JPH05142788A - レジストパターンの形成方法 - Google Patents

レジストパターンの形成方法

Info

Publication number
JPH05142788A
JPH05142788A JP11762492A JP11762492A JPH05142788A JP H05142788 A JPH05142788 A JP H05142788A JP 11762492 A JP11762492 A JP 11762492A JP 11762492 A JP11762492 A JP 11762492A JP H05142788 A JPH05142788 A JP H05142788A
Authority
JP
Japan
Prior art keywords
resist layer
exposed
resist
layer
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11762492A
Other languages
English (en)
Japanese (ja)
Inventor
Kinya Kamiyama
欣也 上山
Takeshi Fujino
毅 藤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11762492A priority Critical patent/JPH05142788A/ja
Priority to DE19924216888 priority patent/DE4216888C2/de
Priority to KR92008601A priority patent/KR960011911B1/ko
Publication of JPH05142788A publication Critical patent/JPH05142788A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11762492A 1991-05-21 1992-05-11 レジストパターンの形成方法 Withdrawn JPH05142788A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11762492A JPH05142788A (ja) 1991-05-21 1992-05-11 レジストパターンの形成方法
DE19924216888 DE4216888C2 (de) 1991-05-21 1992-05-21 Verfahren zur Bildung einer Resiststruktur
KR92008601A KR960011911B1 (en) 1991-05-21 1992-05-21 Method for forming a patterned resist

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3-115826 1991-05-21
JP11582691 1991-05-21
JP11762492A JPH05142788A (ja) 1991-05-21 1992-05-11 レジストパターンの形成方法

Publications (1)

Publication Number Publication Date
JPH05142788A true JPH05142788A (ja) 1993-06-11

Family

ID=26454254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11762492A Withdrawn JPH05142788A (ja) 1991-05-21 1992-05-11 レジストパターンの形成方法

Country Status (3)

Country Link
JP (1) JPH05142788A (de)
KR (1) KR960011911B1 (de)
DE (1) DE4216888C2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07142349A (ja) * 1993-11-16 1995-06-02 Mitsubishi Electric Corp 現像工程におけるフォトレジストパターンの倒れを防止する方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970002427B1 (en) * 1994-01-14 1997-03-05 Lg Semicon Co Ltd Fine patterning method of photoresist film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07142349A (ja) * 1993-11-16 1995-06-02 Mitsubishi Electric Corp 現像工程におけるフォトレジストパターンの倒れを防止する方法

Also Published As

Publication number Publication date
DE4216888C2 (de) 1998-03-19
DE4216888A1 (de) 1992-11-26
KR960011911B1 (en) 1996-09-04

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990803