JP2002006106A - Filter for plasma display panel and plasma display panel display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a filter for PDP which can have easily electrical conduc tion between it and a PDP, and is excellent in assembling to PDPs. SOLUTION: The filter for PDP 100 is provided with a transparent substrate 10, a transparent adhesive agent layer 20 laminated through a shield layer 11 which shields an electromagnetic wave and/or a near infrared ray on the surface of this transparent substrate 10 and electrodes 30 located at a peripheral part of the conductive side of the shield layer 11, directly pasted to a PDP's front display part through the transparent adhesive agent layer 20 and has a characteristic that the electrodes 30 are extended to the PDP's front side along the side of the transparent adhesive agent layer 20.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a filter used for a plasma display panel (hereinafter, referred to as a PDP) and a PDP display using the same.

[0002]

2. Description of the Related Art In today's society, computerization has been remarkably progressing, and the performance required for displays for displaying images as terminals has been diversified. Among them, PDPs are easy to increase in size and thickness, are attracting the most attention as new displays following CRTs and liquid crystals, and are already on the market.

[0003] PDP is a rare gas sealed in a panel,
In particular, a discharge is generated in a gas mainly composed of neon, and the R, G, B phosphors applied to the cells of the panel are generated by the vacuum ultraviolet rays generated at that time. In this light emission process, electromagnetic waves and near infrared rays unnecessary for the operation of the PDP are simultaneously emitted. Electromagnetic waves need to be cut because they cause malfunctions to peripheral devices and adversely affect the human body. Near infrared has a wavelength of 850 to 1,200 n
m, remote control of home appliances, karaoke, audiovisual equipment, etc.
Since the light receiving sensitivity of the controller is 700 to 1,300 nm, there is a problem that the controller malfunctions, and it is necessary to cut the controller.

[0004] In order to cut electromagnetic waves and near infrared rays, various methods have hitherto been attempted. For example, a transparent multilayer film having a structure in which a metal thin film is sandwiched between high-refractive-index transparent thin films is provided as a shield layer on the surface of a transparent substrate, and this filter is provided on the front surface of a PDP with a transparent adhesive layer provided on the back surface of the transparent substrate. There is known a method in which a PDP front plate is attached directly to the front of a PDP via an air layer, or is attached to a transparent molded body such as a glass plate or a hard resin plate to form a front plate for a PDP. Here, in the above-mentioned shield layer, the conductivity and infrared reflection properties of the metal thin film can be utilized, and a function of preventing reflection of visible light on the surface of the metal thin film can be imparted by the high refractive index transparent thin film.

In such a PDP filter, it is necessary to electrically connect the conductive surface of the PDP to the PDP and to ground the PDP. If the filter is not taken, electric charges are charged to the filter, and the filter itself becomes an antenna, which tends to cause inconvenience such as newly oscillating electromagnetic waves. For this reason, conventionally, an electrode is formed by forming a metal film, applying a conductive paste, or bonding a conductive adhesive tape on the peripheral portion of the PDP filter. I have to.

[0006]

However, conventional PDPs
The filter is located at a position where the shield layer is farther from the PDP, that is, at a position on the exposed surface side opposite to the transparent adhesive layer on the transparent substrate. And a protective layer to improve the heat and humidity storage stability, it requires troublesome processing to electrically connect the electrode formed on the periphery of the filter and (the conductive surface of) the shield layer. Or electrical conduction with the PDP side was difficult, and the assemblability to the PDP was poor.

[0007] In view of such circumstances, the present invention provides a P
An electrical connection with the DP can be easily performed.
It is an object of the present invention to provide a PDP filter excellent in assemblability into a DP and a PDP display device using the same.

[0008]

Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, provided a shield layer made of a transparent multilayer film or the like on the surface of a transparent substrate.
A structure in which a transparent adhesive layer facing the DP is laminated, electrodes are formed on the periphery of the conductive surface of the shield layer, and the electrodes are extended to the front side of the PDP along the side surfaces of the transparent adhesive layer. Then, it was found that a PDP filter capable of easily establishing electrical conduction with the PDP was obtained. That is, in this PDP filter, the electrode on the shield layer is a PDP.
Side and directly on the conductive surface of the shield layer,
Further, since this extends to the front side of the PDP, electrical conduction between the PDP and the PDP can be easily achieved, and the PDP can be easily connected.
It has been found that it is easy to assemble into the device.

The PDP filter thus configured can be directly attached to the front display of the PDP via the transparent adhesive layer, so that it is lightweight and thin, and does not require an air layer between the filter and the PDP. Therefore, the filter can be used as a direct-attached type filter having excellent visibility, which does not cause double reflection, and thereby the original function of the shield layer can be well exhibited. It has been found that by establishing electrical continuity with the electromagnetic wave, the electromagnetic shielding effect can be better exhibited. Furthermore, since the shield layer is covered with the transparent substrate in the above directly attached state, even if a protective layer is not provided on the shield layer as in the related art, good surface scratch resistance and moisture heat storage can be obtained. It was also found that good results could be obtained in that the PDP was integrated with the PDP by the above-mentioned direct bonding, and that fragments could be prevented from scattering when the PDP was damaged.

The present invention has been completed based on the above findings. That is, the present invention provides a transparent substrate, a transparent adhesive layer laminated on a surface of the transparent substrate via a shield layer for shielding electromagnetic waves and / or near infrared rays,
An electrode located on the periphery of the conductive surface of the shield layer, and a PDP filter directly attached to the front display of the PDP via the transparent adhesive layer, wherein the electrode is And extending to the front side of the PDP along the side surface of the transparent adhesive layer. In particular, according to the present invention, the electrode
PDP filter of the above configuration extending to a position wrapping the peripheral portion of the side surface and the back surface of the transparent substrate through the side surface of the shield layer, and the above electrode, wherein the electrode has a metal foil as at least one of the constituent materials. A filter for a PDP can be provided.

According to the present invention, as a particularly preferred embodiment of such a filter for a PDP, a shield layer is formed of a transparent multilayer film in which a metal thin film and a high-refractive-index transparent thin film are repeatedly laminated, and the reflection on the back surface of the transparent substrate is provided. A visible light transmittance of 50% or more, a visible light reflectance of 10% or less, a near infrared ray (wavelength: 800 to
(1,200 nm) It is possible to provide a PDP filter having a transmittance of 20% or less. Further, the present invention provides a PDP having the above-described PDP filter directly attached to the front display portion of the PDP via the transparent adhesive layer.
A DP display device can be provided.

[0012]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing an example of the PDP filter of the present invention, and FIG. 2 is a front view of the PDP filter as viewed from the PDP side.

Referring to FIGS. 1 and 2, the PDP of the present invention is shown.
The filter for use 100 includes a transparent substrate 10 and the transparent substrate 1.
0, a shield layer 11 for shielding electromagnetic waves and / or near-infrared rays formed on the surface, a transparent adhesive layer 20 laminated via the shield layer 11, and a shield layer 11 Electrodes 3 located on the periphery of the conductive surface of, for example, four sides
0 and PDP through the transparent adhesive layer 20 described above.
It is configured to be directly pasted on the front display section of
In addition, the electrode 30 extends along the side surface of the transparent adhesive layer 20 to the front surface side of the PDP.

With this configuration, the electrode 30 at the peripheral edge of the shield layer 11 is located on the PDP side and is formed directly on the conductive surface of the shield layer 11, and this extends to the front side of the PDP. Therefore, electrical conduction between the shield layer 11 and the PDP can be easily achieved, and the assembling property to the PDP is improved. In addition, by directly attaching the shield layer 11 to the front display portion of the PDP via the transparent adhesive layer 20, the original function of the shield layer 11 can be exhibited. Can be better expressed. In addition, since the shield layer 11 is covered with the transparent substrate 10 in the directly attached state, the surface abrasion resistance and the resistance to moist heat preservation can be improved without providing a protective layer as in the conventional case. Strong resistance to external moisture, chlorine and sulfur atmospheres.

The transparent substrate 10 may be any as long as it has transparency in the visible light region and has a somewhat smooth surface. For example, polyethylene terephthalate, triacetyl cellulose, polyethylene naphthalate, polyether sulfone, polycarbonate, polyacrylate
And polymer films such as polyetheretherketone, polypropylene, polysterene, and polyimide, but are not limited thereto. The thickness is not particularly limited as long as there is no problem such as formation of heat wrinkles in a dry process, but is usually preferably 10 to 250 μm.

A hard coat layer may be provided on one or both sides of the transparent substrate 10. Hard coat material is
It may be an ultraviolet or electron beam curing type or a thermosetting type. For UV or electron beam curing type, ester type,
Acrylic, urethane, amide, silicone, epoxy, acrylic / urethane, acrylic / epoxy and other monomers and oligomers mixed with a photopolymerization initiator, etc. Then, the photopolymerization initiator may not be contained. The thermosetting type includes resins such as phenolic, urea, melamine, unsaturated polyester, polyurethane, and epoxy resins, if necessary, with a crosslinking agent, polymerization initiator, polymerization accelerator, solvent, and viscosity. Those containing a regulator and the like are included. The thickness of the hard coat layer is suitably from 1 to 10 μm, and more preferably from 2 to 7 μm.

The surface of the transparent substrate 10 is subjected to an etching process such as a sputtering process or a corona process,
A layer in which an easy-adhesion layer for improving the adhesion between the shield layer 11 and the transparent substrate 10 may be formed.

The shield layer 11 may have any function of shielding electromagnetic waves and / or near infrared rays. Preferably, the shield layer 11 is made of a transparent multilayer film in which a metal thin film and a high refractive index transparent thin film are repeatedly laminated. Preferably, the transparent multilayer film has a structure in which a metal thin film is sandwiched between transparent thin films having a high refractive index. FIG. 3 shows a high refractive index transparent thin film 1B / metal thin film 1A / high refractive index transparent thin film 2B from the transparent substrate 10 side.
/ Metal thin film 2A / High refractive index transparent thin film 3B / Metal thin film 3A
This is an example in which the shield layer 11 is constituted by a transparent multilayer film composed of a high refractive index transparent thin film 4B / metal thin film 4A / high refractive index transparent thin film 5B. Here, the number of repetitions of the metal thin film and the high-refractive-index transparent thin film can be increased or decreased as required.

In the above transparent multilayer film, the metal thin film (1)
The materials A, 2A, 3A, and 4A) are preferably, but not particularly limited to, silver and at least one element selected from gold, copper, palladium, platinum, manganese, and cadmium. These metal thin films can be formed by using a vacuum drying process such as a sputtering method, a vacuum evaporation method, or an ion plating method. From the viewpoint of controllability and uniformity of the film thickness, the sputtering method is particularly preferable. .

High refractive index transparent thin films (1B, 2B, 3B, 4
The materials B and 5B) preferably have optical transparency and a refractive index in the range of 1.9 to 2.5. A single material or a material obtained by sintering a plurality of materials may be used. It is more preferable that the material has a migration preventing effect on the metal thin film and a barrier effect of water and oxygen. Specifically, indium oxide, tin oxide, titanium dioxide, cerium oxide,
At least one compound selected from the group consisting of zirconium oxide, zinc oxide, tantalum oxide, niobium pentoxide, silicon dioxide, silicon nitride, aluminum oxide, magnesium fluoride, and magnesium oxide can be preferably used. In particular, those containing indium oxide as a main component and containing a small amount of titanium dioxide, tin oxide, cerium oxide, etc. not only have the effect of preventing the deterioration of the metal thin film, but also have electrical conductivity, so that the metal thin film is This is preferable in that electrical continuity between them is easy. These high-refractive-index transparent thin films can be formed using a vacuum dry process such as a sputtering method, a vacuum evaporation method, or an ion plating method, or a wet method, but from the viewpoint of controllability of film thickness and uniformity. Particularly, the spattering method is preferable.

Although the thickness of the shield layer 11 is not particularly limited, in the case of the transparent multilayer film described above, the thickness of each of the metal thin films (1A, 2A, 3A, 4A) is 1 to 30 n.
m, high refractive index transparent thin film (1B, 2B, 3B, 4B, 5
The thickness of each thin film may be selected so that the optical thickness can be obtained by setting each thickness of B) to a range of 10 to 150 nm. Usually, the total thickness is set to 100 to 500 nm. Is good.

The transparent adhesive layer 20 is made of a base polymer such as an acrylic polymer, a silicone polymer, a polyester, a polyurethane, a polyether, a synthetic rubber, a polyamide, a polyolefin, and an ethylene-vinyl acetate copolymer. Transparent pressure sensitive adhesives are preferably used. In addition to this pressure-sensitive adhesive, an appropriate adhesive such as a hot melt adhesive can also be used, as long as it has excellent transparency and durability. The thickness may be determined as appropriate, but is usually preferably 2 to 200 μm.

The material used for the electrode 30 is not particularly limited as long as it is conductive, has good corrosion resistance, good resistance to wet heat storage, and has good adhesion to the shield layer 11. Specifically, in addition to silver paste, gold, silver,
One metal of copper, platinum, palladium, etc. or 2
Examples include alloys of more than one kind, mixtures of the same metals or alloys as above with organic coating materials, and double-sided conductive tapes prepared by impregnating a copper mesh with an adhesive.

In the case of a conductive double-sided tape, the electrode 30 may be directly bonded to the periphery (four sides) of the conductive surface of the shield layer 11, and may be made of silver paste, various alloy materials, alloys, or the like. In the case of a mixed material or the like, the above-mentioned peripheral portion (a wet process method such as screen printing or microgravure coating method, a dry process method such as a vacuum deposition method or a sputtering method, or a known method such as a plating method) is used. The film may be formed on the four sides). The electrode 30 formed by these methods needs to be extended to the front side of the PDP along the side surface of the transparent adhesive layer 20. Therefore, the thickness of the electrode 30 is as follows:
It is desirable that the thickness is set to be approximately equal to the thickness of the transparent adhesive layer 20.

Further, as shown in FIG. 4, the electrode 30 may extend through the side surface of the shield layer 11 to a position surrounding the peripheral portion of the side surface and the back surface of the transparent substrate 10. In this case, a part or all of the extension may be made of a metal foil such as an aluminum foil. Further, as long as properties such as conductivity and adhesion are satisfied, the entire electrode 30 can be made of metal foil. When the electrode 30 is extended as described above, PD
Since electrical connection with P can be made not only on the conductive surface side of the shield layer 11 but also on the opposite side of the back surface of the transparent substrate 10, the flexibility of assembly is increased. Also,
In electrical connection between the electrode 30 and the PDP, in addition to directly connecting the electrode 30 and the housing of the PDP, connection may be made through an electrode formed on the PDP side.

The PDP filter 1 thus constructed
No. 00 is directly attached to the front display portion (front glass portion) of the PDP via the transparent adhesive layer 20, and the P
By making an electrical connection with the DP, as described above, the original function of the shield layer 11, in particular, an improved electromagnetic shielding effect is exhibited, and the surface abrasion resistance and moisture heat resistance of the shield layer 11 are improved. A PDP display device having excellent storage properties can be obtained. This P
Since the DP display device is directly attached, the DP display device can contribute to preventing scattering of glass of the PDP, reducing the weight, thickness, and cost of the PDP itself. Further, the DP display device has a higher refractive index than a case where a PDP front filter is installed. Since a low air layer is not interposed, problems such as an increase in visible light reflectance due to extra interface reflection and double reflection can be solved, and visibility can be improved.

In the above-mentioned PDP display device of the directly attached type, insufficient strength of the front glass portion may cause a problem.
In order to avoid this, the thickness of the transparent adhesive layer 20 may be increased. In some cases, a film or a molded body capable of effectively absorbing impact may be interposed between the front display portion of the PDP and the filter as an impact protection layer. These layers need only be optically transparent and absorb and reduce impact.

Further, in order to further improve the visibility of the directly attached type PDP display device, in the PDP filter 100 shown in FIGS. 1 to 4, as shown in FIG. The antireflection layer and / or the antiglare layer 40 may be formed on the surface opposite to the surface on which the shield layer 11 is provided). These layers use, as its material, an inorganic compound such as a metal oxide, a fluoride, a silicide, a nitride, a sulfide, a boride, and a carbide, and an organic compound such as a silicon resin and a fluorine-based resin. The thickness may usually be about 0.05 to 1 μm by a sputtering method, a vacuum deposition method, an ion plating method, a wet coating method, or the like. Alternatively, a functional film having such a layer formed on a film substrate in advance may be used, and this may be bonded to the transparent substrate 10 via a transparent adhesive layer.

In the present invention, a particularly preferred PDP filter 100 includes an antireflection layer and / or an antiglare layer 40 on the back surface of a transparent substrate 10 as shown in FIG. Metal thin films (1A, 2A, 3A, 4A) and high refractive index transparent thin films (1
B, 2B, 3B, 4B, and 5B) are repeatedly laminated, and the optical characteristics thereof include a visible light transmittance of 50% or more, a visible light reflectance of 10% or less,
Near infrared (wavelength: 800 to 1,200 nm) transmittance is 2
Those having 0% or less (the near-infrared cut rate is 80% or more) are exemplified. It has a surface resistance of 3Ω /
□ It can be set to the following, and exhibits excellent electromagnetic wave shielding properties due to the electrical connection with the PDP as described above.

[0030]

Next, the present invention will be described more specifically with reference to examples. However, the present invention is not limited only to the following examples. In the following, the measurement of the film thickness was performed by a calibration curve of a film forming speed by a surface roughness meter (DEKTA3) and a precise measurement by a transmission electron microscope. The visible light transmittance, visible light reflectance, near-infrared cut rate, surface resistance of the conductive surface, storage resistance to heat and moisture, and surface scratch resistance were measured by the following methods.

<Visible Light Transmittance and Visible Light Reflectance> An instantaneous multiphotometer “MCPD-3000” manufactured by Otsuka Electronics Co., Ltd.
0 ° incident transmission and reflection spectra were measured, and from the obtained transmission and reflection spectra, JIS R-3016
The visible light transmittance and the visible light reflectivity were calculated according to the above.

<Near-infrared cut rate>"U" manufactured by Hitachi, Ltd.
-3410 "was used to measure the cut rate of light having a wavelength in the range of 800 to 1,200 nm.

<Surface Resistance of Conductive Surface>"Lo" manufactured by Mitsubishi Yuka
using the four-point needle method (JIS K
7194), the surface resistance value (Ω / □) was measured.

<Moisture and heat storage stability>
The sample was placed in a thermo-hygrostat at a relative humidity of 90% for 1,000 hours, and appearance deterioration and changes in optical characteristics were observed.

<Surface Scratch Resistance> On the surface of the test sample,
# 0000 steel wheel was reciprocated 10 times under a load of 2.45 N / cm ² , and the presence or absence of scratches was visually observed.

Example 1 A transparent polyethylene terephthalate (hereinafter referred to as PET) film having a thickness of 125 μm was used as a transparent substrate, and a high refractive index transparent thin film / metal was formed on one surface of the transparent substrate by a DC magnetron sputter method. By a method of repeatedly laminating a thin film / a high refractive index transparent thin film in order, a shield layer composed of a transparent multilayer film was formed. The target material for forming the high refractive index transparent thin film is In ₂ O ₃ -12.6% by weight TiO ₂
And Ag-5% by weight of Au was used as a target material for forming the metal thin film.

The transparent multilayer film thus formed is, from the transparent substrate side, a high-refractive-index transparent thin film (35 nm) / metal thin film (10 nm) / high-refractive-index transparent thin film (70 nm) / metal thin film (15 nm) / high refractive index The structure was as follows: high refractive index transparent thin film (70 nm) / metal thin film (15 nm) / high refractive index transparent thin film (70 nm) / metal thin film (10 nm) / high refractive index transparent thin film (35 nm). The numerical values in parentheses indicate the thickness of each thin film.

Next, Nippon Kayaku Co., Ltd. was added to 100 parts by weight of an ultraviolet curable resin ("KZ7886B" manufactured by JSR Corporation) composed of an acrylic / urethane resin having a refractive index of 1.65.
Was added and diluted with methyl isobutyl ketone to prepare a solution for a high refractive index hard coat layer. This solution is coated on the back surface of the transparent substrate having a shield layer formed on one side with a wire bar # 6, dried at 80 ° C., and irradiated with ultraviolet rays at 200 J / cm ² by an ultra-high pressure mercury lamp. Irradiation was carried out to cure the composition, thereby forming a high refractive index hard coat layer having a thickness of 5 μm.

Next, an alkoxysilane-based sol having a refractive index of 1.36 was applied on the high refractive index hard coat layer with a wire bar, and cured at 120 ° C. for 10 minutes. A low-refractive-index layer having a thickness of 0.1 μm was formed as an anti-reflection layer.

Next, a silver pad is formed on the periphery (four sides) of a shield layer made of a transparent multilayer film formed on one side of the transparent substrate.
Strike [Fujikura Kasei Co., Ltd. "Dootite FA-301C"
A ") was screen-printed and cured at 100 ° C. for 20 minutes to form an electrode having a thickness of 25 μm. Further, a thickness of 2 mm previously formed on a PET separator by coating on the surface of the shield layer so as not to cover the electrode.
A 5 μm acrylic transparent pressure-sensitive adhesive layer is adhered to
A filter for DP was produced. Here, the electrode is located at the periphery of the shield layer, extends along the side surface of the acrylic transparent pressure-sensitive adhesive layer, and is flush with the pressure-sensitive adhesive layer.

This PDP filter was bonded to a slide glass via the transparent pressure-sensitive adhesive layer, and the optical characteristics were evaluated. The visible light transmittance was 62%, the visible light reflectance was 3%, and the near infrared cut rate was 94%. The visible light reflectance was measured by painting the surface of the slide glass opposite to the surface to which the filter for PDP was attached in black. The surface resistance of the conductive surface was 1.7Ω / □. Furthermore, the surface abrasion resistance and the heat and humidity storage stability were examined using the test sample bonded to the slide glass. No remarkable scratches were observed in the surface abrasion resistance test, and the appearance of the filter was extremely good in the moist heat storage resistance test, and no deterioration in appearance and no change in optical characteristics were observed.

Next, a commercially available PDP display device ("42-inch wide plasma display PD manufactured by Fujitsu General Limited") was used.
S-4221-JH "), remove the PDP front plate conventionally attached thereto, and directly attach the PDP filter to the front glass display portion of the PDP via the transparent adhesive layer. The PDP display device was obtained by installing and fixing the PDP housing using a fixing jig such that the entire surface of the electrode at the periphery (4 sides) of the shield layer and the shield layer was completely in contact with each other.

Example 2 In forming an electrode, a technique of immersing in a silver paste (the same as in Example 1) and curing at 100 ° C. for 20 minutes was used. (4 sides),
A peripheral portion (four sides) on (the antireflection layer of) the back side of the transparent substrate;
The electrode straddles the shield layer and the side surface of the transparent substrate, that is, the electrode formed on the peripheral portion of the shield layer in Example 1 wraps the peripheral portion of the side surface and the rear surface of the transparent substrate through the side surface of the shield layer. A PDP filter was manufactured in the same manner as in Example 1, except that an electrode having a configuration extending to the position (the total thickness in the filter thickness direction was 100 nm) was formed.

This PDP filter was directly attached to the front glass display portion of the PDP via the transparent adhesive layer thereof in the same manner as in Example 1 for a commercially available PDP display device. Then, the casing was fixed with a fixing jig such that the entire surface of the electrode at the peripheral portion (four sides) on the rear surface side of the transparent substrate was completely contacted to obtain a PDP display device.

Example 3 In forming the electrodes, a silver pen was applied to the periphery (four sides) of the shield layer on one side of the transparent substrate and the periphery (four sides) of (the antireflection layer thereof) on the back side of the transparent substrate. A screen (same as in Example 1) was screen-printed and cured at 100 ° C. for 20 minutes to form an electrode having a thickness of 25 μm, and the transparent substrate and the side surfaces of the shield layer were formed of aluminum. Example 2 was repeated except that an electrode having almost the same configuration as that of Example 2 was formed by covering with a foil and fixing it with a conductive tape so that both electrodes on the front and back sides were completely electrically connected. Similarly, a filter for PDP was produced.

This PDP filter was directly attached to a commercially available PDP display device via the transparent adhesive layer thereof on the front glass display portion of the PDP by the same operation as in the first embodiment. Then, the casing was fixed with a fixing jig such that the entire surface of the electrode at the peripheral portion (four sides) on the rear surface side of the transparent substrate was completely contacted to obtain a PDP display device.

In order to examine the electromagnetic wave shielding effect of each of the PDP display devices of the first to third embodiments, in an anechoic chamber, an antenna installed at a distance of 10 m from the PDP in a range of 30 to 1000 MHz in an anechoic chamber. Was detected and measured. The results were as shown in Table 1. Table 1 shows the regulated value of VCC1 class A as “Comparative Example 1”, the radiated electric field strength when no filter for PDP is installed as “Comparative Example 2”, and Example 1 as “Reference Example 1”. The radiated electric field strength when the electrode and the casing of the PDP are not electrically connected is also shown.

[0048]

As apparent from Table 1 above, Example 1
In the PDP display devices of Nos. 1 to 3, it was found that a sufficient electromagnetic wave shielding effect was obtained, and that the electromagnetic wave emission level was sufficient to satisfy the VCC1 Class A standard.
In the PDP display device of Reference Example 1, an electromagnetic shielding effect is observed at a frequency of 100 MHz or more.
In P, the radiation intensity is strong, which is particularly problematic 30-1.
In the low frequency range of 00 MHz, almost no electromagnetic wave shielding effect was observed.

As described above, the filters for PDPs of Examples 1 to 3 have a simple electric conduction structure between their electrodes and the PDP, are excellent in assemblability, and have a transparent multilayer film having a shield layer as described above. By providing an anti-reflection layer on the back side of the transparent substrate, electromagnetic wave shielding, near-infrared cut, visibility (visible light transmission, visible light low reflection),
Surface scratch resistance, wet heat storage resistance, etc. can all be satisfied.

[0051]

As described above, according to the present invention, a PDP is provided on a surface of a transparent substrate via a shield layer of electromagnetic waves or near infrared rays.
A transparent adhesive layer to be directly adhered to the front display section is laminated, an electrode is formed on the periphery of the conductive surface of the shield layer, and this electrode extends along the side surface of the transparent adhesive layer to the front side of the PDP. With such a configuration, it is possible to provide a PDP filter which can easily perform electrical conduction with the PDP and has excellent assemblability to the PDP, and a PDP display device using the same. .

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing an example of a plasma display panel filter of the present invention.

FIG. 2 is a front view of the filter shown in FIG. 1 as viewed from a plasma display panel side.

FIG. 3 is a cross-sectional view showing a configuration of a shield layer of the filter shown in FIG.

FIG. 4 is a cross-sectional view showing another example of an electrode structure in the plasma display panel filter of the present invention.

FIG. 5 is a sectional view showing another example (an example in which an antireflection layer is formed) of the filter for a plasma display panel of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Transparent base 11 Shield layer 1A, 2A, 3A, 4A Metal thin film 1B, 2B, 3B, 4B, 5B High refractive index transparent thin film 20 Transparent adhesive layer 30 Electrode 40 Antireflection layer and / or antiglare layer 100 Plasma display Panel filter

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Kazuhiko Miyauchi 1-1-2 Shimohozumi, Ibaraki-shi, Osaka Nitto Denko Corporation (72) Inventor Toshitaka Nakamura 1-1-2 Shimohozumi, Ibaraki-shi, Osaka No. Nitto Denko F-term (reference) 2H048 CA01 CA05 CA12 CA19 CA24 CA25 2K009 AA04 AA15 BB24 CC03 CC14 CC35 CC42 DD02 DD04 EE03 5G435 AA16 BB06 DD11 GG31 GG33 GG34 HH12

Claims (5)

[Claims] 1. A transparent substrate, a transparent adhesive layer laminated on a surface of the transparent substrate via a shield layer for shielding electromagnetic waves and / or near infrared rays, and a conductive surface of the shield layer A filter for a plasma display panel directly attached to the front display section of the plasma display panel via the transparent adhesive layer, wherein the electrode is provided with the transparent adhesive. A filter for a plasma display panel, which extends along the side surface of the layer to the front side of the plasma display panel. 2. The filter for a plasma display panel according to claim 1, wherein the electrode extends to a position surrounding the peripheral portion of the side surface and the back surface of the transparent base via the side surface of the shield layer. 3. The filter for a plasma display panel according to claim 1, wherein the electrode comprises a metal foil as at least one of the constituent materials. 4. The shield layer is composed of a transparent multilayer film in which a metal thin film and a high-refractive-index transparent thin film are repeatedly laminated, and has an antireflection layer and / or an antiglare layer on the back surface of the transparent substrate, and has a visible light transmittance. 50% or more, 10% visible light reflectance
The filter for a plasma display panel according to any one of claims 1 to 3, wherein a transmittance of near infrared rays (wavelength: 800 to 1,200 nm) is 20% or less. 5. A plasma display panel display device comprising the plasma display panel filter according to claim 1 directly attached to a front display portion of the plasma display panel via a transparent adhesive layer. .