JPH05102232A - Semiconductor manufacturing device - Google Patents

Semiconductor manufacturing device

Info

Publication number
JPH05102232A
JPH05102232A JP3259325A JP25932591A JPH05102232A JP H05102232 A JPH05102232 A JP H05102232A JP 3259325 A JP3259325 A JP 3259325A JP 25932591 A JP25932591 A JP 25932591A JP H05102232 A JPH05102232 A JP H05102232A
Authority
JP
Japan
Prior art keywords
capillary
wire
wires
electrode pad
relay point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3259325A
Other languages
Japanese (ja)
Inventor
Jun Taniguchi
潤 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP3259325A priority Critical patent/JPH05102232A/en
Publication of JPH05102232A publication Critical patent/JPH05102232A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78—Apparatus for connecting with wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554—External layer
    • H01L2224/0555—Shape
    • H01L2224/05552—Shape in top view
    • H01L2224/05554—Shape in top view being square
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491—Disposition
    • H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491—Disposition
    • H01L2224/4912—Layout
    • H01L2224/49175—Parallel arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78—Apparatus for connecting with wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78—Apparatus for connecting with wire connectors
    • H01L2224/7825—Means for applying energy, e.g. heating means
    • H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301—Capillary
    • H01L2224/78302—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512—Aligning
    • H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
    • H01L2224/85169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
    • H01L2224/8518—Translational movements
    • H01L2224/85181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852—Applying energy for connecting
    • H01L2224/85201—Compression bonding
    • H01L2224/85205—Ultrasonic bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015—Shape
    • H01L2924/1016—Shape being a cuboid
    • H01L2924/10162—Shape being a cuboid with a square active surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191—Disposition
    • H01L2924/19101—Disposition of discrete passive components
    • H01L2924/19107—Disposition of discrete passive components off-chip wires

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To cut down the required time for wire bonding step as well as the manufacturing cost of semiconductor device by a method wherein, in order to connect an electrode pad to a relay point, the bonding step of multiple wires is performed at one time using a capillary wherein multiple holes are made in-parallel. CONSTITUTION:Wires 3 are passed through respective multiple holes 2 juxtaposed in a capillary 1; the wire 3 ends are made spherical by electric discharge; another capillary 2 is moved to junction an electrode pad 5 with a relay point 6 by pressurization and ultrasonic vibration; and then the wires 3 are cut down. Thus, the bonding step of multiple wires can be performed at one time by equalizing the pitch of the holes 2 of the capillary 1 to that of the electrode pad 5. Furthermore, the dispersion in the loop shape caused by the dispersion in the capillary locus control due to the repetition reproducibility precision of a wire-bonding device can be diminished.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】本発明は、半導体集積回路の表面
に形成された電極パッドと中継点とを導電性細線にて接
続する半導体製造装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus for connecting an electrode pad formed on the surface of a semiconductor integrated circuit and a relay point with a conductive thin wire.

【０００２】[0002]

【従来の技術】半導体集積回路表面に形成された電極パ
ッドとリードフレームのリードやセラミック基板あるい
は樹脂基板表面に形成された配線パターンとを導電性細
線３（以下ワイヤと呼ぶ）を用いて接続することをワイ
ヤボンディングと言う。2. Description of the Related Art Electrode pads formed on the surface of a semiconductor integrated circuit are connected to leads of a lead frame or a wiring pattern formed on the surface of a ceramic substrate or a resin substrate by using conductive thin wires 3 (hereinafter referred to as wires). This is called wire bonding.

【０００３】ここでは、ワイヤボンディングの方式の一
つであるボールボンディングの説明をする。まず先端の
尖った貫通孔を持つ筒状のツール（以下キャピラリと呼
ぶ）にワイヤを通してそのワイヤ先端をキャピラリ下端
よりわずかに突出させ、その突出端を電気放電により加
熱溶融することにより球状にし、電極パッド上にキャピ
ラリを移動させ、加圧，超音波振動により接合する。次
に、ワイヤを送りながら外部接続端子上にキャピラリを
移動させ加圧，超音波振動により接合しながら、ワイヤ
を切断する。以上の動作を電極パッドと外部接続端子と
の接続本数分繰り返される方法である。Here, ball bonding, which is one of wire bonding methods, will be described. First, pass a wire through a cylindrical tool (hereinafter referred to as a capillary) that has a through-hole with a sharp tip, make the tip of the wire slightly protrude from the lower end of the capillary, and make the protruding end spherical by heating and melting by electric discharge. The capillaries are moved onto the pad and bonded by pressure and ultrasonic vibration. Next, while the wire is being fed, the capillary is moved onto the external connection terminal, and the wire is cut while being bonded by pressure and ultrasonic vibration. This is a method in which the above operation is repeated for the number of connections between the electrode pads and the external connection terminals.

【０００４】[0004]

【発明が解決しようとする課題】近年、半導体集積回路
は、多機能化、高機能化が著しく進み、それに伴ない電
極パッド数や外部接続端子数も増加の一途をたどる一方
である。それとあいまって半導体集積回路の小型化に伴
ない電極パッドピッチの微細化も進んでいるが、外部接
続端子側の微細化は遅れており、半導体集積回路から遠
い位置に、外部接続端子を配置しなくてはならず、半導
体集積回路表面の電極パッドと外部接続端子間を長いワ
イヤを用いて接続しなくてはならない。In recent years, semiconductor integrated circuits have become more and more multifunctional and highly functional, and the number of electrode pads and the number of external connection terminals have been increasing along with this. Along with this, miniaturization of the electrode pad pitch is progressing along with the miniaturization of semiconductor integrated circuits, but miniaturization on the external connection terminal side is behind, and external connection terminals are placed at a position far from the semiconductor integrated circuit. It is necessary to connect the electrode pad on the surface of the semiconductor integrated circuit and the external connection terminal with a long wire.

【０００５】しかし、ワイヤボンディング装置精度によ
るキャピラリ軌跡コントロールのばらつきや、ワイヤの
きず、ねじれ等により生ずる、ワイヤの曲がり、たるみ
はワイヤが長くなる程発生しやすくなる。However, as the length of the wire becomes longer, the bending and sagging of the wire, which are caused by variations in the control of the capillary trajectory due to the accuracy of the wire bonding apparatus, flaws and twists of the wire, are more likely to occur.

【０００６】そこで、ワイヤ長さをおさえる為、電極パ
ッドと外部接続端子との間に配線パターンを形成した基
板等の中継点を設けた半導体装置も発明されている。Therefore, in order to reduce the wire length, a semiconductor device has been invented in which a relay point such as a substrate having a wiring pattern is provided between an electrode pad and an external connection terminal.

【０００７】本発明の目的は、上記のような電極パッド
と外部接続端子との間に中継点を有する半導体装置のワ
イヤボンディング所要時間を短縮することにより半導体
装置製造原価の低減を実現することにある。An object of the present invention is to reduce the manufacturing cost of a semiconductor device by shortening the time required for wire bonding of the semiconductor device having a relay point between the electrode pad and the external connection terminal as described above. is there.

【０００８】[0008]

【課題を解決するための手段】本発明の半導体製造装置
は、複数本のワイヤを供給する機構を有し、並列した複
数個の貫通孔２を設けたキャピラリ１を用い、複数本の
ワイヤを通すことにより、一度に複数本のワイヤボンデ
ィングを行なうことを特徴とする。A semiconductor manufacturing apparatus according to the present invention has a mechanism for supplying a plurality of wires and uses a capillary 1 having a plurality of through holes 2 arranged in parallel, and a plurality of wires are It is characterized in that a plurality of wires are bonded at one time by passing them.

【０００９】[0009]

【作用】本発明の上記の構造により、一度に複数本のワ
イヤボンディングを行なうことができ、ループ形状の安
定性、電極パッドのワイヤ接合位置の安定性を向上させ
ることができる。With the above structure of the present invention, a plurality of wires can be bonded at one time, and the stability of the loop shape and the stability of the wire bonding position of the electrode pad can be improved.

【００１０】[0010]

【実施例】図１は本発明に用いるキャピラリの模式図で
あり、図１（ａ）は平面図、図１（ｂ）は側面図であ
る。本発明に用いるキャピラリの形状は、キャピラリ製
造用金型の新規製作を行ない、先端加圧接合部は従来の
キャピラリと同一、並列した孔のピッチは電極パッドの
ピッチと同一にすることにより得られる。1 is a schematic view of a capillary used in the present invention, FIG. 1 (a) is a plan view, and FIG. 1 (b) is a side view. The shape of the capillaries used in the present invention is obtained by making a new die for manufacturing capillaries, the tip pressing joint is the same as the conventional capillaries, and the pitch of the parallel holes is the same as the pitch of the electrode pads. .

【００１１】本発明の半導体製造装置は、並列した複数
個の貫通孔を持ったキャピラリを使用する為、ワイヤを
供給する機構を複数有している。又、キャピラリの向き
と直行する向きに配列された電極パッドと中継点にワイ
ヤボンディングする場合は、キャピラリの取り付けてあ
る部分を直角に回転させることにより行なうことを特徴
とする。Since the semiconductor manufacturing apparatus of the present invention uses the capillaries having a plurality of parallel through holes, it has a plurality of mechanisms for supplying wires. Further, the wire bonding to the relay points and the electrode pads arranged in the direction orthogonal to the direction of the capillaries is characterized in that the portion where the capillaries are mounted is rotated at a right angle.

【００１２】図２から図５は、本発明の実施例を示す説
明図である。キャピラリの並列した複数個の孔のそれぞ
れにワイヤを通し、そのワイヤ先端を電気放電により球
状にし、キャピラリを従来と同様の方法で移動させ、電
極パッド、中継点に加圧、超音波振動により接合を行な
い、ワイヤを切断する。2 to 5 are explanatory views showing an embodiment of the present invention. Insert a wire into each of the parallel holes of the capillary, make the tip of the wire spherical by electric discharge, move the capillary in the same way as in the conventional method, pressurize to the electrode pad and relay point, and join by ultrasonic vibration. And cut the wire.

【００１３】この様に、ワイヤボンディング方法は、従
来と同様のままで、キャピラリの並列した孔のピッチを
電極パッドのピッチと同一にすることにより一度に複数
本のワイヤボンディングを行なうことができるようにな
る。As described above, the wire bonding method is the same as the conventional one, and by making the pitch of the parallel holes of the capillaries the same as the pitch of the electrode pads, a plurality of wire bonds can be bonded at one time. become.

【００１４】又、キャピラリ貫通孔のピッチは固定とな
っている為、電極パッド上にワイヤを接合する際の位置
精度の安定性向上、その他、一度に複数本のワイヤボン
ディグを行なうことにより、ワイヤボンディング装置の
繰り返し再現性精度によるキャピラリ軌跡コントロール
のばらつきの為に発生するループ形状のばらつきの低減
させることができるという特徴をもっている。Further, since the pitch of the through holes of the capillaries is fixed, the stability of the positional accuracy when the wires are bonded onto the electrode pads is improved, and in addition, by bonding a plurality of wires at a time, It has a feature that it is possible to reduce the variation of the loop shape caused by the variation of the capillary trajectory control due to the repeatability accuracy of the wire bonding apparatus.

【００１５】[0015]

【発明の効果】以上述べた様に本発明によれば、キャピ
ラリに並列した複数個の孔を設けることにより、一度に
複数本のワイヤボンディングを行なうことができる。As described above, according to the present invention, it is possible to bond a plurality of wires at one time by providing a plurality of holes in parallel with the capillary.

【００１６】又、従来の一本ずつワイヤボンディングを
する方法では、ワイヤボンディング装置の繰り返し再現
性精度によるキャピラリ軌跡コントロール精度のばらつ
きによるループ形状のばらつきや電極パッド上にワイヤ
を接合する際のワイヤボンディング位置のばらつきが発
生することがあったが、一度に複数本ワイヤボンディン
グを行なうことにより上記不具合の発生頻度を低減する
ことができる。Further, in the conventional method of wire-bonding one wire at a time, the wire bonding apparatus is used to bond the wires on the electrode pads and the loop shape variations due to the capillary locus control accuracy variations due to the repeatability accuracy of the wire bonding apparatus. Although there were cases where the positions varied, the frequency of occurrence of the above problems can be reduced by performing the wire bonding of a plurality of wires at a time.

【図面の簡単な説明】[Brief description of drawings]

【図１】 本発明に用いるキャピラリの模式図であり、
（ａ）は平面図、（ｂ）は側面図である。FIG. 1 is a schematic view of a capillary used in the present invention,
(A) is a plan view and (b) is a side view.

【図２】本発明の実施例のワイヤボンディングの順序を
示す側面図である。FIG. 2 is a side view showing the sequence of wire bonding according to the embodiment of the present invention.

【図３】本発明の実施例のワイヤボンディングの順序を
示す側面図である。FIG. 3 is a side view showing the sequence of wire bonding according to the embodiment of the present invention.

【図４】本発明の実施例のワイヤボンディングの順序を
示す側面図である。FIG. 4 is a side view showing the sequence of wire bonding according to the embodiment of the present invention.

【図５】本発明の実施例のワイヤボンディングの順序を
示す側面図である。FIG. 5 is a side view showing the sequence of wire bonding according to the embodiment of the present invention.

【図６】本発明に用いる半導体装置であり、（ａ）は平
面図、（ｂ）は側面図である。FIG. 6 is a semiconductor device used in the present invention, in which (a) is a plan view and (b) is a side view.

【符号の説明】[Explanation of symbols]

１ キャピラリ ２ 貫通孔 ３ ワイヤ ４ 半導体集積回路 ５ 電極パッド ６ 中継点 ７ 外部接続端子 1 Capillary 2 Through Hole 3 Wire 4 Semiconductor Integrated Circuit 5 Electrode Pad 6 Relay Point 7 External Connection Terminal

Claims (1)

【特許請求の範囲】[Claims] 【請求項１】 半導体集積回路４表面に形成された電極
パッド５と、リードフレーム等の外部接続端子７との間
に、前記電極パッドのピッチと同一ピッチに配列された
導電性を有する中継点６（以下中継点と呼ぶ）が形成さ
れた半導体装置において、電極パッドと中継点とを接続
する際、半導体製造装置に導電性細線を供給する機構を
複数設け、並列した複数個の貫通孔２を設けたボンディ
グツールを用い、複数の導電性細線を通すことにより、
一度に複数本のワイヤボンディングを行なうことを特徴
とした半導体製造装置。1. A conductive relay point arranged between the electrode pad 5 formed on the surface of the semiconductor integrated circuit 4 and an external connection terminal 7 such as a lead frame at the same pitch as the pitch of the electrode pad. In a semiconductor device in which 6 (hereinafter referred to as a relay point) is formed, when connecting the electrode pad and the relay point, a plurality of mechanisms for supplying a conductive thin wire to the semiconductor manufacturing apparatus are provided, and a plurality of parallel through holes 2 are provided. By using a bonding tool equipped with, through multiple conductive thin wires,
A semiconductor manufacturing device characterized by performing bonding of a plurality of wires at a time.
JP3259325A 1991-10-07 1991-10-07 Semiconductor manufacturing device Pending JPH05102232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3259325A JPH05102232A (en) 1991-10-07 1991-10-07 Semiconductor manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3259325A JPH05102232A (en) 1991-10-07 1991-10-07 Semiconductor manufacturing device

Publications (1)

Publication Number Publication Date
JPH05102232A true JPH05102232A (en) 1993-04-23

Family

ID=17332524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3259325A Pending JPH05102232A (en) 1991-10-07 1991-10-07 Semiconductor manufacturing device

Country Status (1)

Country Link
JP (1) JPH05102232A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998031498A1 (en) * 1997-01-22 1998-07-23 Equilasers, Inc. Laser-driven microwelding apparatus and process
JP2009141193A (en) * 2007-12-07 2009-06-25 Rohm Co Ltd Wire bonding method and capillary
US8008183B2 (en) * 2007-10-04 2011-08-30 Texas Instruments Incorporated Dual capillary IC wirebonding

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998031498A1 (en) * 1997-01-22 1998-07-23 Equilasers, Inc. Laser-driven microwelding apparatus and process
US5938952A (en) * 1997-01-22 1999-08-17 Equilasers, Inc. Laser-driven microwelding apparatus and process
US8008183B2 (en) * 2007-10-04 2011-08-30 Texas Instruments Incorporated Dual capillary IC wirebonding
JP2009141193A (en) * 2007-12-07 2009-06-25 Rohm Co Ltd Wire bonding method and capillary

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