JP2003142620A - Electronic apparatus - Google Patents

Electronic apparatus

Info

Publication number
JP2003142620A
JP2003142620A JP2001333282A JP2001333282A JP2003142620A JP 2003142620 A JP2003142620 A JP 2003142620A JP 2001333282 A JP2001333282 A JP 2001333282A JP 2001333282 A JP2001333282 A JP 2001333282A JP 2003142620 A JP2003142620 A JP 2003142620A
Authority
JP
Japan
Prior art keywords
filler
electronic device
solder
sealing material
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001333282A
Other languages
Japanese (ja)
Inventor
Sadakatsu Yoshida
定功 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001333282A priority Critical patent/JP2003142620A/en
Publication of JP2003142620A publication Critical patent/JP2003142620A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Abstract

PROBLEM TO BE SOLVED: To solve the problem wherein, when a heat history of 230 to 240 deg.C is applied, if the electronic apparatus is mounted in an external electric circuit or the like, a sealing material itself for connecting the insulating base of the apparatus to the cover is melted so that a sealability in the apparatus cannot be assured. SOLUTION: In the electronic apparatus 1, the insulating base 3 having a frame-like metallized metal layer 2a on an upper surface is connected to the cover 3 having a frame-like metallized metal layer 3a on a lower surface, by a sealing material 4 containing a filler 4b having a higher melting point than that of a solder 4a in a solder 4 containing a tin as a main component. Consequently, an electronic component 6 is hermetically contained in a space 5 formed of the base 2 and the cover 3. In this apparatus 1, the filler 4b has an alloy layer 4c having a solid phase line temperature of 250 deg.C or higher formed by reacting with the solder 4a on the surface of the filler 4b, and the alloy layers 4c of the adjacent filler 4b are connected to each other.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、内部に半導体素子
や圧電振動子等の電子部品を気密に収容した電子装置に
関し、特に鉛を含有しない半田を用いて気密に封止した
電子装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic device in which electronic parts such as a semiconductor element and a piezoelectric vibrator are hermetically housed, and more particularly to an electronic device hermetically sealed by using lead-free solder.

【0002】[0002]

【従来の技術】従来、半導体素子等の電子部品を収容す
るための電子部品収納用容器は、例えば酸化アルミニウ
ム質焼結体等の電気絶縁材料から成り、その上面の略中
央部に電子部品を収容するための凹部およびその周辺か
ら外部にかけて導出されたタングステンやモリブデン等
の高融点金属から成る複数個のメタライズ配線層を有
し、上面の外周部に封止材が被着された絶縁基体と、同
じく電気絶縁材料から成り、下面の外周部に封止材が被
着された蓋体と、メタライズ配線層に接続され、内部に
収容する電子部品を外部の電気回路に電気的に接続する
ための鉄−ニッケル合金や鉄−ニッケル−コバルト合金
等の金属材料から成る外部リード端子とにより構成され
ている。そして、絶縁基体のメタライズ配線層に外部リ
ード端子を銀ろう等のろう材を介して接続固定し、次
に、絶縁基体の凹部底面に半導体素子等の電子部品を接
着剤を介して取着するとともに電子部品の各電極をボン
ディングワイヤを介してメタライズ配線層に接続し、し
かる後、絶縁基体と蓋体とをその相対向する主面に被着
させておいた各々の封止材を溶融一体化させ、絶縁基体
と蓋体とから成る容器を封止することによって最終製品
としての電子装置となる。なお、このような従来の電子
装置においては、絶縁基体と蓋体とを接合する封止材と
して、鉛を主成分とする半田が使用されていた。
2. Description of the Related Art Conventionally, an electronic component housing container for housing electronic components such as semiconductor elements is made of an electrically insulating material such as an aluminum oxide sintered body, and the electronic components are provided in the substantially central portion of its upper surface. An insulating substrate having a plurality of metallized wiring layers made of a refractory metal such as tungsten and molybdenum led out from the recess for accommodating and its periphery to the outside, and a sealing material adhered to the outer peripheral portion of the upper surface. , Which is also made of an electrically insulating material, is connected to the metallized wiring layer, which is connected to the metallized wiring layer and the lid body having the outer peripheral portion of the lower surface electrically connected to the external electric circuit. And an external lead terminal made of a metal material such as an iron-nickel alloy or an iron-nickel-cobalt alloy. Then, the external lead terminals are connected and fixed to the metallized wiring layer of the insulating substrate through a brazing material such as silver solder, and then electronic components such as semiconductor elements are attached to the bottom surface of the recess of the insulating substrate through an adhesive. At the same time, each electrode of the electronic component is connected to the metallized wiring layer via a bonding wire, and thereafter, the insulating substrate and the lid are adhered to the opposite main surfaces thereof, and the respective sealing materials are melted and integrated. Then, the container made up of the insulating substrate and the lid is sealed to form an electronic device as a final product. In such a conventional electronic device, solder containing lead as a main component has been used as a sealing material for joining the insulating base and the lid.

【0003】しかしながら、封止材に含有される鉛が環
境汚染物質に指定され、例えば、鉛を含有する半田を使
用した電子装置が屋外に廃棄もしくは放置され風雨に曝
された場合、環境中に鉛が溶け出し環境を汚染する危険
性があり、近年、地球環境保護運動の高まりの中で鉛を
含有しない封止材が要求されるようになってきた。
However, when lead contained in the encapsulant is designated as an environmental pollutant and, for example, an electronic device using a solder containing lead is discarded or left outdoors and exposed to the wind and rain, it is exposed to the environment. There is a risk that lead will melt out and pollute the environment, and in recent years, a lead-free encapsulant has been required due to the increasing global environmental protection movement.

【0004】そこで、人体に対して有害である鉛を用い
ない各種封止材が開発・提案されてきた。このような封
止材としては、例えば錫やビスマス−銀、亜鉛−アルミ
ニウム等を主成分とする各種半田が採用されている。
Therefore, various encapsulating materials which do not use lead, which is harmful to the human body, have been developed and proposed. As such a sealing material, for example, various solders containing tin, bismuth-silver, zinc-aluminum or the like as a main component are adopted.

【0005】[0005]

【発明が解決しようとする課題】しかしながら錫や銀・
亜鉛を含有した合金から成る半田は、温度が−55〜+12
5℃の温度サイクル条件下での耐熱疲労性には優れた信
頼性を示すものの、これらを含有する半田は、その融点
がいずれも225℃以下であり、この半田を絶縁基体と蓋
体とを気密に封止する封止材として使用した場合、封止
材に電子装置を外部電気回路等に実装する際の230〜240
℃の熱履歴が加わり封止材が再溶融してしまい、電子装
置内部の気密封止が破れてしまうという問題点を有して
いた。
[Problems to be Solved by the Invention] However, tin and silver
Solder made of an alloy containing zinc has a temperature of -55 to +12.
Although it shows excellent reliability in heat fatigue resistance under the temperature cycle condition of 5 ° C, the melting points of the solders containing them are all 225 ° C or less, and this solder is used as an insulating substrate and a lid. When used as a hermetically sealing material, 230 to 240 when mounting an electronic device on an external electrical circuit etc.
There is a problem that the sealing material is remelted due to the heat history of ℃ and the airtight sealing inside the electronic device is broken.

【0006】また、ビスマス−銀を主成分とする半田
は、−55〜+125℃の温度サイクル条件下での耐熱疲労
特性に劣り、気密信頼性に欠けるため電子装置の気密封
止用に用いるには不適当であるという課題を有してい
た。
Further, the solder containing bismuth-silver as a main component is inferior in heat fatigue resistance under a temperature cycle condition of -55 to + 125 ° C. and lacks airtight reliability, so that it is used for hermetic sealing of electronic devices. Had the problem of being inappropriate.

【0007】さらに、亜鉛−アルミニウムを主成分とす
る半田は、空気中に放置した場合に、腐食が進行しやす
く長期の気密信頼性に欠け、電子装置の気密封止用に用
いるには、これもまた不適当であるという課題があっ
た。
Further, the solder containing zinc-aluminum as a main component easily corrodes when left in the air, and lacks long-term airtight reliability, so that it is necessary to use it for airtight sealing of electronic devices. Was also inappropriate.

【0008】本発明はこのような従来の問題点に鑑み完
成されたもので、その目的は、電子装置を外部電気回路
等に実装する際に230〜240℃の熱履歴が加わっても電子
装置の気密性が確保でき、封止材自体の耐食性にも優
れ、さらに、鉛を含有しない地球環境に優しい電子装置
を提供することにある。
The present invention has been completed in view of the above conventional problems, and an object thereof is to mount an electronic device on an external electric circuit or the like even if a thermal history of 230 to 240 ° C. is applied. It is an object of the present invention to provide an electronic device which can secure the airtightness of the material, is excellent in the corrosion resistance of the sealing material itself, and is environmentally friendly without containing lead.

【0009】[0009]

【課題を解決するための手段】本発明の電子装置は、上
面に枠状のメタライズ金属層が被着された絶縁基体と下
面に枠状のメタライズ金属層を有する蓋体とを、錫を主
成分とする半田に該半田より融点が高いフィラーを含有
させた封止材で接合することにより前記絶縁基体と前記
蓋体とで構成される空所内部に電子部品を気密に収容し
た電子装置において、前記フィラーは、該フィラー表面
に前記半田と反応して形成された250℃以上の固相線温
度を有する合金層が形成されているとともに、隣接する
前記フィラーの前記合金層同士が接合していることを特
徴とするものである。
In the electronic device of the present invention, an insulating substrate having a frame-shaped metallized metal layer on its upper surface and a lid having a frame-shaped metallized metal layer on its lower surface are mainly made of tin. In an electronic device in which an electronic component is hermetically housed inside a space formed by the insulating base and the lid by joining a solder as a component with a sealing material containing a filler having a melting point higher than that of the solder The filler is formed on the surface of the filler with an alloy layer having a solidus temperature of 250 ° C. or higher formed by reacting with the solder, and the alloy layers of adjacent fillers are bonded to each other. It is characterized by being present.

【0010】また、本発明の電子装置は、上記構成にお
いて、前記合金層の厚さが0.5〜10μmであることを特
徴とするものである。
Further, the electronic device of the present invention is characterized in that, in the above structure, the alloy layer has a thickness of 0.5 to 10 μm.

【0011】さらに、本発明の電子装置は、上記構成に
おいて、前記フィラーが、平均粒径が5〜40μmの銀粒
子であることを特徴とするものである。
Further, the electronic device of the present invention is characterized in that, in the above-mentioned constitution, the filler is silver particles having an average particle diameter of 5 to 40 μm.

【0012】また、本発明の電子装置は、上記構成にお
いて、前記封止材が、前記フィラーを5〜25重量%含有
していることを特徴とするものである。
The electronic device of the present invention is characterized in that, in the above structure, the sealing material contains 5 to 25% by weight of the filler.

【0013】本発明の電子装置によれば、封止材に含有
させたフィラーの表面に半田と反応させて形成した250
℃以上の固相線温度を有する合金層を形成するととも
に、フィラーの隣接する合金層同士を接合したことか
ら、封止材中で合金層が立体的かつ連続した骨組を形成
し、封止材が250℃より低い温度で溶融することはな
く、その結果、電子装置にこれを外部電気回路等に実装
する際の230〜240℃の熱履歴が加わったとしても、封止
材が溶融して電子装置内部の気密封止が破れてしまうこ
とのない気密信頼性の高い電子装置とすることができ
る。
According to the electronic device of the present invention, 250 is formed on the surface of the filler contained in the sealing material by reacting with the solder.
Since the alloy layer having a solidus temperature of ℃ or more is formed and the adjacent alloy layers of the filler are joined together, the alloy layer forms a three-dimensional and continuous skeleton in the encapsulating material. Does not melt at temperatures lower than 250 ° C, and as a result, the encapsulant will melt even if a thermal history of 230 to 240 ° C is applied to the electronic device when it is mounted on an external electric circuit or the like. It is possible to provide an electronic device that is highly airtight and reliable without breaking the airtight seal inside the electronic device.

【0014】また、本発明の電子装置によれば、上記構
成において、フィラーの表面に形成した合金層の厚さを
0.5〜10μmとしたことから、封止材を流動性に優れる
とともにより耐熱性の良好なものとすることができ、そ
の結果、より気密封止が良好で耐熱性に優れた電子装置
とすることができる。
Further, according to the electronic device of the present invention, in the above structure, the thickness of the alloy layer formed on the surface of the filler is
Since the thickness is 0.5 to 10 μm, the sealing material can have excellent fluidity and heat resistance, and as a result, an electronic device having better airtight sealing and heat resistance can be obtained. You can

【0015】さらに、本発明の電子装置によれば、上記
構成において、フィラーを平均粒径が5〜40μmの銀粒
子としたことから、銀が半田の主成分である錫と容易に
反応して、フィラー表面に固層線温度が250℃以上の共
晶合金層を形成するとともに隣接する合金層同士が良好
に接合し、その結果、耐熱性に優れるとともに気密封止
の信頼性に優れた電子装置とすることができる。
Further, according to the electronic device of the present invention, in the above structure, since the filler is silver particles having an average particle size of 5 to 40 μm, silver easily reacts with tin which is a main component of solder. , Forming a eutectic alloy layer with a solid layer line temperature of 250 ℃ or more on the filler surface and adjoining adjacent alloy layers satisfactorily, resulting in excellent heat resistance and highly reliable hermetic sealing It can be a device.

【0016】また、本発明の電子装置によれば、上記構
成において、封止材がフィラーを5〜25重量%含有して
いることから、フィラー表面に250℃以上の固相線温度
を有する合金層を適度な割合で形成することができると
ともにフィラーの合金層同士を良好に接合することがで
き、その結果、耐熱性に優れるとともに気密封止に優れ
た電子装置とすることができる。
Further, according to the electronic device of the present invention, in the above structure, since the sealing material contains 5 to 25% by weight of the filler, an alloy having a solidus temperature of 250 ° C. or more on the surface of the filler. The layers can be formed at an appropriate ratio, and the alloy layers of the filler can be satisfactorily joined to each other. As a result, an electronic device having excellent heat resistance and airtight sealing can be obtained.

【0017】[0017]

【発明の実施の形態】次に、本発明の電子装置を添付の
図面に基づいて詳細に説明する。図1は、本発明の電子
装置の実施の形態の一例を示す断面図である。この図に
おいて1は電子装置であり、この電子装置1は、主に上
面に枠状のメタライズ金属層2aが被着された絶縁基体
2と、下面に枠状のメタライズ金属層3aを有する蓋体
3と、封止材4と、電子部品6と、メタライズ配線層7
とから構成されている。
BEST MODE FOR CARRYING OUT THE INVENTION Next, an electronic device of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a sectional view showing an example of an embodiment of an electronic device of the present invention. In the figure, reference numeral 1 denotes an electronic device. The electronic device 1 has a lid body having an insulating substrate 2 mainly having a frame-shaped metallized metal layer 2a deposited on the upper surface and a frame-shaped metallized metal layer 3a on the lower surface. 3, the sealing material 4, the electronic component 6, and the metallized wiring layer 7
It consists of and.

【0018】絶縁基体2は、その上面中央部に電子部品
6を収容するための空所5が設けられており、この空所
5の底面には電子部品6がガラスや樹脂・ろう材等の接
着剤を介して接着固定される。
The insulating base 2 is provided with a cavity 5 for accommodating the electronic component 6 in the center of its upper surface, and the electronic component 6 is made of glass, resin, brazing material or the like on the bottom surface of the cavity 5. It is adhesively fixed through an adhesive.

【0019】また、絶縁基体2は、空所5の底面より外
周部にかけて複数のメタライズ配線層7が被着形成され
ており、このメタライズ配線層7の空所5の底面に位置
する部位には電子部品6の各電極がボンディングワイヤ
8を介して電気的に接続され、外部に導出する部位に
は、外部電気回路(図示せず)に接続される外部リード
端子9がろう材10を介して取着されている。
Further, the insulating substrate 2 has a plurality of metallized wiring layers 7 deposited from the bottom surface of the void 5 to the outer peripheral portion thereof. The metallized wiring layer 7 is located at the portion located on the bottom surface of the void 5. Each electrode of the electronic component 6 is electrically connected through the bonding wire 8, and an external lead terminal 9 connected to an external electric circuit (not shown) is connected to an external electric circuit (not shown) through a brazing material 10 at a portion to be led to the outside. It is attached.

【0020】さらに、絶縁基体2の上面の外周部には、
後述する蓋体3との接合用の枠状のメタライズ金属層2
aが被着されている絶縁基体2は、酸化アルミニウムや
ムライト・窒化アルミニウム・炭化珪素・ガラスセラミ
ックス等を主成分とする焼結体等の電気絶縁材料から成
り、例えば、酸化アルミニウム質焼結体から成る場合
は、先ず、アルミナ(Al23)やシリカ(SiO2
・カルシア(CaO)・マグネシア(MgO)等の原料
粉末に適当な有機溶剤・溶媒を添加混合して泥漿状と成
し、これを従来周知のドクターブレード法やカレンダー
ロール法等を採用してシート状に成形しセラミックグリ
ーンシートを得、しかる後、セラミックグリーンシート
を所定形状に打ち抜き加工するとともに複数枚積層し、
約1600℃の温度で焼成することにより製作される。
Further, on the outer peripheral portion of the upper surface of the insulating base 2,
A frame-shaped metallized metal layer 2 for joining with a lid 3 described later.
The insulating substrate 2 to which a is adhered is made of an electrically insulating material such as a sintered body containing aluminum oxide, mullite, aluminum nitride, silicon carbide, glass ceramics, etc. as a main component, and, for example, an aluminum oxide sintered body. When it is composed of alumina, firstly alumina (Al 2 O 3 ) or silica (SiO 2 )
・ Calcia (CaO), magnesia (MgO) and other raw material powders are mixed with an appropriate organic solvent / solvent to form a slurry, which is then formed using the well-known doctor blade method or calender roll method. Shape to obtain a ceramic green sheet, after which the ceramic green sheet is punched into a predetermined shape and a plurality of layers are laminated,
It is manufactured by firing at a temperature of about 1600 ° C.

【0021】また、メタライズ配線層7および枠状のメ
タライズ金属層2aは、タングステンやモリブデン・マ
ンガン等の高融点金属から成り、これらの粉末に有機溶
剤・溶媒を添加混合した金属ペーストをそれぞれセラミ
ックグリーンシートの所定位置に従来周知のスクリーン
印刷法により所定パターンに被着形成させておき、セラ
ミックグリーンシートと同時に焼成することにより形成
される。なお、メタライズ配線層7および枠状のメタラ
イズ金属層2aには、その表面にニッケルや金等の耐食
性に優れ、半田等のろう材との濡れ性の良好な金属をめ
っき法等により、1.0〜20μmの厚さに被着させておく
と、メタライズ配線層7および枠状のメタライズ金属層
2aの酸化腐食を有効に防止することができる。
The metallized wiring layer 7 and the frame-shaped metallized metal layer 2a are made of a refractory metal such as tungsten, molybdenum and manganese, and a metal paste prepared by adding and mixing an organic solvent and a solvent to these powders is used as ceramic green. It is formed by depositing a predetermined pattern on a predetermined position of the sheet by a conventionally known screen printing method and firing the ceramic green sheet at the same time. It should be noted that the metallized wiring layer 7 and the frame-shaped metallized metal layer 2a are coated with a metal such as nickel or gold, which has excellent corrosion resistance and has good wettability with a brazing material such as solder, by a plating method or the like. When the metallized wiring layer 7 and the frame-shaped metallized metal layer 2a are deposited so as to have a thickness of 20 μm, oxidative corrosion can be effectively prevented.

【0022】他方、蓋体3は、例えばアルミナ(Al2
3)やシリカ(SiO2)・カルシア(CaO)・マグ
ネシア(MgO)等の原料粉末を所定のプレス型内に充
填して一定圧力で押圧して成形し、この成形体を約1500
℃の温度で焼成することにより製作される。
On the other hand, the lid 3 is made of, for example, alumina (Al 2
O 3 ), silica (SiO 2 ), calcia (CaO), magnesia (MgO) and other raw material powders are filled in a predetermined press die and pressed at a constant pressure to form a compact.
It is manufactured by firing at a temperature of ℃.

【0023】また、蓋体3の下面の外周部には、絶縁基
体2との接合用の枠状のメタライズ金属層3aが形成さ
れている。この枠状のメタライズ金属層3aは、上述の
枠状のメタライズ金属層2aと同様に、タングステンや
モリブデン・マンガン等の高融点金属から成り、これら
の粉末に有機溶剤・溶媒を添加混合した金属ペーストを
蓋体3の所定位置に従来周知のスクリーン印刷法により
所定パターンに被着形成させておき、焼成することによ
り形成される。なお、枠状のメタライズ金属層3aに
は、その表面にニッケルや金等の耐食性に優れ、半田等
のろう材との濡れ性の良好な金属をめっき法等により、
1.0〜20μmの厚さに被着させておくと、枠状のメタラ
イズ金属層3aの酸化腐食を有効に防止することができ
る。
A frame-shaped metallized metal layer 3a for joining with the insulating substrate 2 is formed on the outer peripheral portion of the lower surface of the lid 3. The frame-shaped metallized metal layer 3a is made of a refractory metal such as tungsten or molybdenum / manganese, like the frame-shaped metallized metal layer 2a described above, and a metal paste prepared by adding and mixing an organic solvent / solvent to these powders. Is formed on a predetermined position of the lid body 3 by a well-known screen printing method in a predetermined pattern and then baked. The frame-shaped metallized metal layer 3a has a surface on which a metal such as nickel or gold having excellent corrosion resistance and having good wettability with a brazing material such as solder is plated by a plating method or the like.
By depositing it to a thickness of 1.0 to 20 μm, it is possible to effectively prevent oxidative corrosion of the frame-shaped metallized metal layer 3a.

【0024】そして、絶縁基体2の空所5の底面に電子
部品6をガラスや樹脂・ろう材等の接着剤を介して接着
固定するとともに電子部品6の各電極とメタライズ配線
層7とをボンディングワイヤ8を介して電気的に接続
し、しかる後、絶縁基体2および蓋体3のそれぞれに被
着させた枠状メタライズ金属層2a・3aを、錫を主成
分とする半田4aにこの半田4aより融点の高いフィラ
ー4bを含有させた封止材4で接合することにより電子
装置1が完成する。
Then, the electronic component 6 is adhered and fixed to the bottom surface of the void 5 of the insulating substrate 2 through an adhesive such as glass, resin or brazing material, and each electrode of the electronic component 6 and the metallized wiring layer 7 are bonded. After electrically connecting via the wire 8, the frame-shaped metallized metal layers 2a and 3a adhered to the insulating substrate 2 and the lid 3 respectively are attached to the solder 4a containing tin as a main component. The electronic device 1 is completed by joining with the sealing material 4 containing the filler 4b having a higher melting point.

【0025】本発明の電子装置1においては、図2に電
子装置1の要部拡大断面図で示すように、封止材4が錫
を主成分とする半田4aと、フィラー4bと、フィラー
4b表面に形成された合金層4cとで構成されている。
また、このことが重要である。
In the electronic device 1 of the present invention, as shown in the enlarged cross-sectional view of the main part of the electronic device 1 in FIG. 2, the sealing material 4 is a solder 4a containing tin as a main component, a filler 4b, and a filler 4b. It is composed of an alloy layer 4c formed on the surface.
This is also important.

【0026】錫を主成分とする半田4aとしては、例え
ば、錫96.5重量%と銀3.5重量%とから成る共晶や、錫9
5.75重量%と銀3.5重量%と銅0.75重量%とから成る共
晶、錫92重量%と亜鉛8重量%とから成る共晶、錫99.3
重量%と銅0.7重量%とから成る共晶等、あるいはこれ
ら共晶に近い組成等の鉛を含有しない各種半田が用いら
れる。
As the solder 4a containing tin as a main component, for example, a eutectic composed of tin 96.5% by weight and silver 3.5% by weight, tin 9
Eutectic composed of 5.75 wt%, silver 3.5 wt% and copper 0.75 wt%, eutectic composed of tin 92 wt% and zinc 8 wt%, tin 99.3
A eutectic or the like consisting of 1% by weight and 0.7% by weight of copper, or various lead-free solders having a composition close to those of the eutectic are used.

【0027】このような半田4aは、封止材4中で後述
するフィラー4bを保持する必要から、また、電子部品
6の熱的保護や残留応力の観点からは、できる限り低温
で溶融可能なものが、基本的にはフィラー4bの融点以
下の溶融温度であるものが好ましい。半田4aをフィラ
ー4bの融点以下の溶融温度であるものとすることによ
り、半田4aが溶融する際に、それより高い融点を有す
るフィラー4bの表面において、半田4aの融点より高
い固相線温度を有する合金層4cを形成することが可能
となる。なお、錫96.5重量%と銀3.5重量%とから成る
共晶は、その溶融温度が約221℃であり、熱伝導性にも
優れた銀を含有するとともに、耐熱性に優れた立体的か
つ連続した骨格を有する合金層4cを形成し、実装時の
熱履歴に対しても効果的に熱を逃がすことから、好適に
用いられる。
Such a solder 4a can be melted at a temperature as low as possible because it is necessary to hold a filler 4b which will be described later in the sealing material 4, and from the viewpoint of thermal protection and residual stress of the electronic component 6. Those having a melting temperature which is basically lower than the melting point of the filler 4b are preferable. By setting the melting temperature of the solder 4a to be equal to or lower than the melting point of the filler 4b, when the solder 4a is melted, a solidus temperature higher than the melting point of the solder 4a is generated on the surface of the filler 4b having a higher melting point. It becomes possible to form the alloy layer 4c which it has. A eutectic consisting of 96.5% by weight tin and 3.5% by weight silver has a melting temperature of approximately 221 ° C, contains silver with excellent thermal conductivity, and is three-dimensional and continuous with excellent heat resistance. The alloy layer 4c having the above-mentioned skeleton is formed, and the heat is effectively released to the heat history at the time of mounting, so that it is preferably used.

【0028】なお、半田4aの量は、半田4aがフィラ
ー4b間に濡れ広がりその隙間を充填できる量を供給し
ておくことが必要である。また、半田4aとフィラー4
bとの濡れ性を向上させ、フィラー4bの表面に合金層
4cを均一に形成し易くするために、封止材4に松脂等
に代表される種々のフラックス成分等の添加物を、合金
層4cの固相線温度を低下させない範囲で添加すること
や、封止材4を不活性ガス雰囲気中や還元ガス雰囲気中
で加熱することも効果的である。
The amount of the solder 4a needs to be supplied so that the solder 4a can spread between the fillers 4b and fill the gap. In addition, the solder 4a and the filler 4
In order to improve the wettability with b and facilitate the uniform formation of the alloy layer 4c on the surface of the filler 4b, additives such as various flux components typified by pine resin are added to the sealing material 4 in the alloy layer. It is also effective to add 4c in a range that does not lower the solidus temperature and to heat the sealing material 4 in an inert gas atmosphere or a reducing gas atmosphere.

【0029】フィラー4bは、錫を主成分とする半田4
aより融点が高く、錫の含有量が50重量%以下で250℃
以上の固相線温度を有する合金層4cを形成する各種フ
ィラーが適用できる。このようなフィラー4bとして
は、銀や銅・アルミニウム・金・鉄・パラジウム・白金
・チタン等の金属粒子、またはこれらの金属を含有した
合金粒子、もしくはこれらの金属を被覆したセラミック
スやガラス等の無機物粒子等があげられる。とりわけ銀
粒子は、錫を主成分とする半田4aとの濡れ性が良好で
あり、半田4aの流動性への影響も少なく、その上、銀
が錫との固相線温度の高い合金を形成し、熱伝導性にも
優れるため好適に使用される。なお、銀を含有する金属
粒子や表面に銀を被覆した粒子を使用してもよい。
The filler 4b is the solder 4 containing tin as a main component.
250 ℃ with a melting point higher than that of a and a tin content of 50 wt% or less
Various fillers that form the alloy layer 4c having the above solidus temperature can be applied. Examples of the filler 4b include metal particles of silver, copper, aluminum, gold, iron, palladium, platinum, titanium, etc., alloy particles containing these metals, or ceramics or glass coated with these metals. Examples include inorganic particles. In particular, the silver particles have good wettability with the solder 4a containing tin as a main component, have little influence on the fluidity of the solder 4a, and further, silver forms an alloy with tin having a high solidus temperature. However, it is also preferably used because it has excellent thermal conductivity. In addition, you may use the metal particle containing silver and the particle which coat | covered the surface with silver.

【0030】また、フィラー4bは、その形状が基本的
には球状が好ましいが、必ずしも真球状である必要はな
く、楕円球状や円柱状の他、本発明におけるフィラー4
bとして機能させることができるものであれば、種々の
異形状のものであっても良い。
The shape of the filler 4b is basically preferably spherical, but it does not necessarily have to be true spherical, and it may be elliptic spherical or cylindrical, and the filler 4 in the present invention.
Various different shapes may be used as long as they can function as b.

【0031】さらに、フィラー4bは、その平均粒径が
気密封止する際において封止材4の流動性の観点からは
5〜40μmであるものが好ましい。フィラー4bの平均
粒径を5〜40μmとすることにより、フィラー4bの表
面が封止材4中の錫を主成分とする半田4aと容易に反
応して錫との合金層4cを形成するとともに、隣接する
合金層4c同士が接合して耐熱性に優れるとともに強固
な合金層4bが立体的かつ連続した骨組として形成さ
れ、封止材4の耐熱性が向上するとともに熱伝導性にも
優れたものとすることができる。
Further, the filler 4b preferably has an average particle size of 5 to 40 μm from the viewpoint of fluidity of the sealing material 4 when hermetically sealing. By setting the average particle size of the filler 4b to 5 to 40 μm, the surface of the filler 4b easily reacts with the solder 4a containing tin as a main component in the sealing material 4 to form an alloy layer 4c with tin. , The adjacent alloy layers 4c are joined to each other to have excellent heat resistance, and the strong alloy layer 4b is formed as a three-dimensional and continuous skeleton, so that the heat resistance of the sealing material 4 is improved and the heat conductivity is also excellent. Can be one.

【0032】なお、フィラー4bの平均粒径が5μm未
満となると、封止材4を溶融する際にフィラー4bが溶
けてしまい消滅してしまう危険性があり、また、40μm
を超えると立体的かつ連続した骨組を緻密に形成できな
くなる傾向がある。従って、フィラー4bの平均粒径は
5〜40μmが好ましい。また、ここで立体的かつ連続し
た骨組とは、核となるフィラー4bの表面に形成された
合金層4cが、上下左右の隣接するフィラー4bの表面
に形成された合金層4cと接合して、封止材4全体にわ
たって立体的かつ連続した接合状態となっていることを
さし、この骨格で形成される空間には半田4aが充填さ
れている。
If the average particle size of the filler 4b is less than 5 μm, there is a risk that the filler 4b will melt and disappear when the sealing material 4 is melted.
If it exceeds, it tends to be difficult to form a three-dimensional and continuous frame densely. Therefore, the average particle size of the filler 4b is preferably 5 to 40 μm. The three-dimensional and continuous skeleton means that the alloy layer 4c formed on the surface of the core filler 4b is joined to the alloy layer 4c formed on the surfaces of the adjacent fillers 4b on the left, right, top, and bottom, This indicates that the entire sealing material 4 is in a three-dimensional and continuous bonded state, and the space formed by this skeleton is filled with solder 4a.

【0033】フィラー4bの含有量は、フィラー4bが
金属材料の場合には、封止材4の耐熱性の向上および錫
を主成分とする半田4aの濡れ性や流動性を考慮すると
1〜30重量%が好ましい。特に、銀粒子の場合、5〜25
重量%であれば、気密封止する際の封止材4の流動性が
良好であり、封止材4中の錫を主成分とする半田4aと
反応して銀粒子表面に耐熱性に優れた厚さを有する合金
層4cを容易に形成できる。
When the filler 4b is a metal material, the content of the filler 4b is 1 to 30 in consideration of the improvement of the heat resistance of the sealing material 4 and the wettability and fluidity of the solder 4a containing tin as a main component. Weight percent is preferred. Especially in the case of silver particles,
If it is wt%, the fluidity of the sealing material 4 at the time of hermetic sealing is good, and it reacts with the solder 4a containing tin as a main component in the sealing material 4 and has excellent heat resistance on the surface of the silver particles. The alloy layer 4c having a large thickness can be easily formed.

【0034】また、フィラー4bとして無機材料粒子に
金属膜を被着形成したものでも同様の効果を奏し、とり
わけ、熱伝導性の観点からは無機材料粒子として、58.6
W/mKの熱伝導率を有する窒化アルミニウムや268W
/mKの熱伝導率有する炭化珪素等は好適である。さら
に、金属膜を被着した無機材料粒子の平均粒径は、半田
4aの濡れ性および流動性の観点からは、上記金属材料
と同等であれば何等問題はない。従って、その含有量も
金属材料と同等の効果を有しながら上記無機材料の比重
から同等体積とした分だけで良い。
Further, the same effect can be obtained even if the filler 4b is formed by depositing a metal film on the inorganic material particles, and in particular, from the viewpoint of thermal conductivity, the inorganic material particles are 58.6%.
Aluminum nitride or 268W with a thermal conductivity of W / mK
Silicon carbide or the like having a thermal conductivity of / mK is suitable. Furthermore, from the viewpoint of the wettability and the fluidity of the solder 4a, the average particle size of the inorganic material particles coated with the metal film is not problematic as long as it is the same as the above metal material. Therefore, the content of the inorganic material may be equivalent to that of the metal material, while having the same effect as that of the metal material.

【0035】従って、フィラー4bとして銀粒子を採用
する場合には、その粒径は、気密封止する際の封止材4
の良好な流れ性および封止材4中の錫を主成分とする半
田4aと容易に反応して錫との共晶合金を形成し、この
共晶合金が互いに接合して耐熱性に優れた強固な立体的
かつ連続した骨組を形成し易いという観点からは、5〜
40μmが好ましい。また、その含有量は、5〜25重量%
が以下の理由により好適である。すなわち、先の含有量
の範囲とすることにより、封止材4の流動性が良好であ
るとともに銀粒子表面に耐熱性に優れた厚さの合金層4
cを形成でき、この電子装置1を外部電気回路に実装す
る際に、半田4aが溶融しても耐熱性に優れた立体的か
つ連続した骨組を成す強固に接合した合金層4cが半田
4aを保持して容器の気密封止が破られることが無い。
Therefore, when silver particles are used as the filler 4b, the particle size thereof is determined by the sealing material 4 used for hermetic sealing.
And the solder 4a containing tin as a main component in the encapsulating material 4 easily react with each other to form a eutectic alloy with tin, and the eutectic alloys are bonded to each other to have excellent heat resistance. From the viewpoint that it is easy to form a strong three-dimensional and continuous frame,
40 μm is preferable. Moreover, the content is 5 to 25% by weight.
Is preferable for the following reasons. That is, when the content is within the above range, the flowability of the sealing material 4 is good and the alloy layer 4 having a thickness excellent in heat resistance is formed on the surface of the silver particles.
c, and when the electronic device 1 is mounted on an external electric circuit, even if the solder 4a is melted, the solidly bonded alloy layer 4c forming a three-dimensional and continuous frame having excellent heat resistance forms the solder 4a. The airtight seal of the container is maintained and not broken.

【0036】また、本発明における合金層4cは、電子
装置1を外部電気回路等に実装する際の230〜240℃の加
熱温度を超える固相線温度を有することが必要である。
それにより封止材4が上記実装する際の加熱温度に曝さ
れても、封止材4中で合金層4cが立体的かつ連続した
骨組を形成し、封止材4が250℃より低い温度で溶融す
ることはなく、その結果、電子装置にこれを外部電気回
路等に実装する際の230〜240℃の熱履歴が加わったとし
ても、封止材4が溶融して電子装置内部の気密封止が破
れてしまうことのない気密信頼性の高い電子装置とする
ことができる。
Further, the alloy layer 4c in the present invention needs to have a solidus temperature exceeding the heating temperature of 230 to 240 ° C. when mounting the electronic device 1 on an external electric circuit or the like.
Thereby, even when the sealing material 4 is exposed to the heating temperature at the time of mounting, the alloy layer 4c forms a three-dimensional and continuous skeleton in the sealing material 4, and the sealing material 4 has a temperature lower than 250 ° C. As a result, even if the electronic device is subjected to a heat history of 230 to 240 ° C. when it is mounted on an external electric circuit or the like, the sealing material 4 is melted and the air inside the electronic device is melted. It is possible to provide an electronic device that is highly airtight and highly reliable without breaking the tight seal.

【0037】また、この合金層4cの厚さは、耐熱性の
向上と立体的かつ連続した骨組の合金層4cにおける半
田4aの保持強度の点からは0.1μm以上が好ましい。
また、封止材4の流動性を考慮すると合金層4cの厚さ
は30μm以下が好ましい。特に、合金層4cの厚さが10
μm以下であると封止材4の流動性が良好であり、ま
た、合金層4cの耐熱性が安定して向上するという点か
らは0.5μm以上が好ましい。従って、封止材4の流動
性が良好で、かつ耐熱性に優れた合金層4cを有する封
止材4が得られることからは、その厚さは0.5〜10μm
が最適である。
The thickness of the alloy layer 4c is preferably 0.1 μm or more from the viewpoint of improving heat resistance and holding strength of the solder 4a in the alloy layer 4c having a three-dimensional and continuous frame structure.
Further, considering the fluidity of the sealing material 4, the thickness of the alloy layer 4c is preferably 30 μm or less. In particular, the alloy layer 4c has a thickness of 10
When the thickness is less than or equal to μm, the fluidity of the sealing material 4 is good, and from the viewpoint that the heat resistance of the alloy layer 4c is stably improved, 0.5 μm or more is preferable. Therefore, the thickness of the sealing material 4 is 0.5 to 10 μm because the sealing material 4 has the fluidity of the sealing material 4 and the alloy layer 4c excellent in heat resistance.
Is the best.

【0038】このような封止材4による絶縁基体2と蓋
体3との接合は、まず、封止材4を蓋体3に被着してい
る枠状のメタライズ金属層3aの表面にスクリーン印刷
法を用いて印刷・塗布しておき、その後、絶縁基体2の
枠状のメタライズ金属層2aと蓋体3の枠状のメタライ
ズ金属層3aとの間に封止材4が挟まるように蓋体3を
絶縁基体2上に載置し、しかる後、蓋体3を絶縁基体2
側に一定圧力で押圧しながら約300〜350℃の温度に加熱
して封止材4を溶融させることにより、フィラー4b表
面に錫との合金が形成されるとともに立体的かつ連続し
た合金層4cが形成され、絶縁基体2の上面に蓋体3が
気密に接合される。
In order to bond the insulating substrate 2 and the lid 3 with the sealing material 4 as described above, first, a screen is formed on the surface of the frame-shaped metallized metal layer 3a covering the lid 3 with the sealing material 4. Printing and application are performed by using a printing method, and then the lid is so placed that the sealing material 4 is sandwiched between the frame-shaped metallized metal layer 2a of the insulating substrate 2 and the frame-shaped metallized metal layer 3a of the lid 3. The body 3 is placed on the insulating base 2, and then the lid 3 is placed on the insulating base 2.
The sealing material 4 is melted by heating it to a temperature of about 300 to 350 ° C. while pressing it to the side with a constant pressure, whereby an alloy with tin is formed on the surface of the filler 4 b and a three-dimensional and continuous alloy layer 4 c is formed. Is formed, and the lid 3 is airtightly joined to the upper surface of the insulating base 2.

【0039】次に、本発明の電子装置の製造方法の一例
を説明する。まず、アルミナ質焼結体から成る絶縁基体
2の上面中央部の空所5底面に電子部品6の一種である
半導体素子をガラスや樹脂・ろう材等の接着剤を介して
接着固定するとともに、電子部品6の各電極をメタライ
ズ配線層7にボンディングワイヤ8を介して電気的に接
続する。その後、絶縁基体2の上面と蓋体3の下面にあ
らかじめ枠状のメタライズ金属層2a・3aをそれぞれ
被着形成しておく。次に、蓋体3の枠状のメタライズ金
属層3a表面に錫が96.5重量%、銀が3.5重量%から成
る半田4aに平均粒径が30μmの球状の銀粉を20重量%
分散させた封止材4を被着させる。さらに、この蓋体3
を絶縁基体2上面の枠状のメタライズ金属層2aに押圧
しながら330℃の温度で加熱接合する。この加熱接合に
より、銀粉の表面に銀がリッチで固相線温度が480℃以
上である銀−錫合金が形成されるとともに、隣接する銀
−錫合金同士が接合して平均厚さが8μmの立体的かつ
連続した合金層4cが形成される。
Next, an example of a method of manufacturing the electronic device of the present invention will be described. First, a semiconductor element, which is a type of electronic component 6, is bonded and fixed to the bottom surface of the space 5 at the center of the upper surface of the insulating substrate 2 made of an alumina-based sintered body through an adhesive such as glass, resin, or a brazing material. Each electrode of the electronic component 6 is electrically connected to the metallized wiring layer 7 via the bonding wire 8. After that, frame-shaped metallized metal layers 2a and 3a are formed on the upper surface of the insulating substrate 2 and the lower surface of the lid 3 in advance. Next, 20% by weight of spherical silver powder having an average particle diameter of 30 μm is applied to the solder 4a composed of 96.5% by weight of tin and 3.5% by weight of silver on the surface of the frame-shaped metallized metal layer 3a of the lid body 3.
The dispersed sealing material 4 is applied. Furthermore, this lid 3
While being pressed against the frame-shaped metallized metal layer 2a on the upper surface of the insulating substrate 2, heat bonding is performed at a temperature of 330 ° C. By this heat bonding, a silver-tin alloy having a rich silver and a solidus temperature of 480 ° C. or higher is formed on the surface of the silver powder, and adjacent silver-tin alloys are bonded to each other and have an average thickness of 8 μm. A three-dimensional and continuous alloy layer 4c is formed.

【0040】かくして空所5内部に電子部品6を気密に
封止した製品としての電子装置1が得られる。この電子
装置1を外部電気回路に240℃の温度で実装した後、電
子装置1の気密評価試験を行ない、気密性が保持されて
いることを確認した。
Thus, the electronic device 1 as a product in which the electronic component 6 is hermetically sealed inside the void 5 is obtained. After mounting the electronic device 1 on an external electric circuit at a temperature of 240 ° C., an airtightness evaluation test of the electronic device 1 was performed to confirm that the airtightness was maintained.

【0041】なお、本発明は上記実施例に限定されるも
のではなく、本発明の要旨を逸脱しない範囲であれば種
々の変更は可能であり、上述の実施例では電子部品とし
て半導体素子を例に挙げ、これを収容した電子装置につ
いて詳述したが、圧電振動子や弾性表面波素子等の電子
部品を収容した電子装置にも適用可能である。また、上
述の実施例では、蓋体を絶縁材料から成るものとした
が、鉄−ニッケル合金や鉄−ニッケル−コバルト合金等
の金属材料から成るものとしてもよい。
The present invention is not limited to the above embodiments, and various modifications can be made without departing from the scope of the present invention. In the above embodiments, a semiconductor element is used as an electronic component. Although the electronic device housing this is described in detail above, it is also applicable to an electronic device housing electronic components such as a piezoelectric vibrator and a surface acoustic wave element. Further, although the lid is made of an insulating material in the above-mentioned embodiments, it may be made of a metal material such as an iron-nickel alloy or an iron-nickel-cobalt alloy.

【0042】[0042]

【発明の効果】本発明の電子装置によれば、封止材に含
有させたフィラーの表面に半田と反応させて形成した25
0℃以上の固相線温度を有する合金層を形成するととも
に、フィラーの隣接する合金層同士を接合したことか
ら、封止材中で合金層が立体的かつ連続した骨組を形成
し、封止材が250℃より低い温度で溶融することはな
く、その結果、電子装置にこれを外部電気回路等に実装
する際の230〜240℃の熱履歴が加わったとしても、封止
材が溶融して電子装置内部の気密封止が破れてしまうこ
とのない気密信頼性の高い電子装置とすることができ
る。
According to the electronic device of the present invention, it is formed on the surface of the filler contained in the sealing material by reacting with the solder.
Forming an alloy layer having a solidus temperature of 0 ° C or more and joining adjacent alloy layers of the filler to form a three-dimensional and continuous skeleton of the alloy layer in the encapsulant, and sealing The material does not melt at temperatures below 250 ° C, and as a result, the encapsulant melts even if a thermal history of 230 to 240 ° C is applied to the electronic device when mounting it on an external electric circuit. As a result, it is possible to obtain an electronic device that is highly airtight and highly reliable without breaking the airtight seal inside the electronic device.

【0043】また、本発明の電子装置によれば、上記構
成において、フィラーの表面に形成した合金層の厚さを
0.5〜10μmとしたことから、封止材を流動性に優れる
とともにより耐熱性の良好なものとすることができ、そ
の結果、より気密封止が良好で耐熱性に優れた電子装置
とすることができる。
Further, according to the electronic device of the present invention, in the above structure, the thickness of the alloy layer formed on the surface of the filler is
Since the thickness is 0.5 to 10 μm, the sealing material can have excellent fluidity and heat resistance, and as a result, an electronic device having better airtight sealing and heat resistance can be obtained. You can

【0044】さらに、本発明の電子装置によれば、上記
構成において、フィラーを平均粒径が5〜40μmの銀粒
子としたことから、銀が半田の主成分である錫と容易に
反応して、フィラー表面に固層線温度が250℃以上の共
晶合金層を形成するとともに隣接する合金層同士が良好
に接合し、その結果、耐熱性に優れるとともに気密封止
の信頼性に優れた電子装置とすることができる。
Further, according to the electronic device of the present invention, in the above structure, since the filler is silver particles having an average particle size of 5 to 40 μm, silver easily reacts with tin which is a main component of solder. , Forming a eutectic alloy layer with a solid layer line temperature of 250 ℃ or more on the filler surface and adjoining adjacent alloy layers satisfactorily, resulting in excellent heat resistance and highly reliable hermetic sealing It can be a device.

【0045】また、本発明の電子装置によれば、上記構
成において、封止材がフィラーを5〜25重量%含有して
いることから、フィラー表面に250℃以上の固相線温度
を有する合金層を適度な割合で形成することができると
ともにフィラーの合金層同士を良好に接合することがで
き、その結果、耐熱性に優れるとともに気密封止に優れ
た電子装置とすることができる。
Further, according to the electronic device of the present invention, in the above structure, since the sealing material contains 5 to 25% by weight of the filler, an alloy having a solidus temperature of 250 ° C. or higher on the surface of the filler. The layers can be formed at an appropriate ratio, and the alloy layers of the filler can be satisfactorily joined to each other. As a result, an electronic device having excellent heat resistance and airtight sealing can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電子装置の実施の形態の一例を示す断
面図である。
FIG. 1 is a sectional view showing an example of an embodiment of an electronic device of the present invention.

【図2】本発明の電子装置の要部拡大断面図である。FIG. 2 is an enlarged cross-sectional view of an essential part of the electronic device of the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・・電子装置 2・・・・・・・絶縁基体 2a・・・・・・枠状のメタライズ金属層 3・・・・・・・蓋体 3a・・・・・・枠状のメタライズ金属層 4・・・・・・・封止材 4a・・・・・・錫を主成分とする半田 4b・・・・・・フィラー 4c・・・・・・合金層 5・・・・・・・空所 6・・・・・・・電子部品 1 ... Electronic device 2 ... Insulating substrate 2a --- Frame-shaped metallized metal layer 3 ... Lid 3a .... Frame-shaped metallized metal layer 4 ... Encapsulating material 4a ... Solder containing tin as a main component 4b ... Filler 4c ··· Alloy layer 5 ... Vacancy 6 ... Electronic parts

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 上面に枠状のメタライズ金属層が被着さ
れた絶縁基体と下面に枠状のメタライズ金属層を有する
蓋体とを、錫を主成分とする半田に該半田より融点が高
いフィラーを含有させた封止材で接合することにより前
記絶縁基体と前記蓋体とで構成される空所内部に電子部
品を気密に収容した電子装置において、前記フィラー
は、該フィラー表面に前記半田と反応して形成された2
50℃以上の固相線温度を有する合金層が形成されてい
るとともに、隣接する前記フィラーの前記合金層同士が
接合していることを特徴とする電子装置。
1. An insulating substrate having a frame-shaped metallized metal layer on its upper surface and a lid having a frame-shaped metallized metal layer on its lower surface are soldered to a solder containing tin as a main component and having a higher melting point than the solder. In an electronic device in which an electronic component is hermetically housed inside a space composed of the insulating base and the lid by joining with a sealing material containing a filler, the filler is the solder on the surface of the filler. Formed by reacting with
An electronic device, wherein an alloy layer having a solidus temperature of 50 ° C. or higher is formed, and the alloy layers of the adjacent fillers are bonded to each other.
【請求項2】 前記合金層の厚さが0.5〜10μmで
あることを特徴とする請求項1記載の電子装置。
2. The electronic device according to claim 1, wherein the alloy layer has a thickness of 0.5 to 10 μm.
【請求項3】 前記フィラーは、平均粒径が5〜40μ
mの銀粒子であることを特徴とする請求項1または請求
項2記載の電子装置。
3. The filler has an average particle size of 5 to 40 μm.
The electronic device according to claim 1 or 2, wherein the electronic device is a silver particle of m.
【請求項4】 前記封止材は、前記フィラーを5〜25
重量%含有していることを特徴とする請求項1乃至請求
項3のいずれかに記載の電子装置。
4. The sealing material contains 5 to 25 of the filler.
The electronic device according to any one of claims 1 to 3, wherein the electronic device contains wt%.
JP2001333282A 2001-10-30 2001-10-30 Electronic apparatus Pending JP2003142620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001333282A JP2003142620A (en) 2001-10-30 2001-10-30 Electronic apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001333282A JP2003142620A (en) 2001-10-30 2001-10-30 Electronic apparatus

Publications (1)

Publication Number Publication Date
JP2003142620A true JP2003142620A (en) 2003-05-16

Family

ID=19148576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001333282A Pending JP2003142620A (en) 2001-10-30 2001-10-30 Electronic apparatus

Country Status (1)

Country Link
JP (1) JP2003142620A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100059244A1 (en) * 2007-03-05 2010-03-11 Kyocera Corporation Microstructure Apparatus and Method for Manufacturing Microstructure Apparatus
WO2011125414A1 (en) * 2010-04-01 2011-10-13 株式会社村田製作所 Electronic component and method for producing same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100059244A1 (en) * 2007-03-05 2010-03-11 Kyocera Corporation Microstructure Apparatus and Method for Manufacturing Microstructure Apparatus
JP5500983B2 (en) * 2007-03-05 2014-05-21 京セラ株式会社 MICROSTRUCTURE DEVICE AND METHOD FOR MANUFACTURING MICROSTRUCTURE DEVICE
WO2011125414A1 (en) * 2010-04-01 2011-10-13 株式会社村田製作所 Electronic component and method for producing same
JP5435040B2 (en) * 2010-04-01 2014-03-05 株式会社村田製作所 Electronic component and manufacturing method thereof
US8835770B2 (en) 2010-04-01 2014-09-16 Murata Manufacturing Co., Ltd. Electronic component and method for manufacturing the same

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