JPH05144965A - Package for containing electronic component - Google Patents

Package for containing electronic component

Info

Publication number
JPH05144965A
JPH05144965A JP3304527A JP30452791A JPH05144965A JP H05144965 A JPH05144965 A JP H05144965A JP 3304527 A JP3304527 A JP 3304527A JP 30452791 A JP30452791 A JP 30452791A JP H05144965 A JPH05144965 A JP H05144965A
Authority
JP
Japan
Prior art keywords
metal layer
solder
metallized
insulating substrate
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3304527A
Other languages
Japanese (ja)
Other versions
JP2750232B2 (en
Inventor
Soichi Obata
総一 小畑
Yoshihiro Hosoi
義博 細井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP3304527A priority Critical patent/JP2750232B2/en
Publication of JPH05144965A publication Critical patent/JPH05144965A/en
Application granted granted Critical
Publication of JP2750232B2 publication Critical patent/JP2750232B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Landscapes

  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Abstract

PURPOSE:To provide a package for containing an electronic component in which a cover is rigidly connected to an insulating base to normally and stably operate the component for a long period. CONSTITUTION:The package for containing an electronic component has an insulating base l and a cover 2, and connects the cover 2 to a metallized metal layer 8 covering the base 1 through a sealer 9 made of solder to contain the component therein. The surface of the layer 8 covering the base 1 is covered with a metal layer 10 made of nickel containing cobalt in such a manner that the concentration of cobalt in the layer 10 is gradually increased toward the surface to be connected with the solder from the surface of the layer 8. The layer 8 of the base 1 is solder-bonded to the cover 2 over a wide area to completely airtightly seal a vessel 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体素子や水晶振動
子、圧電振動子等の電子部品を収容する電子部品収納用
パッケージの改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component storage package for storing electronic components such as semiconductor elements, crystal oscillators, piezoelectric oscillators and the like.

【0002】[0002]

【従来の技術】従来、電子部品を収容する電子部品収納
用パッケージ、例えば半導体素子を収容するパッケージ
は酸化アルミニウム質焼結体等の電気絶縁材料から成
り、その上面の略中央部に半導体素子を収容するための
載置部を有し、且つ該載置部周辺から外部にかけて導出
されたタングステン、モリブデン、マンガン等の高融点
金属粉末から成るメタライズ配線層を有する絶縁基体
と、半導体素子を外部電気回路に電気的に接続するため
に前記メタライズ配線層に銀ロウ等のロウ材を介し取着
された外部リード端子と、金属製蓋体とから構成されて
おり、絶縁基体の半導体素子載置部に半導体素子を接着
材を介して載置固定し、半導体素子の各電極とメタライ
ズ配線層とをボンディングワイヤを介して電気的に接続
するとともに絶縁基体の上面に蓋体を半田から成る封止
材により接合させ、絶縁基体と蓋体とから成る容器の内
部に半導体素子を気密に封入することによって製品とし
ての半導体装置となる。
2. Description of the Related Art Conventionally, an electronic component housing package for housing electronic components, for example, a package for semiconductor elements, is made of an electrically insulating material such as aluminum oxide sintered body, and the semiconductor element is provided at the substantially central portion of its upper surface. A semiconductor element is provided with an insulating base having a mounting portion for accommodating and having a metallized wiring layer made of a high melting point metal powder such as tungsten, molybdenum, or manganese led out from the periphery of the mounting portion to the outside. An external lead terminal attached to the metallized wiring layer via a brazing material such as silver brazing for electrically connecting to a circuit and a metallic lid, and a semiconductor element mounting portion of an insulating substrate. A semiconductor element is mounted and fixed on the substrate with an adhesive, and each electrode of the semiconductor element and the metallized wiring layer are electrically connected via a bonding wire and an insulating substrate is formed. Are joined by a sealing material comprising a lid of solder on the upper surface, a semiconductor device as a product by encapsulating a semiconductor element hermetically in the interior of the container consisting of an insulating substrate and the lid.

【0003】尚、かかる従来の半導体素子収納用パッケ
ージは絶縁基体への蓋体の接合が、絶縁基体の蓋体と対
向する主面に予めタングステン、モリブデン、マンガン
等の高融点金属粉末から成るメタライズ金属層とニッケ
ルから成る金属層を被着させておき、絶縁基体のメタラ
イズ金属層に蓋体を半田を介し接合することによって行
われている。
In the conventional package for housing a semiconductor element, the lid is joined to the insulating substrate by metallizing a high melting point metal powder such as tungsten, molybdenum or manganese on the main surface of the insulating substrate facing the lid. This is done by depositing a metal layer and a metal layer made of nickel, and joining the lid to the metallized metal layer of the insulating substrate via solder.

【0004】また前記絶縁基体のメタライズ金属層に被
着させるニッケルから成る金属層はメタライズ金属層の
半田に対する濡れ性を良好なものとする作用を為し、メ
タライズ金属層上に従来周知のメッキ法により被着され
る。
The metal layer made of nickel, which is deposited on the metallized metal layer of the insulating substrate, serves to improve the wettability of the metallized metal layer with respect to solder, and the metallized metal layer is coated on the metallized metal layer by a well-known plating method. Be applied by.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、この従
来の電子部品収納用パッケージにおいては絶縁基体のメ
タライズ金属層に被着されているニッケルは半田に対し
濡れ性が良いものの半田の広がり性が悪いため、絶縁基
体のメタライズ金属層上に半田を介して蓋体を接合させ
る際、半田が絶縁基体のメタライズ金属層表面に十分に
広がらず、その結果、絶縁基体のメタライズ金属層と蓋
体との半田接合が部分的なものとなって容器の気密封止
の信頼性が大幅に低下し、内部に収容する電子部品を長
期間にわたり正常、且つ安定に作動させることができな
いという欠点を有していた。そこで上記欠点を解消する
ために絶縁基体のメタライズ金属層表面に被着させたニ
ッケルから成る金属層にコバルトを含有させ半田の広が
り性を改善することが考えられる。
However, in this conventional package for storing electronic parts, nickel deposited on the metallized metal layer of the insulating substrate has good wettability with respect to solder but poor spreadability of solder. When the lid is joined onto the metallized metal layer of the insulating substrate via the solder, the solder does not spread sufficiently on the surface of the metallized metal layer of the insulating substrate, and as a result, the solder between the metallized metal layer of the insulating substrate and the lid is soldered. There was a drawback that the reliability of the airtight sealing of the container was greatly reduced due to the partial bonding, and the electronic parts housed inside could not be operated normally and stably for a long period of time. .. Therefore, in order to solve the above-mentioned drawbacks, it is considered that cobalt is contained in the metal layer made of nickel deposited on the surface of the metallized metal layer of the insulating substrate to improve the spreadability of the solder.

【0006】しかしながら、ニッケルにコバルトを含有
させると半田の広がり性は改善されるものの半田に吸収
され易くなり、絶縁基体のメタライズ金属層上に半田を
介して蓋体を接合させるとメタライズ金属層表面のコバ
ルトを含有するニッケルが半田に吸収されて接合部に半
田と濡れ性、広がり性が悪いメタライズ金属層が露出
し、その結果、絶縁基体のメタライズ金属層に蓋体を強
固に接合させることができなくなるという欠点を誘発す
る。
However, although the spreadability of the solder is improved by containing cobalt in nickel, it is easily absorbed by the solder, and when the lid is bonded onto the metallized metal layer of the insulating substrate via the solder, the surface of the metallized metal layer is joined. The nickel containing cobalt of is absorbed by the solder, and the metallized metal layer having poor wettability and spreadability with the solder is exposed at the joint, and as a result, the lid can be firmly bonded to the metallized metal layer of the insulating substrate. Induces the drawback of not being able to.

【0007】[0007]

【発明の目的】本発明は上記欠点に鑑み案出されたもの
で、その目的は絶縁基体に蓋体を強固に接合させて内部
に収容する電子部品を長期間にわたり正常、且つ安定に
作動させることができる電子部品収納用パッケージを提
供することにある。
SUMMARY OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and an object of the present invention is to firmly join a lid to an insulating base and to operate electronic parts housed therein normally and stably for a long period of time. An object of the present invention is to provide a package for storing electronic components.

【0008】[0008]

【課題を解決するための手段】本発明は絶縁基体と蓋体
とから成り、絶縁基体に被着させたメタライズ金属層に
蓋体を半田から成る封止材を介し接合させることによっ
て内部に電子部品を収容するようになした電子部品収納
用パッケージであって、前記絶縁基体に被着させたメタ
ライズ金属層の表面にコバルトを含有したニッケルより
成る金属層を被着させるとともに該金属層のコバルト含
有濃度をメタライズ金属層表面より半田が接合される面
に向かって順次、濃くしたことを特徴とするものであ
る。
SUMMARY OF THE INVENTION The present invention comprises an insulating substrate and a lid, and the lid is joined to a metallized metal layer deposited on the insulating substrate through an encapsulant made of solder, so that the inside of the electronic component is electronically sealed. What is claimed is: 1. A package for accommodating electronic parts, comprising: depositing a metal layer made of nickel containing cobalt on a surface of a metallized metal layer deposited on the insulating base; and cobalt of the metal layer. It is characterized in that the content concentration is gradually increased from the surface of the metallized metal layer toward the surface to which the solder is joined.

【0009】[0009]

【実施例】次に本発明を添付図面に基づき詳細に説明す
る。図1 は本発明の電子部品収納用パッケージを半導体
素子を収容する半導体素子収納用パッケージを例にとっ
て説明するための断面図であり、1は電気絶縁材料から
成る絶縁基体、2は蓋体である。この絶縁基体1と蓋体
2とで半導体素子4を収容するための容器3が構成され
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view for explaining a semiconductor element housing package for housing a semiconductor element of the electronic component housing package of the present invention, in which 1 is an insulating base made of an electrically insulating material, and 2 is a lid. .. The insulating base 1 and the lid 2 form a container 3 for housing the semiconductor element 4.

【0010】前記絶縁基体1はその上面中央部に半導体
素子4を収容するための空所を形成する凹部1aが設けて
あり、該凹部1a底面には半導体素子4 がガラス、樹脂、
ロウ材等の接着材を介し取着される。
The insulating base 1 is provided with a recess 1a which forms a space for accommodating the semiconductor element 4 in the center of the upper surface thereof, and the semiconductor element 4 is provided on the bottom surface of the recess 1a with glass, resin,
It is attached via an adhesive material such as a brazing material.

【0011】前記絶縁基体1 は酸化アルミニウム質焼結
体、ムライト質焼結体、窒化アルミニウム質焼結体、炭
化珪素質焼結体等の電気絶縁材料から成り、例えば、酸
化アルミニウム質焼結体から成る場合、アルミナ(Al 2
O 3 ) 、シリカ(SiO2 ) 、マグネシア(MgO) 、カルシア
(CaO) 等の原料粉末に適当な有機溶剤、溶媒を添加混合
して泥漿状となすとともにこれをドクターブレード法を
採用することによってセラミックグリーンシート( セラ
ミック生シート) を形成し、しかる後、前記セラミック
グリーンシートに適当な打ち抜き加工を施すとともに複
数枚積層し、高温( 約1600℃) で焼成することによって
製作される。
The insulating substrate 1 is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, and a silicon carbide sintered body. Alumina (Al 2
O 3 ), silica (SiO 2 ), magnesia (MgO), calcia
(CaO) raw material powder such as a suitable organic solvent, the solvent is added and mixed to form a slurry and a doctor blade method is used to form a ceramic green sheet (ceramic green sheet). It is manufactured by performing appropriate punching processing on ceramic green sheets and stacking multiple sheets and firing at high temperature (about 1600 ° C).

【0012】また前記絶縁基体1 には凹部1a周辺より容
器3の外部にかけて導出するメタライズ配線層5 が形成
されており、該メタライズ配線層5 の凹部1a周辺部は半
導体素子4 の各電極がボンディングワイヤ6 を介して電
気的に接続され、また容器3の外部に導出された部位に
は外部電気回路と接続される外部リード端子7 が銀ロウ
等のロウ材を介し取着される。
A metallized wiring layer 5 extending from the periphery of the recess 1a to the outside of the container 3 is formed on the insulating base 1, and the electrodes of the semiconductor element 4 are bonded to the periphery of the recess 1a of the metallized wiring layer 5 by bonding. External lead terminals 7 that are electrically connected through wires 6 and that are connected to an external electric circuit are attached to a portion led out of the container 3 through a brazing material such as silver brazing.

【0013】前記メタライズ配線層5 はタングステン
(W) 、モリブデン(Mo)、マンガン(Mn)等の高融点金属粉
末から成り、該高融点金属粉末に適当な有機溶剤、溶媒
を添加混合して得た金属ペーストを従来周知のスクリー
ン印刷法等の厚膜手法を採用し、絶縁基体1 となるセラ
ミックグリーンシートに予め被着させておくことによっ
て絶縁基体1 の凹部1a周辺から容器3 の外部に導出する
よう被着形成される。
The metallized wiring layer 5 is made of tungsten.
(W), molybdenum (Mo), manganese (Mn) and other high-melting point metal powder, a suitable organic solvent to the high-melting point metal powder, a metal paste obtained by adding and mixing a solvent is a conventionally known screen printing method. A thick film method such as the above is adopted, and the ceramic green sheet to be the insulating substrate 1 is attached in advance so that it is attached and formed so as to be led out from the periphery of the recess 1a of the insulating substrate 1 to the outside of the container 3.

【0014】尚、前記メタライズ配線層5 はその露出す
る外表面にニッケル、金等の良導電性で、且つ耐蝕性に
優れた金属をメッキ法により1.0乃至20.0μm の厚みに
層着させておくとメタライズ配線層5の酸化腐食を有効
に防止することができるとともにメタライズ配線層5 と
ボンディングワイヤ6 との接続及びメタライズ配線層5
と外部リード端子7 とのロウ付け取着が極めて強固なも
のとなる。従って、メタライズ配線層5 の酸化腐食を防
止し、メタライズ配線層5 とボンディングワイヤ6 との
接続及びメタライズ配線層5 と外部リード端子7 とのロ
ウ付けを強固なものとなすにはメタライズ配線層5 の露
出外表面にニッケル、金等を1.0 乃至20.0μm の厚みに
層着させておくことが好ましい。
The metallized wiring layer 5 is formed by depositing a metal having good conductivity such as nickel and gold and excellent corrosion resistance to a thickness of 1.0 to 20.0 μm on the exposed outer surface by plating. It is possible to effectively prevent oxidative corrosion of the metallized wiring layer 5 and the connection between the metallized wiring layer 5 and the bonding wire 6, and the metallized wiring layer 5.
The brazing attachment between the external lead terminal 7 and the external lead terminal 7 becomes extremely strong. Therefore, in order to prevent oxidative corrosion of the metallized wiring layer 5, and to firmly connect the metallized wiring layer 5 and the bonding wire 6 and braze the metallized wiring layer 5 and the external lead terminal 7, the metallized wiring layer 5 It is preferable that nickel, gold or the like is layered on the exposed outer surface to a thickness of 1.0 to 20.0 μm.

【0015】また前記メタライズ配線層5 にロウ付けさ
れる外部リード端子7 は内部に収容する半導体素子4 を
外部電気回路に接続する作用を為し、外部リード端子7
を外部電気回路に接続することによって内部に収容され
る半導体素子4 はメタライズ配線層5 及び外部リード端
子7 を介し外部電気回路と電気的に接続されることとな
る。
The external lead terminals 7 brazed to the metallized wiring layer 5 have a function of connecting the semiconductor element 4 housed therein to an external electric circuit.
When the semiconductor element 4 is connected to an external electric circuit, the semiconductor element 4 housed inside is electrically connected to the external electric circuit via the metallized wiring layer 5 and the external lead terminal 7.

【0016】前記外部リード端子7 はコバール金属(Fe-
Ni-Co 合金) や42アロイ(Fe-Ni合金) 等の金属から成
り、コバール金属等のインゴット( 塊) を圧延加工法や
打ち抜き加工法等、従来周知の金属加工法を採用するこ
とによって所定の板状に形成される。
The external lead terminal 7 is made of Kovar metal (Fe-
Ni-Co alloy), 42 alloy (Fe-Ni alloy), etc., and the ingot (lump) of Kovar metal etc. is specified by adopting the well-known metal processing methods such as rolling and punching. Is formed into a plate shape.

【0017】尚、前記外部リード端子7 はその外表面に
ニッケル及び金をメッキ法により1.0 乃至20.0μm の厚
みに層着させておくと外部リード端子7 の酸化腐食を有
効に防止するとともに外部リード端子7 と外部電気回路
との電気的接続を良好となすことができる。そのため外
部リード端子7 はその外表面にニッケル及び金をメッキ
法により1.0 乃至20.0μm の厚みに層着させておくこと
が好ましい。
The outer lead terminal 7 is coated with nickel and gold on the outer surface by plating so as to have a thickness of 1.0 to 20.0 μm, so that the outer lead terminal 7 can be effectively prevented from being oxidized and corroded. Good electrical connection between the terminal 7 and the external electric circuit can be achieved. Therefore, it is preferable that the outer lead terminal 7 is layered on its outer surface with nickel and gold to a thickness of 1.0 to 20.0 μm by a plating method.

【0018】前記絶縁基体1 はまたその上面にメタライ
ズ金属層8が被着されており、該タングステン金属層8
には金属製蓋体2 が半田から成る封止材9 を介して接合
され、これによって容器3 の内部に半導体素子4 が気密
に封入される。
The insulating substrate 1 also has a metallized metal layer 8 deposited on the upper surface thereof, the tungsten metal layer 8
A metallic lid 2 is bonded to the via via a sealing material 9 made of solder, whereby the semiconductor element 4 is hermetically sealed inside the container 3.

【0019】前記絶縁基体1 の上面に被着させたメタラ
イズ金属層8 は、例えばタングステン、モリブデン、マ
ンガン等の高融点金属粉末から成り、該高融点金属粉末
に有機溶剤、溶媒を添加混合して得た金属ペーストを絶
縁基体1 となるセラミックグリーンシートに従来周知の
スクリーン印刷法等を採用することによって印刷塗布し
ておき、セラミックグリーンシートを高温で焼成し絶縁
基体1 となす際に同時に絶縁基体1 の上面に被着され
る。
The metallized metal layer 8 deposited on the upper surface of the insulating substrate 1 is made of a refractory metal powder such as tungsten, molybdenum, or manganese, and the refractory metal powder is mixed with an organic solvent or a solvent. The obtained metal paste is applied by printing onto a ceramic green sheet to be the insulating substrate 1 by adopting a conventionally known screen printing method or the like, and at the same time when the ceramic green sheet is fired at a high temperature to form the insulating substrate 1, the insulating substrate is formed. It is attached to the upper surface of 1.

【0020】また前記メタライズ金属層8 はその外表面
に、ニッケルにコバルトを含有させた金属より成る金属
層10が被着されており、該金属層10はメタライズ金属層
8 に蓋体2 を強固に接合させる作用を為す。
The metallized metal layer 8 has an outer surface coated with a metal layer 10 made of a metal containing nickel and cobalt. The metal layer 10 is a metallized metal layer.
It works to firmly attach the lid 2 to the 8.

【0021】更に前記メタライズ金属層8 に被着させた
金属層10はコバルトの含有濃度がメタライズ金属層8 の
表面から封止材9 の半田が接合される面に向かって順
次、濃くなっており、これによって絶縁基体1 のメタラ
イズ金属層8 に金属製蓋体2 を半田から成る封止材9 を
介して接合させる際、金属層10の外表面にはコバルトが
多量に含有されているため半田との濡れ性、広がり性が
良く、接合初期おいて半田をメタライズ金属層8 の接合
面全体に広がらせることができ、また接合が進むと金属
層10の外表面部が半田に吸収されるが、その吸収は金属
層10のコバルト含有量が徐々に少なくなり半田に吸収さ
れにくくなっていることから途中で停止され、接合面に
メタライズ金属層8 が直接露出するのを有効に防止する
ことができ、その結果、蓋体2 を絶縁基体1 のメタライ
ズ金属層8 上に広い面積で半田接合させ、蓋体2 を絶縁
基体1 に強固に接合させることが可能となる。
Further, the metal layer 10 deposited on the metallized metal layer 8 has a cobalt content concentration which gradually increases from the surface of the metallized metal layer 8 toward the surface to which the solder of the sealing material 9 is joined. As a result, when the metal lid 2 is joined to the metallized metal layer 8 of the insulating substrate 1 via the sealing material 9 made of solder, the outer surface of the metal layer 10 contains a large amount of cobalt. Has good wettability and spreadability with the solder, and the solder can be spread over the entire bonding surface of the metallized metal layer 8 at the initial stage of bonding, and when the bonding progresses, the outer surface of the metal layer 10 is absorbed by the solder. However, the absorption is stopped in the middle because the cobalt content of the metal layer 10 is gradually reduced and it is difficult to be absorbed by the solder, and it is possible to effectively prevent the metallized metal layer 8 from being directly exposed on the joint surface. Done, resulting in lid 2 It is possible to solder-bond to the metallized metal layer 8 of the insulating base 1 over a wide area, and to firmly bond the lid 2 to the insulating base 1.

【0022】尚、前記コバルトの含有濃度がメタライズ
金属層8 の表面から封止材の半田が接合される面に向か
って順次、濃くなっている金属層10は、絶縁基体1 のメ
タライズ金属層8 表面にまずニッケル及びニッケル コ
バルトをメッキ法により順次、被着させ、しかる後、こ
れを熱処理し、ニッケル コバルトのコバルトを下地の
ニッケルに拡散させていくことによって、或いは絶縁基
体1 のメタライズ金属層8 表面にニッケル コバルトを
電解メッキ法により被着させる際、電解メッキのための
電流密度を徐々に高くしコバルトの析出量を順次、多く
していくことによって形成される。
The metal layer 10 in which the cobalt content concentration is gradually increased from the surface of the metallized metal layer 8 toward the surface of the encapsulant to which the solder is bonded is the metallized metal layer 8 of the insulating substrate 1. First, nickel and nickel-cobalt are sequentially deposited on the surface by a plating method, and then heat-treated to diffuse cobalt of nickel-cobalt into the underlying nickel or the metallized metal layer 8 of the insulating substrate 1. When nickel-cobalt is deposited on the surface by electrolytic plating, it is formed by gradually increasing the current density for electrolytic plating and gradually increasing the amount of cobalt deposited.

【0023】また前記コバルトの含有濃度がメタライズ
金属層8 の表面から封止材の半田が接合される面に向か
って順次、濃くなっている金属層10はその外表面部のコ
バルト含有濃度を0.05乃至3.0 重量%としておくと蓋体
2 と絶縁基体1 に設けたメタライズ金属層8 とを広い面
積で半田接合させ、絶縁基体1 のメタライズ金属層8に
蓋体2 を極めて強固に接合させることができる。従っ
て、前記金属層10はその外表面部のコバルト含有濃度を
0.05乃至3.0 重量%としておくことが好ましい。
The metal content of the metal layer 10 is gradually increased from the surface of the metallized metal layer 8 toward the surface of the encapsulating material to which the solder is bonded, and the cobalt content concentration of the outer surface portion is 0.05. ~ 3.0% by weight lid
2 and the metallized metal layer 8 provided on the insulating base 1 can be solder-bonded over a wide area, and the lid 2 can be bonded to the metallized metal layer 8 of the insulating base 1 extremely firmly. Therefore, the metal layer 10 has a cobalt content concentration on its outer surface portion.
It is preferably set to 0.05 to 3.0% by weight.

【0024】また前記絶縁基体1 の上面に接合される蓋
体2 はコバール金属や42アロイ等の金属材料から成り、
絶縁基体1 に被着させたメタライズ金属層8 に半田から
成る封止材10を介し接合させることによって内部に半導
体素子4 を気密に封止する作用を為す。
The lid 2 bonded to the upper surface of the insulating base 1 is made of a metal material such as Kovar metal or 42 alloy.
By bonding the metallized metal layer 8 adhered to the insulating substrate 1 through the sealing material 10 made of solder, the semiconductor element 4 is hermetically sealed inside.

【0025】かくして本発明の半導体素子収納用パッケ
ージによれば絶縁基体1 の凹部1a底面に半導体素子4 を
接着材を介して載置固定するとともに該半導体素子の各
電極をボンディングワイヤ6 を介してメタライズ配線層
5 に電気的に接続し、しかる後、前記絶縁基体1 の上面
に蓋体2 を半田から成る封止材10を介して接合させ、絶
縁基体1 と蓋体2 とから成る容器3 内部に半導体素子4
を気密に封止することによって最終製品としての半導体
装置となる。
Thus, according to the package for accommodating semiconductor elements of the present invention, the semiconductor element 4 is mounted and fixed on the bottom surface of the recessed portion 1a of the insulating substrate 1 with an adhesive, and each electrode of the semiconductor element is bonded with a bonding wire 6. Metallized wiring layer
Then, the lid 2 is joined to the upper surface of the insulating base 1 through the sealing material 10 made of solder, and the semiconductor is placed inside the container 3 made up of the insulating base 1 and the lid 2. Element 4
Is hermetically sealed to form a semiconductor device as a final product.

【0026】尚、本発明は上述の実施例に限定されるも
のではなく、本発明の要旨を逸脱しない範囲であれば種
々の変更は可能であり、例えば上述の実施例では半導体
素子を収容する半導体素子収納用パッケージを例にとっ
て説明したが他の電子部品、例えば水晶振動子や圧電振
動子等を収容するパッケージにも適用し得、また上述の
実施例では蓋体2 にコバール金属等の金属材料を使用し
たが酸化アルミニウム質焼結体等の電気絶縁性材料を使
用してもよい。この場合、蓋体を絶縁基体1 に半田から
成る封止材を介して接合させる際、酸化アルミニウム質
焼結体は半田と接合しないことから蓋体2 の下面に予め
タングステン等から成るメタライズ金属層を被着させて
おき、これを絶縁基体1 に設けたメタライズ金属層8 に
半田接合させることになる。
The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the present invention. For example, in the above-mentioned embodiments, semiconductor elements are accommodated. Although the semiconductor element housing package has been described as an example, it can be applied to a package housing other electronic components such as a crystal oscillator or a piezoelectric oscillator, and in the above-described embodiment, the lid 2 is made of metal such as Kovar metal. Although the material is used, an electrically insulating material such as an aluminum oxide sintered body may be used. In this case, since the aluminum oxide sintered body is not joined to the solder when the lid body is joined to the insulating substrate 1 via the sealing material made of solder, the metallized metal layer made of tungsten or the like is previously formed on the lower surface of the lid body 2. Is adhered, and this is soldered to the metallized metal layer 8 provided on the insulating substrate 1.

【0027】[0027]

【発明の効果】本発明の電子部品収納用パッケージによ
れば絶縁基体に被着させたメタライズ金属層の表面にコ
バルトを含有したニッケルより成る金属層を被着させる
とともに該金属層のコバルト含有濃度をメタライズ金属
層表面より半田が接合される面に向かって順次、濃くし
たことから絶縁基体のメタライズ金属層に蓋体を半田か
ら成る封止材を介して接合させる際、蓋体を絶縁基体の
メタライズ金属層に広い面積で半田接合させることがで
き、その結果、絶縁基体のメタライズ金属層に蓋体を強
固に接合させて容器内部の気密封止を完全となし、内部
に収容する電子部品を長期間にわたって正常、且つ安定
に作動させることが可能となる。
According to the package for housing electronic parts of the present invention, a metal layer made of nickel containing cobalt is deposited on the surface of the metallized metal layer deposited on the insulating substrate, and the cobalt content concentration of the metal layer is deposited. When the lid is joined to the metallized metal layer of the insulating substrate through the sealing material made of solder, the lid is made thicker from the surface of the metallized metal layer toward the surface to which the solder is joined. The metallized metal layer can be soldered over a wide area, and as a result, the lid is firmly bonded to the metallized metal layer of the insulating substrate to completely hermetically seal the inside of the container, and the electronic components to be housed inside can be formed. It becomes possible to operate normally and stably for a long period of time.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電子部品収納用パッケージを半導体素
子を収容する半導体素子収納用パッケージを例にとって
説明する断面図である。
FIG. 1 is a cross-sectional view for explaining an electronic component storage package of the present invention by taking a semiconductor element storage package for storing a semiconductor element as an example.

【符号の説明】[Explanation of symbols]

1・・・・・絶縁基体 2・・・・・蓋体 3・・・・・容器 5・・・・・メタライズ配線層 7・・・・・外部リード端子 8・・・・・メタライズ金属層 9・・・・・封止材 10・・・・・金属層 1 ... Insulating substrate 2 ... Lid 3 ... Container 5 ... Metallized wiring layer 7 ... External lead terminal 8 ... Metallized metal layer 9 ... Sealing material 10 ... Metal layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】絶縁基体と蓋体とから成り、絶縁基体に被
着させたメタライズ金属層に蓋体を半田から成る封止材
を介し接合させることによって内部に電子部品を収容す
るようになした電子部品収納用パッケージであって、前
記絶縁基体に被着させたメタライズ金属層の表面にコバ
ルトを含有したニッケルより成る金属層を被着させると
ともに該金属層のコバルト含有濃度をメタライズ金属層
表面より半田が接合される面に向かって順次、濃くした
ことを特徴とする電子部品収納用パッケージ。
1. An electronic component is housed inside by comprising an insulating substrate and a lid, and joining the lid to a metallized metal layer adhered to the insulating substrate via a sealing material made of solder. In the package for housing electronic parts, a metal layer made of nickel containing cobalt is deposited on the surface of the metallized metal layer deposited on the insulating substrate, and the cobalt content concentration of the metal layer is adjusted to the metallized metal layer surface. A package for storing electronic components, characterized in that the solder is gradually darkened toward the surface to which the solder is bonded.
JP3304527A 1991-11-20 1991-11-20 Electronic component storage package Expired - Fee Related JP2750232B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3304527A JP2750232B2 (en) 1991-11-20 1991-11-20 Electronic component storage package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3304527A JP2750232B2 (en) 1991-11-20 1991-11-20 Electronic component storage package

Publications (2)

Publication Number Publication Date
JPH05144965A true JPH05144965A (en) 1993-06-11
JP2750232B2 JP2750232B2 (en) 1998-05-13

Family

ID=17934088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3304527A Expired - Fee Related JP2750232B2 (en) 1991-11-20 1991-11-20 Electronic component storage package

Country Status (1)

Country Link
JP (1) JP2750232B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005243873A (en) * 2004-02-26 2005-09-08 Kyocera Corp Cover body and electronic apparatus using the same
JP2006185966A (en) * 2004-12-24 2006-07-13 Kyocera Corp Electronic device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005243873A (en) * 2004-02-26 2005-09-08 Kyocera Corp Cover body and electronic apparatus using the same
JP2006185966A (en) * 2004-12-24 2006-07-13 Kyocera Corp Electronic device
JP4511337B2 (en) * 2004-12-24 2010-07-28 京セラ株式会社 Electronic equipment

Also Published As

Publication number Publication date
JP2750232B2 (en) 1998-05-13

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