JPH0513119B2 - - Google Patents
Info
- Publication number
- JPH0513119B2 JPH0513119B2 JP61056580A JP5658086A JPH0513119B2 JP H0513119 B2 JPH0513119 B2 JP H0513119B2 JP 61056580 A JP61056580 A JP 61056580A JP 5658086 A JP5658086 A JP 5658086A JP H0513119 B2 JPH0513119 B2 JP H0513119B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- ωcm
- specific resistivity
- compound semiconductor
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5658086A JPS62216999A (ja) | 1986-03-14 | 1986-03-14 | 化合物半導体単結晶およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5658086A JPS62216999A (ja) | 1986-03-14 | 1986-03-14 | 化合物半導体単結晶およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62216999A JPS62216999A (ja) | 1987-09-24 |
| JPH0513119B2 true JPH0513119B2 (enrdf_load_stackoverflow) | 1993-02-19 |
Family
ID=13031100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5658086A Granted JPS62216999A (ja) | 1986-03-14 | 1986-03-14 | 化合物半導体単結晶およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62216999A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0787187B2 (ja) * | 1987-08-13 | 1995-09-20 | 古河電気工業株式会社 | GaAs化合物半導体基板の製造方法 |
| JPS6472999A (en) * | 1987-09-14 | 1989-03-17 | Nippon Mining Co | Heat treatment of compound semiconductor single crystal |
| JP2505222B2 (ja) * | 1987-10-16 | 1996-06-05 | 昭和電工株式会社 | 半絶縁体GaAs基板の製造方法 |
| JP2545477B2 (ja) * | 1988-02-24 | 1996-10-16 | 株式会社ジャパンエナジー | 化合物半導体単結晶およびその製造方法並びにそれを用いた半導体装置 |
| US5209811A (en) * | 1988-03-25 | 1993-05-11 | Shin-Etsu Handotai Company Limited Of Japan | Method for heat-treating gallium arsenide monocrystals |
| JPH01257200A (ja) * | 1988-04-08 | 1989-10-13 | Furukawa Electric Co Ltd:The | GaAs化合物半導体基板の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60210591A (ja) * | 1984-04-05 | 1985-10-23 | Hitachi Cable Ltd | 半絶縁性GaAs単結晶の製造方法 |
| JPS6144800A (ja) * | 1984-08-09 | 1986-03-04 | Sumitomo Electric Ind Ltd | 結晶の品質改善方法 |
-
1986
- 1986-03-14 JP JP5658086A patent/JPS62216999A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62216999A (ja) | 1987-09-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |