JPH0487156U - - Google Patents
Info
- Publication number
- JPH0487156U JPH0487156U JP13031790U JP13031790U JPH0487156U JP H0487156 U JPH0487156 U JP H0487156U JP 13031790 U JP13031790 U JP 13031790U JP 13031790 U JP13031790 U JP 13031790U JP H0487156 U JPH0487156 U JP H0487156U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- mass spectrometer
- inductively coupled
- valve
- frequency inductively
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000009834 vaporization Methods 0.000 claims description 2
- 230000008016 vaporization Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案の高周波誘導結合プラズマ質量
分析装置を示す図、第２図は従来の高周波誘導結
合プラズマ質量分析装置を示す図である。
１……試料加熱気化室、３……管、４……プラ
ズマイオン化室、５……サンプリングオリフイス
、６……インターフエース、７……質量分析計、
１２……ＣＰＵ、１５，１６……バルブ。
FIG. 1 is a diagram showing a high frequency inductively coupled plasma mass spectrometer according to the present invention, and FIG. 2 is a diagram showing a conventional high frequency inductively coupled plasma mass spectrometer. 1... Sample heating vaporization chamber, 3... Tube, 4... Plasma ionization chamber, 5... Sampling orifice, 6... Interface, 7... Mass spectrometer,
12...CPU, 15,16...Valve.
Claims (1)
バルブを設け、乾燥中の溶媒をプラズマに導入し
ないようにしたことを特徴とする高周波誘導結合
プラズマ質量分析装置。 A high-frequency inductively coupled plasma mass spectrometer characterized in that a valve is provided between a sample heating vaporization chamber and a plasma ionization chamber to prevent a solvent during drying from being introduced into the plasma.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13031790U JPH0487156U (en) | 1990-11-30 | 1990-11-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13031790U JPH0487156U (en) | 1990-11-30 | 1990-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0487156U true JPH0487156U (en) | 1992-07-29 |
Family
ID=31877670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13031790U Pending JPH0487156U (en) | 1990-11-30 | 1990-11-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0487156U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012069516A (en) * | 2010-08-25 | 2012-04-05 | Hitachi High-Technologies Corp | Drug detection device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01183050A (en) * | 1988-01-07 | 1989-07-20 | Toshiba Corp | Sample introducing device for inductive coupling plasma mass analysis |
-
1990
- 1990-11-30 JP JP13031790U patent/JPH0487156U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01183050A (en) * | 1988-01-07 | 1989-07-20 | Toshiba Corp | Sample introducing device for inductive coupling plasma mass analysis |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012069516A (en) * | 2010-08-25 | 2012-04-05 | Hitachi High-Technologies Corp | Drug detection device |