JPH05125535A - Vapor deposition frame for forming electrode of piezoelectric substance - Google Patents
Vapor deposition frame for forming electrode of piezoelectric substanceInfo
- Publication number
- JPH05125535A JPH05125535A JP3313343A JP31334391A JPH05125535A JP H05125535 A JPH05125535 A JP H05125535A JP 3313343 A JP3313343 A JP 3313343A JP 31334391 A JP31334391 A JP 31334391A JP H05125535 A JPH05125535 A JP H05125535A
- Authority
- JP
- Japan
- Prior art keywords
- frame
- mask
- piezoelectric
- vapor deposition
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 22
- 239000000126 substance Substances 0.000 title 1
- 230000002093 peripheral effect Effects 0.000 claims abstract description 6
- 238000006073 displacement reaction Methods 0.000 claims abstract description 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000001629 suppression Effects 0.000 claims 1
- 239000013078 crystal Substances 0.000 abstract description 20
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000010408 film Substances 0.000 description 4
- 230000005284 excitation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、圧電体に励振電極を形
成する際に用いる圧電体の電極形成用の蒸着枠に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition frame for forming an electrode of a piezoelectric body used when forming an excitation electrode on the piezoelectric body.
【0002】[0002]
【従来の技術】従来、圧電体を所定の角度に切断して板
状に成形し、板面に真空蒸着等により金属薄膜からなる
電極を形成して圧電振動を励振する圧電共振子が知られ
ている。このような圧電共振子は電子回路の多くの分野
で時間、周波数等の基準として広く用いられている。特
に圧電体として水晶を用いた水晶共振子は水晶の圧電体
としての優れた特性と製造技術の進歩とによって高性能
でコストも安価なために大量に製造され使用されてい
る。しかして水晶共振子の製造工程において、水晶片に
励振電極を形成する場合には、たとえば真空雰囲気にお
いて、アルミ、銀、金等の金属を加熱して金属蒸気を発
生させ、この前面に水晶片を配置して所謂真空蒸着によ
って金属薄膜からなる電極を形成するようにしている。
このような真空蒸着によって電極を形成する場合、生産
性を高めるために複数、たとえば数十個の水晶片を蒸着
枠に挟持して蒸着を行うようにしている。図2はこのよ
うな蒸着枠の一例を示す組立斜視図で外枠1、中枠2お
よび外枠3からなる。そして中枠2には電極を形成すべ
き水晶片の外形形状に対応した保持孔2aを穿設して、
ここに水晶片4を配設する。また、両外枠1、3には、
それぞれ水晶片4の両側板面に形成すべき励振電極の形
状に対応したマスク孔1a、3aを穿設している。そし
て中枠2の保持孔2aに水晶片4を位置させてその両側
に両外枠1、3を配置し、両外枠1、3および中枠2を
貫通するように設けたネジ穴1b、3b、2bにネジ5
を貫装して締め付けて一体化し、水晶片4を所定の位置
に保持するようにしている。2. Description of the Related Art Conventionally, there is known a piezoelectric resonator in which a piezoelectric body is cut at a predetermined angle to be formed into a plate shape, and an electrode made of a metal thin film is formed on the plate surface by vacuum deposition or the like to excite piezoelectric vibration. ing. Such a piezoelectric resonator is widely used as a reference for time, frequency, etc. in many fields of electronic circuits. In particular, quartz resonators using quartz as a piezoelectric body are manufactured and used in large quantities because of their high performance and low cost due to the excellent characteristics of quartz as a piezoelectric body and the progress of manufacturing technology. However, in the process of manufacturing a crystal resonator, when forming an excitation electrode on a crystal piece, for example, a metal such as aluminum, silver, or gold is heated in a vacuum atmosphere to generate metal vapor, and the crystal piece is formed in front of this. Are arranged to form an electrode made of a metal thin film by so-called vacuum deposition.
When the electrodes are formed by such vacuum vapor deposition, a plurality of, for example, several tens of crystal pieces are sandwiched between vapor deposition frames for vapor deposition in order to improve productivity. FIG. 2 is an assembly perspective view showing an example of such a vapor deposition frame, which is composed of an outer frame 1, a middle frame 2 and an outer frame 3. Then, a holding hole 2a corresponding to the outer shape of the crystal piece on which the electrode is to be formed is formed in the middle frame 2,
The crystal piece 4 is arranged here. In addition, in both outer frames 1 and 3,
Mask holes 1a, 3a corresponding to the shapes of the excitation electrodes to be formed on both side plates of the crystal piece 4 are formed. Then, the crystal piece 4 is positioned in the holding hole 2a of the middle frame 2, both outer frames 1 and 3 are arranged on both sides thereof, and screw holes 1b are provided so as to penetrate both outer frames 1 and 3 and the middle frame 2, Screw 5 on 3b, 2b
Are pierced and tightened to be integrated, and the crystal piece 4 is held at a predetermined position.
【0003】しかしてこのような蒸着枠に水晶片4を挟
持する場合には、各水晶片4に均一に締め付け力を作用
させ、かつ外枠1、3を水晶片4の板面に密着させる必
要がある。このため蒸着枠に比較的狭い間隔で多数のネ
ジ5を設けて厚み方向に締め付けて一体化するようにし
ている。たとえば実際に製造工程で使用されている60
個の水晶片4を保持する蒸着枠では15本のネジ5を用
いて締め付けるようにしたものもある。このため蒸着枠
に水晶片4を納めて組み立てる作業は極めて面倒で、し
かも多数のネジ5の締め付け力にムラを生じないように
しなければならず細心の注意と高度の熟練を必要とする
問題があった。蒸着枠を組み立てた際にネジ5の締め付
け力にムラがあると間に挟んだ水晶片4を確実に保持で
きないために、水晶片4は中枠2の透孔2a内で動いて
しまう。このために、たとえば複数の電極膜を重ねて形
成する場合に、電極膜の形成位置にずれを生じて振動特
性を損ない極端な場合はネジ5の締め付け力の片寄りに
よって水晶片4を破損することもあった。However, when the quartz pieces 4 are sandwiched between such vapor deposition frames, a tightening force is uniformly applied to each quartz piece 4, and the outer frames 1 and 3 are brought into close contact with the plate surface of the quartz piece 4. There is a need. For this reason, a large number of screws 5 are provided at relatively narrow intervals on the vapor deposition frame and tightened in the thickness direction to integrate them. For example, 60 actually used in the manufacturing process
There is also a vapor deposition frame for holding the individual crystal pieces 4, which is tightened using 15 screws 5. For this reason, the work of putting the crystal piece 4 into the vapor deposition frame and assembling it is extremely troublesome, and it is necessary to prevent unevenness in the tightening force of the large number of screws 5. there were. If the tightening force of the screw 5 is uneven when the vapor deposition frame is assembled, the crystal piece 4 sandwiched therebetween cannot be reliably held, so that the crystal piece 4 moves within the through hole 2a of the middle frame 2. For this reason, for example, when a plurality of electrode films are formed in a layered manner, the position where the electrode films are formed is deviated, and the vibration characteristics are impaired. There were things.
【0004】[0004]
【発明が解決しようとする課題】本発明は上記の事情に
鑑みてなされたもので、蒸着枠に水晶片を納めて組み立
てる作業を容易に行うことができ、しかも多数の圧電片
に対して均一な力で保持することができ、それによって
蒸着膜を正確な位置精度で形成することができ、良好な
振動特性を得ることができる圧電体の電極形成用の蒸着
枠を提供することを目的とするものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and the work of assembling a crystal piece in a vapor deposition frame can be easily performed, and moreover, it is uniform for a large number of piezoelectric pieces. It is an object of the present invention to provide a vapor deposition frame for forming an electrode of a piezoelectric body, which can be held by various forces, whereby a vapor deposition film can be formed with accurate positional accuracy, and good vibration characteristics can be obtained. To do.
【0005】[0005]
【課題を解決するための手段】本発明は中枠に穿設した
圧電片の外形形状に対応する複数の保持孔にそれぞれ圧
電片を配設し、この中枠の両側板面にそれぞれマスク孔
を有する第1、第2のマスクを添設し、少なくとも一方
のマスクのマスク孔の外周に板厚方向への変位を許容す
る切り溝を設けて該マスク孔の外周部分を中枠方向へ弾
性的に押圧する舌片を有する抑え枠を添設し、中枠、各
マスクおよび抑え板をダボによって位置決めするととも
に板厚方向に緊締する力枠を設けたことを特徴とするも
のである。According to the present invention, piezoelectric pieces are arranged in a plurality of holding holes corresponding to the outer shape of a piezoelectric piece formed in an inner frame, and mask holes are respectively formed on both side plate surfaces of the inner frame. First and second masks having the above are additionally provided, and a kerf for allowing displacement in the plate thickness direction is provided on the outer periphery of the mask hole of at least one of the masks, and the outer peripheral portion of the mask hole is elastic in the middle frame direction. It is characterized in that a holding frame having a tongue piece that is pressed against is attached, a middle frame, each mask and the holding plate are positioned by dowels, and a force frame for tightening in the plate thickness direction is provided.
【0006】[0006]
【実施例】以下、本発明の一実施例を図1に示す組立斜
視図を参照して詳細に説明する。図中11は金属薄板か
らなる中枠で、たとえばエッチング加工等によって電極
を形成すべき圧電片12の外形形状に対応した保持孔1
3を穿設している。そして14、15はそれぞれ第1、
第2のマスクで中枠11の両側板面に添設するようにし
ている。そして第1、第2のマスク14、15も中枠1
1と同様の金属薄板からなり、中枠11に形成した各保
持孔13に対応して、それぞれ圧電片12に形成すべき
電極形状に対応したマスク孔16を穿設している。なお
第2のマスク15の各マスク孔16の外周には切り溝1
7を設けて板厚方向へ変位することを許容するようにし
ている。そして第2のマスク15の外側には抑え枠18
を添設している。この抑え枠18には第2のマスク15
の各マスク孔16の外周部分を中枠11方向へ弾性的に
押圧する舌片19を形成している。そして第1のマスク
14および抑え枠18の外側に、それぞれ力枠20、2
1を設けている。この力枠20、21の一方にはダボ2
2を突設して上記中枠11、各マスク14、15および
抑え枠18の所定の位置を板厚方向に貫通して位置決め
を行うとともに2本のネジ23(1本は図示せず)によ
って一体に板厚方向に緊締するようにしている。なお力
枠20、21による押圧力が均等に作用するように力枠
の対向面は外側に湾曲して成形するようにしてもよい。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the perspective assembly view shown in FIG. Reference numeral 11 in the drawing denotes an inner frame made of a thin metal plate, and a holding hole 1 corresponding to the outer shape of the piezoelectric piece 12 on which an electrode is to be formed by etching or the like.
3 is drilled. 14 and 15 are the first and
The second mask is attached to both side plate surfaces of the middle frame 11. The first and second masks 14 and 15 are also the inner frame 1
The same metal thin plate as that of No. 1 is provided, and mask holes 16 corresponding to the electrode shapes to be formed on the piezoelectric pieces 12 are formed corresponding to the holding holes 13 formed in the middle frame 11. The kerf 1 is formed on the outer periphery of each mask hole 16 of the second mask 15.
7 is provided to allow displacement in the plate thickness direction. The holding frame 18 is provided outside the second mask 15.
Is attached. The second mask 15 is attached to the holding frame 18.
A tongue piece 19 that elastically presses the outer peripheral portion of each mask hole 16 toward the inner frame 11 is formed. Then, outside the first mask 14 and the holding frame 18, the force frames 20 and 2 are provided.
1 is provided. Dowel 2 is provided on one of the force frames 20 and 21.
2 is provided so as to penetrate through the predetermined positions of the inner frame 11, the masks 14 and 15 and the holding frame 18 in the plate thickness direction to perform positioning, and by two screws 23 (one not shown). It is designed to be tightened together in the plate thickness direction. The opposing surfaces of the force frames may be curved outward so that the pressing force of the force frames 20 and 21 acts evenly.
【0007】このような構成であれば、力枠20、21
を2本のネジ23で緊締するようにしているので、ネジ
23の締め付け力のバラツキによって蒸着枠に歪みを生
じることもない。したがって各圧電片12に均等に締め
付け力を作用させることができ、かつ抑え枠18の舌片
19によって第2のマスク15の各マスク孔16の外周
部分を弾性的に中枠11方向に押圧することによって各
圧電片12を所定位置に確実に保持することができる。
しかして力枠20、21を抑えるネジ23は2本だけで
よいので圧電片12を挟み込む作業の作業性も良好であ
り、かつ格別の熟練も必要としない。したがって生産性
を向上し、高品質の金属薄膜を効率よく形成することが
でき高性能の水晶振動子を安価に提供することができ
る。なお本発明は上記実施例に限定されるものではな
く、たとえば上記実施例では丸板状の水晶片を用いた水
晶振動子を用いた例について説明したが、短冊型の水晶
片に電極を形成する場合にも適用することができる。さ
らに上記実施例では、第2のマスクの外側に抑え枠18
を設けるようにしたが、第1、第2の各マスク14、1
5の外側にそれぞれ抑え枠18を設けるようにしてもよ
い。この場合は第1のマスク14のマスク孔の外周部分
にも切り溝を設けることが望ましい。また上記実施例で
は中枠11、マスク14、15、抑え枠18を一体に力
枠20、21で挟持して2本のネジを用いて緊締するよ
うにしているが、このようなものに限定することなく、
たとえばクリップ等を用いて緊締するようにしてもよ
い。With such a structure, the force frames 20, 21
Is tightened with two screws 23, so that the vapor deposition frame is not distorted due to variations in the tightening force of the screws 23. Therefore, the tightening force can be uniformly applied to each piezoelectric piece 12, and the tongue piece 19 of the holding frame 18 elastically presses the outer peripheral portion of each mask hole 16 of the second mask 15 toward the middle frame 11. As a result, each piezoelectric piece 12 can be securely held at a predetermined position.
However, since only two screws 23 for holding the force frames 20 and 21 are required, the workability of sandwiching the piezoelectric piece 12 is good, and no special skill is required. Therefore, productivity can be improved, a high-quality metal thin film can be efficiently formed, and a high-performance crystal resonator can be provided at low cost. It should be noted that the present invention is not limited to the above-described embodiment, and for example, in the above-mentioned embodiment, an example using a crystal oscillator using a round plate-shaped crystal piece has been described, but an electrode is formed on a strip-shaped crystal piece. It can also be applied to the case. Further, in the above embodiment, the holding frame 18 is provided outside the second mask.
However, the first and second masks 14 and 1 are provided.
The restraining frames 18 may be provided on the outer sides of the respective parts 5. In this case, it is desirable to form a kerf on the outer peripheral portion of the mask hole of the first mask 14. Further, in the above embodiment, the middle frame 11, the masks 14 and 15, and the holding frame 18 are integrally clamped by the force frames 20 and 21 and tightened by using two screws, but the invention is not limited to this. Without doing
For example, clips may be used for tightening.
【0008】[0008]
【発明の効果】以上詳述したように、本発明によれば蒸
着枠に圧電片を納めて組み立てる際の作業性が良好で多
数の圧電片に対して均一な力で保持することができ高い
位置精度で蒸着膜を形成することができる圧電体の電極
形成用の蒸着枠を提供することができる。As described above in detail, according to the present invention, the workability when assembling the piezoelectric pieces in the vapor deposition frame is good, and it is possible to hold a large number of piezoelectric pieces with a uniform force. It is possible to provide a vapor deposition frame for forming electrodes of a piezoelectric body, which can form a vapor deposition film with positional accuracy.
【0009】[0009]
【図1】本発明の蒸着枠の一例を示す組立斜視図であ
る。FIG. 1 is an assembled perspective view showing an example of a vapor deposition frame of the present invention.
【図2】従来の蒸着枠の一例を示す組立斜視図である。FIG. 2 is an assembled perspective view showing an example of a conventional vapor deposition frame.
11 中枠 12 水晶片 13 透孔 14、15 マスク 16 マスク孔 17 切り溝 18 抑え枠 19 舌片 20、21 力枠 23 ネジ 11 Middle Frame 12 Crystal Piece 13 Through Hole 14, 15 Mask 16 Mask Hole 17 Cut Groove 18 Holding Frame 19 Tongue Piece 20, 21 Force Frame 23 Screw
Claims (1)
にそれぞれ圧電片を配設した中枠と、 この中枠の両側板面にそれぞれ添設され中枠に設けた各
保持孔に対応して圧電片に形成すべき電極形状に対応し
たマスク孔を穿設した第1、第2のマスクと、 少なくとも一方のマスクのマスク孔の外周に形成した該
マスク孔の部分の板厚方向への変位を許容する切り溝
と、 マスク孔の外周に切り溝を有するマスクの外側に添設さ
れ各マスク孔の外周部分を中枠方向に弾性的に押圧する
舌片を設けた抑え枠と、 上記マスクおよび抑え枠の各外側にそれぞれ添設され中
枠、各マスク枠および抑え板を板厚方向に貫通するダボ
によって位置決めするとともに板厚方向に一体に緊締す
る力枠と、 を具備することを特徴とする圧電体の電極形成用の蒸着
枠。1. A plurality of holding holes corresponding to the outer shape of a piezoelectric piece.
The inner frame with the piezoelectric pieces respectively disposed on the inner frame and the inner frames attached to both side plate surfaces of the inner frame.
Corresponds to the electrode shape to be formed on the piezoelectric piece corresponding to the holding hole
First and second masks having a mask hole formed therein, and the mask formed on the outer periphery of the mask hole of at least one of the masks.
A kerf that allows displacement of the mask hole part in the plate thickness direction
With a kerf on the outer periphery of the mask hole.
Elastically presses the outer peripheral portion of each mask hole toward the middle frame.
Inside the press frame with the tongue and the mask and press frame
Dowels that penetrate the frame, each mask frame, and the suppression plate in the plate thickness direction
Positioning and tightening together in the plate thickness direction
A vapor deposition for electrode formation of a piezoelectric body, characterized by comprising:
frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3313343A JPH05125535A (en) | 1991-10-31 | 1991-10-31 | Vapor deposition frame for forming electrode of piezoelectric substance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3313343A JPH05125535A (en) | 1991-10-31 | 1991-10-31 | Vapor deposition frame for forming electrode of piezoelectric substance |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05125535A true JPH05125535A (en) | 1993-05-21 |
Family
ID=18040111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3313343A Pending JPH05125535A (en) | 1991-10-31 | 1991-10-31 | Vapor deposition frame for forming electrode of piezoelectric substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05125535A (en) |
-
1991
- 1991-10-31 JP JP3313343A patent/JPH05125535A/en active Pending
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