタ
キシャル成長させた。このとき、融液の温度は940℃
から860℃まで変化させ、成長速度は毎分1μmであ
った。
EXAMPLE 13 mol% of zinc oxide was added to lithium niobate having a lithium composition of 0.942 with respect to niobium,
Further, as a flux, lithium vanadate (LiVO
3 ) was added in an amount of 50 mol% (when the total amount of niobium and zinc oxide was 100) and heated to prepare a melt. The lithium composition was 0.942 with respect to niobium, and epitaxial growth was performed using this melt on a lithium niobate substrate whose main surface was the -Z axis. At this time, the temperature of the melt is 940 ° C.
To 860 ° C. and the growth rate was 1 μm / min.

【0013】エピタキシャル成長により形成された厚み
10μmの光導波路の伝搬損失は、30dB/cm以上
あったが、これをオゾン(O3 )中で2時間アニールす
ると、伝搬損失は2dB/cmに減少した。これはエピ
タキシャル層にわずかに含まれるバナジウムの価数が、
アニールにより3価から5価に変化したためと考えられ
る。また、エピタキシャル層による光導波路は、TMモ
ード、TEモードともに伝搬した。更に、波長488n
mのアルゴン・レーザーを1KW/cm2 の強度で入射
させても、光損失はみられなかった。
The propagation loss of the optical waveguide having a thickness of 10 μm formed by epitaxial growth was 30 dB / cm or more, but when this was annealed in ozone (O 3 ) for 2 hours, the propagation loss was reduced to 2 dB / cm. This is because the valence of vanadium contained in the epitaxial layer is
It is considered that the change from trivalent to pentavalent due to annealing. In the optical waveguide formed by the epitaxial layer, both TM mode and TE mode propagated. Furthermore, wavelength 488n
No light loss was observed even when an argon laser of m was incident at an intensity of 1 KW / cm 2 .

【0014】ニオブに対しリチウム組成が0.942で
あるニオブ酸リチウムに、酸化亜鉛を11モル%添加
し、更にフラックスとしてバナジウム酸リチウム(Li
VO3 )を50モル%(ニオブと酸化亜鉛の総体を10
0としたとき)添加して加熱し得た融液、また、ニオブ
に対しリチウム組成が0.942であるニオブ酸リチウ
ムに、酸化亜鉛を12モル%添加し、更にフラックスと
してバナジウム酸リチウム(LiVO3 )を50モル%
(ニオブと酸化亜鉛の総体を100としたとき)添加し
て加熱し得た融液を用いて、上述と同様な光導波路を形
成できた。
11 mol% of zinc oxide was added to lithium niobate having a lithium composition of 0.942 with respect to niobium, and lithium vanadate (Li) was used as a flux.
50 mol% of VO 3 (total amount of niobium and zinc oxide is 10
12 mol% of zinc oxide was added to the melt obtained by adding and heating, and to lithium niobate having a lithium composition of 0.942 with respect to niobium, and lithium vanadate (LiVO 4) was added as a flux. 3 ) 50 mol%
An optical waveguide similar to that described above could be formed by using the melt obtained by adding (when the total of niobium and zinc oxide was 100) and heating.

【0015】[0015]

【発明の効果】以上説明したように本発明による光導波
路材料は、チタンを拡散せず光損傷に強いので、短波長
領域での使用に有利である。また、エピタキシャル用の
基板としてニオブ酸リチウムを使用できるために、格子
歪の少ない光導波路が形成され、しかも、得られた光導
波路は常光、異常光ともに導波させることができる。
As described above, the optical waveguide material according to the present invention does not diffuse titanium and is resistant to optical damage, and is therefore advantageous for use in the short wavelength region. Further, since lithium niobate can be used as a substrate for epitaxial growth, an optical waveguide with less lattice distortion is formed, and the obtained optical waveguide can guide both ordinary light and extraordinary light.

【図面の簡単な説明】[Brief description of drawings]

【図1】ニオブ酸リチウムに添加した酸化亜鉛の濃度と
屈折率の関係を示す図である。
FIG. 1 is a diagram showing the relationship between the concentration of zinc oxide added to lithium niobate and the refractive index.

【図2】酸化亜鉛の添加濃度をパラメータとしニオブ酸
リチウムの光誘起屈折率変化量の時間依存性を示す図で
ある。
FIG. 2 is a diagram showing the time dependence of the amount of change in the light-induced refractive index of lithium niobate with the added concentration of zinc oxide as a parameter.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ニオブ酸リチウム単結晶基板上に、酸化
亜鉛を11モル%以上添加したニオブ酸リチウム融液を
用いてエピタキシャル成長させることによって形成せし
めたエピタキシャル成長層を有することを特徴とする亜
鉛添加ニオブ酸リチウム光導波路材料。
1. A zinc-added niobium layer having an epitaxial growth layer formed on a lithium-niobate single crystal substrate by epitaxial growth using a lithium niobate melt containing 11 mol% or more of zinc oxide. Lithium oxide optical waveguide material.
【請求項2】 ニオブ酸リチウムを基板とし、エピタキ
シャル法によりニオブ酸リチウムに酸化亜鉛を11モル
%以上添加したニオブ酸リチウム融液からエピタキシャ
ル成長層を成長させることを特徴とした光導波路材料の
製造方法。
2. A method for manufacturing an optical waveguide material, which comprises using lithium niobate as a substrate and growing an epitaxial growth layer from a lithium niobate melt obtained by adding 11 mol% or more of zinc oxide to lithium niobate by an epitaxial method. ..
JP32042391A 1991-12-04 1991-12-04 Zinc-doped lithium niobate optical waveguide material and method of manufacturing the same Expired - Lifetime JP2958408B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32042391A JP2958408B2 (en) 1991-12-04 1991-12-04 Zinc-doped lithium niobate optical waveguide material and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32042391A JP2958408B2 (en) 1991-12-04 1991-12-04 Zinc-doped lithium niobate optical waveguide material and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH05155694A true JPH05155694A (en) 1993-06-22
JP2958408B2 JP2958408B2 (en) 1999-10-06

Family

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