JPH0513005Y2 - - Google Patents
Info
- Publication number
- JPH0513005Y2 JPH0513005Y2 JP1986015251U JP1525186U JPH0513005Y2 JP H0513005 Y2 JPH0513005 Y2 JP H0513005Y2 JP 1986015251 U JP1986015251 U JP 1986015251U JP 1525186 U JP1525186 U JP 1525186U JP H0513005 Y2 JPH0513005 Y2 JP H0513005Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- waveguide
- generation chamber
- plasma
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011810 insulating material Substances 0.000 claims description 16
- 230000002265 prevention Effects 0.000 claims description 5
- 238000005530 etching Methods 0.000 description 23
- 238000000605 extraction Methods 0.000 description 10
- 230000002093 peripheral effect Effects 0.000 description 7
- 230000005284 excitation Effects 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986015251U JPH0513005Y2 (id) | 1986-02-04 | 1986-02-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986015251U JPH0513005Y2 (id) | 1986-02-04 | 1986-02-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62126831U JPS62126831U (id) | 1987-08-12 |
| JPH0513005Y2 true JPH0513005Y2 (id) | 1993-04-06 |
Family
ID=30806010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986015251U Expired - Lifetime JPH0513005Y2 (id) | 1986-02-04 | 1986-02-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0513005Y2 (id) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61131450A (ja) * | 1984-11-30 | 1986-06-19 | Canon Inc | ドライエツチング装置 |
-
1986
- 1986-02-04 JP JP1986015251U patent/JPH0513005Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61131450A (ja) * | 1984-11-30 | 1986-06-19 | Canon Inc | ドライエツチング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62126831U (id) | 1987-08-12 |
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