JPH05114795A - Shielding plate - Google Patents

Shielding plate

Info

Publication number
JPH05114795A
JPH05114795A JP27431391A JP27431391A JPH05114795A JP H05114795 A JPH05114795 A JP H05114795A JP 27431391 A JP27431391 A JP 27431391A JP 27431391 A JP27431391 A JP 27431391A JP H05114795 A JPH05114795 A JP H05114795A
Authority
JP
Japan
Prior art keywords
conductive layer
silver paste
electrode
shielding plate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27431391A
Other languages
Japanese (ja)
Other versions
JP2933765B2 (en
Inventor
Kenji Nakamura
謙治 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP27431391A priority Critical patent/JP2933765B2/en
Publication of JPH05114795A publication Critical patent/JPH05114795A/en
Application granted granted Critical
Publication of JP2933765B2 publication Critical patent/JP2933765B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

PURPOSE:To provide a shielding plate which is transparent and excellent in shielding effect so as to protect a TFT liquid crystal panel against malfunction caused by noises which are generated in cold cathode ray tube pack light mounted on the TFT liquid crystal panel. CONSTITUTION:A shielding plate is composed of a transparent conductive layer 3 provided to one side of a high molecular film 2, an anti-reflection layer 4 formed on the conductive layer 3, and a lead-out wire connection electrode 5 formed by forming silver paste into an electrode by burning, where contact resistance between the silver paste electrode and a transparent conductive layer is set less than 2kOMEGA/square. An antireflection layer is formed of material soluble in silver paste, whereby contact resistance can be lessened between a conductive layer and silver paste, and thus a shielding plate excellent in transparency and shielding property can be obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は在来品に比べ透明性が優
れ、かつ電磁波シールド効果を有する、液晶表示部等を
周辺機器から発生する電磁波ノイズから隔離するための
シールド板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shield plate for separating a liquid crystal display section and the like from electromagnetic wave noise generated from peripheral devices, which is more transparent than conventional products and has an electromagnetic wave shielding effect. .

【0002】[0002]

【従来の技術】近年コンピューターは小型軽量化の一途
をたどっている。それに伴い表示部分に液晶パネルが採
用されている。液晶パネルは電圧で駆動されており、冷
陰極管を液晶パネルのバックライトに用いられることが
多い。現在冷陰極管が発生する電位変化により、液晶パ
ネルが誤動作することが問題となっている。冷陰極管か
らの光を遮断することなく該電位変化の影響をなくすこ
とが可能なシールド板の検討が種々行われている。反射
防止層のない透明導電フィルムに引き出し線接続用電極
を有するものはシールド効果は良好であるが反射防止膜
を有するものに比べて透明性の劣とるものしか得られな
い。また従来のフッ化マグネシウム等低屈折率の無機薄
膜を反射防止膜を用いられたものは導電層と引き出し線
接続用電極との接触抵抗が大きく十分なシールド効果が
得がたい欠点があった。
2. Description of the Related Art Recently, computers are becoming smaller and lighter. Along with that, a liquid crystal panel has been adopted for the display part. The liquid crystal panel is driven by voltage, and a cold cathode tube is often used as a backlight of the liquid crystal panel. At present, there is a problem that a liquid crystal panel malfunctions due to a potential change generated by a cold cathode tube. Various studies have been conducted on a shield plate capable of eliminating the influence of the potential change without blocking the light from the cold cathode tube. A transparent conductive film having no antireflection layer and an electrode for connecting a lead wire has a good shielding effect, but only a film having inferior transparency is obtained as compared with one having an antireflection film. Further, a conventional inorganic thin film such as magnesium fluoride using an antireflection film has a drawback that the contact resistance between the conductive layer and the lead-line connecting electrode is large and a sufficient shield effect cannot be obtained.

【0003】[0003]

【発明が解決しようとする課題】本発明は冷陰極管等か
ら発生する電位変化による液晶表示部の誤動作が生じる
問題を解決するために種々の検討の結果なされたもの
で、その目的とするところは、透明性、シールド性の優
れたシールド板を提供することにある。
DISCLOSURE OF THE INVENTION The present invention has been made as a result of various studies in order to solve the problem that the liquid crystal display unit malfunctions due to a potential change generated from a cold cathode tube or the like. Is to provide a shield plate having excellent transparency and shielding properties.

【0004】[0004]

【課題を解決するための手段】本発明は、高分子フィル
ム(2)の少なくとも片側に透明導電層(3)を有し該
導電層上に反射防止層(4)を付与した後に引き出し線
接続用電極(5)として銀ペーストを焼成して形成した
電極を有し、銀ペースト電極と透明導電層との間の接触
抵抗値が2kΩ/□以下であることを特徴とするシール
ド板である。
According to the present invention, a polymer film (2) has a transparent conductive layer (3) on at least one side thereof, and an antireflection layer (4) is provided on the conductive layer, and then leads are connected. A shield plate having an electrode formed by firing a silver paste as a working electrode (5) and having a contact resistance value between the silver paste electrode and the transparent conductive layer of 2 kΩ / □ or less.

【0005】ここでいう接触抵抗値(Rt)は図2に示
すようにシールド板を縦の長さacm横の長さb+2cmの
長方形とし、横両端部に幅1cmの引き出し線接続用電極
を付与した時の電極管抵抗をRmとし導電層のシート抵
抗値をRfとした時、Rt=b/a×Rm−Rfで表わ
されるものとする。
As for the contact resistance value (Rt) here, as shown in FIG. 2, the shield plate is a rectangle having a vertical length of a cm and a horizontal length of b + 2 cm. When the electrode tube resistance is Rm and the sheet resistance value of the conductive layer is Rf, Rt = b / a × Rm-Rf.

【0006】本発明で用いる高分子フィルムは真空蒸
着、イオンプレーティング又は、スパッタ法等で導電性
膜を形成するために耐熱性のある透明な高分子フィルム
が用いられポリスルホン、ポリエーテルスルホン、ポリ
エチレンテレフタレートをはじめとしたポリエステル系
樹脂等が上げられる。
As the polymer film used in the present invention, a transparent polymer film having heat resistance is used for forming a conductive film by vacuum deposition, ion plating, sputtering or the like. Polysulfone, polyether sulfone, polyethylene Examples include polyester resins such as terephthalate.

【0007】又、導電性膜素材である金属および/また
金属酸化物としては、金、銀、ジルコニウム、インジウ
ム、錫、チタン等や又は酸化錫、酸化インジウム、錫−
カドミウム酸化物等を使用することが出来る。
As the metal and / or metal oxide which is the material of the conductive film, gold, silver, zirconium, indium, tin, titanium or the like or tin oxide, indium oxide, tin-
Cadmium oxide or the like can be used.

【0008】当然該導電性膜を高分子フィルムに付与す
るは、真空蒸着法、スパッタ法等の物理堆積や化学メッ
キ法、気相法等の化学堆積法で導電性膜を付与しても何
らさしつかえない。又、これらの導電性膜を高分子フィ
ルムに付与するのに、その密着性等を向上させるために
高分子フィルムと導電層の間に第3層を形成させたもの
であっても何ら差障りはなく、むしろ高分子フィルムと
導電膜層の密着性を上げるということは、その透明導電
フィルムによりつくられたシールド板の可撓性や加工性
を向上させるために望ましいものである。
Naturally, the conductive film may be applied to the polymer film by applying the conductive film by physical deposition such as vacuum deposition method, sputtering method or chemical deposition method such as chemical plating method or vapor phase method. It doesn't matter. In addition, even if a third layer is formed between the polymer film and the conductive layer in order to improve the adhesion and the like of applying these conductive films to the polymer film, there is no problem. Rather, increasing the adhesion between the polymer film and the conductive film layer is desirable in order to improve the flexibility and workability of the shield plate made of the transparent conductive film.

【0009】高分子フィルム(2)に透明導電性膜
(3)を付与したもの、該導電膜膜(3)上に高分子樹
脂をトップコートし反射防止膜層(4)を付与する。こ
の高分子樹脂のトップコート層の屈折率は1.7以下な
らば反射防止効果を示すが好ましくは1.6以下のもの
だと反射光はほとんど発生しなくなりより好ましい。又
高分子樹脂は銀ペーストに対し可溶であり、更に優れた
膜形成性を有している高分子によって形成されたもので
あることが肝要である。このような条件を満たす高分子
としては可溶性のポリカーボネート、PMMA、シアノ
エチル化ヒドロキシエチルセルローズ、シアノエチルプ
ルラーン、シアノエチル化ポバール等が上げられる。
A polymer film (2) provided with a transparent conductive film (3), and a polymer resin is top-coated on the conductive film (3) to provide an antireflection film layer (4). If the refractive index of the top coat layer of this polymer resin is 1.7 or less, an antireflection effect is exhibited, but if it is 1.6 or less, it is more preferable that almost no reflected light is generated. Further, it is important that the polymer resin is soluble in the silver paste and is formed of a polymer having an excellent film forming property. Examples of polymers satisfying such conditions include soluble polycarbonate, PMMA, cyanoethylated hydroxyethyl cellulose, cyanoethyl pullulan, cyanoethylated poval and the like.

【0010】また薄膜形成法としては一般に溶液を用い
た塗布法が用いられ、ディップ法、ロールコーター法、
ドクターブレード法、スピンナー法等の常法が用いられ
る。塗布後乾燥し必要に応じて硬化させて透明導電性フ
ィルム(1)が得られる。
As a thin film forming method, a coating method using a solution is generally used, and a dipping method, a roll coater method,
Conventional methods such as doctor blade method and spinner method are used. After coating, it is dried and, if necessary, cured to obtain a transparent conductive film (1).

【0011】得られた該透明導電性フィルム(1)は銀
ペースト印刷により引き出し線接続用電極(5)が付与
されシールド板となる。図1にシールド板の正面図を示
す。図1中の引き出し線接続用電極部(5)に銀ペース
トをスクリーン印刷し100 〜180 度で10〜120 分焼成す
る。焼成中反射防止膜層中に銀ペースト中の導電物質が
拡散し、引き出し線電接続用電極と導電層間の接続抵抗
値が低くアース線を該電極に接続すると良好なシールド
効果が得られる。接触抵抗値が2kΩ/□以上になると
導電層のシート抵抗値によらずシールド効果が得られな
くなる。
The transparent conductive film (1) thus obtained serves as a shield plate to which the lead-line connecting electrode (5) is applied by silver paste printing. FIG. 1 shows a front view of the shield plate. A silver paste is screen-printed on the lead wire connecting electrode part (5) in FIG. 1 and baked at 100 to 180 ° for 10 to 120 minutes. The conductive substance in the silver paste diffuses into the antireflection film layer during firing, and the connection resistance value between the lead wire connection electrode and the conductive layer is low, and a good shielding effect can be obtained by connecting the ground wire to the electrode. When the contact resistance value is 2 kΩ / □ or more, the shielding effect cannot be obtained regardless of the sheet resistance value of the conductive layer.

【0012】[0012]

【実施例】(実施例1)100 μm厚のPESフィルム
(2)に、アンダーコート剤として、エポキシアクリレ
ートおよびウレタンアクリレートを主成分とする紫外線
硬化物を塗布しさらにスパッタ法にて厚さ30nm、表面
のシート抵抗値300Ω/□のITO薄膜層(3)を形
成した。このITO膜上に シアノエチル化ヒドロキシセルローズ 5 重量部 シアノエチル化プルラーン 5 重量部 レベリング剤;フロラードFC−431(住友スリーエム製) 0.05 重量部 ジメチルホルムアミド 990 重量部 からなるコーティング剤を膜厚200 nmになるように、キ
スコーターにより塗布し、120 ℃で3分間加熱して溶剤
分を飛散させて反射防止膜層(4)を形成した。得られ
た透明導電性フィルムのシート抵抗値は 350Ω/□であ
り、また可視光の全光透過率は90%であった。該透明
導電性フィルム(1)にスクリーン印刷版を用いて銀ペ
ースト(シントーケミトロン製 シントロンK−343
1)を巾1cm、間隔20cmで長さ10cmに塗布し、 160
℃で約1時間焼成した後、図1に示すように縦10cm、
横30cmに打抜き、引き出し線接続用電極(5)を付与
しシールド板を作成した。その後に引き出し線接続用電
極(5)にはんだ付けで引き出し線を付け、TFT液晶
セルと冷陰極管の間に装着した後引き出し線を冷陰極管
のアース電極に接続駆動した所、TFTの周辺電位分布
による誤動作はまったく認められなかった。次いで図2
に従い引出し線接続用電極巾(c)1cm、縦(a)10
cm、横(b)20cmのシールド板測定片を切り出しテス
ターで測定した結果接触抵抗値は10Ω/□であった。
EXAMPLES Example 1 A 100 μm thick PES film (2) was coated with an ultraviolet-cured material containing epoxy acrylate and urethane acrylate as main components as an undercoating agent, and the thickness was 30 nm by a sputtering method. An ITO thin film layer (3) having a surface sheet resistance value of 300Ω / □ was formed. Onto this ITO film, cyanoethylated hydroxycellulose 5 parts by weight cyanoethylated pullulan 5 parts by weight Leveling agent; Florard FC-431 (manufactured by Sumitomo 3M) 0.05 parts by weight dimethylformamide 990 parts by weight A coating agent having a film thickness of 200 nm Was coated with a kiss coater and heated at 120 ° C. for 3 minutes to scatter the solvent component to form an antireflection film layer (4). The sheet resistance value of the obtained transparent conductive film was 350 Ω / □, and the total light transmittance of visible light was 90%. A silver paste (manufactured by Shinto Chemitron, Syntron K-343) was applied to the transparent conductive film (1) using a screen printing plate.
Apply 1) to a length of 10 cm with a width of 1 cm and an interval of 20 cm.
After firing at ℃ for about 1 hour, as shown in Figure 1, length 10 cm,
A blank was punched out to a width of 30 cm, and an electrode (5) for connecting a lead wire was provided to prepare a shield plate. After that, a lead wire is attached to the lead wire connecting electrode (5) by soldering, the lead wire is mounted between the TFT liquid crystal cell and the cold cathode tube, and then the lead wire is connected to the ground electrode of the cold cathode tube and driven. No malfunction due to potential distribution was observed. Then Fig. 2
Drawer wire connection electrode width (c) 1 cm, length (a) 10
As a result of cutting out a shield plate measuring piece of 20 cm in width and 20 cm in width (b) and measuring with a tester, the contact resistance value was 10 Ω / □.

【0013】(比較例1)実施例1中の反射防止膜のみ
をフッ化マグネシウムをスパッタリングにより付与する
方法にかえたシールド板は全光透過率90%以上であっ
たが接触抵抗値は10kΩ/□と高く、TFTの誤動作
防止効果は得られなかった。 (比較例2)実施例1中の反射防止膜を省いた時接触抵
抗値は5Ω/□と良好であったが、シールド板の透明部
分の全光透過率が84%と低く液晶パネル表示部駆動時
の視認性を低下させる結果となった。
(Comparative Example 1) The shield plate obtained by changing the method of applying magnesium fluoride only to the antireflection film in Example 1 had a total light transmittance of 90% or more, but the contact resistance value was 10 kΩ /. It was as high as □, and the effect of preventing malfunction of the TFT was not obtained. (Comparative Example 2) When the antireflection film in Example 1 was omitted, the contact resistance value was as good as 5 Ω / □, but the total light transmittance of the transparent portion of the shield plate was as low as 84% and the liquid crystal panel display section was low. As a result, the visibility during driving was reduced.

【0014】[0014]

【発明の効果】TFT液晶パネル用途のシールド板は高
透明でかつシールド効果が良好なものが必要である。本
発明で得られたシールド板は従来両立が困難であった高
透明高シールド性を有し該用途に好適である。
The shield plate used for the TFT liquid crystal panel is required to be highly transparent and have a good shield effect. The shield plate obtained by the present invention has high transparency and high shieldability, which have been difficult to achieve at the same time, and is suitable for the use.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のシールド板の正面図及びA−A′断面
図である。
FIG. 1 is a front view and an AA ′ cross-sectional view of a shield plate of the present invention.

【図2】シールド板の接触抵抗値を測定するための測定
片の正面図である。
FIG. 2 is a front view of a measuring piece for measuring a contact resistance value of a shield plate.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 高分子フィルムの少なくとも片側に透明
導電層を有し、該導電層上に反射防止膜を付与した後に
引き出し線接続用として銀ペーストを焼成して形成した
電極を有し、該銀ペースト電極と透明導電層との間の接
触抵抗値が2kΩ/□以下であることを特徴とするシー
ルド板。
1. A polymer film having a transparent conductive layer on at least one side, and an electrode formed by firing a silver paste for connecting a lead line after applying an antireflection film on the conductive layer, A shield plate having a contact resistance value of 2 kΩ / □ or less between a silver paste electrode and a transparent conductive layer.
JP27431391A 1991-10-22 1991-10-22 Shield plate Expired - Fee Related JP2933765B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27431391A JP2933765B2 (en) 1991-10-22 1991-10-22 Shield plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27431391A JP2933765B2 (en) 1991-10-22 1991-10-22 Shield plate

Publications (2)

Publication Number Publication Date
JPH05114795A true JPH05114795A (en) 1993-05-07
JP2933765B2 JP2933765B2 (en) 1999-08-16

Family

ID=17539910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27431391A Expired - Fee Related JP2933765B2 (en) 1991-10-22 1991-10-22 Shield plate

Country Status (1)

Country Link
JP (1) JP2933765B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005191164A (en) * 2003-12-25 2005-07-14 Toyobo Co Ltd Electromagnetic wave shield film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005191164A (en) * 2003-12-25 2005-07-14 Toyobo Co Ltd Electromagnetic wave shield film

Also Published As

Publication number Publication date
JP2933765B2 (en) 1999-08-16

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